Patents Assigned to Sumitomo Chemical Company, Limited
  • Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern
    Patent number: 11739056
    Abstract: Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R2, R3 and R4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: August 29, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Yukako Anryu, Koji Ichikawa
  • Resist composition and method for producing resist pattern
    Patent number: 11740555
    Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
    Type: Grant
    Filed: February 15, 2021
    Date of Patent: August 29, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yukako Anryu, Satoshi Yamaguchi, Koji Ichikawa
  • Banding band
    Patent number: 11738921
    Abstract: This banding band has a belt-like portion having a plurality of teeth on at least one surface thereof, and a securing portion positioned at one end of the belt-like portion, wherein the securing portion has a through-hole into which the other end of the belt-like portion can be inserted, and at least the belt-like portion comprises an amorphous resin having a glass transition temperature of 180° C. or higher.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: August 29, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Keisuke Yamanishi, Taiga Sakai
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230266666
    Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, —CH2— included in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ? m1 + m7 ? 5, 0 ? m2 + m8 ? 4, 0 ? m3 + m9 ? 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X7 represents a single bond, —CH2—, —O—, —S—, etc., and Al— represents an organic anion.
    Type: Application
    Filed: August 26, 2022
    Publication date: August 24, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Saki KATO, Koji ICHIKAWA
  • NITRO COMPOUND DETECTION ELEMENT
    Publication number: 20230266301
    Abstract: An object is to provide a technique for detecting a nitro compound. The object is achieved by a nitro compound detection element formed from a specific type of an insect olfactory receptor or from an insect olfactory receptor having a specific mutation introduced.
    Type: Application
    Filed: July 21, 2021
    Publication date: August 24, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Atsufumi OZOE, Yasuhiko TAKAHASHI
  • PIEZOELECTRIC STACK, PIEZOELECTRIC ELEMENT, AND METHOD OF MANUFACTURING PIEZOELECTRIC STACK
    Publication number: 20230270013
    Abstract: There is provided a piezoelectric stack, including: a substrate; an oxide film on the substrate, containing zinc and oxygen as main elements; an electrode film on the oxide film; and a piezoelectric film on the electrode film, being an alkali niobium oxide film containing potassium, sodium, niobium, and oxygen and having a perovskite structure.
    Type: Application
    Filed: March 16, 2021
    Publication date: August 24, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki KURODA, Kenji SHIBATA, Kazutoshi WATANABE, Takeshi KIMURA
  • Method for manufacturing sputtering target and sputtering target
    Patent number: 11731230
    Abstract: A sputtering target that is less likely to cause abnormal discharge is manufactured. A method for manufacturing a sputtering target includes performing multi-stage polishing on a sputtering surface of a target material having a Vickers hardness of 100 or less being made of metal by using a plurality of abrasives having different grit numbers in ascending order of grit number from a small grit number to a large grit number.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: August 22, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiro Fujita, Koji Nishioka
  • Nitride crystal substrate and method for manufacturing the same
    Patent number: 11732380
    Abstract: There is provided a nitride crystal substrate having a main surface and formed of group-III nitride crystal, wherein NIR/NElec, satisfies formula (1) below, which is a ratio of a carrier concentration NIR at a center of the main surface relative to a carrier concentration NElec: 0.5?NIR/NElec?1.5 . . . (1) where NIR is the carrier concentration on the main surface side of the nitride crystal substrate obtained based on a reflectance of the main surface measured by a reflection type Fourier transform infrared spectroscopy, and NElec is the carrier concentration in the nitride crystal substrate obtained based on a specific resistance of the nitride crystal substrate and a mobility of the nitride crystal substrate measured by an eddy current method.
    Type: Grant
    Filed: May 13, 2019
    Date of Patent: August 22, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Fumimasa Horikiri, Takeshi Kimura
  • METHOD FOR PRODUCING OPTICALLY ACTIVE COMPOUND
    Publication number: 20230257408
    Abstract: An object of the present invention is to provide a further more effective process for preparing a certain optically active compound including an optically active 1-acetyl-2,2,4-trimethyl-1,2,3,4-tetrahydroquinoline. The present invention provides a process for an optically active compound represented by formula (3) (wherein R5 represents a hydrogen atom etc., R6 and R7 each independently represents a hydrogen atom, etc., R8 represents a C1-C6 alkyl group, and R9, R10 and R11 each independently represents a hydrogen atom, etc. The carbon atom with a symbol of the asterisked “*” represents an asymmetric carbon atom), which comprises a reacting a compound represented by formula (2) (wherein R5, R6, R7, R8, R9, R10, and R11 has the same meanings as the above) with hydrogen in the presence of asymmetric cobalt complex.
