Abstract: A method and system of accurately processing a discrete time input signal having a first clock rate into a discrete time output signal having a second clock rate is presented. The method includes delta filtering the input signal to produce an intermediate signal having the first clock rate and delta interpolating the intermediate signal to produce the output signal. Delta filtering includes calculating an input delta signal by subtracting an initial value from the input signal, generating a filtered delta signal, and adding the initial value to the filtered delta signal. Delta interpolating includes upsampling the intermediate signal to the second clock rate, calculating an upsampled intermediate delta signal by subtracting an initial value from the upsampled intermediate signal, filtering the intermediate delta signal, and adding the initial value to the filtered intermediate delta signal.

Abstract: A method and system of efficiently processing a discrete time input signal having a plurality of input signal samples that occur at a first clock rate into a discrete time output signal having a second clock rate that is R times the first clock rate is presented. The method includes receiving the input signal and filtering the input signal with an N-taps finite impulse response (FIR) filter having N filter coefficients. The method reduces the number of required operations and reduces computational errors in the filtering and interpolation of discrete input signals.

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

Abstract: The use of refractive optical elements to reduce or eliminate unwanted wavelength components from a laser emission. The method and apparatus described herein introduces modifications to the parallelism of one or more existing optical elements within the laser to dispersively separate wavelength components of the laser emission. According to embodiments of the invention, modifications in the parallelism can be made to the output coupler, intra-cavity polarizing optical components, and extra-cavity beamsplitter to accomplish separation of wavelength components without the introduction of additional optical components or reduction in the operating capacity of the laser. Additional optical components can be used to accomplish further separation of the wavelength components after the laser beam leaves the laser resonator.

Abstract: The present invention provides a ultraviolet (UV) polarizing beam splitter cube. The UV polarizing beam splitter cube is transmissive to light at wavelengths equal to or less than 170 nm, and for example at 157 nm. The UV polarizing beam splitter cube can image at high quality light incident over a wide range of angles and including a numeric aperture greater than 0.6, and for example at 0.75. In one embodiment, the UV polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, and a coating interface having at least one layer of a thin film fluoride material. In one example implementation, a UV polarizing beam splitter cube comprises a pair of prisms that are made of at least calcium fluoride material, and a coating interface having a stack of alternating layers of thin film fluoride materials. The alternating layers of thin film fluoride materials comprise first and second fluoride materials.

Abstract: A lithography system and method for calculating an optimal discrete time trajectory for a movable device is described. A trajectory planner of the lithography system calculates an optimal discrete time trajectory subject to maximum velocity and maximum acceleration constraints. The trajectory planner begins by calculating a continuous time, three-segment trajectory for a reticle stage, a wafer stage or a framing blade, including a first phase for acceleration at the maximum acceleration to the maximum velocity, a second phase for travel at the maximum velocity and a third phase for deceleration at the negative maximum acceleration to a final velocity. Next, the trajectory planner converts said continuous time, three-segment trajectory to a discrete time trajectory. The time of execution of the resulting trajectory is at most three quanta greater than the time of execution of the continuous time trajectory. One advantage of the system is the reduction of scanning times of a lithography system.

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

Abstract: The present invention is directed to efficient and accurate filtering and interpolation techniques. Methods of the present invention reduce the number of required operations and reduce computational errors in the filtering and interpolation of discrete input signals.

Abstract: An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another.

Abstract: Particular types of distortion within a lithographic system may be characterized by linewidth control parameters. Linewidth control parameters of any given line or feature within a printed pattern vary as a result of optical capabilities of the lithography apparatus used, particular characteristics of the reticle, focus setting, light dose fluctuations, etc. The instant invention uses focus offset coefficients to change the focus at points within a slot to compensate for the linewidth control parameter variations introduced by the factors contributing to such variations. Additionally, different focuses can be set dynamically along the scan for a particular slot point. A set, or sets, of focus offset coefficients is generated for a particular lithography apparatus, depending on the number of linewidth control parameters for which correction is desired.

Abstract: The present invention provides an ultraviolet (UV) polarizing beam splitter cube. The UV polarizing beam splitter cube is transmissive to light at wavelengths equal to or less than 170 nm and can image, at high quality, light incident over a wide range of angles and including a numeric aperture greater than 0.6. The UV polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, and a coating interface having at least one layer of a thin film fluoride material. Alternating layers of thin film fluoride materials can comprise a first fluoride material having a first refractive index and a second fluoride material having a second refractive index. The first and second fluoride materials form a stack of fluoride materials having relatively high and low refractive indices such that the coating interface separates UV light into two polarized states.

Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Abstract: This invention is a substrate thermal management system for efficient, rapid, controllable and uniform thermal management over a wide temperature range. The thermal management system integrates a thermal source, thermal sink and a thermal diffuser. According to the invention, a thermal diffuser is positioned stationary relative to the wafer surface and coupled to a thermal source and a thermal sink, which are also stationary relative to the wafer surface. The thermal source includes a plurality of zones adapted to provide differing amounts of heat and a controllable temperature field over a surface proximal to the thermal diffuser. The thermal sink comprises a heat-carrying media with a controllable temperature.

Abstract: Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

Abstract: The use of refractive optical elements to reduce or eliminate unwanted wavelength components from a laser emission. The method and apparatus described herein introduces modifications to the parallelism of one or more existing optical elements within the laser to dispersively separate wavelength components of the laser emission. According to embodiments of the invention, modifications in the parallelism can be made to the output coupler, intra-cavity polarizing optical components, and extra-cavity beamsplitter to accomplish separation of wavelength components without the introduction of additional optical components or reduction in the operating capacity of the laser. Additional optical components can be used to accomplish further separation of the wavelength components after the laser beam leaves the laser resonator.

Abstract: A wafer cluster tool comprising a series of processes has a scheduler which synchronizes all events in the system. Events in the cluster tool are scheduled to occur at regular, periodic intervals, thereby improving throughput and quality. The scheduler also eliminates conflicts for transportation resources between modules in the cluster tool. Wafers are loaded into the cluster tool at a regular interval, referred to as a sending period. All events in the system are synchronized with the sending period, and all event timings are normalized in terms of the sending period. The conflicts are resolved by selectively adding delays in modules which can tolerate them without degrading throughput or performance in the system; modules that cannot tolerate delays are exempted. The periodicity of the scheduled cluster tool enables the identification of wafers in the cluster tool. The identification of the order in which a wafer was loaded also identifies a module path followed by the wafer.

Abstract: A hot plate assembly includes a base plate, a lid and a housing positioned between the base plate and the lid. The housing, lid and base plate form a process chamber. An insulator is positioned adjacent to the base plate in the process chamber. An air gap is formed at least partially between a bottom surface of the insulator and a top surface of the base plate. A hot plate is positioned adjacent to the insulator in the process chamber. At least a first reflective member is positioned between the hot plate and the insulator.

Abstract: The present invention provides a method and system for controlling the refractive index of gaseous mixture of the projection optics of a lithographic tool. In one embodiment, the present invention corrects projection optic aberrations due to altitude specific barometric pressure variations. Furthermore, the present invention provides control over the aberrations of an optical system, the ability to compensate for altitude changes, the ability to compensate for pressure changes, and the ability to purge gases from the optical system. In an embodiment, the system of the present invention includes at least one gas supply to provide a gas for a mixture, at least one mass flow controller associated with each gas supply, where the mass flow controller measures and controls the quantity of a respective gas for the mixture, and at least one flow gauge to substantially maintain laminar flow within the lithography apparatus.