Patents Assigned to Sumitomo Chemical Company
  • Patent number: 10870796
    Abstract: A light-emitting polymer comprising a light-emitting repeat unit in a backbone of the polymer, wherein the polymer has an anisotropy of no more than 0.8 and wherein a transition dipole moment of the light-emitting repeat unit is aligned with the polymer backbone.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: December 22, 2020
    Assignees: Cambridge Display Technology Limited, Sumitomo Chemical Company Limited
    Inventors: Ruth Pegington, Michael Cass, David Mohamad, Matthew Roberts, William Tarran, Martin Humphries
  • Patent number: 10870755
    Abstract: The present invention relates to a method for producing thermoplastic aromatic polysulfone resin, in which a polymerization reaction is performed in an organic solvent by using compound (A), a dihalogeno compound represented by Formula (I), compound (B), a divalent phenol represented by Formula (II), and compound (C), an alkali metal carbonate, at a charging molar ratio satisfying the following Formulae (1) to (3): (1) 0.900<(A)/(B)<0.990; (2) {(A)/(B)}?0.02<(C)/(B)<{(A)/(B)}+0.01; and (3) (C)/(B)<1.00, In Formulae (I) and (II), R1 to R4 represent an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, X and X? represent a halogen atom, Y represents one or more groups selected from the group consisting of —SO2—, —C(CH3)2—, —CH2—, —O— and —CO—, or a single bond, and n1, n2, n3 and n4 represent an integer of 0 to 4.
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: December 22, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomokazu Yasunaga, Shinji Ohtomo, Toshiaki Sugimura
  • Publication number: 20200392373
    Abstract: A mixed composition comprising an organosilicon compound represented by the following formula (a1), a solvent, water, and a carboxylic acid compound, wherein a mass ratio of the water to the organosilicon compound is 30.0 or more. In the following formula (a1), a plurality of Aa1 each independently represent a hydrolyzable group, Za1 represents a hydrocarbon chain-containing group, x is 0 or 1. Ra10 represents an alkyl group having 6 to 20 carbon atoms in which a part of methylene groups may be replaced with an oxygen atom and one or more hydrogen atoms may be replaced with a fluorine atom, and Za1 and Ra10 may be the same or different.
    Type: Application
    Filed: March 29, 2019
    Publication date: December 17, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Michiru UEHARA, Tomonori MIYAMOTO, Yasuharu SHIMAZAKI
  • Publication number: 20200393399
    Abstract: A sensor including a detection film formed from a resin composition, a first electrode provided on a first surface of the detection film, and a second electrode provided on a second surface of the detection film, wherein the first surface of the detection film includes a rough surface having fine irregularities with a root mean square roughness (Rq) of 0.3 ?m to 3.0 ?m in a portion that is in contact with the first electrode.
    Type: Application
    Filed: March 25, 2019
    Publication date: December 17, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Megumi HAYASAKA, Yoshifumi KOMATSU, Yoshihiro HARADA
  • Publication number: 20200385343
    Abstract: Disclosed are a salt represented by formula (1), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R1 and R2 each represent a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R4 and/or a plurality of R5 may be the same or different from each other.
    Type: Application
    Filed: June 2, 2020
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20200385853
    Abstract: Provided is a sputtering target that is less likely to cause abnormal discharge. The sputtering target has a sputtering surface in which a lightness L in a Lab color system is more than 27 and 51 or less.
    Type: Application
    Filed: September 21, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiroyuki TSUKADA, Masahiro FUJITA, Koji NISHIOKA
  • Publication number: 20200388746
    Abstract: There is provided a laminated substrate having a piezoelectric film, including: a substrate; a first electrode film provided on the substrate; and a piezoelectric film provided on the first electrode film, wherein an oxide film containing an oxide represented by a composition formula of RuOx or IrOx, is provided on the piezoelectric film.
    Type: Application
    Filed: April 19, 2018
    Publication date: December 10, 2020
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Kenji SHIBATA, Kazutoshi WATANABE, Fumimasa HORIKIRI
  • Publication number: 20200387069
    Abstract: Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same: wherein R1, R2 and R3 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, m1, m2 and m3 represent an integer of 0 to 4, and when m1, m2 and/or m3 are 2 or more, a plurality of R1, a plurality of R2 and/or a plurality of R3 may be the same or different from each other, and X1 represents —CO—, —SO— or —SO2—.
