Patents Assigned to Sumitomo Chemical Company, Limited
  • Publication number: 20200243804
    Abstract: According to an embodiment, a method of manufacturing an organic electronic device including a stack including a first electrode layer, one or more functional layers, and a second electrode layer, the one or more functional layers and the second electrode layer being formed in this order on the first electrode layer, comprises: a first layer forming step of forming a first layer 24 among the layers included in the stack; and a second layer forming step of forming a second layer on the first layer by using a coating solution containing a material for the second layer and a solvent with boiling point of 160° C. or more, the second layer being in contact with the first layer. In the first layer forming step, the first layer is formed with a thickness t smaller than a desired thickness such that the first layer has the desired thickness T due to an increase in a thickness of the first layer as the second layer is formed.
    Type: Application
    Filed: October 11, 2018
    Publication date: July 30, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Tadashi GODA
  • Publication number: 20200243732
    Abstract: The present disclosure relates to a light-emitting composition containing a perovskite compound and inorganic fine particles.
    Type: Application
    Filed: July 26, 2018
    Publication date: July 30, 2020
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Shota Naito, Kentaro Mase
  • Publication number: 20200236939
    Abstract: The present invention relates to a herbicidal composition including trifludimoxazin and at least one compound selected from the group consisting of a herbicide compound group B and a safener group C, wherein a weight ratio of trifludimoxazin to the at least one compound selected from the group consisting of the herbicide compound group B and the safener group C is 1:0.1 to 1:50. According to the present invention, the herbicidal composition having an excellent controlling effect on weeds can be provided.
    Type: Application
    Filed: April 16, 2020
    Publication date: July 30, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Yoshinobu JIN
  • Publication number: 20200243803
    Abstract: A method of manufacturing an organic device including: forming a plurality of organic device units in one direction at predetermined intervals; affixing a sealing member extending in the one direction, such that a part of each of a first and a second electrode layer in each of the organic device units is exposed and the sealing member straddles across the plurality of organic device units; and cutting the plurality of organic device units to which the sealing member is affixed; in the affixing, the sealing member including a sealing base material containing a material having conductivity, and an adhesive portion containing a pressure-sensitive adhesive is affixed to the organic device unit; in the cutting, the sealing member is cut such that a cutting blade is allowed to approach from the sealing member side, and the adhesive portion after being cut protrudes to the outside from the sealing base material.
    Type: Application
    Filed: August 2, 2018
    Publication date: July 30, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takashi FUJII, Yasuo MATSUMOTO, Shinichi MORISHIMA
  • Publication number: 20200239713
    Abstract: The present invention relates to an ink composition including a semiconductor nanoparticle (1) which contains a perovskite compound, and a curable resin composition (2), in which the ink composition may further include a solvent (3), a value of Z in Formula (a) of Z?(O2+O3+N2+N3)/(C2+C3) is 0.37 or less, O2, N2, and C2 represent the number of O atoms, the number of N atoms, and the number of C atoms, respectively, in the curable resin composition (2), and O3, N3, and C3 represent the number of O atoms, the number of N atoms, and the number of C atoms, respectively in the solvent (3).
    Type: Application
    Filed: July 26, 2018
    Publication date: July 30, 2020
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Sho Kanesaka, Takeshi Miyamoto, Shota Naito
  • Patent number: 10727538
    Abstract: As a nonaqueous electrolyte secondary battery whose battery performance is prevented from being deteriorated by charge and discharge, provided is a nonaqueous electrolyte secondary battery including: a nonaqueous electrolyte secondary battery separator having ion permeability barrier energy of not less than 300 J/mol/?m and not more than 900 J/mol/?m per unit film thickness; and a nonaqueous electrolyte containing a given additive in an amount of not less than 0.5 ppm and not more than 300 ppm.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: July 28, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Eiko Kashiwazaki, Ichiro Arise, Chikara Murakami
  • Patent number: 10727463
    Abstract: A lateral surface (12e) of a long separator sheet (12a, 12b) has a value of edge length (R)/longer side length (P) which is less than 1.04. It is therefore possible to provide the long porous separator sheet that is less likely to be torn in processing.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: July 28, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomoaki Ozeki, Masateru Sembara, Daizaburo Yashiki
  • Patent number: 10723861
    Abstract: An injection molded body containing a (meth)acrylic resin composition containing a (meth)acrylic resin and an inorganic filler and having a surface with an arithmetic average roughness of 20 nm or more and 280 nm or less is provided. The inorganic filler preferably has a particle diameter of 0.1 ?m or more and 100 ?m or less. An injection molded body having high glossiness and excellent scratch resistance, even when colored, and an automotive member containing the injection molded body are also provided.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: July 28, 2020
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshimi Kawamoto, Yoichi Yasutomi, Kazuki Daimatsu
  • Patent number: 10725380
    Abstract: A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: July 28, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamamoto, Koji Ichikawa
  • Patent number: 10721929
    Abstract: A compound represented by Formula (I) is provided. In Formula (I), Q represents a group represented by Formula Q1, Q2, or Q3, and T represents a chain hydrocarbon group, an alkoxyalkyl group, an alkylsulfanylalkyl group, an alkylsulfinylalkyl group, or an alkylsulfonylalkyl group, which has a halogen atom; a cycloalkylalkyl group or a cycloalkyl group, which has a substituent; OR1, S(O)mR1, OS(O)2R1, CH2OR1, NR1R29, C(O)R1, C(O)NR1R29, NR29C(O)R1, N?CR1R30, or a group represented by any one of Formulas T-1 to T-12.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: July 28, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kohei Orimoto, Masaru Shimomura
  • Publication number: 20200231720
    Abstract: Disclosed is a compound represented by formula (I): in formula (I), R1 and R2 each independently represent a hydrogen atom or a methyl group, X1 and X2 each independently represent a group represented by any one of formula (X1-1) to formula (X1-8): A1 and A2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—, and R3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—.