    Type: Application
    Filed: July 6, 2021
    Publication date: August 17, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Leopold Mpaka LUTETE, Koji HAGIYA
  • RESIN COMPOSITION, RESIN FILM, AND DISPLAY DEVICE
    Publication number: 20230257571
    Abstract: There is provided a resin composition containing a resin (A), a light scattering agent (B), a solvent (C), and a leveling agent (H), in which the content ratio of the solvent (C) is 40% by mass or more and less than 74% by mass based on the total amount of the resin composition, and the content ratio of the leveling agent (H) is 0.01% by mass or more and 1% by mass or less based on the total amount of the resin composition.
    Type: Application
    Filed: August 12, 2021
    Publication date: August 17, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • INORGANIC POROUS SUBSTRATE, INORGANIC POROUS SUPPORT, AND NUCLEIC ACID PRODUCTION METHOD
    Publication number: 20230256425
    Abstract: An inorganic porous substrate having a silyl group represented by (i) and (ii) and having characteristics (iii) to (v), an inorganic porous support derived from the inorganic porous substrate, and a nucleic acid production method using the inorganic porous support: (i) a silyl group (A): a silyl group represented by the formula (i-1); (ii) a silyl group (B): at least one silyl group selected from the group consisting of silyl groups represented by (ii-1), (ii-2), and (ii-3); (iii) a particle diameter of 1 ?m or more; (iv) a pore diameter of 20 nm or more; and (v) a cumulative pore volume in a pore diameter range of 40 nm to 1000 nm of more than 0.32 mL/g and 4 mL/g or less.
    Type: Application
    Filed: May 12, 2021
    Publication date: August 17, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takeshi ISHIYAMA, Ikuya OSHIRO, Takashi HARA
  • HERBICIDAL COMPOSITION AND METHOD FOR CONTROLLING WEEDS
    Publication number: 20230255206
    Abstract: Provided herein is a herbicidal composition which exerts excellent control effect on weeds, and a method for controlling weeds. A herbicidal composition comprising epyrifenacil and one or more compounds selected from the following compound group Y: Compound group Y: group consisting of 4-amino-3-chloro-5-fluoro-6-(7-fluoro-1H-indol-6-yl)pyridine-2-carboxylic acid cyanomethyl ester, phenylisoxazoline compound represented by the following formula (1): (1S,4R)-4-[[[(5S)-3-(3,5-difluorophenyl)-5-vinyl-4H-1,2-oxazol-5-yl]carbonyl]amino]-cyclopent-2-ene-1-carboxylic acid methyl ester, rimisoxafen and 2,4-D DMAPA salt.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 17, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshinobu JIN, Yoshinao SADA
  • Method for manufacturing ciliary margin stem cells
    Patent number: 11724005
    Abstract: The invention provides a method for producing a ciliary marginal zone stem cell induced to differentiate from a pluripotent stem cell, including either the following step (1) or step (2), or both of these steps: (1) a step of floating culturing cells obtained from a cell aggregate containing a ciliary marginal zone-like structure induced to differentiate from pluripotent stem cells, thereby obtaining a retinosphere; and (2) a step of collecting stage specific embryonic antigen-1 positive cells from cells obtained from a cell aggregate containing a ciliary marginal zone-like structure induced to differentiate from pluripotent stem cells.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: August 15, 2023
    Assignees: SUMITOMO CHEMICAL COMPANY, LIMITED, RIKEN
    Inventors: Atsushi Kuwahara, Yoshiki Sasai
  • Dopant, charge transfer salt and organic electronic device
    Patent number: 11730055
    Abstract: A compound of formula (I): (Core)n-(X)m wherein Core is a core group; n is 0 and m is 1, or n is 1 and m is at least 1; and X is a group of formula (II): wherein: R1, R3 and R5 are each independently H or a substituent; R2 and R4 are each a substituent; one of R1-R5 is a direct bond or divalent linking group linking the group of formula (II) to Core in the case where n is 1; x and y are 0, 1, 2, 3 or 4; and the compound of formula (I) is substituted with at least one ionic substituent. The compound may be used as an n-dopant to dope an organic semiconductor.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: August 15, 2023
    Assignees: Cambridge Display Technology Limited, Sumitomo Chemical Company Limited
    Inventors: Thomas Kugler, Sheena Zuberi, Florence Bourcet, Jean-Benoit Giguere
  • Method for Producing Optical Film Containing Polyimide-Based Resin
    Publication number: 20230250312
    Abstract: The present invention relates to a method for producing an optical film, the method comprising: step (I) for dissolving a polyimide-based resin in a solvent to prepare a varnish; step (II) for applying the varnish onto a substrate to form a coating film; and step (III) for drying the coating film to form a film, wherein the polyimide-based resin contains a constitutional unit derived from an aliphatic diamine, the solvent in step (I) has a moisture absorption speed per unit area of 25% by mass/h m2 or more as measured by a Karl Fischer method, and a time T from the completion of the formation of the coating film in step (II) to the start of the drying of the coating film in step (III) satisfies the following equation (A): T < 0.0018 Vs ( A ) wherein Vs represents a moisture absorption speed per minute (% by mass/min) of the solvent as determined by a Karl Fischer method.
