Abstract: The present invention is a method for producing perovskite type quantum dots, wherein, using a plurality of precursor solutions each containing a different element, each of the plurality of precursor solutions is heated and sprayed as an aerosol of the precursor solution, and the plurality of aerosols are collided to cause a gas phase reaction, dropping in a solvent to synthesize core particles containing the different elements. This provides a method for producing quantum dots that enables control of the particle size and yields nanoparticles with a uniform particle size even in large-scale synthesis.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: A composition for forming an organic film, including: a compound represented by the following general formula (1); and an organic solvent, wherein in the general formula (1), X represents any one group of X1 to X3 represented by the following general formulae (2), (3), and (5), and two or more kinds of X are optionally used in combination, wherein in the general formula (3), W represents a carbon atom or a nitrogen atom; “n1” represents 0 or 1; “n2” represents an integer of 1 to 3; and R1 independently represents any one of groups represented by the following general formula (4), and wherein in the general formula (5), R2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and R3 represents any one of the following groups.

Abstract: A resin composition containing a base resin and quantum dots that are crystalline nanoparticle phosphors, the base resin containing a fluorine-containing resin. This provides a resin composition capable of enhancing the stability of quantum dots.

Abstract: The present invention relates to a process for preparing a (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (S,R)-(2), wherein R1 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, and a bold wedged bond represents the absolute configuration, and a (1R,2S)-(2-acetoxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (R,S)-(3), wherein R1 is as defined above, a hashed wedged bond represents the absolute configuration, and Ac represents an acetyl group, the process comprising: subjecting a (1RS,2SR)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (RS,SR)-(2), wherein R1 is as defined above, and a hashed unwedged bond represents a relative configuration, to a kinetic resolution reaction with a lipase in the presence of vinyl acetate to obtain the (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound ((S,R)-(2)

Abstract: Provided are: a (hydrolyzable) organosiloxane compound which is represented by general formula (1) and contains a lipophilic group capable of forming a cured film having excellent lipophilicity and wear resistance; and a surface treatment agent containing the compound. (In the formula, A is any one among —CH3, —C(?O)OR1, —C(?O)NR12, —C(?O)SR1, and —P(?O)(OR1)2; R1 is a hydrogen atom, a C1-30 alkyl group, a C6-30 aryl group, or a C7-30 aralkyl group; Y is independently a divalent organic group; W is independently a C1-4 alkyl group, a phenyl group, a hydroxyl group, or a hydrolyzable group; R is independently a C1-4 alkyl group or a phenyl group; X is independently a hydroxyl group or a hydrolyzable group; n is an integer of 1-3; and q is an integer of 1-3.

Abstract: The present invention is a planarizing agent for forming an organic film, including an aromatic-group-containing compound having a molecular weight represented by a molecular formula of 200 to 500, wherein a blended composition that includes the planarizing agent and a preliminary composition containing an organic film-forming resin and a solvent, and having a complex viscosity of 1.0 Pa·s or more in a temperature range of 175° C. or higher has a temperature range in which a complex viscosity of the blended composition is less than 1.0 Pa·s in a temperature range of 175° C. or higher. This provides a planarizing agent for forming an organic film to yield a composition for forming an organic film having a high planarizing ability; a composition for forming an organic film containing this planarizing agent; a method for forming an organic film using this composition; and a patterning process.

Abstract: It is an object of the present invention to provide a personal care composition having not only a low environmental impact and a good skin feel but also a high cleansing property. The object can be achieved by a personal care composition containing water and low substituted hydroxypropyl cellulose, wherein the low substituted hydroxypropyl cellulose has an average particle size (D50) on a volume basis by dry laser diffraction of 30 ?m to 200 ?m and an aspect ratio equal to or more than 1.0 and less than 5.0, and the like.

Abstract: Provided is a cured or uncured electromagnetic wave shielding sheet with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm being impregnated with a resin and/or with the resin being laminated thereon, the sheet exhibiting a superior electromagnetic wave shielding performance with respect to millimeter waves and terahertz waves. The sheet may for example be one with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm and a specific resistance of not larger than 0.005 ?·cm being impregnated with a resin and/or with the resin being laminated thereon; or one with a carbon nanotube unwoven cloth having a thickness of not larger than 1 mm, an air permeability of not larger than 0.5 cm3/cm2·s and a specific resistance of not larger than 0.005 ?·cm being impregnated with a resin.

Abstract: A drying method of a polyimide paste which can maintain a printing shape while maintaining productivity includes an organic solvent and a polyimide resin dissolved in the organic solvent, and which becomes cured polyimide by being cured as a result of being dried and heated, the drying method including a step of applying the polyimide paste to a surface of a base material, a step of applying a solvent including a polar material to a surface of the base material at least at a portion where the polyimide paste is applied, and a step of, after applying the solvent including the polar material, drying the polyimide paste and the solvent including the polar material.

