Abstract: The present invention is embodied in a carbon dioxide compression and delivery device that uses a plurality of reversible thermoelectric devices and to a method to operate such carbon dioxide compression and delivery device.

Abstract: The present invention is embodied in a carbon dioxide compression and delivery device that uses a plurality of reversible thermoelectric devices and to a method to operate such carbon dioxide compression and delivery device.

Abstract: An apparatus for recycling exhaust gas includes a vessel containing a reversible ammonia sorber material which is exothermic when sorbing (“loading”) ammonia and which is endothermic when releasing (“unloading”) ammonia. A first valve selectively couples a source of exhaust gas including ammonia to a first port of the vessel, a second valve selectively couples a vacuum pump to the vessel, and a third valve selectively coupling a second port of the vessel to an output. A controller opens and closes the first valve, the second valve and the third valve to implement a loading phase, an intermediate venting phase and an unloading phase for the vessel.

Abstract: A hydrogen purification method that is used to separate hydrogen gas from a source gas. A hydrogen separator is provided that has at least one hydrogen permeable tube. A support tube is provided for each hydrogen permeable tube. A support tube is coaxially aligned with the hydrogen permeable tube, wherein a micro-channel exists between the hydrogen permeable tube and the support tube in an area of overlap. A tubular wire structure is placed within the micro-channel. The tubular wire structure is coated with catalyst material. The source gas is introduced into the micro-channel. The source gas spreads thinly past the tubular wire structure in the micro-channel. The restrictions of the micro-channel cause the source gas to embody turbulent flow characteristics as it flows. The turbulent flow causes the hydrogen separator to separate hydrogen from the source gas in a highly efficient manner.

Abstract: The tube assemblies are joined together into a matrix by a plate. The plate has a first surface, an opposite second surface and a plurality of holes. Each hole has a countersunk region that descends into the plate from the first surface. Tube assemblies are provided. Each tube assembly has a first end, an opposite second end, and a flare structure. The flare structure is sized to be fully received within the countersunk region. The tube assemblies extend through the holes in the plate. The flare structure of each tube assembly is welded to the plate within the countersunk region of each hole through which each tube assembly passes.

Abstract: The tube assemblies are joined together into a matrix by a plate. The plate has a first surface, an opposite second surface and a plurality of holes. Each hole has a countersunk region that descends into the plate from the first surface. Tube assemblies are provided. Each tube assembly has a first end, an opposite second end, and a flare structure. The flare structure is sized to be fully received within the countersunk region. The tube assemblies extend through the holes in the plate. The flare structure of each tube assembly is welded to the plate within the countersunk region of each hole through which each tube assembly passes.

Abstract: An apparatus for recycling exhaust gas includes a vessel containing a reversible ammonia sorber material which is exothermic when sorbing (“loading”) ammonia and which is endothermic when releasing (“unloading”) ammonia. A first valve selectively couples a source of exhaust gas including ammonia to a first port of the vessel, a second valve selectively couples a vacuum pump to the vessel, and a third valve selectively coupling a second port of the vessel to an output. A controller opens and closes the first valve, the second valve and the third valve to implement a loading phase, an intermediate venting phase and an unloading phase for the vessel.

Abstract: The invention teaches a purification system which uses a series of operations, in a single unit, to purify air, while extending the life of the purification units. Air is passed through a coarse water trap to remove liquid. The semi-dry air, is then passed through adsorbers, which remove the remaining moisture and all the carbon dioxide in a purification process. The present invention flows the air to be purified through adsorption columns twice, before and after passing the air through an oxygen catalyst unit. The flows of air are then rotated to a third column, which is thermally regenerating with the facilitation of a regeneration air supply from the purified air.

Abstract: The present invention provides a gas purification system with improved efficiency, simpler construction, cost reductions, form factor improvements, and increased durability. The present invention provides cost and form factor improvements through fewer components overall and through utilizing multiple integrated components. Prior art gas purification systems are more bulky and complicated. The present invention achieves increased thermal efficiency through utilization of a regenerative heat exchanger to recapture a portion of the heat energy transferred to the gas during the purification process. Prior art purifiers lacked a regenerative heat exchanger. The present invention integrates the two components into one integrated heater and purification vessel assembly. The present invention integrates the two discrete components into one integrated hydrogen sorption and particle filter assembly. The integrated hydrogen sorption and particle filter assembly is also capable of operating at higher temperatures.

Abstract: The present invention provides a gas purification system with improved efficiency, simpler construction, cost reduction, form factor improvements, and increased durability. The present invention provides cost and form factor improvements through fewer components overall and through utilizing multiple integrated components. Prior art gas purification system are more bulky and complicated. The present invention achieves increased thermal efficiency through utilization of a regenerative heat exchanger to recapture a portion of the heat energy transferred to the gas during the purification process. Prior art purifiers lacked a regenerative heat exchanger. The present invention integrates the two components into one integrated heater and purification vessel assembly. The present invention integrates the two discrete components into one integrated hydrogen sorption and particle filter assembly. The integrated hydrogen sorption and particle filter assembly is also capable of operating at higher temperatures.

