Abstract: A solar cell includes a light-receiving surface electrode formed on a light-receiving surface, a back surface electrode formed on a backside, and a CZ silicon single crystal substrate doped with gallium. The CZ silicon single crystal substrate contains 12 ppm or more oxygen atoms. A spiral oxygen-induced defect is not observed in an EL (electroluminescence) image of the solar cell.

Abstract: An amino-modified silicone emulsion including: (A) an amino-modified silicone represented by formula (1), having a viscosity at 25° C. of 200 to 100,000 mPa·s, and an amine equivalent of 1,000 to 20,000 g/mol; (B) 5 to 100 mass % of a nonionic surfactant relative to the mass of component (A); (C) 50 to 100 mol % of lactic or acetic acid relative to a number of moles of amino groups of component (A); and (D) 85 to 10,000 mass % of water relative to the mass of component (A), where an increased amount of each of (D4), (D5), and (D6) is less than 3,000 ppm relative to the mass of component (A) when the emulsion has been stored at 25° C. for 6 months. Thus, the emulsion is provided wherein octamethyl cyclotetrasiloxane etc. hardly increase over time, and provides excellent smoothness and softness when blended in a hair cosmetic or a fiber treatment agent.

Abstract: The present invention is an emulsified composition, including: (A): a titanium-atom-containing silicone resin; (B): one or more oil agents selected from the group consisting of a hydrocarbon oil, an ester oil, and a silicone oil, the oil agent being able to dissolve the component (A) and being liquid at 25° C.; and (C): water, where the emulsified composition contains no surfactant. Accordingly, an object of the present invention is to provide: an emulsified composition having excellent stability and usability without a surfactant; and a cosmetic material including the above emulsified composition and having excellent feeling of use.

Abstract: A polymer containing a structural unit including an aromatic hydroxy group bonded to a main chain, where the aromatic hydroxy group is protected by an acid-labile group represented by the following formula (ALU-1) and is deprotected by action of an acid to become alkali-soluble. This provides: a polymer that makes it possible to form a resist film with which it is possible to form a pattern having extremely high isolated space resolution, small LER, and excellent rectangularity, effects of development loading and residue defects being suppressed, and the pattern having etching resistance and suppressed pattern collapse in the produced resist pattern; a chemically amplified positive resist composition containing the polymer; a resist patterning process using the chemically amplified positive resist composition; and a mask blank including the chemically amplified positive resist composition.

Abstract: A film formation device which forms a film on a substrate through the heat treatment of a starting material solution in the form of a mist, the film formation device including a mist conversion unit that generates a mist by converting the starting material solution into mist, a carrier gas supply unit that supplies a carrier gas for transporting the mist generated by the mist conversion unit, a film formation unit that includes therein a placement part for placing the substrate and that is where the mist transported by the carrier gas is supplied onto the substrate, and an exhaust unit that exhausts exhaust gas from the film formation unit, and further including, above the placement part in the film formation unit, a nozzle for supplying the mist onto the substrate and a top plate for adjusting the flow of the mist supplied from the nozzle.

Abstract: A bio-electrode composition contains (A) an ionic polymer material. The component (A) is a polymer compound containing: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a side chain with a radical-polymerizable double bond in a structure selected from the group consisting of (meth)acrylate, vinyl ether, and styrene. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode to enable signal collection immediately after attachment to skin and prevention of residue on the skin after peeling from the skin; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Abstract: Provided is a method for producing a GaN layered substrate, comprising the steps of: subjecting a C-plane sapphire substrate 11 having an off-angle of 0.5° to 5° to a high-temperature nitriding treatment at 800° C. to 1,000° C. to carry out a surface treatment of the C-plane sapphire substrate; carrying out epitaxial growth of GaN on the surface of the surface-treated C-plane sapphire substrate 11 to produce a GaN film carrier having a surface of an N polar face; forming an ion implantation region 13ion by carrying out ion implantation on the GaN film 13; laminating and joining a support substrate 12 with the GaN film-side surface of the ion-implanted GaN film carrier; and separating at the ion-implanted region 13ion in the GaN film 13 to transfer a GaN thin film 13a onto the support substrate 12, to produce a GaN layered substrate 10 having, on the support substrate 12, a GaN thin film 13a having a surface of a Ga polar face.

