Abstract: In an embodiment, metal-organic nanowires or nanofibers comprising polymer chains with around 100 or more repeat units are synthesized. The metal-organic nanowires or nanofibers are exposed to a reactive gas at a temperature in excess of around 100° C. and at a pressure in the range from around 0.001 to around 100 atmospheres.

Abstract: An electroplating apparatus includes an electrode at the bottom of a chamber, an ionically resistive element with through holes arranged horizontally at the top of the chamber, with a membrane in the middle. One or more panels extend vertically and parallelly from the membrane to the element and extend linearly across the chamber, forming a plurality of regions between the membrane and the element. A substrate with a protuberance extending along a chord of the substrate and contacting a top surface of the element is arranged above a first region. An electrolyte flowed between the substrate and the element descends into the first region via the through holes on a first side of the protuberance and ascends from the first region via the through holes on a second side of the protuberance, forcing air bubbles out from a portion of the element associated with the first region.

Abstract: A power generation system comprises a fuel gas supply device 13 for controlling methane concentration or carbon dioxide concentration in a mixed gas MG containing methane and carbon dioxide within a setting range for the concentration in the fuel gas of a gas engine 11, and for supplying the mixed gas MG to the gas engine 11 as the fuel gas, and a gas concentration sensor 14 for measuring the carbon dioxide concentration or the methane concentration of the mixed gas MG.

Abstract: A solid-state lamp includes a first plurality of solid-state emitters that emit light at visible wavelengths and a second plurality of solid-state emitters that emit light at a safe ultraviolet wavelength, wherein the second plurality of solid-state emitters emit light at least when the first plurality of solid-state emitters emit light.

Abstract: Methods and apparatus for determining whether a substrate includes an unacceptably high amount of oxide on its surface are described. The substrate is typically a substrate that is to be electroplated. The determination may be made directly in an electroplating apparatus, during an initial portion of an electroplating process. The determination may involve immersing the substrate in electrolyte with a particular applied voltage or applied current provided during or soon after immersion, and recording a current response or voltage response over this same timeframe. The applied current or applied voltage may be zero or non-zero. By comparing the current response or voltage response to a threshold current, threshold voltage, or threshold time, it can be determined whether the substrate included an unacceptably high amount of oxide on its surface. The threshold current, threshold voltage, and/or threshold time may be selected based on a calibration procedure.

Abstract: Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.

Abstract: Processing methods and apparatus for increasing a reaction chamber batch size. Such a method of processing deposition substrates (e.g., wafers), involves conducting a deposition on a first portion of a batch of deposition wafers in a reaction chamber, conducting an interval conditioning reaction chamber purge to remove defects generated by the wafer processing from the reaction chamber; and following the interval conditioning mid-batch reaction chamber purge, conducting the deposition on another portion of the batch of wafers in the reaction chamber. The interval conditioning reaction chamber purge is conducted prior to exceeding a baseline for acceptable defect (e.g., particle) generation in the chamber and is performed while no wafers are positioned in the reaction chamber.

Abstract: Imaging layers on the surface of a substrate may be patterned using next generation lithographic techniques, and the resulting patterned film may be used as a lithographic mask, for example, for production of a semiconductor device.

Abstract: Methods and systems for monitoring of sensor data for processing by machine-learning models to generate event predictions to estimate a risk a medical event are provided. An electronic device or wearable smart device may monitor the output of various sensors to collect data related to a person's activity level, location changes, and communications and may use this information as input to a personalized trained machine-learning model to predict a likelihood of an event.

Abstract: The embodiments herein relate to apparatuses and methods for electroplating one or more materials onto a substrate. Embodiments herein utilize a cross flow conduit in the electroplating cell to divert flow of fluid from a region between a substrate and a channeled ionically resistive plate positioned near the substrate down to a level lower than level of fluid in a fluid containment unit for collecting overflow fluid from the plating system for recirculation. The cross flow conduit can include channels cut into components of the plating cell to allow diverted flow, or can include an attachable diversion device mountable to an existing plating cell to divert flow downwards to the fluid containment unit. Embodiments also include a flow restrictor which may be a plate or a pressure relief valve for modulating flow of fluid in the cross flow conduit during plating.

Abstract: Embodiments of the present disclosure relate to atomic beam collimators and, more particularly, to miniaturized coplanar atomic beam collimators. In some examples, an atomic beam collimator may comprise an atomic channel disposed in a substrate. Additional atomic channels may be provided coplanar with the first atomic channel in the substrate. Some examples include a series of cascaded atomic channels, each cascaded atomic channel separated by a gap. The gaps may reduce the off-flux atoms in the output of the atomic collimator. In some examples, a system may comprise an atomic collimator, an atom source, and/or a microelectromechanical system device. These component can be separate devices or can be incorporated into a common substrate.

