Abstract: A method for thermocapillary drying of substrates includes the step of elevating a submerged substrate away from a rinsing liquid. Such movement of the substrate forms a meniscus on opposite sides of the substrate. The curved raised portion of the meniscus at each side of the substrate is gently heated in such a way as to induce thermocapillary flows, which cause the rinsing fluid to flow away from the substrate so that the withdrawing substrate may be pulled out dry and clean. Heating may be accomplished by directing a warm gas onto the meniscus or by heating the meniscus with rays from a radiation/light source. Apparatus is also provided for performing the various method steps.

Abstract: A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

Abstract: A device for treatment of substrates in a fluid container includes a container containing a treatment fluid and a substrate transport device moveable into a position above the container. The substrate transport device has at least one substrate holding device for securing the substrates in a first position and releasing the substrates in a second position. A third position may be provided in which a first set of substrates is secured and a second set of substrates is released. The substrate holding device is preferably at least one rotatable securing rod.

Abstract: A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

Abstract: A device for chemical wet treatment of substrates has a tank containing a treatment fluid for treating the substrates. At least one substrate carrier for supporting the substrates within the tank is provided. At least one substrate lifting device for lifting the substrates off the substrate carrier is provided. A lifting apparatus for lifting and lowering the substrate carrier is positioned in the tank. The lifting apparatus has a first transport carriage connected to the substrate lifting device and a second transport carriage connected to a holder of the substrate carrier. The first and second transport carriages are connected to one another by a jointed connection.

Abstract: A method and device for the wet processing of substrates in a container are provided. At least one liquid is introduced via at least one liquid inlet into the container. A liquid overflow device is adapted to float on the surface of the liquid in the container. The overflow device is provided with openings for withdrawing liquid from the container. Accompanied by release or flooding of the substrates disposed in the container, the overflow device, together with the surface of the liquid, drops to below the substrates or is raised from the substrates.

Abstract: A device for coating substrates with a capillary slot includes a component having a capillary slot with an outlet opening. A container filled with a coating fluid is provided. The component is positioned in the container such that the capillary slot communicates with the coating fluid and such that the coating fluid is supplied to the capillary slot. A device for moving vertically the outlet opening of the capillary slot relative to the container is also provided.

Abstract: A device for coating substrates has a capillary slot which is used in a first step to apply lacquer to the substrate. In a second step, the lacquer layer thickness of the substrate is reduced and made more uniform by spinning in a spinning device.

Abstract: A method for treating substrates includes chemically treating at least one substrate in a container with at least one treatment fluid and washing said at least one substrate with a washing fluid in the same container. Subsequently, the at least one substrate is dried.

Abstract: A device for coating a plate has an open channel being open in an upward direction and a device for supplying a liquid to the open channel. The liquid in the open channel forms an convexly curved portion projecting upwardly from the open channel. A device for transporting a plate at a close distance past the open channel is provided, with which a surface to be coated of the plate facing the convexly curved portion of the liquid is guided such that a thin film of the liquid is deposited on the surface to be coated by adhesion effects. Another device for lacquering or coating plates or disks has a capillary slot that is filled with a liquid coating medium. The plate to be coated is advanced across the capillary slot with the surface to be coated facing downwardly so that due to the capillary effect a thin layer is deposited on the surface of the plate.