Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of triple bond-bearing tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.
Abstract: In a hydraulic composition for additive manufacturing which includes (A) at least one water-soluble hydroxyalkyl alkyl cellulose selected from hydroxypropyl methyl cellulose and hydroxyethyl methyl cellulose, (B) a defoamer, (C) cement, (D) water, (E) polyvinyl alcohol and (F) borax, the water-soluble hydroxyalkyl alkyl cellulose has an alkoxy group degree of substitution of from 1.6 to 2.0 and a 2 wt % aqueous-solution viscosity at 20° C. of from 50 to 1,000 mPa·s, the polyvinyl alcohol has a degree of saponification of from 70 to 90 mol % and a 4 wt % aqueous-solution viscosity at 20° C. of from 20 to 80 mPa·s, and the water is added in an amount of from 25 to 70 parts by weight per 100 parts by weight of the cement. The composition has a good extrudability from a nozzle and a good self-supportability following deposition.
Abstract: A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) as a repeating unit, and an organic solvent, where AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent; each R represents a hydrogen atom or a monovalent organic group having 2 to 10 carbon atoms and an unsaturated bond; R? represents a single bond or W1; and W1 represents a divalent organic group having 6 to 80 carbon atoms and one or more aromatic rings. This invention provides: a composition for forming an organic film, the composition containing a polymer having an indenofluorene structure with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using this composition; and a polymer for providing such a composition for forming an organic film.
Abstract: A resist composition comprising a quencher containing a nitroxyl radical having an iodized aliphatic hydrocarbyl group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
Abstract: The present invention provides (6Z,9Z)-6,9-dodecadien-1-yne of the following formula (1). Further, the present invention provides a process for preparing (6Z,9Z)-6,9-dodecadien-1-yne (1): the process comprising reacting a (3Z,6Z)-10-halo-3,6-decadiene compound of the following general formula (2), wherein X represents a halogen atom with a metal acetylide of the following general formula (3), wherein M represents Na, Li, K, Ag, Cu (I), MgZ, CaZ, or Cu(II)Z, wherein Z represents a halogen atom or an ethinyl group to form (6Z,9Z)-6,9-dodecadien-1-yne (1).
Abstract: The conductive wiring material composition includes (A) a polymer compound having a repeating unit “a” which has a structure selected from an ammonium salt, a lithium salt, a sodium salt, a potassium salt and a silver salt of any of fluorosulfonic acid, fluorosulfonimide and fluorosulfonamide and (B) metal powder, wherein the component (B) is contained with an amount exceeding 50 parts by mass based on 100 parts by mass of a solid content of the conductive wiring material composition excluding the component (B).
Type:
Grant
Filed:
July 1, 2020
Date of Patent:
October 10, 2023
Assignee:
SHIN-ETSU CHEMICAL CO., LTD.
Inventors:
Jun Hatakeyama, Koji Hasegawa, Osamu Watanabe
Abstract: The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10?6 (1/K) or less and further a density of 4.6 g/cm3 or less, and a pellicle characterized by including the pellicle frame as an element.
Abstract: A paramagnetic garnet-type transparent ceramic that exhibits a high laser damage threshold, said ceramic being a sintered body of a Tb-containing rare earth-aluminum garnet represented by formula (1), and being characterized in that the average sintered grain size is 10-40 ?m, and the insertion loss at a wavelength of 1,064 nm in the optically effective region along the length direction of a 20 mm-long sample is 0.05 dB or less. (Tb1-x-yYxScy)3(Al1-zScz)5O12??Formula (1) (In the formula, 0?x<0.45, 0?y<0.08, 0?z<0.2, and 0.001<y+z<0.20.