Abstract: An onium salt type monomer having the following formula (a1) or (a2).

Abstract: A method for forming a film, including: forming a film on a base body; and discharging a gas with a discharging unit. A channel plate is above and opposite to the base body via a space. A mixed gas flow linearly flows from a mixed gas supplying unit toward the discharging unit so that the mixed gas through the space above the base body is along at least part of a main surface of the base body. A projection is formed on a part of: the channel plate and/or the stage to inhibit deviation of the mixed gas flow from a direction toward the discharging unit. The channel plate and projection are provided so that a gap having a width smaller than a shortest distance in the space between the channel plate and the base body is formed, and the film-formation and the discharging are performed.

Abstract: A method of producing a raw material solution for a film-forming according to a Mist CVD method including a temperature at which a solute containing a metallic element is mixed with a solvent and stirred is 30° C. or higher, and a method of film-forming according to the Mist CVD method using a raw material solution produced by the method of producing the raw material solution.

Abstract: In a method for producing hydrogen and carboxylic acid, a primary alcohol of 1 to 7 carbon atoms and water are reacted by being continuously introduced into a flow reactor packed with a solid catalyst consisting of an alloy of ruthenium and tin on a support and passed through the reactor under temperature and pressure conditions at which the water assumes a gaseous state. This method enables hydrogen and carboxylic acid to be produced in a high yield or at a high purity from a primary alcohol and water in a short time and by simple operations.

Abstract: A process for process for preparing 6-isopropenyl-3-methyl-9-decenyl acetate of the following formula (3), wherein Ac represents an acetyl group, the process comprising steps of: preparing a nucleophilic reagent, 5-isopropenyl-2-methyl-8-nonenyl compound, of the following general formula (1): wherein M1 represents Li, MgZ1, ZnZ1, Cu, CuZ1, or CuLiZ1, wherein Z1 represents a halogen atom or a 5-isopropenyl-2-methyl-8-nonenyl group, from a 5-isopropenyl-2-methyl-8-nonenyl halide compound of the following general formula (4): wherein X1 represents a halogen atom; subjecting the nucleophilic reagent (1), 5-isopropenyl-2-methyl-8-nonenyl compound, to an addition reaction with at least one electrophilic reagent selected from the group consisting of formaldehyde, paraformaldehyde, and 1,3,5-trioxane, followed by a hydrolysis reaction to form 6-isopropenyl-3-methyl-9-decenol of the following formula (2); and acetylating 6-isopropenyl-3-methyl-9-decenol (2) to form 6-isopropenyl-3-methyl-9-decenyl acetate (3).

Abstract: A negative electrode active material for a non-aqueous electrolyte secondary battery, containing negative electrode active material particles, including silicon compound particles each containing a silicon compound (SiOx: 0.5?x?1.6) and at least one or more of Li2SiO3 and Li2Si2O5, the material includes a phosphate, the negative electrode active material particles each have a surface containing lithium element, and a ratio mp/ml satisfies 0.02?mp/ml?3, where ml represents a molar quantity of the lithium element and contained per unit mass of the particles, and mp represents a molar quantity of phosphorus element contained per unit mass of the particles. Thereby, a negative electrode active material is capable of stabilizing an aqueous negative electrode slurry prepared in producing a negative electrode of a secondary battery, and capable of improving initial charge-discharge characteristics when the negative electrode active material is used for a secondary battery.

Abstract: Provided is a curable resin composition for a bonding film that has a high adhesion force to a copper foil with a small surface roughness, maintains a high adhesion force even after HAST, and can also be turned into a cured product superior in dielectric properties. The curable resin composition for a bonding film that is to be bonded to a copper foil, contains: (A) a maleimide compound having at least one dimer acid frame-derived hydrocarbon group per molecule, that is represented by the following formula (1), (2) or (3) wherein A independently represents a tetravalent organic group having a cyclic structure, B independently represents a divalent hydrocarbon group having 6 to 60 carbon atoms and is a hydrocarbon group other than a dimer acid frame-derived hydrocarbon group, D represents a dimer acid frame-derived hydrocarbon group, m, l and n are each 1 to 100; and (B) a catalyst.

