Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Patent number: 11746237
    Abstract: Provided are: a (hydrolyzable) organosiloxane compound which is represented by general formula (1) and contains a lipophilic group capable of forming a cured film having excellent lipophilicity and wear resistance; and a surface treatment agent containing the compound. (In the formula, A is any one among —CH3, —C(?O)OR1, —C(?O)NR12, —C(?O)SR1, and —P(?O)(OR1)2; R1 is a hydrogen atom, a C1-30 alkyl group, a C6-30 aryl group, or a C7-30 aralkyl group; Y is independently a divalent organic group; W is independently a C1-4 alkyl group, a phenyl group, a hydroxyl group, or a hydrolyzable group; R is independently a C1-4 alkyl group or a phenyl group; X is independently a hydroxyl group or a hydrolyzable group; n is an integer of 1-3; and q is an integer of 1-3.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: September 5, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Seiya Mori, Ryusuke Sakoh
  • Patent number: 11749785
    Abstract: A resin composition containing a base resin and quantum dots that are crystalline nanoparticle phosphors, the base resin containing a fluorine-containing resin. This provides a resin composition capable of enhancing the stability of quantum dots.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: September 5, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshihiro Nojima, Shinji Aoki, Kazuya Tobishima
  • Publication number: 20230274936
    Abstract: The present invention is a planarizing agent for forming an organic film, including an aromatic-group-containing compound having a molecular weight represented by a molecular formula of 200 to 500, wherein a blended composition that includes the planarizing agent and a preliminary composition containing an organic film-forming resin and a solvent, and having a complex viscosity of 1.0 Pa·s or more in a temperature range of 175° C. or higher has a temperature range in which a complex viscosity of the blended composition is less than 1.0 Pa·s in a temperature range of 175° C. or higher. This provides a planarizing agent for forming an organic film to yield a composition for forming an organic film having a high planarizing ability; a composition for forming an organic film containing this planarizing agent; a method for forming an organic film using this composition; and a patterning process.
    Type: Application
    Filed: February 23, 2023
    Publication date: August 31, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yasuyuki YAMAMOTO, Kenta ISHIWATA, Toshiharu YANO, Tsutomu OGIHARA
  • Publication number: 20230270655
    Abstract: It is an object of the present invention to provide a personal care composition having not only a low environmental impact and a good skin feel but also a high cleansing property. The object can be achieved by a personal care composition containing water and low substituted hydroxypropyl cellulose, wherein the low substituted hydroxypropyl cellulose has an average particle size (D50) on a volume basis by dry laser diffraction of 30 ?m to 200 ?m and an aspect ratio equal to or more than 1.0 and less than 5.0, and the like.
    Type: Application
    Filed: March 16, 2023
    Publication date: August 31, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takane SUDO, Yasuyuki HIRAMA, Shingo NIINOBE
  • Publication number: 20230276606
    Abstract: Provided is a cured or uncured electromagnetic wave shielding sheet with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm being impregnated with a resin and/or with the resin being laminated thereon, the sheet exhibiting a superior electromagnetic wave shielding performance with respect to millimeter waves and terahertz waves. The sheet may for example be one with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm and a specific resistance of not larger than 0.005 ?·cm being impregnated with a resin and/or with the resin being laminated thereon; or one with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm, an air permeability of not larger than 0.5 cm3/cm2·s and a specific resistance of not larger than 0.005 ?·cm being impregnated with a resin.
    Type: Application
    Filed: February 22, 2023
    Publication date: August 31, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinji ABE, Toshio SHIOBARA
  • Patent number: 11742438
    Abstract: A method for manufacturing a solar cell having a P-type silicon substrate wherein one main surface is a light-receiving surface and another is a backside, a plurality of back surface electrodes formed on a part of the backside, an N-type layer in at least a part of the light-receiving surface, and contact areas in which the substrate contacts the electrodes; wherein the P-type silicon substrate is a silicon substrate doped with gallium and has a resistivity of 2.5 ?·cm or less; and a back surface electrode pitch Prm [mm] of contact areas in which the P-type silicon substrate is in contact with the back surface electrodes and the resistivity Rsub [?·cm] of the substrate satisfy the relation represented by the following formula (1). log(Rsub)??log(Prm)+1.
