Patents Assigned to Sumitomo Chemical Company, Limited
  • Patent number: 11782342
    Abstract: A salt represented by the formula (I):
    Type: Grant
    Filed: October 2, 2018
    Date of Patent: October 10, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Yuki Takahashi, Koji Ichikawa
  • Patent number: 11780813
    Abstract: The present invention provides a new production method for a chlorobenzene compound. Specifically, the present invention provides a production method in which the compound represented by formula (1) (in the formula, X1 represents a halogen atom) and chlorine are reacted in the presence of a Brønsted acid, thereby obtaining the chlorobenzene compound represented by formula (2) (in the formula, X1 represents the same as above).
    Type: Grant
    Filed: January 29, 2020
    Date of Patent: October 10, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Junichi Ishikawa, Tohru Inoue, Takayuki Wakamatsu, Miyuki Iguchi
  • Publication number: 20230314359
    Abstract: There is provided an electrochemical sensor that electrochemically detects a specific substance in a test sample 50 by bringing a liquid test sample 50 into contact with sensor electrodes 20 arranged on a support 10, the electrochemical sensor including a holding structure 30 that constitutes a non-sealed finite space facing the sensor electrodes 20 and holds the test sample 50 that is brought into contact with the sensor electrodes 20 in the finite space.
    Type: Application
    Filed: June 3, 2021
    Publication date: October 5, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masafumi YOKOYAMA, Masatomo SHIBATA
  • Publication number: 20230314938
    Abstract: Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including the same. wherein R1 and R2 each represent a hydroxy group, —O—R10, etc.; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc.; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5; X0 represents a single bond, a hydrocarbon group which may have a substituent; Rbb1 represents a hydrogen atom, a halogen atom, etc.; X10 represents a single bond, *—O—**, etc.; and L10 represents a single bond or a hydrocarbon group which may have a substituent.
    Type: Application
    Filed: March 27, 2023
    Publication date: October 5, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Publication number: 20230314939
    Abstract: A carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including same. wherein R1 to R3 each represent a hydroxy group, —O—R10, etc.; R4 to R9 each represent a halogen atom, a haloalkyl group, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5; X0 represents a single bond or a hydrocarbon group which may have a substituent; Rbb1 represents a hydrogen atom, a halogen atom, etc.; X10 represents a single bond, *—O—**, etc.; and L10 represents a single bond or a hydrocarbon group which may have a substituent.
    Type: Application
    Filed: March 27, 2023
    Publication date: October 5, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Publication number: 20230312635
    Abstract: The present invention provides an efficient process for preparing a nucleic acid oligomer, that is, a process for preparing a nucleic acid having a phosphate triester bond effectively by oxidizing a nucleic acid precursor having a phosphite triester bond. Also the present invention provides a process for preparing a nucleic acid compound having at its 5?-terminus a nucleotide represented by formula (I) by a phosphoramidite method, which comprises a step of reacting a precursor having a phosphite triester bond represented by a formula (II) (the definitions of substituents of formulae (I) and (II) are described in the Description) with an oxidation solution which contains iodine, pyridine and water, and a molar ratio of iodic acid to iodine (mole of iodic acid/mole of iodine) is 30×10?3 or less.
    Type: Application
    Filed: December 14, 2020
    Publication date: October 5, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takuya MIYAGAWA, Masashi NISHIO
  • Publication number: 20230312880
    Abstract: A particulate composition contains ?-alumina particles, and water-absorbing polymer particles. The content of the water-absorbing polymer particles is 2 parts by mass or more and 60 parts by mass or less with respect to 100 parts by mass of the ?-alumina particles, and the content of the ?-alumina particles in the particulate composition is 50% by mass or more.
    Type: Application
    Filed: October 22, 2021
    Publication date: October 5, 2023
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Toshiyuki IKOMA, Ryohei HAMANO, Norifumi AZUMA, Kousuke UOE, Kazuo SADAOKA
  • Publication number: 20230312869
    Abstract: The object of the present invention is to provide a colored resin composition containing an aluminum phthalocyanine pigment capable of forming a colored coating film with no foreign matter (preferably a colored coating film with no foreign matter and good adhesion). The colored resin composition of the present invention contains a colorant, a compound represented by formula (DA), a resin, and a solvent, wherein the colorant contains an aluminum phthalocyanine pigment. [In formula (DA), Rd1 represents a hydrocarbon group having 1 to 12 carbon atoms and optionally having a substituent. When the hydrocarbon group has 2 to 12 carbon atoms and the hydrocarbon group has —CH2—, —CH2— may be substituted with —O—, —S—, or —CO—. Rd2 and Rd3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and optionally having a substituent, or Rd2 and Rd3 are combined to form a ring together with —CO—NRd1—CO—.
    Type: Application
    Filed: August 27, 2021
    Publication date: October 5, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takahiro KUROGI, Takuma AOKI, Tomohiro NAKAYAMA, Tetsuo AKASAKA, Manabu TOGAI
  • Publication number: 20230320113
    Abstract: The present disclosure provides a light emitting device having an anode and a cathode, and a first layer and a second layer disposed between the anode and the cathode.