Abstract: In one aspect, embodiments of the present disclosure can comprise a non-contact signal detection system for detecting movement associated with a subject. The system can comprise a carrier source configured to generate a first carrier signal in phase coherence with a second carrier signal. Additionally, the system may incorporate a phase-locked loop including noise pre-cancellation system for suppressing the noise associated with a beat signal and a controlled oscillation system. The noise pre-cancellation system can be configured to phase-lock the beat signal to a first reference signal in order to stabilize the phase of the beat signal and pre-cancel the noise associated with the beat signal. The controlled oscillation system can include a propagation pathway on which a transmission signal is phase-modulated with a vibratory signal of the subject. Once acquired, the vibratory signal can have suppressed noise.

Abstract: This disclosure relates to recombinant or chimeric FVIII proteins, variants, and vectors encoding the proteins containing one or more ancestral mutations. In certain embodiments, one or more protein domains comprise amino acid sequences that are derived from ancestrally reconstructed amino acid sequences. In certain embodiments, the disclosure relates to pharmaceutical compositions comprising the proteins or vectors and related methods of inducing blood clotting.

Abstract: A transformational energy efficient technology using ionic liquid (IL) to couple with monoethanolamine (MEA) for catalytic CO2 capture is disclosed. [EMmim+][NTF2?] based catalysts are rationally synthesized and used for CO2 capture with MEA. A catalytic CO2 capture mechanism is disclosed according to experimental and computational studies on the [EMmim+][NTF2?] for the reversible CO2 sorption and desorption.

Abstract: Embodiments of the present disclosure can include a method for convective intracellular delivery including providing cells and molecules to a microchannel having compressive surfaces, wherein the compressive surfaces define compression gaps having a height of from 20 and 80% of the average cell diameter; and a plurality of relaxation spaces disposed between the compressive surfaces; flowing the cell medium through the microchannel, wherein as the cell medium flows through the microchannel, the plurality of cells undergo a convective intracellular delivery process comprising: compressing the plurality of cells, wherein the compressing causes the plurality of cells to undergo a loss in intracellular volume (Vloss); and passing the plurality of cells to a first relaxation space, wherein the plurality of cells undergo a gain in volume (Vgain) and absorb a portion of the plurality of molecules.

Abstract: Methods for wet-etching semiconductor samples and devices fabricated from the same are disclosed. The methods can be for selectively wet-etching a semiconductor sample comprising selecting a liquid-phase solution such that when the semiconductor sample is etched with the liquid-phase solution, at least a portion of one of a first doped region or a second doped region is etched at a greater rate than at least a portion of the other of the first doped region or the second doped region; and wet-etching, with the liquid-phase solution, the at least a portion of one of the first doped region or the second doped region at a first etch rate and the at least a portion of the other of the first doped region or the second doped region at a second etch rate; wherein the first etch rate can be greater than the second etch rate.

Abstract: A method or apparatus for three-dimensionally printing. The method may comprise causing a phase change in a region of the first material by applying focused energy to the region using a focused energy source, and displacing the first material with a second material. The apparatus may comprise a container configured to hold a first material, a focused energy source configured to cause a phase change in a region of the first material by applying focused energy to the region, and an injector configured to displace the first material with a second material. The first material may comprise a yield stress material, which is a material exhibiting Herschel-Bulkley behavior. The yield stress material may comprise a soft granular gel. The second material may comprise one or more cells.

Abstract: Systems and methods for achieving a pre-determined factor associated with the edge region within the plasma chamber is described. One of the methods includes providing an RF signal to a main electrode within the plasma chamber. The RF signal is generated based on a frequency of operation of a first RF generator. The method further includes providing another RF signal to an edge electrode within the plasma chamber. The other RF signal is generated based on the frequency of operation of the first RF generator. The method includes receiving a first measurement of a variable, receiving a second measurement of the variable, and modifying a phase of the other RF signal based on the first measurement and the second measurement. The method includes changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.

Abstract: Tensegrity structures and methods of constructing tensegrity structures of three-dimensional tensegrity lattices formed from truncated octahedron elementary cells. Space-tiling translational symmetry is achieved by performing recursive reflection operations on the elementary cells. This topology exhibiting unprecedented static and dynamic mechanical properties.

Abstract: A method includes: receiving a first signal from a first sensor at a first filter and preventing passage of a first portion of the first signal via the first filter. The first portion of the first signal is at a first RF. A second portion of the first signal is indicative of a first temperature of a first electrode in a plasma chamber. The method further includes: outputting a second signal from the first filter; receiving the second signal at a second filter; and preventing passage of a portion of the second signal via the second filter. The portion of the second signal is at a second RF. The second RF is less than the first RF. The first filter and the second filter are implemented on a printed circuit board. The method further includes adjusting a temperature of the first electrode based on an output of the second filter.