Abstract: A rejuvenable ambient temperature purifier is provided. The purifier includes an enclosure with a chamber having an inlet and an outlet. Purifier material comprising a mixture of a transition metal material and a getter material is disposed within the chamber. The transition metal material is in a dispersed form with at least 5% of the transition metal material being in metallic form. The getter material is also in a dispersed form intermixed with the transition metal material. The getter material is selected from the group including Zr, Ti, Nb, Ta, V, and alloys thereof.

Abstract: A semiconductor manufacturing system includes a getter-based gas purifier coupled in flow communication with a gas distribution network for a semiconductor fabrication facility. The gas distribution network supplies purified gas to at least one wafer processing chamber in the semiconductor fabrication facility. The gas purifier includes a getter column having a metallic vessel with an inlet, an outlet, and a containment wall extending between the inlet and the outlet. Getter material which purifies gas flowing therethrough by sorbing impurities therefrom is disposed in the vessel. A first temperature sensor is disposed in a top portion of the getter material. The first temperature sensor is located in a melt zone to detect rapidly the onset of an exothermic reaction which indicates the presence of excess impurities in the incoming gas to be purified. A second temperature sensor is disposed in a bottom portion of the getter material.

Abstract: The present invention provides a method and apparatus to purify various gases utilizing the superior performance a heated getter process in a smaller package than previous multiple stage, heated getter processes. The smaller package includes inner and outer enclosures, and an integral, regenerative heat exchanger to simultaneously increase heater efficiency and cool the purified gas. The invention also includes a particle filter to remove particles from the gas flow. The invention further provides an interface to various modular gas stick substrate designs with an inlet and an outlet in one end of the integrated heated getter purifier system. The inlet gas is preheated by the integral heat exchanger and then heated to operating temperature of 200-400° C. The heated getter removes various impurities from the gas. The heated gas is then cooled in the integral heat exchanger. The cooled gas is exposed to a second quantity of cooler getter to remove residual impurities.

Abstract: A semiconductor manufacturing system includes a getter-based gas purifier coupled in flow communication with a gas distribution network for a semiconductor fabrication facility. The gas distribution network supplies purified gas to at least one wafer processing chamber in the semiconductor fabrication facility. The gas purifier includes a getter column having a metallic vessel with an inlet, an outlet, and a containment wall extending between the inlet and the outlet. Getter material which purifies gas flowing therethrough by sorbing impurities therefrom is disposed in the vessel. A first temperature sensor is disposed in a top portion of the getter material. The first temperature sensor is located in a melt zone to detect rapidly the onset of an exothermic reaction which indicates the presence of excess impurities in the incoming gas to be purified. A second temperature sensor is disposed in a bottom portion of the getter material.

Abstract: A semiconductor manufacturing system includes a getter-based gas purifier coupled in flow communication with a gas distribution network for a semiconductor fabrication facility. The gas distribution network supplies purified gas to at least one wafer processing chamber in the semiconductor fabrication facility. The gas purifier includes a getter column having a metallic vessel with an inlet, an outlet, and a containment wall extending between the inlet and the outlet. Getter material which purifies gas flowing therethrough by sorbing impurities therefrom is disposed in the vessel. A first temperature sensor is disposed in a top portion of the getter material. The first temperature sensor is located in a melt zone to detect rapidly the onset of an exothermic reaction which indicates the presence of excess impurities in the incoming gas to be purified. A second temperature sensor is disposed in a bottom portion of the getter material.

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

Abstract: An improved getter pump module includes a number of getter elements and a heating element that heats the getter elements. The getter elements are preferably porous, sintered getter disks. The heating element is disposed proximate to the getter elements and provides heat to activate the getter material and cause it to pump desired gasses. The getter elements and heater element are partially surrounded by a focus shield that is positioned between the getter elements and a wall of a processing chamber that encloses the getter elements, the heater element, and the focus shield. The focus shield is provided to reflect thermal energy to the getter material from the heater element, to provide high pumping speeds or short activation/baking times, and to reduce the heat seen by the chamber from the heating element. In certain embodiments of the present invention the focus shield is angled as to be wedge shaped, and may include planar extension portions. Multiple focus shields are provided in some embodiments.

Abstract: A semiconductor manufacturing system includes a getter-based gas purifier coupled in flow communication with a gas distribution network for a semiconductor fabrication facility. The gas distribution network supplies purified gas to at least one wafer processing chamber in the semiconductor fabrication facility. The gas purifier includes a getter column having a metallic vessel with an inlet, an outlet, and a containment wall extending between the inlet and the outlet. Getter material which purifies gas flowing therethrough by sorbing impurities therefrom is disposed in the vessel. A first temperature sensor is disposed in a top portion of the getter material. The first temperature sensor is located in a melt zone to detect rapidly the onset of an exothermic reaction which indicates the presence of excess impurities in the incoming gas to be purified. A second temperature sensor is disposed in a bottom portion of the getter material.

Abstract: A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber.

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.