    Type: Application
    Filed: September 13, 2021
    Publication date: October 5, 2023
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Toshiaki Sasada, Atsushi Asano
  • Publication number: 20230314941
    Abstract: A carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including the same. wherein R1 to R3 each represent a hydroxy group, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0?m1+m7?5, 0?m2+m8?4, O?m3+m9?4, one or more of m1 to m3 is/are an integer of 1 or more; X4 represents a single bond, etc.; X0 represents a single bond, a hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.
    Type: Application
    Filed: March 27, 2023
    Publication date: October 5, 2023
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Patent number: 11773243
    Abstract: Provided is an ethylene-based modifier with which a film having good slipperiness and relatively less fish eyes can be formed. The ethylene-based modifier has a strain-hardening exponent of 0.27 or more and 0.53 or less as determined by the LAOS method.
    Type: Grant
    Filed: July 6, 2022
    Date of Patent: October 3, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Chen Liu, Takaya Ichimiya
  • Patent number: 11773226
    Abstract: Provided is a film including a thermoplastic resin, in which a relative permittivity of the film at a frequency of 1 GHz is 3 or less, a dielectric loss tangent of the film at a frequency of 1 GHz is 0.005 or less, and a molecular orientation (MOR) value of the film, which is measured by a microwave orientation meter, is in a range of 1 to 1.1.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: October 3, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Shohei Azami, Shinji Ohtomo, Toyonari Ito
  • Patent number: 11773266
    Abstract: Provided is a polymer having a sharp melting peak and allowing easy adjustment of the melting peak temperature. Specifically provided is a polymer having two or more kinds of constitutional units containing an alkyl group having 14 or more and 30 or less carbon atoms, wherein the proportions of the number of the two or more kinds of constitutional units containing an alkyl group having 14 or more and 30 or less carbon atoms are each 20% or more, with respect to 100% of the total number of all constitutional units containing an alkyl group having 14 or more and 30 or less carbon atoms. An enthalpy of fusion of the polymer observed within a temperature range of 10° C. or higher and lower than 60° C. in differential scanning calorimetry is 30 J/g or more.
    Type: Grant
    Filed: April 20, 2021
    Date of Patent: October 3, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji Ishiwata, Yasutoyo Kawashima, Yoshinobu Nozue
  • Publication number: 20230305392
    Abstract: A salt represented by formula (I), an acid generator, a resin, and a resist composition including the same. wherein R1 to R3 each represent a hydroxy group, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Publication number: 20230305395
    Abstract: A salt represented by formula (I), an acid generator, a resin, and a resist composition including the same. wherein R1 and R2 each represent a hydroxy group, etc.; R4, R5, R7 and R8 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represents an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Publication number: 20230305391
    Abstract: A salt represented by formula (1), an acid generator, a resin, and a resist composition including the same. wherein R1 to R3 each represent a hydroxy group, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Patent number: 11767401
    Abstract: The present invention provides a gel containing a water-absorbing crosslinked polymer, and a condensate of a reactive silicon compound having at least one selected from the group consisting of an acidic dissociative group, an acidic dissociative group in a salt form, and a derivative group of an acidic dissociative group.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: September 26, 2023
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Taigo Kashiwabara, Ayumi Ogawa, Takashi Kamikawa
  • Patent number: 11766726
    Abstract: A method for machining a sputtering target that includes a sputtering surface, an opposing surface opposite to the sputtering surface, and an outer peripheral surface being between the sputtering surface and the opposing surface comprises the steps of: fixing the sputtering target on a fixing table by mounting the sputtering surface or the opposing surface of the sputtering target on the fixing table; and cutting the outer peripheral surface of the sputtering target by a cutting tool while rotating the cutting tool along a circumferential direction of the outer peripheral surface of the sputtering target.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: September 26, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiro Fujita, Koji Nishioka
  • Patent number: 11769909
    Abstract: An aspect of the present invention achieves a nonaqueous electrolyte secondary battery porous layer that has both favorable ion permeability and favorable heat resistance despite being thin. A nonaqueous electrolyte secondary battery porous layer in accordance with an aspect of the present invention has a thickness of less than 8 ?m and an elastic modulus in a shear direction of not less than 16 GPa.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: September 26, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuichiro Azuma, Kensaku Horie
  • Patent number: 11770941
    Abstract: A method of producing a film having excellent external quantum efficiency when used in a light emitting layer of a light emitting device is provided. A method of film production includes preparing an ink containing a specific metal complex, storing the ink for 3 days or more under light shielding, and forming a film by using the stored ink. The total content of metal complexes having a molecular weight larger by 16, 32 or 48 than that of the specific metal complex according to an area percentage value determined by liquid chromatography is 0.6 or less when the content of the specific metal complex is taken as 100.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: September 26, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Satoshi Kobayashi, Makoto Anryu, Mika Shirasaki, Hiroyuki Hayasaka, Toshiaki Sasada