Patents Assigned to Shikoku Chemicals Corporation
  • Patent number: 11807596
    Abstract: The purpose of the present invention is to provide: novel thiol compounds; a method for synthesizing said thiol compounds; curing agents containing said thiol compounds; resin compositions containing said thiol compounds and an epoxy compound; and resin compositions containing said thiol compounds and an ene compound having a carbon-carbon double bond in a molecule. Furthermore, the purpose of the present invention is to provide adhesives and sealants having these resin compositions as ingredients. The thiol compounds of the present invention are represented by chemical formula (I) to chemical formula (VII).
    Type: Grant
    Filed: October 25, 2018
    Date of Patent: November 7, 2023
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Naoto Okumura, Akihito Otsuka, Takeshi Kumano, Kazuyuki Fujikawa, Yusuke Araki
  • Patent number: 11773207
    Abstract: An objective of the present invention is to provide: a novel thiol compound; a method for synthesizing the thiol compound; a curing agent containing the thiol compound; a resin composition containing the thiol compound and an epoxy compound; and a resin composition containing the thiol compound and an enic compound having an intramolecular carbon-carbon double bond. The thiol compound of the present invention, as exemplified by the compounds listed below, is a reaction product of a certain type of dialkene compound and a thiol compound, and has two or more intramolecular thioether bonds but no ester bonds.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: October 3, 2023
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Naoto Okumura, Yusuke Araki, Takeshi Kumano
  • Patent number: 11702507
    Abstract: This invention provides a material having a low dissipation factor that is suitable for use as an insulating material for a printed wiring board and the like; a resin composition used for the production of the material; and an application using the material. The present invention relates to a resin composition comprising a mono(C6-C20 alkyl)diallyl isocyanurate and a polyphenylene ether resin; a cured product of the resin composition; and use of the cured product.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: July 18, 2023
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Akihito Otsuka, Takashi Kashiwabara, Kazunori Aoki, Takeshi Kumano
  • Patent number: 11680076
    Abstract: The purpose of the present invention is to provide: a novel triazole silane compound and a method for synthesizing the same, and a silane coupling agent containing the triazole silane compound as a component; and a surface treatment solution, a surface treatment method, and a method for bonding two different materials, which use said triazole silane compound.
    Type: Grant
    Filed: April 5, 2018
    Date of Patent: June 20, 2023
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Takayuki Murai, Miya Tanioka, Shusaku Iida, Masato Katsumura, Noriaki Yamaji, Takahito Imamine, Masahiko Tsujino, Hirohiko Hirao
  • Patent number: 11472823
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: October 18, 2022
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki Yamaji, Takayuki Murai, Miya Tanioka, Shusaku Iida, Masato Katsumura, Takahito Imamine, Masahiko Tsujino, Tomoya Mae, Hirohiko Hirao
  • Publication number: 20220185960
    Abstract: This invention provides a material having a low dissipation factor that is suitable for use as an insulating material for a printed wiring board and the like; a resin composition used for the production of the material; and an application using the material. The present invention relates to a resin composition comprising a mono(C6-C20 alkyl)diallyl isocyanurate and a polyphenylene ether resin; a cured product of the resin composition; and use of the cured product.
    Type: Application
    Filed: March 26, 2020
    Publication date: June 16, 2022
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Akihito OTSUKA, Takashi KASHIWABARA, Kazunori AOKI, Takeshi KUMANO
  • Publication number: 20220112330
    Abstract: An objective of the present invention is to provide: a novel thiol compound; a method for synthesizing the thiol compound; a curing agent containing the thiol compound; a resin composition containing the thiol compound and an epoxy compound; and a resin composition containing the thiol compound and an enic compound having an intramolecular carbon-carbon double bond. The thiol compound of the present invention, as exemplified by the compounds listed below, is a reaction product of a certain type of dialkene compound and a thiol compound, and has two or more intramolecular thioether bonds but no ester bonds.
    Type: Application
    Filed: December 23, 2019
    Publication date: April 14, 2022
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Naoto OKUMURA, Yusuke ARAKI, Takeshi KUMANO
  • Patent number: 11225788
    Abstract: To provide a roof structure free from generation of a dead space, capable of reducing a load moment. A roof structure including a roof (1) supported by a post (2) is a cantilever structure having the front end of the roof (1) formed in a free end and the rear end connected to the upper end of the post (2). The lower end of the post (2) is fixed in a concrete foundation (5). The post (2) is tilted with the upper end directed backward and with the lower end directed forward. A counter moment cm generated on the post (2) at the time of application of a load to the roof (1) reduces a load moment (M) generated by the load, thereby bringing the post (2) into an advantageous state in strength. The configuration of the post (2) with two post members and a vertical connecting member (10) connecting the post members facilitates the construction of the post (2) to be tilted at a desired angle.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: January 18, 2022
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Koji Sakaguchi, Shinji Sagawa
  • Patent number: 11078450
    Abstract: A stabilized solid bleaching agent which has good solubility in water without undergoing the occurrence of foaming and without generating residues has been demanded. The present invention provides a stabilized solid-bleaching-agent-containing material having a coating layer formed therein, wherein the coating layer contains at least one component selected from the group consisting of an alkali metal salt of an aromatic carboxylic acid, an alkali metal salt of a non-cyclic dicarboxylic acid, an alkali metal salt of a non-cyclic monocarboxylic acid having 1 to 7 carbon atoms and mixtures thereof.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: August 3, 2021
