Patents Assigned to Rohm and Haas Electronic Materials, LLC
  • Patent number: 10844037
    Abstract: Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: November 24, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Paul J. Labeaume
  • Patent number: 10831100
    Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: November 10, 2020
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: Emad Aqad, James W. Thackeray
  • Patent number: 10821433
    Abstract: An ion exchange resin comprises a crosslinked resin and a salt covalently bonded to a carbon of the resin, wherein the salt comprises a first non-metallic cation and a first counteranion, wherein the first counteranion comprises a second non-metallic cation and a thiosulfate counteranion, and wherein the ion exchange resin is essentially free of metals. The ion exchange resin finds particular use in the removal of impurities from solutions that are useful in the manufacture of semiconductor devices.
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: November 3, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Andrey Rudenko, Gerhard Pohlers
  • Patent number: 10818493
    Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: October 27, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere
  • Patent number: 10818860
    Abstract: The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer; and the polymer comprises, as polymerized units, at least one or more monomers having a first monomer structure comprising a) a polymerizable group, b) an electroactive group with formula NAr1Ar2Ar3 wherein Ar1, Ar2 and Ar3 independently are C6-C50 aromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: October 27, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Anatoliy N Sokolov, Brian Goodfellow, Robert David Grigg, Liam P Spencer, John W Kramer, David D Devore, Sukrit Mukhopadhyay, Peter Trefonas, III
  • Patent number: 10809616
    Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: October 20, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
  • Patent number: 10794866
    Abstract: Acoustic wave sensors comprise: a piezoelectric layer, first and second electrodes arranged with the piezoelectric layer in a piezoelectric transducer circuit; and a polymeric sensing layer for adsorbing a gas-phase analyte, the adsorption of which analyte causes a change in resonant frequency of the piezoelectric transducer circuit, wherein the polymeric sensing layer comprises: (a) a polymer chosen from substituted or unsubstituted: polyarylenes comprising the reaction product of monomers comprising a first monomer comprising an aromatic acetylene group and a second monomer comprising a cyclopentadienone group; polyamides; polypyrazoles; or novolacs; or a cured product thereof; (b) a polymer chosen from substituted or unsubstituted: polyamic acids; or polyamic acid-polyimide copolymers; (c) a polymer formed from one or more monomers comprising a monomer comprising a polar group-substituted arylcyclobutene group, or a cured product thereof; or (d) a polymer comprising polymerized units of a monomer chosen fr
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: October 6, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Christopher Gilmore, Aaron A. Rachford, Hee Jae Yoon, Jaclyn Murphy, Peter Trefonas, III, Deyan Wang
  • Patent number: 10788751
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: September 29, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Matthew Grandbois, Myung Yeol Kim, Eui Hyun Ryu, Jae Hwan Sim, Min Kyung Jang, Jung-June Lee
  • Patent number: 10790146
    Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: September 29, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Shintaro Yamada, Li Cui, Christopher Gilmore, Joshua A. Kaitz, Sheng Liu, James F. Cameron, Suzanne M. Coley
  • Patent number: 10754249
    Abstract: In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: August 25, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Michael K. Gallagher, Owendi Ongayi
  • Patent number: 10738039
    Abstract: Reaction products of diamines with the reaction products of monoamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: August 11, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Lingli Duan, Chen Chen, Shaoguang Feng, Zukhra I. Niazimbetova, Maria Anna Rzeznik
  • Patent number: 10738388
    Abstract: Copper electroplating baths include reaction products of amines and polyacrylamides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: August 11, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Weijing Lu, Lingli Duan, Zukhra Niazimbetova, Chen Chen, Maria Rzeznik
  • Publication number: 20200230433
    Abstract: This invention provides a phototherapy garment for treating neonatal jaundice, the phototherapy garment comprising a first layer of a flexible soft-textured non-woven material, a second layer of a flexible stretchable substrate supporting light-emitting diode (LED) light sources and a thin flexible third layer with heat transfer capability to provide dissipation of waste heat from the LEDs of the second layer. This invention also provides a phototherapy garment for treating other medical conditions.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 23, 2020
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: H DAVOD ROSENFELD, JEFFREY M CALVERT
  • Patent number: 10719014
    Abstract: New photoresist compositions are provided that comprise a component that comprises an amide group and multiple hydroxyl groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and an amide component with multiple hydroxyl groups that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: July 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Chunyi Wu, Gerhard Pohlers, Gregory P. Prokopowicz, Mingqi Li, Cheng-Bai Xu
  • Patent number: 10718059
    Abstract: Nickel electroplating compositions containing cationic polymers of a reaction product of an imidazole compound and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: July 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael Lipschutz, Sen Kang
  • Patent number: 10711360
    Abstract: Nickel electroplating compositions containing copolymers of arginine and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: July 14, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Patent number: 10703917
    Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: July 7, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: John P. Amara, James F. Cameron, Jin Wuk Sung, Gregory P. Prokopowicz
  • Patent number: 10684549
    Abstract: Pattern-formation methods comprise: (a) providing a substrate; (b) forming a photoresist pattern over the substrate; (c) applying a pattern treatment composition to the photoresist pattern, the pattern treatment composition comprising a solvent mixture comprising a first organic solvent and a second organic solvent, wherein the first organic solvent has a boiling point that is greater than a boiling point of the second organic solvent, and wherein the first organic solvent has a boiling point of 210° C. or more; and (d) thereafter heating the photoresist pattern. The methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: June 16, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin Rowell, Cong Liu, Cheng Bai Xu, Irvinder Kaur, Xisen Hou, Mingqi Li
  • Patent number: 10670965
    Abstract: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: June 2, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Cong Liu, Cheng-Bai Xu, Mingqi Li
  • Patent number: 10662541
    Abstract: Copper electroplating baths include reaction products of amines, polyacrylamides and bisepoxides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: May 26, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Weijing Lu, Lingli Duan, Zukhra Niazimbetova, Chen Chen, Maria Rzeznik