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: August 29, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hiroyuki Otsuka
  • Patent number: 11742439
    Abstract: A drying method of a polyimide paste which can maintain a printing shape while maintaining productivity includes an organic solvent and a polyimide resin dissolved in the organic solvent, and which becomes cured polyimide by being cured as a result of being dried and heated, the drying method including a step of applying the polyimide paste to a surface of a base material, a step of applying a solvent including a polar material to a surface of the base material at least at a portion where the polyimide paste is applied, and a step of, after applying the solvent including the polar material, drying the polyimide paste and the solvent including the polar material.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: August 29, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takenori Watabe, Hiroshi Hashigami, Hiroyuki Ohtsuka
  • Patent number: 11739184
    Abstract: A polysiloxazane compound having an alkoxysilyl group having an average composition of formula (1): wherein R1 represents a monovalent hydrocarbon group. R2 represents a monovalent hydrocarbon group, R3 represents an unsubstituted monovalent hydrocarbon group, R4 represents a divalent hydrocarbon group having 2 to 20 carbon atoms, X represents a methyl group, Y represents a group of formula (2) or (3) below: (R2 is same as above. R5 and R6 represent a monovalent hydrocarbon group, Z represents a divalent hydrocarbon group and the like, p is an integer of 0 to 9, and q is 0, 1, or 2.), n is an integer of 11 to 500, m is 0, 1, or 2, r is 0 or 1, and a, b, and c are numbers that satisfy 0<a<1, 0?b<1, 0<c<1, and a+2b+2c=1.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: August 29, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Masato Kawakami
  • Publication number: 20230265338
    Abstract: A quantum dot-containing polymer contains quantum dots that emit fluorescence by excitation light, wherein the quantum dot-containing polymer is a combined polymer of the quantum dots in which a ligand having a reactive substituent is coordinated to the outermost surface and a silicone compound having a polymerizable substituent. The quantum dot-containing polymer is stabilized by mild conditions.
    Type: Application
    Filed: April 19, 2021
    Publication date: August 24, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shinji AOKI, Yoshihiro NOJIMA, Kazuya TOBISHIMA
  • Publication number: 20230263720
    Abstract: A cosmetic contains a high molecular weight polymer that is an addition polymerization product between: a polymer crosslinking agent of a (meth)acrylic-based graft silicone having a main chain with (meth)acrylic-based repeating units represented by the following formulae (I), (II), and (III), and side chains with unsaturated bonds and an organopolysiloxane structure; and an organohydrogen polysiloxane represented by the following general formula (4). A represents a group selected from an alkoxy group having 1 to 22 carbon atoms and an aryloxy group having 6 to 20 carbon atoms. B represents a group having an unsaturated bond represented by the following formula (1). C represents a group represented by the following formula (2), (3-1), or (3-2).
    Type: Application
    Filed: April 5, 2021
    Publication date: August 24, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Ryunosuke HATA
  • Patent number: 11731992
    Abstract: A halosilane compound: R1CH2CH2SiR52X is prepared by hydrosilylation reaction of a vinyl compound: R1CH?CH2 with a halogenodiorganosilane compound having formula: HSiR52X in the co-presence of an iridium catalyst, an internal olefin compound, and an allyl halide. The halosilane compound is prepared on an industrial scale with the advantages of low costs, high yields, and high selectivity, using a small amount of iridium catalyst.
    Type: Grant
    Filed: April 1, 2022
    Date of Patent: August 22, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koichi Nakazawa, Takahiro Kojima, Ayumu Kiyomori
  • Patent number: 11732169
    Abstract: Provided is a silicone adhesive composition having (A) a condensation product of a linear or branched diorganopolysiloxane having a silicon atom-bonded hydroxy group and/or a silicon atom-bonded alkoxy group having 1 to 10 carbon atoms at a terminal and having no alkenyl group, a linear or branched diorganopolysiloxane having at least two alkenyl groups, and an organopolysiloxane comprising an R13SiO0.5 unit and an SiO2 unit and having a silicon atom-bonded hydroxy group and/or a silicon atom-bonded alkoxy group having 1 to 6 carbon atoms, (B) an organohydrogenpolysiloxane having at least three SiH groups and an average polymerization degree of 80 or less in an amount of 0.1 to 5 parts by mass, relative to 100 parts by mass of component (A), and (C) a platinum group metal catalyst in a catalytic amount.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: August 22, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ken Nakayama, Yasuyoshi Kuroda
  • Patent number: 11731930
    Abstract: The present invention provides a process for preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3), wherein R represents a linear or branched alkyl group having 1 to 4 carbon atoms, the process comprising subjecting a haloacetaldehyde alkyl 2,3-dimethyl-2-cyclopentenyl acetal compound of the following general formula (1), wherein R is as defined above, and Y represents a halogen atom, to a dehydrohalogenation reaction in the presence of a base, followed by a rearrangement reaction to obtain a (1,2-dimethyl-2-cyclopentenyl)acetate compound of the following general formula (2), wherein R is as defined above, and subjecting the (1,2-dimethyl-2-cyclopentenyl)acetate compound (2) to an epoxidation reaction, followed by an isomerization reaction and then a methylenation reaction to obtain the (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3).
