Abstract: A tube includes an outer layer including a first material having flexibility, an inner layer including a second material having flexibility and chemical resistance, and an intermediate layer arranged between the outer layer and the inner layer and including an electrically conductive material.

Abstract: Provided is a substrate processing apparatus including a substrate floating unit for floating a substrate, a nozzle unit positioned above the substrate floating unit to eject a liquid chemical onto the substrate, a measurement unit for measuring a floating amount of the substrate, and a controller for obtaining a serial number of the substrate and providing control to change, based on the serial number, reference signal data used by the measurement unit to measure the floating amount of the substrate.

Abstract: An apparatus and method for dispensing treatment liquid, which enable treatment liquid to be accurately dispensed to an intended position on a substrate having a non-planar surface on the basis of measurement information obtained by three-dimensionally measuring the substrate. The apparatus may include: a substrate support unit on which a substrate is seated; a three-dimensional (3D) measurement device configured to three-dimensionally measure the substrate seated on the substrate support unit; a head unit configured to dispense treatment liquid onto the substrate seated on the substrate support unit; and a controller configured to receive actually measured 3D substrate information of the substrate from the 3D measurement device, generate printing pattern image information based on the actually measured 3D substrate information, and apply printing command information to the head unit according to the generated printing pattern image information.

Abstract: Proposed is a transport hand and a ring transport system using the same and, more particularly, to a transport hand and a ring transport system using the same with an improved structure to prevent a ring from being separated from a ring carrier during a ring transport process by temporarily fixing the ring using vacuum adsorption.

Abstract: Provided is a substrate treatment apparatus including a treatment container equipped with a conductive member. The conductive member is made of a material having a lower resistivity than that of the treatment container. The conductive member prevents a rise of an electric potential of the treatment container, which is caused by charging during treatment of a substrate, thereby preventing the substrate from being contaminated and damaged by particles and electrostatic arcing.

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a support unit disposed within the treating space and configured to support a substrate; and a plasma generation unit configured to generate a plasma from a process gas supplied to the treating space; and wherein the plasma generation unit comprises: a bottom electrode member; and a top electrode member opposite to the bottom electrode member, wherein the top electrode member comprises: an electrode plate including an electrode; a first plate made of a different material from the electrode plate; and a second plate, and wherein the second plate, the electrode plate, and the first plate are stacked on one another.

Abstract: A rail inspection device is provided. The rail inspection device includes: a drive part configured to drive on a lower rail; side wheels configured to rotate such that the drive part moves in a first direction on the lower rail, wherein the side wheels are provided on two side surfaces of the drive part opposite to each other in a second direction that intersects the first direction; upper wheels provided on an upper surface of the drive part and configured to rotate in contact with a branch guide rail provided above an upper portion of the drive part; a body connected to a lower surface of the drive part in a third direction that is perpendicular to the first direction and the second direction; and an inclination sensor provided on the upper surface of the drive part and configured to measure an inclination of the body.

Abstract: Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

Abstract: The inventive concept relates to an apparatus for treating a substrate. According to an embodiment, the substrate treating apparatus includes a housing having a process space therein, a support unit that supports the substrate in the housing, a nozzle that dispenses a treatment liquid onto the substrate supported on the support unit, and a liquid supply unit that supplies the treatment liquid to the nozzle, in which the liquid supply unit includes a container having a storage space in which the treatment liquid is stored, a liquid supply tube that causes the treatment liquid to flow from the container to the nozzle, and a microwave applying member that applies microwaves to the treatment liquid before the treatment liquid is supplied to the nozzle.

Abstract: Disclosed is a support unit for supporting a substrate. The support unit includes a support plate having an inner space defined therein, a heating member disposed in the inner space and emitting light for heating the substrate supported on the support unit, and a reflective member disposed along an edge region of the support plate and reflecting thermal energy of the light to an edge region of the substrate supported on the support unit.

Abstract: Disclosed is a method for removing a film from a substrate by irradiating a plurality of unit pulse laser beams to an edge region of the substrate. The method includes a first irradiation operation for irradiating a plurality of unit pulse laser beams onto the substrate while the substrate is rotating, and a second irradiation operation for irradiating a plurality of unit pulse laser beams to regions of the substrate onto which the unit pulse laser beams are not irradiated in the first irradiation operation.

Abstract: An ink impact point correction apparatus for automatically measuring and correcting an impact point of ink using a pattern on a substrate, on which a coordinate system is displayed, and a substrate treating system including the same are provided. The ink impact point correction apparatus includes a recognition unit for acquiring information on the impact point of ink at a plurality of points located on a substrate; and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point, wherein a coordinate pattern in the form of a coordinate system is formed at the plurality of points.

Abstract: A substrate treating apparatus and a substrate treating method are disclosed. The substrate treating apparatus includes a process module configured to perform processing on a substrate, an index module configured to insert the substrate into the process module and withdraw the substrate, of which the processing is completed, from the process module, a loading module configured to relay the substrate between the process module in a vacuum atmosphere and the index module in an atmospheric pressure atmosphere by switching an atmosphere thereof to the vacuum atmosphere or the atmospheric pressure atmosphere, and a control module configured to receive operation states from the process module, the index module, and the loading module and schedule operations of the process module, the index module, and the loading module in a direction in which the number of substrates to be processed per unit time increases with reference to the received operation states.

Abstract: There is provided a transport control system assigning multiple jobs to an overhead hoist transport (OHT) based on the availability of linkage transporting and the likelihood of transport congestion. The transport control system includes: a plurality of transports, each of the plurality of transports transporting a carrier with a wafer loaded thereon; and a transport control apparatus controlling the plurality of transports and determining one of the plurality of transports as a target transport to which multiple jobs are to be assigned. The transport control apparatus determines one of the plurality of transports as the target transport based on a first element, which is the availability of linkage transporting, and a second element, which is the likelihood of transport congestion.

Abstract: A mark printing device includes a driving unit driving along a driving rail of an overhead hoist transport, a printing unit being configured to print on the driving rail a mark for guiding a motion of a vehicle, a data processing unit receiving design data including design information of the driving rail and first information on a position and type of the mark from a server, an encoder unit being configured to calculate a rotation amount of a servo motor provided in the driving unit to detect a current position of the driving unit and a driving distance of the driving unit, and a control unit being configured to control the driving unit and the printing unit to print the mark on the driving rail by using the design data and second information on the current position and the driving distance of the driving unit.

Abstract: A substrate, a display panel, and a substrate manufacturing method are proposed. The substrate includes a base layer; partitioning walls located on the base layer and dividing the base layer into a plurality of pixel regions, and patterns located in each of the pixel regions of the base layer, and guiding spread of a liquid drop discharged to the base layer.

Abstract: An apparatus for treating the substrate includes a process chamber with a treating space therein, a support member located in the treating space to support the substrate, and a gas supply unit supplying a surface-modifying gas to the treating space. The gas supply unit includes a bubbler tank provided with an accommodating space for storing a liquid alkyne-based chemical, the bubbler tanks bubbling the liquid alkyne-based chemical by supplying an inert gas to the accommodating space to generate the surface-modifying gas, a heater heating the liquid alkyne-based chemical stored in the bubbler tank at a first temperature, and a gas supply line coupled between the process chamber and the bubbler tank to supply the surface modified gas to the treating space and provided with a first valve.

Abstract: The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.