Patents Assigned to Shin-Etsu Chemicals Co., Ltd.
  • Patent number: 6376603
    Abstract: A titanium oxide-filled addition reaction-curable silicone rubber composition including (A) a diorganopolysiloxane containing at least two alkenyl groups in one molecule, (B) an organohydrogenpolysiloxane containing in one molecule at least two silicon-bonded hydrogen atoms, (C) a platinum group metal catalyst, and (D) a titanium oxide powder having been surface-treated with a compound selected from the group consisting of a tetraalkoxysilane and a partial hydrolysis-condensation product of a tetraalkoxysilane; the titanium oxide powder being contained in an amount not less than 15 parts by weight based on 100 parts by weight of the component (A). The composition has a low viscosity and low thixotropic properties and easy to handle, even though it contains titanium oxide in a large quantity, and especially has a superior operability when used as a light-screening agent or a reflecting agent.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: April 23, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Tsutomu Kashiwagi
  • Patent number: 6376977
    Abstract: There is disclosed a silicon electrode plate including silicon single crystal used as an upper electrode in a plasma etching apparatus wherein concentration of interstitial oxygen contained in the silicon electrode plate is not less than 5×1017 atoms/cm3 and not more than 1.5×1018 atoms/cm3, and the silicon electrode plate wherein nitrogen concentration in the silicon electrode plate is not less than 5×1013 atoms/cm3 and not more than 5×1015 atoms/cm3. There can be provided a silicon electrode plate consisting of silicon single crystal used as an upper electrode in a plasma etching apparatus wherein problems due to adhesion of impurities such as heavy metal or the like can be prevented.
    Type: Grant
    Filed: May 30, 2000
    Date of Patent: April 23, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Makoto Kawai, Keiichi Goto, Kazuyoshi Tamura, Yoshihiro Kubota, Toshimi Kobayashi
  • Patent number: 6376078
    Abstract: Disclosed are spherical particles of a polyorganosilsesquioxane resin have a unique optical properties when each particle has a core-cladding composite structure consisting of a core portion of, for example, a polymethylsilsesquioxane resin and a cladding layer of, for example, a polyphenylsilsesquioxane resin having refractive indices differing by at least 0.02, the diameter of the core portion being in a specified range relative to the diameter of the whole particle. Such particles of a core-cladding structure can be prepared by conducting the hydrolysis-condensation reaction of organotrialkoxysilanes, e.g., methyl trimethoxysilane and phenyl trimethoxysilane, in two successive steps by using different silane compounds or by using silane mixtures of different mixing proportion in the first and second step reactions.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: April 23, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd
    Inventor: Yoshinori Inokuchi
  • Patent number: 6376923
    Abstract: A sealing material comprising (A) a liquid epoxy resin, (B) a curing agent, (C) a copolymer obtained through addition reaction between an alkenyl group-containing epoxy resin and an SiH group-containing organopolysiloxane, (D) an inorganic filler having a specific surface area of less than 4 m2/g, and (E) a fine inorganic filler having a specific surface area of at least 4 m2/g and surface treated with an aminosilane or organosilazane compound is suitable for sealing flip-chip type semiconductor devices. Despite high loading of inorganic fillers, the material has a low viscosity in the low shear region and improved thin-film infiltration and forms a reliable seal.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: April 23, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuaki Sumita, Kimitaka Kumagae, Miyuki Wakao, Toshio Shiobara
  • Patent number: 6372860
    Abstract: In a silicone rubber composition comprising an organopolysiloxane as a base polymer, 0.1-50 parts by weight of a modified silicone fluid having a melting point of up to 100° C. and a refractive index difference of 0.01-0.05 from the base polymer is blended per 100 parts by weight of the composition. The composition is cast and cured to form a mother mold which maintains parting properties over a long term.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: April 16, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kei Miyoshi, Kouichi Tanaka
  • Patent number: 6372337
    Abstract: A grease composition having high thermal conductivity and excellent dispensation suitability, comprising (A) 100 parts by weight of a base oil and (B) 500 to 1,200 parts by weight of metallic aluminum powder having the average particle size in the range of 0.5-50 &mgr;m; wherein the aluminum powder is a mixture of fine metallic aluminum powder having an average size of 0.5 to 5 &mgr;m and coarse metallic aluminum powder having an average particle size of 10 to 40 &mgr;m; and a semiconductor device utilizing the aforesaid grease composition.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: April 16, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Takahashi, Kunihiro Yamada, Kenichi Isobe
  • Patent number: 6372839
