Patents Assigned to S'Tile
  • Patent number: 9741881
    Abstract: A photovoltaic module and its manufacturing method. The module includes a first support wafer made of sintered silicon and a second layer of single-crystal silicon.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: August 22, 2017
    Assignee: S'TILE
    Inventors: Alain Straboni, Emmanuel Turlot
  • Patent number: 9230806
    Abstract: The present invention relates to a method for forming a crystallized silicon layer made up of grains having an average size of no less than 20 ?m, including at least the steps that comprise: (1) providing a layer of silicon to be (re)crystallized, the average grain size of which is less than 10 ?m; (2) placing said layer of silicon to be (re)crystallized in contact with a liquid composition at least partially made up of a metal solvent; and (3) exposing the assembly to a thermal treatment suitable for (re)crystallizing said layer of silicon with the expected grain size, characterized in that said thermal treatment includes heating the assembly made up of the layer of silicon in contact with said liquid composition to a temperature that is lower than 1410° C. and at least equal to the eutectic temperature in the solvent-silicon phase diagram.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: January 5, 2016
    Assignees: Commissariat a l'Energie Atomique et aux Energies Alternatives, S'Tile
    Inventors: Jean-Paul Garandet, Virginie Brize, Etienne Pihan, Alain Straboni, Florent Dupont
  • Patent number: 8975093
    Abstract: The instant disclosure relates to a device and method for recrystallising a silicon wafer or a wafer comprising at least one silicon layer. The silicon wafer or the at least one silicon layer of the wafer is totally molten.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: March 10, 2015
    Assignee: S'Tile
    Inventor: Alain Straboni
  • Patent number: 8405183
    Abstract: An electronic structure includes a first area having silicon grains having a size smaller than 100 micrometers and a second area superposed to the first area and having silicon grains having a size greater than or equal to 100 micrometers. The first and second areas form a support. At least one layer of an epitaxial semiconductor material is disposed on the second area.
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: March 26, 2013
    Assignee: S'Tile Pole des Eco-Industries
    Inventor: Alain Straboni
  • Publication number: 20120164760
    Abstract: The instant disclosure relates to a device and method for recrystallising a silicon wafer or a wafer comprising at least one silicon layer. The silicon wafer or the at least one silicon layer of the wafer is totally molten.
    Type: Application
    Filed: July 22, 2010
    Publication date: June 28, 2012
    Applicant: S'Tile
    Inventor: Alain Straboni
  • Patent number: 8192648
    Abstract: A method of forming a material from a source material including the following steps of grinding the source material to get powders if the source material is not already in the form of powders; sintering the powders with at least one compression step and one thermal processing step; and purifying the material with a gas flow, the gas flow passing through the porosity channels of the material.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: June 5, 2012
    Assignee: S'Tile
    Inventor: Alain Straboni
  • Publication number: 20110186111
    Abstract: A photovoltaic module and its manufacturing method. The module includes a sintered silicon support including several integrated photovoltaic cells.
    Type: Application
    Filed: November 24, 2010
    Publication date: August 4, 2011
    Applicant: S'Tile
    Inventors: Alain Straboni, Emmanuel Turlot
  • Publication number: 20100258172
    Abstract: An electronic structure includes a first area having silicon grains having a size smaller than 100 micrometers and a second area superposed to the first area and having silicon grains having a size greater than or equal to 100 micrometers. The first and second areas form a support. At least one layer of an epitaxial semiconductor material is disposed on the second area.
    Type: Application
    Filed: April 14, 2010
    Publication date: October 14, 2010
    Applicant: S'TILE
    Inventor: Alain Straboni
  • Publication number: 20090039319
    Abstract: A method of forming a material from a source material including the following steps of grinding the source material to get powders if the source material is not already in the form of powders; sintering the powders with at least one compression step and one thermal processing step; and purifying the material with a gas flow, the gas flow passing through the porosity channels of the material.
    Type: Application
    Filed: August 1, 2008
    Publication date: February 12, 2009
    Applicant: S'TILE
    Inventor: Alain Straboni
  • Publication number: 20090028740
    Abstract: A method of manufacturing a semiconductor material in the form of bricks or granules, includes a step of sintering powders of at least one material selected from the group consisting of silicon, germanium, gallium arsenide, and the alloys thereof so as to form said granules. The sintering step includes the steps of compacting and thermal processing the powders, and a step of purifying the semiconductor material using a flow of a gas. The gas flow passes through the porosity channels of the material.
    Type: Application
    Filed: August 1, 2008
    Publication date: January 29, 2009
    Applicant: S'TILE
    Inventor: Alain Straboni
  • Patent number: D441881
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: May 8, 2001
    Assignee: U.S. Tile
    Inventor: Eric Martin Hahn