Patents Assigned to Rohm and Haas Electronic Materials, LLC
  • Publication number: 20190346763
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 14, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Patent number: 10474032
    Abstract: In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: November 12, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Michael K. Gallagher
  • Patent number: 10472563
    Abstract: The present invention provides methods for making polymerizable monomer compositions comprising purifying a (b) monomer mixture of (i) one or more monomers having at least two polymerizable vinyl groups and (ii) one or more monomers having a single polymerizable vinyl group as part of a (meth)acrylate ester group by any one or more of treating the monomer mixture in an activated porous alumina or silica column, sieve drying the monomer mixture in a vacuum followed by drying over dried molecular sieves having average pore sizes of from 2 to 20 Angstroms, freeze-pump-thaw (FPT) treating by freezing the monomer mixture in a vessel or container to a temperature below ?75° C., degassing the monomer mixture by application of vacuum in the range of 102 to 10?2 Pa, sealing the vessel or container under vacuum, and thawing the composition to room temperature; and, combining in an inert gas atmosphere the resulting monomer mixture (b) with a composition (a) of quantum dots in dry form or organic solvent solution.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: November 12, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Liang Chen, Leslie E. O'Leary, Zhifeng Bai, Yuming Lai, Jake Joo
  • Patent number: 10466588
    Abstract: New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: November 5, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Cheng-Bai Xu
  • Patent number: 10458032
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: October 29, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Patent number: 10454036
    Abstract: The present invention relates to a polymeric charge transfer layer comprising a polymer and a p-dopant. The polymer comprises as polymerized units, Monomer A, Monomer B, and Monomer C crosslinking agent. The present invention further relates to an organic electronic device, especially an organic light emitting device containing the polymeric charge transfer layer.
    Type: Grant
    Filed: January 8, 2015
    Date of Patent: October 22, 2019
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials Korea Ltd., Rohm and Haas Electronic Materials LLC
    Inventors: Liam P. Spencer, Hong-Yeop Na, Yoo-Jin Doh, Chun Liu, Minrong Zhu, Jichang Feng, Zhengming Tang, Shaoguang Feng, Kenneth L. Kearns, Jr., Timothy De Vries, Sukrit Mukhopadhyay, John W. Kramer, Peter Trefonas, III, David D. Devore, William H. H. Woodward
  • Patent number: 10435380
    Abstract: Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: October 8, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Lingli Duan, Chen Chen, Shaoguang Feng, Zukhra I. Niazimbetova, Maria Anna Rzeznik
  • Patent number: 10428436
    Abstract: Indium electroplating compositions containing amine compounds in trace amounts to electroplate substantially defect-free uniform indium which has a smooth surface morphology. The indium electroplating compositions can be used to electroplate indium metal on metal layers of various substrates such as semiconductor wafers and as thermal interface materials.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: October 1, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Yi Qin, Kristen Flajslik, Mark Lefebvre
  • Patent number: 10399893
    Abstract: A coated glass substrate. The coated glass substrate comprises a glass sheet having a thickness from 0.1 to 0.7 mm and coated on a first side with a first optical layer having a positive photo-elastic constant and coated on a second side with a second optical layer having a negative photo-elastic constant.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: September 3, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Company, Dow Global Technologies LLC
    Inventors: Shih-Wei Chang, Lanfang Li, Kathleen M. O'Connell, Weijun Zhou
  • Patent number: 10377848
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: August 13, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Seon-Hwa Han, Sung Wook Cho, Hae-Kwang Pyun, Jung-June Lee, Shintaro Yamada
  • Patent number: 10370320
    Abstract: Provided are purification methods, comprising: (a) providing an organic solvent and a phenolic peroxide formation inhibitor, wherein the organic solvent has a first boiling point at standard atmospheric pressure (bp1) and the phenolic peroxide formation inhibitor has a second boiling point at standard atmospheric pressure (bp2) that satisfy the following inequality (I): bp2?(1.10)(bp1)??(I); and (b) heating the organic solvent and the phenolic peroxide formation inhibitor to a temperature causing the organic solvent and phenolic peroxide formation inhibitor to vaporize, and (ii) condensing the vaporized organic solvent and peroxide formation inhibitor to provide a purified mixture of the organic solvent and peroxide formation inhibitor. The methods find particular use in the purification of solvents that are useful in process chemicals for the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: August 6, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Andrey Rudenko, Gerhard Pohlers
  • Patent number: 10365562
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: July 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Vipul Jain, Suzanne Coley, Anthony Zampini
  • Patent number: 10359698
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: July 23, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Patent number: 10340144
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: July 2, 2019
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES, LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Patent number: 10317795
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: June 11, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • Publication number: 20190163055
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Patent number: 10294569
    Abstract: A specific cysteine derivative is added to electroless copper plating compositions to improve the stability of the electroless copper plating compositions such that the plating activity of the electroless plating copper compositions is not compromised even when electroless plating at low plating temperatures and high stabilizer and high leached catalyst concentrations.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: May 21, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Alejo M. Lifschitz Arribio, Donald E. Cleary
  • Patent number: 10295910
    Abstract: New photoresist are provided that comprises a low-Tg component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: May 21, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Gerhard Pohlers
  • Patent number: 10294359
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer comprising a polymer wherein the surface tension of the polymer with the first polymer and the surface tension of the polymer with the second polymer are both lower than the surface tension between the first polymer and second polymer; where the additive polymer comprises a reactive functional moiety that forms a bond or a complex or a coordinate with the substrate upon being disposed on the substrate; where the reactive functional moiety is unreacted when it is a part of the composition; and a solvent.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: May 21, 2019
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Phillip D. Hustad, Jieqian Zhang, Peter Trefonas, III
  • Patent number: 10273591
    Abstract: A flux composition which includes one or more organic compounds including one or more sulfonic acid groups, salts or anhydrides thereof is applied to tin or tin alloy deposits. The flux composition is then homogenized on the tin or tin alloy to inhibit tin or tin alloy oxidation and improve brightness of the tin or tin alloy.
    Type: Grant
    Filed: January 20, 2013
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Peter R. Levey