Abstract: This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material. Therefore, embodiments of the present invention minimizes tip deflection errors allowing allow high aspect Nano-bits to reliably and accurately nanomachine small high aspect three dimensional structures to repair and rejuvenate photomasks.
Abstract: A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.
Type:
Grant
Filed:
March 25, 2008
Date of Patent:
August 9, 2011
Assignee:
Rave, LLC
Inventors:
Jeffrey E. LeClaire, Kenneth Gilbert Roessler, David Brinkley
Abstract: A method of nanomachining is provided. The method includes plunging a nanometer-scaled tip into a surface of a substrate at a first location in a first direction that is substantially perpendicular to the surface, thereby displacing a first portion of the substrate with the tip. The method also includes withdrawing the tip from the substrate in a second direction that is substantially opposite to the first direction. The method further includes moving at least one of the tip and the substrate laterally relative to each other. In addition, the method also includes plunging the tip into the substrate at a second location in a third direction that is substantially parallel to the first direction, thereby displacing a second portion of the substrate with the tip and withdrawing the tip from the substrate in a fourth direction that is substantially opposite to the third direction.
Type:
Grant
Filed:
September 17, 2007
Date of Patent:
November 9, 2010
Assignee:
Rave, LLC
Inventors:
Bernabe J. Arruza, Ronald Bozak, Kenneth Gilbert Roessler, Andrew Dinsdale, Tod Evan Robinson, David Brinkley
Abstract: This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material.
Abstract: A scan data collection operation includes performing a scanning operation using a scan path that includes a directional component that is additional to a data collection directional component. The collected scan data is mapped to another set of locations, thus allowing for detection of surface features using fewer scans.
Abstract: A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.
Type:
Application
Filed:
January 14, 2009
Publication date:
May 7, 2009
Applicant:
RAVE LLC
Inventors:
Barry F. HOPKINS, David J. Ray, Jeffrey E. LeClaire, Roy White
Abstract: A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.
Type:
Grant
Filed:
May 2, 2006
Date of Patent:
February 24, 2009
Assignee:
Rave LLC
Inventors:
Barry F. Hopkins, David J. Ray, Jeffrey E. LeClaire, Roy White
Abstract: A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.
Type:
Grant
Filed:
February 2, 2005
Date of Patent:
January 29, 2008
Assignee:
Rave, LLC
Inventors:
Barry F. Hopkins, David J. Ray, Jeffrey E. LeClaire, Roy White
Abstract: A scan data collection operation includes performing a scanning operation using a scan path that includes a directional component that is additional to a data collection directional component. The collected scan data is mapped to another set of locations, thus allowing for detection of surface features using fewer scans.
Abstract: A scan data collection operation includes performing a scanning operation using a scan path that includes a directional component that is additional to a data collection directional component. The collected scan data is mapped to another set of locations, thus allowing for detection of surface features using fewer scans.