    Abstract: A composition comprising (A) a liquid epoxy resin, (B) spherical silica obtained by heating and burning spherical particles of polyorganosilsesquioxane, and (C) a curing accelerator is suitable as an underfill material for flip-chip type semiconductor devices. The composition has improved thin film infiltration and storage stability.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: April 16, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Ito, Toshio Shiobara, Kazuaki Sumita
  • Publication number: 20020042017
    Abstract: A chemically amplified positive resist composition contains as a base a carboxyl or phenolic hydroxyl group-containing resin soluble in aqueous alkaline solution, in which acid labile groups are incorporated into at least some of the hydrogen atoms on the carboxyl or phenolic hydroxyl groups so that the resin becomes insoluble or substantially insoluble in alkali, wherein the resin contains acid labile groups of at least two types, acid labile groups of one type are acetal or ketal groups, and acid labile groups of the other type are tertiary hydrocarbon groups or tertiary hydrocarbon group-containing substituents. The resist composition remains stable during vacuum standing after exposure to electron beams or soft x-rays, leaves minimal footings on chromium substrates, has an excellent sensitivity and resolution, and is thus suited as a micropatterning material for use in the processing of mask substrates.
    Type: Application
    Filed: July 19, 2001
    Publication date: April 11, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20020041934
    Abstract: Provided is an enteric coating technique capable of carrying out enteric coating without using an organic solvent and without causing a spray gun to clog, while keeping a equipment cost low. More specifically, from a spray gun comprising a nozzle for spraying an enteric polymer dispersion and/or solution and a nozzle for spraying a plasticizer solution, these solutions are sprayed simultaneously and separately through the nozzles. A mixture of these solutions thus obtained during spraying is applied to a preparation.
    Type: Application
    Filed: August 23, 2001
    Publication date: April 11, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuichi Nishiyama, Kazuhisa Hayakawa
  • Patent number: 6368683
    Abstract: There is disclosed a pellicle for photolithography comprising at least a pellicle membrane adhered to a pellicle frame, wherein the pellicle membrane exhibits light transmission of 50% or more when it is irradiated by an excimer laser having a wavelength of 160 nm or less. The present invention provides a pellicle for photolithography comprising a pellicle membrane of high light transmission and excellent durability even after long term irradiation with a vacuum ultraviolet light of a short wavelength.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: April 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Toru Shirasaki
  • Patent number: 6369155
    Abstract: To a fluorosilicone rubber composition comprising an organopolysiloxane having trifluoropropyl groups, a microparticulate silica filler, and a curing agent, there is added a specific amount of a linear organopolysiloxane oil having trifluoropropylmethylsiloxy groups in its backbone and having no crosslinked points in its molecule. The composition cures into fluorosilicone rubber experiencing minimized swell upon immersion in fuel oil and having satisfactory mechanical strength.
    Type: Grant
    Filed: June 23, 2000
    Date of Patent: April 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kenichi Takita
  • Patent number: 6369279
    Abstract: Styrene derivatives of formula (1) are novel wherein R1 is hydrogen, C1-20 alkyl, fluoro-substituted C1-20 alkyl, chloro, or trichloromethyl, R2 is a phenol protecting group, p, q and r are integers in the range of 0≦p<5, 0≦q<5, 0<r<5, and 0<p+q<5. Polymers obtained by polymerizing the styrene derivatives are useful as the base polymer of resist compositions.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: April 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mutsuo Nakashima, Jun Hatakeyama, Jun Watanabe, Yuji Harada
  • Publication number: 20020039701
    Abstract: A ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate having a Mw of 1,000-500,000 is blended as a base resin to formulate a chemically amplified, positive resist composition which has advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution, a satisfactory pattern profile after exposure, high etching resistance, and process adaptability.
    Type: Application
    Filed: August 14, 2001
    Publication date: April 4, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takanobu Takeda, Osamu Watanabe, Kazuhiro Hirahara, Kazunori Maeda, Wataru Kusaki, Shigehiro Nagura
  • Publication number: 20020038633
    Abstract: A cellulose ether having a viscosity of at least 80,000 mPa·s, as measured in a 2 wt % aqueous solution thereof at 20° C. by Ubbelohde's viscometer No. 5 according to JIS K2283-1993 is useful as a binder in the preparation of pet waste-absorbing granular material. The pet waste-absorbing granules effectively gather into clumps upon contact with pet urine, are economical because of a reduced weight per urination of granules gathered into clumps to be removed, and are combustible or disposable by flushing in the toilet.
