Patents Assigned to Silecs Oy
  • Patent number: 7060634
    Abstract: An integrated circuit is provided comprising a substrate and discrete areas of electrically insulating and electrically conductive material, wherein the electrically insulating material is a hybrid organic-inorganic material that has a density of 1.45 g/cm3 or more and a dielectric constant of 3.0 or less. The integrated circuit can be made by a method comprising: providing a substrate; forming discrete areas of electrically insulating and electrically conductive material on the substrate; wherein the electrically insulating material is deposited on the substrate followed by heating at a temperature of 350° C. or less; and wherein the electrically insulating material is a hybrid organic-inorganic material that has a density of 1.45 g/cm3 or more after densification. Also disclosed is a method for making an integrated circuit comprising performing a dual damascene method with an electrically conductive material and a dielectric, the dielectric being a directly photopatterned hybrid organic-inorganic material.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: June 13, 2006
    Assignee: Silecs Oy
    Inventors: Juha T. Rantala, Jason S. Reid, Nungavram S. Viswanathan, T. Teemu T. Tormanen
  • Patent number: 6974970
    Abstract: Thin films are disclosed that are suitable as dielectrics in IC's and for other similar applications. In particular, the invention concerns thin films comprising compositions obtainable by hydrolysis of two or more silicon compounds, which yield an at least partially cross-linked siloxane structure. The invention also concerns a method for producing such films by preparing siloxane compositions by hydrolysis of suitable reactants, by applying the hydrolyzed compositions on a substrate in the form of a thin layer and by curing the layer to form a film. In one example, a thin film comprising a composition is obtained by hydrolyzing a monomeric silicon compound having at least one hydrocarbyl radical, containing an unsaturated carbon-to-carbon bond, and at least one hydrolyzable group attached to the silicon atom of the compound with another monomeric silicon compound having at least one aryl group and at least one hydrolyzable group attached to the silicon atom of the compound to form a siloxane material.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: December 13, 2005
    Assignee: Silecs Oy
    Inventors: Juha T. Rantala, Jason S. Reid, Nungavram S. Viswanathan, T. Teemu T. Tormanen
  • Patent number: 6924384
    Abstract: A compound of the general formula R1R2MR4R5 is disclosed wherein R1 and R2 are independently an aryl, alkyl, alkenyl, epoxy or alkynyl group, wherein at least one of R1 and R2 is fully or partially fluorinated, wherein M is selected from group 14 of the periodic table, wherein R4 and R5 are independently an alkoxy group, OR3, or a halogen group, X, except where M is Si, R4 and R5 are both ethoxy groups or both chlorine groups, and R1 and R2 are perfluorinated groups. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making compounds of the general formula R1MR4R5R6 are also disclosed.
    Type: Grant
    Filed: January 8, 2002
    Date of Patent: August 2, 2005
    Assignee: Silecs Oy
    Inventors: Juha T. Rantala, Arto L. T. Maaninen, Tiina J. Maaninen, Jarkko J. Pietikainen
  • Patent number: 6831189
    Abstract: A method comprises reacting a compound of the general formula R14-mMOR3m wherein m is an integer from 2 to 4, R1 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R1 is nonfluorinated, or fully or partially fluorinated; OR3 is alkoxy; and M is an element selected from group 14 of the periodic table; with a compound of the general formula R2M1 wherein R2 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R2 is at least partially fluorinated; and M1 is an element from group I of the periodic table; so as to make a compound of the general formula R14-mMOR3m-1R2.
    Type: Grant
    Filed: January 8, 2002
    Date of Patent: December 14, 2004
    Assignee: Silecs Oy
    Inventors: Juha A. Rantala, Arto L. T. Maaninen, Tiina J. Maaninen, Jarkko J. Pietikainen
  • Patent number: 6803476
    Abstract: A method comprises reacting a compound of the general formula R14−mMOR3m wherein m is an integer from 2 to 4, OR3 is an alkoxy group, and M is an element selected from group 14 of the periodic table; with a compound of the general formula R2X2+Mg, wherein X2 is Br or I; where R1 and R2 are independently selected from alkyl, alkenyl, aryl, alkynyl, or epoxy, and wherein at least one of R1 and R2 is partially or fully fluorinated; so as to make a compound of the general formula R2R14−mMOR3m−1; followed by reacting R2R14−mMOR3m−1 with a halogen or halogen compound in order to replace one or more OR3 groups with a halogen group so as to form R2R14−mMOR3m−1−nXn, where X is a halogen and n is from 1 to 3 and m<n—except where R1 is fluorinated phenyl, M is Si and OR3 is ethoxy.
    Type: Grant
    Filed: January 8, 2002
    Date of Patent: October 12, 2004
    Assignee: Silecs Oy
    Inventors: Juha T. Rantala, Arto L. T. Maaninen, Tiina J. Maaninen, Jarkko J. Pietikainen