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Akihiro Norimoto, Koichi Sahiro, Tsuyoshi Toyota, Yoshiya Iwasaki
  • Publication number: 20210179642
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Application
    Filed: February 24, 2021
    Publication date: June 17, 2021
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki YAMAJI, Takayuki MURAl, Miya TANIOKA, Shusaku IIDA, Masato KATSUMURA, Takahito IMAMINE, Masahiko TSUJINO, Tomoya MAE, Hirohiko HIRAO
  • Patent number: 11014946
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 25, 2021
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki Yamaji, Takayuki Murai, Miya Tanioka, Shusaku Iida, Masato Katsumura, Takahito Imamine, Masahiko Tsujino, Tomoya Mae, Hirohiko Hirao
  • Patent number: 10975108
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: April 13, 2021
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki Yamaji, Takayuki Murai, Miya Tanioka, Shusaku Iida, Masato Katsumura, Takahito Imamine, Masahiko Tsujino, Tomoya Mae, Hirohiko Hirao
  • Patent number: 10913731
    Abstract: The purpose of the present invention is to provide: a novel curable compound which can be expected to be used as a raw material for photocurable resins and thermosetting resins; a method for synthesizing said compound; a resin composition containing said compound; and a cured product thereof. This compound is an epoxy-oxetane compound represented by a formula, and this compound has a structure in which two epoxycyclohexyl groups (groups in which an oxirane ring and a cyclohexane ring are condensed) are bonded to an oxetane ring via a connector having one ether bond. In formula (I?), R1 to R3 may be the same as, or different from, each other, and each denote a hydrogen atom or a methyl group. n is 1 or 2.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: February 9, 2021
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Kazunori Aoki, Naoto Okumura, Takashi Kashiwabara, Yusuke Araki, Akihito Otsuka, Takeshi Kumano
  • Publication number: 20200369606
    Abstract: The purpose of the present invention is to provide: novel thiol compounds; a method for synthesizing said thiol compounds; curing agents containing said thiol compounds; resin compositions containing said thiol compounds and an epoxy compound; and resin compositions containing said thiol compounds and an ene compound having a carbon-carbon double bond in a molecule. Furthermore, the purpose of the present invention is to provide adhesives and sealants having these resin compositions as ingredients. The thiol compounds of the present invention are represented by chemical formula (I) to chemical formula (VII).
    Type: Application
    Filed: October 25, 2018
    Publication date: November 26, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Naoto OKUMURA, Akihito OTSUKA, Takeshi KUMANO, Kazuyuki FUJIKAWA, Yusuke ARAKI
  • Publication number: 20200270236
    Abstract: The purpose of the present invention is to provide: a novel curable compound which can be expected to be used as a raw material for photocurable resins and thermosetting resins; a method for synthesizing said compound; a resin composition containing said compound; and a cured product thereof. This compound is an epoxy-oxetane compound represented by a formula, and this compound has a structure in which two epoxycyclohexyl groups (groups in which an oxirane ring and a cyclohexane ring are condensed) are bonded to an oxetane ring via a connector having one ether bond. In formula (I?), R1 to R3 may be the same as, or different from, each other, and each denote a hydrogen atom or a methyl group. n is 1 or 2.
    Type: Application
    Filed: October 15, 2018
    Publication date: August 27, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Kazunori AOKI, Naoto OKUMURA, Takashi KASHIWABARA, Yusuke ARAKI, Akihito OTSUKA, Takeshi KUMANO
  • Publication number: 20200223875
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Application
    Filed: July 31, 2018
    Publication date: July 16, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki YAMAJI, Takayuki MURAl, Miya TANIOKA, Shusaku IIDA, Masato KATSUMURA, Takahito IMAMINE, Masahiko TSUJINO, Tomoya MAE, Hirohiko HIRAO
  • Patent number: 10550131
    Abstract: The present invention provides a novel mercaptoethylglycoluril compound. The present invention also provides a curing agent for an epoxy resin using the substance, an epoxy resin composition using the curing agent for an epoxy resin, and an adhesive and a sealing agent each using the epoxy resin composition.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: February 4, 2020
    Assignees: SHIKOKU CHEMICALS CORPORATION, NAMICS CORPORATION
    Inventors: Akikazu Matsuda, Naoto Okumura, Takeshi Kumano
  • Publication number: 20200031852
    Abstract: The abstract of the international application is being replace by the following abstract: The purpose of the present invention is to provide: a novel triazole silane compound and a method for synthesizing the same, and a silane coupling agent containing the triazole silane compound as a component; and a surface treatment solution, a surface treatment method, and a method for bonding two different materials, which use said triazole silane compound.
    Type: Application
    Filed: April 5, 2018
    Publication date: January 30, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Takayuki MURAI, Miya TANIOKA, Shusaku IIDA, Masato KATSUMURA, Noriaki YAMAJI, Takahito IMAMINE, Masahiko TSUJINO, Hirohiko HIRAO
  • Patent number: 10405422
    Abstract: The present invention is a copper film-forming agent containing a copper complex composed of a copper formate and a 5-membered or 6-membered nitrogen-containing heterocyclic compound having from 1 to 3 nitrogen atoms, in which the nitrogen-containing heterocyclic compound has one or two ring structures, the total number of carbon atoms contained in a substituent is from 1 to 5, and an element other than a carbon atom in the compound is not bonded to a hydrogen atom.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: September 3, 2019
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Shusaku Iida, Takayuki Murai, Hirohiko Hirao
  • Patent number: 10398028
    Abstract: A surface treating composition for copper or a copper alloy comprising an imidazole compound and means for using the composition in the soldering of electronic parts to printed wiring boards are disclosed.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: August 27, 2019
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Hirohiko Hirao, Noriaki Yamaji, Masato Nakanishi, Takayuki Murai