    Type: Application
    Filed: July 1, 2021
    Publication date: August 10, 2023
    Applicants: Sumitomo Chemical Company, Limited, Zymergen Inc.
    Inventors: Takashi Sakurai, Arjan Zoombelt, Justin Kerszulis
  • Method for producing thermoplastic elastomer composition
    Patent number: 11718740
    Abstract: Provided is a method for producing a thermoplastic elastomer composition that can form a molded article having both good appearance and high stiffness. The method for producing a thermoplastic elastomer composition comprises the following first step and second step, wherein the produced thermoplastic elastomer composition contains 5 mass % or less of a mineral oil (C): first step: a step of melt-kneading polypropylene (A-1) and an ethylene-based copolymer rubber (B) in the presence of an organic peroxide, the polypropylene (A-1) being polypropylene of which 20° C. xylene insoluble fraction has an intrinsic viscosity [?cxis] of 0.1 dl/g or more and less than 1.5 dl/g; and second step: a step of further adding polypropylene (A-2) of which 20° C. xylene insoluble fraction has an intrinsic viscosity [?cxis] of 1.5 dl/g or more and 7 dl/g or less, and melt-kneading the resulting mixture.
    Type: Grant
    Filed: August 24, 2022
    Date of Patent: August 8, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Shinichiro Shimomura
  • Resin pellet and method of producing resin pellet
    Patent number: 11717988
    Abstract: There are provided a resin pellet having high transportability in a solid state in a feeder and a method of producing the same. A resin pellet has a recess, and when a height of the resin pellet in a case in which the resin pellet is disposed on a horizontal plane in such a manner that the recess faces the horizontal plane is defined as T1, and a maximum diameter of the resin pellet as viewed from a direction perpendicular to the horizontal plane is defined as L, an aspect ratio defined by L/T1 is 1.2 to 1.8.
    Type: Grant
    Filed: August 13, 2020
    Date of Patent: August 8, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshihiko Manami, Shohei Ueno
  • Group III nitride crystal substrate having a diameter of 4 inches or more and a curved c-plane with a radius of curvature of 15 m or more
    Patent number: 11718927
    Abstract: There is provided a method of manufacturing a crystal substrate, including: preparing a first crystal body which is a substrate comprising a single crystal of group III nitride produced by a vapor phase method and having a first main surface, and in which c-plane of the single crystal is curved in a concave spherical shape with a predetermined curvature; and growing a second crystal body comprising a single crystal of group III nitride on the first main surface, in a mixed melt containing an alkali metal and a group III element.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: August 8, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takehiro Yoshida, Masatomo Shibata, Seiji Sarayama, Takashi Sato, Naoya Miyoshi, Akishige Murakami
  • Optical Film
    Publication number: 20230242721
    Abstract: The present invention relates to an optical film having a glass transition temperature of 165° C. or higher, an optical transmittance at 350 nm of 10% or less, an in-plane retardation of 30 nm or less, and a retardation in a thickness direction of 100 nm or less.
    Type: Application
    Filed: July 1, 2021
    Publication date: August 3, 2023
    Applicants: Sumitomo Chemical Company, Limited, Zymergen Inc.
    Inventors: Takashi Sakurai, Christiaan Schroeder, Matt Blom, Lennon Chu
  • METHOD FOR PRODUCING NUCLEIC ACID OLIGOMER
    Publication number: 20230242570
    Abstract: An object of the present invention is to provide an efficient method for producing a nucleic acid oligomer. An object of the present invention is to provide a method for producing a nucleic acid oligomer represented by formula (2) (in the formula, the symbols have the meanings described in the specification), including a step of reacting a nucleic acid oligomer represented by formula (1) (in the formula, the symbols have the meanings described in the specification) with a trichloroacetic acid solution in which a molar ratio of formaldehyde to trichloroacetic acid (formaldehyde mol/trichloroacetic acid mol) is 11×10?5 or less.
    Type: Application
    Filed: July 8, 2021
    Publication date: August 3, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki TANAKA, Hideki OKUMURA, Toshifumi KANO