Patents Assigned to Rave LLC
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Patent number: 10384238Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: May 20, 2016Date of Patent: August 20, 2019Assignee: RAVE LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. Leclaire
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Patent number: 10330581Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: May 20, 2016Date of Patent: June 25, 2019Assignee: RAVE LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. Leclaire
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Patent number: 9958771Abstract: A method and apparatus for removing a pellicle from a photomask wherein the adhesive between the pellicle frame and photomask is cooled sufficiently to allow the adhesive property of the adhesive to diminish to the point where the adhesive will release from the photomask with little or no mechanical force and leaving minimal adhesive on the photomask. The adhesive is cooled by way of manifolds containing coolant being brought in contact with the pellicle frame or by way of a coolant spray nozzles spraying coolant directly onto the pellicle frame.Type: GrantFiled: June 23, 2016Date of Patent: May 1, 2018Assignee: RAVE LLCInventors: Brian J. Grenon, James Boyette, Alexander M. Figliolini
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Publication number: 20170371239Abstract: A method and apparatus for removing a pellicle from a photomask wherein the adhesive between the pellicle frame and photomask is cooled sufficiently to allow the adhesive property of the adhesive to diminish to the point where the adhesive will release from the photomask with little or no mechanical force and leaving minimal adhesive on the photomask. The adhesive is cooled by way of manifolds containing coolant being brought in contact with the pellicle frame or by way of a coolant spray nozzles spraying coolant directly onto the pellicle frame.Type: ApplicationFiled: June 23, 2016Publication date: December 28, 2017Applicant: Rave LLCInventors: Brian J. Grenon, James Boyette
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Patent number: 9588420Abstract: A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.Type: GrantFiled: February 19, 2016Date of Patent: March 7, 2017Assignee: RAVE LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 9285674Abstract: A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.Type: GrantFiled: March 12, 2015Date of Patent: March 15, 2016Assignee: RAVE LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 8986460Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.Type: GrantFiled: June 3, 2014Date of Patent: March 24, 2015Assignee: Rave, LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 8741067Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.Type: GrantFiled: November 11, 2013Date of Patent: June 3, 2014Assignee: Rave, LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Publication number: 20140130215Abstract: The present invention discloses a method of fabricating a scanning probe microscopy probe including positioning a pattern probe over a mold substrate; indenting the pattern probe into the mold substrate material to form a mold pit; depositing a film onto the mold substrate including the mold pit; removing a portion of the deposited film to form a probe, and releasing the probe from the mold substrate material.Type: ApplicationFiled: November 7, 2012Publication date: May 8, 2014Applicant: RAVE, LLCInventors: David Brinkley, Roy L. White
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Patent number: 8696818Abstract: A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.Type: GrantFiled: October 15, 2012Date of Patent: April 15, 2014Assignee: Rave LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Publication number: 20140069457Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.Type: ApplicationFiled: November 11, 2013Publication date: March 13, 2014Applicant: Rave, LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 8613803Abstract: Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, the surface of a substrate having a contaminating particulate disposed thereon is cleaned by directing a laser towards the substrate, generating a temperature increase in the substrate and transferring thermal energy from the substrate to the particulate to decompose the particulate. The laser has a wavelength that is substantially the same as a local maximum of the substrate absorption spectrum.Type: GrantFiled: October 22, 2012Date of Patent: December 24, 2013Assignee: Rave, LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 8562749Abstract: A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.Type: GrantFiled: May 20, 2012Date of Patent: October 22, 2013Assignee: Rave LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Publication number: 20130037053Abstract: A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.Type: ApplicationFiled: October 15, 2012Publication date: February 14, 2013Applicant: RAVE, LLCInventor: Rave, LLC
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Patent number: 8334084Abstract: A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.Type: GrantFiled: August 19, 2011Date of Patent: December 18, 2012Assignee: Rave LLCInventor: Tod Evan Robinson
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Patent number: 8293019Abstract: Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.Type: GrantFiled: November 24, 2008Date of Patent: October 23, 2012Assignee: Rave, LLCInventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
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Patent number: 8287653Abstract: A method of debris removal is provided. The method includes positioning a nanometer-scaled tip adjacent to a piece of debris on a substrate. The method also includes adhering the piece of debris to the tip. In addition, the method also includes removing the piece of debris from the substrate by moving the tip away from the substrate.Type: GrantFiled: September 17, 2007Date of Patent: October 16, 2012Assignee: Rave, LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Publication number: 20120231397Abstract: A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.Type: ApplicationFiled: May 20, 2012Publication date: September 13, 2012Applicant: RAVE LLCInventors: Jeffrey E. Le Claire, Kenneth G. Roessler, David Brinkley
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Patent number: 8182609Abstract: The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a thermal increase in the particle and removing the particle from the substrate by thermal decomposition. The laser has a wavelength that substantially coincides with a high absorption coefficient of the particle.Type: GrantFiled: August 8, 2008Date of Patent: May 22, 2012Assignee: Rave, LLCInventors: Jeffrey E. Le Claire, Kenneth G. Roessler, David Brinkley
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Publication number: 20110303062Abstract: A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.Type: ApplicationFiled: August 19, 2011Publication date: December 15, 2011Applicant: RAVE LLCInventor: Tod Evan Robinson