Abstract: A method for manufacturing a surface-treated gas-phase-process silica particle, the method including steps of: adding 1,3-divinyl-1,1,3,3-tetramethyldisilazane to a raw material gas-phase-process silica particle and introducing a vinyldimethylsilyl group on a surface of the raw material gas-phase-process silica particle to obtain a preliminarily treated silica particle; and adding hexamethyldisilazane to the preliminarily treated silica particle and introducing a trimethylsilyl group on a surface of the preliminarily treated silica particle to obtain a surface-treated gas-phase-process silica particle.

Abstract: Provided is an addition-reaction-curable organopolysiloxane composition comprising (A) an organopolysiloxane having at least two silicon-atom-binding alkenyl groups per molecule, (B) an organohydrogenpolysiloxane having at least two silicon-atom-binding hydrogen atoms (Si—H groups) per molecule, (C) an organopolysiloxane having at least one (meth)acryl group per molecule, (D) a linear olefin having a melting point of 20° C. or lower and a flash point of 40° C. or higher, and (E) a platinum-group metal-based catalyst, in which the amount of a metal other than a platinum-group metal is 100 ppm or less, the addition-reaction-curable organopolysiloxane composition can be cured satisfactorily and exhibits satisfactory adhesiveness even when the amount of the platinum-group metal-based catalyst is small, and an acryl-group-containing silicone cannot be precipitated and separated over time.

Abstract: A nitride semiconductor substrate includes: a heat-resistant support substrate having a core including nitride ceramic enclosed in an encapsulating layer; a planarization layer provided on the heat-resistant support substrate; a silicon single crystal layer having a carbon concentration of 1×1017 atoms/cm3 or higher provided on the planarization layer; a carbonized layer containing silicon carbide as a main component and having a thickness of 4 to 2000 nm provided on the silicon single crystal layer; and a nitride semiconductor layer provided on the carbonized layer. This provides a high-quality nitride semiconductor substrate (a nitride semiconductor substrate particularly suitable for GaN-based high mobility transistors (HEMT) for high-frequency switches, power amplifiers, and power switching devices); and a method for producing the same.

Abstract: A compound for forming a metal-containing film to be contained in a composition for forming a metal-containing film used in manufacturing a semiconductor, where the compound for forming a metal-containing film is represented by the following general formula (M-1) or (M-2). This provides: a compound for forming a metal-containing film having better dry etching resistance than conventional resist underlayer film materials and also having high filling and planarizing properties; a composition for forming a metal-containing film containing the compound; a patterning process in which the composition is used as a resist underlayer film material; a patterning process in which the composition is used as a resist material; and a semiconductor photoresist material containing the composition.

Abstract: A resist composition comprising a polymer or polymer-bound photoacid generator is provided, the polymer comprising repeat units derived from a sulfonium or iodonium salt having a urethane, thiourethane or urea bond in a linker between a polymerizable unsaturated bond and a fluorosulfonic acid site. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: An adhesive composition, including: a reaction product (A) among a bifunctional epoxy resin represented by the formula (2), a tri- or more functional epoxy resin represented by the formula (3), and a saturated acid anhydride represented by the following general formula (4); a UV-sensitive reaction initiator (B); and a dilution solvent (C), wherein the component (A) is a compound represented by the formula (1), a ratio of a total mole of epoxy groups in the multi-functional epoxy resin to a mole of the saturated acid anhydride is 1.30 to 3.00, and a mole of the bifunctional epoxy resin relative to a total mole of the multi-functional epoxy resin is 0.001 to 0.15. This provides a highly reliable epoxy-resin-based adhesive composition and film-shaped sealing material having a low viscosity, curability at low temperature, and high adhesiveness, and retaining power generation performance of a perovskite solar cell before and after sealing.