Abstract: A polysiloxazane compound having an alkoxysilyl group having an average composition of formula (1): wherein R1 represents a monovalent hydrocarbon group. R2 represents a monovalent hydrocarbon group, R3 represents an unsubstituted monovalent hydrocarbon group, R4 represents a divalent hydrocarbon group having 2 to 20 carbon atoms, X represents a methyl group, Y represents a group of formula (2) or (3) below: (R2 is same as above. R5 and R6 represent a monovalent hydrocarbon group, Z represents a divalent hydrocarbon group and the like, p is an integer of 0 to 9, and q is 0, 1, or 2.), n is an integer of 11 to 500, m is 0, 1, or 2, r is 0 or 1, and a, b, and c are numbers that satisfy 0<a<1, 0?b<1, 0<c<1, and a+2b+2c=1.

Abstract: A method for manufacturing a solar cell having a P-type silicon substrate wherein one main surface is a light-receiving surface and another is a backside, a plurality of back surface electrodes formed on a part of the backside, an N-type layer in at least a part of the light-receiving surface, and contact areas in which the substrate contacts the electrodes; wherein the P-type silicon substrate is a silicon substrate doped with gallium and has a resistivity of 2.5 ?·cm or less; and a back surface electrode pitch Prm [mm] of contact areas in which the P-type silicon substrate is in contact with the back surface electrodes and the resistivity Rsub [?·cm] of the substrate satisfy the relation represented by the following formula (1). log(Rsub)??log(Prm)+1.

Abstract: A quantum dot-containing polymer contains quantum dots that emit fluorescence by excitation light, wherein the quantum dot-containing polymer is a combined polymer of the quantum dots in which a ligand having a reactive substituent is coordinated to the outermost surface and a silicone compound having a polymerizable substituent. The quantum dot-containing polymer is stabilized by mild conditions.

Abstract: A cosmetic contains a high molecular weight polymer that is an addition polymerization product between: a polymer crosslinking agent of a (meth)acrylic-based graft silicone having a main chain with (meth)acrylic-based repeating units represented by the following formulae (I), (II), and (III), and side chains with unsaturated bonds and an organopolysiloxane structure; and an organohydrogen polysiloxane represented by the following general formula (4). A represents a group selected from an alkoxy group having 1 to 22 carbon atoms and an aryloxy group having 6 to 20 carbon atoms. B represents a group having an unsaturated bond represented by the following formula (1). C represents a group represented by the following formula (2), (3-1), or (3-2).

Abstract: The present invention provides a process for preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3), wherein R represents a linear or branched alkyl group having 1 to 4 carbon atoms, the process comprising subjecting a haloacetaldehyde alkyl 2,3-dimethyl-2-cyclopentenyl acetal compound of the following general formula (1), wherein R is as defined above, and Y represents a halogen atom, to a dehydrohalogenation reaction in the presence of a base, followed by a rearrangement reaction to obtain a (1,2-dimethyl-2-cyclopentenyl)acetate compound of the following general formula (2), wherein R is as defined above, and subjecting the (1,2-dimethyl-2-cyclopentenyl)acetate compound (2) to an epoxidation reaction, followed by an isomerization reaction and then a methylenation reaction to obtain the (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3).

Abstract: A halosilane compound: R1CH2CH2SiR52X is prepared by hydrosilylation reaction of a vinyl compound: R1CH?CH2 with a halogenodiorganosilane compound having formula: HSiR52X in the co-presence of an iridium catalyst, an internal olefin compound, and an allyl halide. The halosilane compound is prepared on an industrial scale with the advantages of low costs, high yields, and high selectivity, using a small amount of iridium catalyst.

Abstract: A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: Provided is a silicone adhesive composition having (A) a condensation product of a linear or branched diorganopolysiloxane having a silicon atom-bonded hydroxy group and/or a silicon atom-bonded alkoxy group having 1 to 10 carbon atoms at a terminal and having no alkenyl group, a linear or branched diorganopolysiloxane having at least two alkenyl groups, and an organopolysiloxane comprising an R13SiO0.5 unit and an SiO2 unit and having a silicon atom-bonded hydroxy group and/or a silicon atom-bonded alkoxy group having 1 to 6 carbon atoms, (B) an organohydrogenpolysiloxane having at least three SiH groups and an average polymerization degree of 80 or less in an amount of 0.1 to 5 parts by mass, relative to 100 parts by mass of component (A), and (C) a platinum group metal catalyst in a catalytic amount.

Abstract: Provided is a composition for forming a protective film using a polymer having an imide group: that is cured under a film-forming condition not only in the air but in an inert gas; that can form a protective film having excellent heat resistance, embedding and planarization ability for a pattern formed on a substrate, and good adhesiveness to the substrate; and that can form a protective film having excellent resistance against an alkaline aqueous hydrogen peroxide.

Abstract: A resist composition comprising a sulfonim salt having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.