Abstract: A curable silicone gel composition including: (A) 100 parts by mass of a branched-chain organosiloxane that has a specific structure; (B) 0.1-50 parts by mass of a diorganopolysiloxane in which both molecular chain terminals are blocked with a diorganohydrogensiloxy group; (C) a platinum-based catalyst; (D) a phosphorous acid triester compound in an amount that is 3-15 molecules per one platinum atom in the (C) component, said phosphorous acid triester compound having a structure in which a chain alkyl group is bonded to an oxygen atom of phosphorous acid; (E) an organic peroxide for which the 10-hour half-life temperature is 120° C. or greater, in an amount that is 5-50 times the amount of the (D) component; and (F) an oxidation inhibitor. This curable silicone gel composition demonstrates superior high-temperature storability and deep section curability.
Abstract: A thermosetting resin composition, including: a thermosetting resin; a laser direct structuring additive; an inorganic filler; and a coupling agent, wherein the coupling agent contains one or more selected from the group consisting of a triazine functional group-, isocyanate functional group-, isocyanuric acid functional group-, benzotriazole functional group-, acid anhydride functional group-, azasilacyclopentane functional group-, imidazole functional group-, and unsaturated group-containing-silane coupling agent, and is not a mercaptosilane coupling agent, an amino silane coupling agent, or an epoxy silane coupling agent.
Abstract: A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.
Abstract: A film-forming method in which film-formation is performed by heat-treating a mist of a raw material solution, the method including: dissolving metal gallium in an acidic solution containing at least one of hydrobromic acid and hydroiodic acid to prepare the raw material solution having a concentration of a metal impurity of less than 2%; and atomizing the raw material solution into a mist, and performing film-forming. This method can provide a film-forming method that can form a film having good crystallinity at a high film-forming rate.
Abstract: A resist composition comprising a base polymer comprising repeat units containing a tertiary ester group having a double or triple bond and a halogenated aromatic group exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile having reduced edge roughness or size variation.
Abstract: A pellicle characterized by having an amount of released aqueous gas of 1×10?3 Pa·L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1×10?5 Pa·L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4×10?7 Pa·L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23° C. and 1×10?3 Pa or less.
Abstract: This silicone composition contains (A) an organopolysiloxane which has at least two aliphatic unsaturated hydrocarbon groups per molecule and has a kinematic viscosity at 25° C. of 60-100,000 mm2/s, (B) an organohydrogenpolysiloxane represented by general formula (I) (R1 is an alkyl group having 1-6 carbon atoms, R2 is R1 or a hydrogen atom, n is an integer between 2 and 40, m is an integer between 0 and 98, and the value of n+m is such that 5?n+m?100), (C) a flaky graphite powder having an average thickness of 100 nm or less, (D) a thermally conductive filler having a thermal conductivity of 10 W/m·° C. or more, (E) a platinum group metal catalyst and (G) a slightly volatile isoparaffin compound which has a boiling point of 160-360° C. and which can disperse or dissolve the component (A) and the component (B). This silicone composition can give a silicone grease having a higher thermal conductivity and better handleability than conventional silicone greases.
Abstract: In a photomask blank including a transparent substrate and a first inorganic film containing either or both of a transition metal and silicon, and optional a second inorganic film containing either or both of a transition metal and silicon, when an intensity of secondary ions is measured in the thickness direction of the transparent substrate and the inorganic films by TOF-SIMS with using a primary ion source of Bi and a sputtering ion source of Cs, an intensity of secondary ions containing carbon detected at the interface of the transparent substrate and the inorganic film or the inorganic films is higher than both intensities of the secondary ions containing carbon detected, respectively, at the sides remote from the interface.
Abstract: Provided is a bismaleimide compound having a favorable compatibility with other resins and contributing to a higher Tg. The compound is represented by the following formula wherein A independently represents a tetravalent organic group having a cyclic structure, B independently represents a divalent hydrocarbon group having 6 to 200 carbon atoms, Q independently represents a cyclohexane backbone-containing divalent alicyclic hydrocarbon group having 6 to 60 carbon atoms, W represents B or Q, n represents 1 to 100, m represents 0 to 100, repeating units identified by n and m whose bonding pattern may be alternate, block or random are present in any order, and wherein Q is independently represented by the following formula (2): wherein each of R1, R2, R3 and R4 independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, each of x1 and x2 represents a number of 0 to 4.
Abstract: A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.