    Type: Grant
    Filed: June 6, 2022
    Date of Patent: August 22, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Miyoshi Yamashita, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 11733608
    Abstract: A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: January 12, 2021
    Date of Patent: August 22, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20230259027
    Abstract: A resist composition comprising a sulfonim salt having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Application
    Filed: January 10, 2023
    Publication date: August 17, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Publication number: 20230257905
    Abstract: A substrate for group-III nitride epitaxial growth and a method for producing the same is capable of fabricating a high-quality group III nitride single crystal at low cost. The substrate for group-III nitride epitaxial growth includes: a supporting substrate having a structure in which a core consisting of nitride ceramics is wrapped in an encapsulating layer having a thickness of between 0.05 ?m and 1.5 ?m, inclusive; a planarizing layer provided on an upper surface of the supporting substrate, the planarizing layer having a thickness of between 0.5 ?m and 3.0 ?m, inclusive; and a seed crystal layer consisting of a single crystal with a thickness of between 0.1 ?m and 1.5 ?m, inclusive, provided on an upper surface planarizing layer and having an uneven pattern on the surface.
    Type: Application
    Filed: May 18, 2021
    Publication date: August 17, 2023
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Yoshihiro KUBOTA, Minoru KAWAHARA, Masato YAMADA
  • Publication number: 20230257880
    Abstract: A method for producing a gallium oxide semiconductor film by a mist CVD method, including, a mist-forming step in which a raw material solution containing gallium is misted in a mist-forming unit to generate mist, a carrier gas supply step of supplying a carrier gas for transferring the mist to the mist-forming unit, a transferring step of transferring the mist from the mist-forming unit to a film forming chamber using the carrier gas via a supply pipe connecting the mist-forming unit and the film forming chamber, a rectification step of rectifying flow of the mist and the carrier gas supplied to a surface of a substrate in the film forming chamber so as to flow along the surface of the substrate, a film forming step of heat-treating the rectified mist to form a film on the substrate, and an exhaust step of exhausting waste gas upward from the substrate.
    Type: Application
    Filed: May 17, 2021
    Publication date: August 17, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takenori WATABE
  • Publication number: 20230260787
    Abstract: Provided is a composition for forming a protective film using a polymer having an imide group: that is cured under a film-forming condition not only in the air but in an inert gas; that can form a protective film having excellent heat resistance, embedding and planarization ability for a pattern formed on a substrate, and good adhesiveness to the substrate; and that can form a protective film having excellent resistance against an alkaline aqueous hydrogen peroxide.
    Type: Application
    Filed: January 18, 2023
    Publication date: August 17, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keisuke NIIDA, Takashi SAWAMURA, Daisuke KORI, Seiichiro TACHIBANA
  • Patent number: 11723872
    Abstract: Provided is a rapid release tablet excellent in binding capability and disintegrability and also excellent in storage stability and the like. More specifically, provided are a granulated composite comprising low-substituted hydroxypropyl cellulose having a degree of hydroxypropoxy substitution of from 5 to 16% by weight and D-mannitol, wherein the D-mannitol contains 0.9% by weight or less of D-sorbitol; a rapid release tablet comprising the granulated composite and a drug; and a method for producing a granulated composite comprising the steps of: mixing low-substituted hydroxypropyl cellulose having a degree of hydroxypropoxy substitution of from 5 to 16% by weight, first D-mannitol, and water to obtain an aqueous dispersion, and granulating while adding the aqueous dispersion to second D-mannitol, wherein the first D-mannitol and the second D-mannitol contain 0.9% by weight or less of D-sorbitol in total.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: August 15, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuyuki Hirama, Naosuke Maruyama
  • Patent number: 11724838
    Abstract: Provided are a method and an apparatus for extruding into a tube and filling the tube at a high speed and simultaneously sealing the tube. Specifically provided is a method for producing a polymer tube, containing a liquid therein and being sealed at constant intervals, the method including an extrusion step of continuously melt-extruding a polymer material through a die into at least one tube, while feeding a liquid into the tube to obtain at least one liquid-containing tube; and sealing step of discontinuously pressing the at least one liquid-containing tube between a pair of pressurizing members at constant intervals to cause pressure-bonding before the tube solidifies, while continuously taking up the extruded tube.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: August 15, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryuichi Saguchi, Tomoaki Kaji, Masahiko Naruse