    Type: Application
    Filed: August 17, 2001
    Publication date: April 4, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazuhisa Hayakawa
  • Publication number: 20020038557
    Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90-120° so that the porous silica matrix has a density of 0.1-1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.
    Type: Application
    Filed: August 17, 2001
    Publication date: April 4, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Matsuo, Hisatoshi Otsuka, Kazuo Shirota, Shigeru Maida
  • Publication number: 20020039690
    Abstract: A phase shift mask blank includes a transparent substrate and a phase shift film thereon. The phase shift film is composed primarily of a metal and silicon, typically molybdenum silicide oxide carbide or molybdenum silicide oxide nitride carbide, and has a film stress no higher than 100 MPa. The low stress makes it possible to maintain a good substrate flatness when the phase shift film is formed during production of the phase shift mask blank, and when the phase shift film is patterned during production of a phase shift mask from the blank.
    Type: Application
    Filed: August 20, 2001
    Publication date: April 4, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yukio Inazuki, Tamotsu Muruyama, Hideo Kaneko, Satoshi Okazaki
  • Patent number: 6365766
    Abstract: Organohalosilanes are prepared by reacting an organic halide with metallic silicon particles in the presence of a metallic copper catalyst which is a metallic copper powder in flake form having a bulk specific gravity of 1-3 g/cm3 and a mean particle size of 10 &mgr;m to 1 mm as measured by laser diffraction particle size distribution analysis.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: April 2, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Masaaki Furuya, Yoshihiro Shirota, Akio Muraida, Susumu Ueno, Toshio Shinohara
  • Publication number: 20020036031
    Abstract: A sintered rare earth magnet consisting essentially of 20-30% by weight of R (wherein R is Sm or a mixture of Sm and another rare earth element), 10-45% by weight of Fe, 1-10% by weight of Cu, 0.5-5% by weight of Zr, and the balance of Co has on its surface a composite layer containing Sm2O3 and/or CoFe2O4 in Co or Co and Fe. The magnet is resistant to hydrogen embrittlement.
    Type: Application
    Filed: July 30, 2001
    Publication date: March 28, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuaki Sakaki, Masanobu Shimao, Hajime Nakamura, Takehisa Minowa
  • Patent number: 6362291
    Abstract: A process for producing a polymer by polymerizing in a polymerization vessel a monomer having an ethylenic double bond is provided. In this process, the polymerization vessel has a polymer scale preventive coating film on its inner wall surfaces and other surfaces with which the monomer comes into contact during polymerization. The coating film is formed by coating a coating liquid containing (A) a compound selected from the group consisting of an aromatic compound having 5 or more conjugated &pgr; bonds and a heterocyclic compound having 5 or more conjugated &pgr; bonds, and (B) a compound selected from the group consisting of an inorganic colloid, a chelate reagent, a metal compound that produces a metal ion capable of forming a complex having at least two coordination numbers, and an acid; the coating liquid being coated by means of steam as a carrier.
    Type: Grant
    Filed: July 13, 2000
    Date of Patent: March 26, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Mikio Watanabe, Genji Noguki
  • Publication number: 20020033205
    Abstract: An R—Fe—B permanent magnet wherein R is Nd or a combination of Nd with a rare earth element is prepared by casting an R—Fe—B alloy, crushing the alloy in an oxygen-free atmosphere of argon, nitrogen or vacuum, effecting comminution, compaction, sintering, aging, and cutting and/or polishing the magnet to give a finished surface. The magnet is then heat treated in an argon, nitrogen or low-pressure vacuum atmosphere having a limited oxygen partial pressure, obtaining a highly oil resistant sintered permanent magnet having corrosion resistance and hydrogen barrier property even in a high pressure hot environment of refrigerant and/or lubricant as encountered in compressors.
    Type: Application
    Filed: May 30, 2001
    Publication date: March 21, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd
    Inventors: Kazuo Tamura, Masanobu Shimao, Ryuji Hamada, Takehisa Minowa