Abstract: Disclosed is a coating comprising a polymeric layer, wherein the polymeric layer comprises a reaction product of a first monomer comprising two or more aromatic acetylene groups and a second monomer comprising two or more cyclopentadienone groups, or a cured product of the reaction product. The coating may or may not additionally contain a crosslinker and/or a thermal acid generator. Optical thin films made from the coatings exhibit refractive indices that make them useful as interlayers for matching refractive indices between adjacent layers of display devices; thereby improving device output efficiency.
Type:
Grant
Filed:
November 9, 2020
Date of Patent:
September 5, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Catherine Mulzer, Anastasia L. Patterson, Charles R. Kinzie, Brian Litchfield, Christopher D. Gilmore, Bethany L. Seckman
Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
Type:
Grant
Filed:
July 8, 2021
Date of Patent:
August 22, 2023
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Charlotte A. Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron, Daniel Greene
Abstract: Reaction products of amines and polymers containing saturated heterocyclic moieties may be used as levelers in metal electroplating baths. The reaction products may plate metal with good surface properties and good physical reliability.
Type:
Grant
Filed:
January 17, 2020
Date of Patent:
August 22, 2023
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Lingli Duan, Chen Chen, Tong Sun, Zukhra I. Niazimbetova, Maria Anna Rzeznik
Abstract: Crystal plane orientation enrichment compounds are applied to copper to modify copper grain orientation distribution to the favorable crystal plain orientation to enhance copper electroplating. Electroplating copper on the modified copper enables faster and selective electroplating.
Type:
Grant
Filed:
April 1, 2022
Date of Patent:
June 27, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Alejo M. Lifschitz Arribio, Jonathan D. Prange, Michael K. Gallagher, Alexander Zielinski, Luis A. Gomez, Joseph F. Lachowski
Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.
Type:
Grant
Filed:
November 30, 2020
Date of Patent:
May 2, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
Abstract: Silver electroplating compositions deposit rough, matt silver having needle-like grain structures. The rough, matt, silver deposits enable good adhesion with dielectric materials, even in environments of high relative humidity.
Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
Type:
Grant
Filed:
April 18, 2016
Date of Patent:
March 28, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Emad Aqad, James W. Thackeray, James F. Cameron
Abstract: There is provided a polymer which is the copolymerization product from a mixture including: (a) 10-50 mol % of at least one addition polymerizable arylcyclobutene monomer; (b) 15-50 mol % of at least one addition polymerizable diene monomer; and (c) 15-60 mol % of at least one addition polymerizable aromatic vinyl monomer. The polymer can be used in electronic applications.
Type:
Grant
Filed:
November 30, 2020
Date of Patent:
March 14, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Colin Hayes, Colin Calabrese, Michael K Gallagher, Robert K Barr
Abstract: Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.
Type:
Grant
Filed:
February 3, 2022
Date of Patent:
February 14, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC (RHEM)
Inventors:
Youngmin Yoon, Miguel A. Rodriguez, Michael Lipschutz, Jamie Y. C. Chen, Kristen Griffin
Abstract: There is provided a curable composition for forming an anti-reflective film. The composition includes: (a) hollow silica nanoparticles; (b) a siloxane binder having reactive groups; (c) at least one additional material having reactive groups; (d) an initiator; and (e) solvent. The siloxane binder is present in an amount that is at least 50% by weight of the total weight of (siloxane binder+additional materials having reactive groups). The weight ratio of hollow silica nanoparticles to the total of (siloxane binder+additional materials having reactive groups) is no greater than 1.75 to 1.
Abstract: A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.
Type:
Grant
Filed:
October 15, 2019
Date of Patent:
January 31, 2023
Assignees:
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Hye-Won Lee, Min Kyung Jang, Soo Jung Leem, Jae Hwan Sim, Emad Aqad
Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
Type:
Grant
Filed:
December 22, 2016
Date of Patent:
January 10, 2023
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Emad Aqad, William Williams, III, James F. Cameron
Abstract: Crystal plane orientation enrichment compounds are applied to copper to modify copper grain orientation distribution to the favorable crystal plain orientation to enhance copper electroplating. Electroplating copper on the modified copper enables faster and selective electroplating.
Type:
Grant
Filed:
September 21, 2020
Date of Patent:
November 29, 2022
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Alejo M. Lifschitz Arribio, Jonathan D. Prange, Michael K. Gallagher, Alexander Zielinski, Luis A. Gomez, Joseph F. Lachowski
Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
Type:
Grant
Filed:
December 7, 2017
Date of Patent:
November 22, 2022
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the polymer comprises polymerized units of general formulas (I) and (II): wherein: X independently represents a halogen atom; Q represents a single bond, —O—, or —C(O)O—; R1 independently represents hydrogen, a halogen atom, C1-C12 alkyl or C1-C12 fluoroalkyl; R2 represents C1-C3 alkyl or C1-C3 fluoroalkyl; and m is an integer from 0 to 4; and wherein the polymerized units of general formula (I) are present in the polymer in an amount of 10 to 90 mol % and the polymerized units of general formula (II) are present in the polymer in an amount from 10 to 60 mol %, based on total polymerized units of the polymer. The photoresist pattern trimming compositions and their use in pattern formation methods find particular applicability in the manufacture of semiconductor devices.
Abstract: Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include thiol terminal aliphatic compounds having carboxyl or sulfonic groups which enable deposition of silver rich binary silver-bismuth alloys having deposits which are matte to semi-bright, uniform and have a low coefficient of friction.
Type:
Grant
Filed:
September 1, 2020
Date of Patent:
September 6, 2022
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Miguel A. Rodriguez, Youngmin Yoon, Michael Lipschutz, Jamie Y. C. Chen
Abstract: A polymer composite comprising: (a) quantum dots; (b) polymerized units of a compound of formula (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent; and (c) a light stabilizer compound comprising two 1-alkyloxy-2,2,6,6-tetramethyl-4-piperidinyl substituents.
Type:
Grant
Filed:
June 22, 2017
Date of Patent:
June 28, 2022
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventors:
Jaebum Joo, James C. Taylor, Tanya Singh-Rachford