    Type: Application
    Filed: January 26, 2018
    Publication date: July 23, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Satoshi YAMAGUCHI, Koji ICHIKAWA
  • Publication number: 20200233301
    Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)n3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.
    Type: Application
    Filed: January 14, 2020
    Publication date: July 23, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
  • Publication number: 20200233300
    Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
    Type: Application
    Filed: January 14, 2020
    Publication date: July 23, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
  • Patent number: 10717723
    Abstract: The invention provides a method for producing a crystal of a uracil compound with high purity by a process which can be carried out in an industrial scale. Specifically, the invention provides a method for producing a crystal of a uracil compound, wherein the method comprises dissolving a composition comprising a uracil compound represented by formula (1) in organic solvents consisting of a C3-C6 alcohol solvent and an aromatic solvent to obtain a solution, and precipitating a crystal of said uracil compound from the solution.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: July 21, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Yuki Sato
  • Patent number: 10717792
    Abstract: A polymer that is capable of affording a heat storage material superior in humidity permeability and shape retention after phase transition and that is superior in molding processability is provided. The polymer includes constitutional units (A) derived from ethylene, constitutional units (B) represented by a specified formula, and optionally includes constitutional units (C) represented by another specified formula. Where the total number of the units (A), the units (B), and the units (C) is 100%, the number of the units (A) accounts for 70% to 99%, the total number of the units (B) and the units (C) accounts for 1% by weight to 30% by weight. Where the total number of the units (B) and the units (C) is 100%, the number of the units (B) accounts for 1% to 100% and the number of the units (C) accounts for 0% to 99%.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: July 21, 2020
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yu Miura, Yasutoyo Kawashima, Kohei Ueda, Yoshinobu Nozue
  • Patent number: 10717884
    Abstract: The present invention relates to a resin solution composition containing at least one resin selected from the group consisting of aromatic polysulfones, aromatic polyamideimides, aromatic polyetherimides, aromatic polyimides and aromatic polyamic acids, a sulfone-based solvent, and an ester-based solvent, wherein in this resin solution composition, an amount of the resin, relative to the total mass of the resin solution composition, is at least 10% by mass but not more than 50% by mass, and an amount of the ester-based solvent, relative to the total amount of the sulfone-based solvent and the ester-based solvent, is at least 15% by mass but not more than 85% by mass.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: July 21, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kazuyuki Ito, Masanobu Matsubara
  • Patent number: 10717809
    Abstract: The invention provides a production method of a polymer compound having a constitutional unit represented by the formula (3-1) and a constitutional unit represented by the formula (3-2), which contains a step of reacting a compound represented by the formula (1) and a compound represented by the formula (2) in the presence of a transition metal complex, a base and an organic solvent having a peroxide amount of 15 ppm by weight or less: wherein Ar1 and Ar2 represent a divalent aromatic hydrocarbon group, a divalent heteroaromatic group, a group represented by the formula (4) or the like; X1 represents a bromine atom or the like; X2 represents —B(OH)2, a borane residue, a borate ester residue or the like; wherein Ar represents a divalent aromatic hydrocarbon group, a divalent heteroaromatic group or the like, Ar? represents an aryl group or a monovalent heteroaromatic group, m represents an integer of 0-2.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: July 21, 2020
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yasutaka Yatsumonji, Haruki Otsuka, Ayuko Miura
  • Publication number: 20200225276
    Abstract: One embodiment of the present invention provides a method for evaluating the electrical defect density of a semiconductor layer, which comprises: a step for measuring an electric current by applying a voltage to a semiconductor element 1 which comprises a GaN layer 12 that serves as a semiconductor layer; and a step for deriving the electrical defect density in the GaN layer 12 with use of the measured electric current value.
    Type: Application
    Filed: August 6, 2018
    Publication date: July 16, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kuniyuki KAKUSHIMA, Takuya HOSHII, Hitoshi WAKABAYASHI, Kazuo TSUTSUI, Hiroshi IWAI, Taiki YAMAMOTO
  • Publication number: 20200223795
    Abstract: Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I): In formula (I), R1, R2, R3, R4 and R5 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R6, R7 and R8 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 1 to 5, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, m8 represents an integer of 0 to 4, and AI? represents an organic anion.
    Type: Application
    Filed: April 8, 2019
    Publication date: July 16, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yukako ANRYU, Koji ICHIKAWA
  • Publication number: 20200227262
    Abstract: Provided is a crystal laminate including: a crystal substrate formed from a monocrystal of group III nitride expressed by a compositional formula InxAlyGa1-x-yN (where 0?x?1, 0?y?1, 0?x+y?1), the crystal substrate containing at least any one of n-type impurity selected from the group consisting of Si, Ge, and O; and a crystal layer formed by a group III nitride crystal epitaxially grown on a main surface of the crystal substrate, at least any one of p-type impurity selected from the group consisting of C, Mg, Fe, Be, Zn, V, and Sb being ion-implanted in the crystal layer. The crystal laminate is configured in a manner such that an absorption coefficient of the crystal substrate for light with a wavelength of 2000 nm when the crystal substrate is irradiated with the light falls within a range of 1.8 cm?1 or more and 4.6 cm?1 or less under a temperature condition of normal temperature.
    Type: Application
    Filed: April 19, 2018
    Publication date: July 16, 2020
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, SCIOCS COMPANY LIMITED, HOSEI UNIVERSITY
    Inventors: Fumimasa HORIKIRI, Takehiro YOSHIDA, Tomoyoshi MISHIMA