Patents Assigned to Sanwa Shutter Corporation
  • Patent number: 4837877
    Abstract: This invention discloses an elevation bed apparatus which moves up and down while keeping its horizontal posture, in order to improve an effective use of an indoor space. The elevation bed of this invention includes an elevation device and a safety device, and the elevation device includes a winding mechanism and a wire driving system of a wire wound on the winding mechanism. A bed main body moves up and down along a guide rail when the wire is wound and rewound. When the elevation bed is of an electric type, the safety device checks the operation or cuts off the power source to stop the elevating motion of the bed main body.
    Type: Grant
    Filed: October 28, 1987
    Date of Patent: June 13, 1989
    Assignee: Sanwa Shutter Corporation
    Inventors: Takeaki Hamada, Akio Okada, Kiyoshi Abe, Katsuhiro Udagawa, Fumitoshi Okazaki, Kouji Fujino
  • Patent number: 4662420
    Abstract: This invention relates to a panel shutter mechanism for covering and uncovering the opening of a building, wherein in one position the panels constituting the shutter are arranged in the same plane so as to cover the opening when each of the panels is supported by guide rails uprightly placed on both edges of the opening, and the panels locked in place by a locking mechanism, and in the other position the panels are rolled up so as to leave the opening uncovered, wherein each of the panels is housed side-by-side in a housing located above the upper ends of the guide rails.
    Type: Grant
    Filed: May 26, 1983
    Date of Patent: May 5, 1987
    Assignee: Sanwa Shutter Corporation
    Inventor: Masato Hirao
  • Patent number: 4343171
    Abstract: A cold roll forming apparatus for forming a slat for a shutter having forming rolls successively disposed along a path line of the material and a pattern embossing roll disposed along the path line is shown. Metal band sheet fed through the apparatus is formed into a predetermined slat configuration and simultaneously repeated patterns are embossed on the flat surface of the slat.
    Type: Grant
    Filed: May 29, 1980
    Date of Patent: August 10, 1982
    Assignee: Sanwa Shutter Corporation
    Inventor: Tokiyoshi Kagawa