    Type: Application
    Filed: June 2, 2020
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20200385361
    Abstract: The present invention provides an intermediate compound for preparing a 2-substituted-3-ethylsulfonylpyridine compound, and a novel process for preparing the 2-substituted-3-ethylsulfonylpyridine compound. The present invention provides also a process for preparing a compound represented by formula (2), which comprises a step (a): a step of reacting of 3-ethylsulfonylpyridine N-oxide with a compound represented by formula (1) (wherein X represents a chlorine atom etc., Q represents a C1-3 alkoxy group optionally substituted with one or more fluorine atoms, etc.) in the presence of one or more compounds selected from Group P, a carboxylic acid or a carboxylate salt, a base, and a palladium compound or a nickel compound in a solvent to obtain a compound represented by formula (2), Group P: a group consisting of the following compounds: a compound represented by formula (4): R3P (wherein R represents an alkyl group having 1 to 6 carbon atoms, etc.), etc.
    Type: Application
    Filed: December 4, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji HAGIYA, Junichi ISHIKAWA
  • Publication number: 20200383328
    Abstract: The present invention relates to a fungicide composition having excellent fungicidal activity, particularly a fungicide composition comprising isofetamid and mandestrobin as active ingredients, and a method for controlling a disease of a crop, which comprises applying isofetamid and mandestrobin to the crop.
    Type: Application
    Filed: August 31, 2018
    Publication date: December 10, 2020
    Applicants: ISHIHARA SANGYO KAISHA, LTD., SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuzuka ABE, Shuko NISHIMI
  • Publication number: 20200384598
    Abstract: A sputtering target that is less likely to cause abnormal discharge is manufactured. A method for manufacturing a sputtering target includes performing multi-stage polishing on a sputtering surface of a target material having a Vickers hardness of 100 or less being made of metal by using a plurality of abrasives having different grit numbers in ascending order of grit number from a small grit number to a large grit number.
    Type: Application
    Filed: September 21, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiro FUJITA, Koji NISHIOKA
  • Publication number: 20200385328
    Abstract: The present invention provides an industrially-advantageous process for preparing a benzoyl formic acid compound, and an efficient process for preparing a pyridazine compound using the same process. Specifically, the present invention provides a process for preparing a compound represented by formula (2), which comprises a step (B): a step of reacting a compound represented by formula (1) with a nitrosyl sulfuric acid in water to produce the compound represented by formula (2).
    Type: Application
    Filed: October 26, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tadafumi MATSUNAGA, Yasuhiro KATAOKA, Masato KAWAMURA, Shun TANIMURA
  • Publication number: 20200388786
    Abstract: A manufacturing method for an electronic device 1 includes: a bonding step S09 of bonding a band-shaped sealing member 11, extending in one direction, along the one direction such that a portion of each of a first electrode layer 5 and a second electrode layer 9 in each electronic device part 10 is exposed and that the sealing member straddles a plurality of electronic device parts 10; a cutting step S05 of making a cut in a sealing body 20 that is a parent material of the sealing member 11 and has a larger dimension in the width direction, orthogonal to the one direction, than the sealing member 11 so as to form a width being the width of the sealing member 11, before the bonding step S09; and a separation step S08 of separating the sealing member 11 from the sealing body 20 in which the cut has been made, after the cutting step S05 and before the bonding step S09. In the bonding step S09, the sealing member 11, separated from the sealing body 20 in the separation step S08, is bonded.
    Type: Application
    Filed: November 29, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Shinichi MORISHIMA, Masaya SHIMOGAWARA, Takashi FUJII
  • Publication number: 20200388546
    Abstract: There is provided a method for measuring a film thickness of a thin film in a nitride semiconductor laminate having the thin film homoepitaxially grown on a substrate comprising group-III nitride semiconductor crystal, wherein the film thickness of the thin film is measured using the substrate having a carrier concentration and an infrared absorption coefficient which are interdependent, and using Fourier Transform Infrared Spectroscopy method or Infrared Spectroscopic Ellipsometry method.
    Type: Application
    Filed: April 27, 2018
    Publication date: December 10, 2020
    Applicants: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Fumimasa HORIKIRI
  • Publication number: 20200388793
    Abstract: An organic electronic device manufacturing method according to one embodiment comprises: a device base forming step of forming a device base in which a first electrode, a device functional part including an organic layer, and a second electrode are provided in this order on a substrate; a dehydration step S22 of heating and dehydrating a protective film-equipped sealing member, in which a protective film is laminated, via an adhesive layer, on a sealing member having a sealing base, the adhesive layer laminated on an one surface of the sealing base, and a resin layer laminated on an other surface of the sealing base, while the protective film-equipped sealing member 10 is conveyed using at least one roll; and a sealing member bonding step of removing the protective film from the protective film-equipped sealing member after subjected to the dehydration step, and then bonding the sealing member to the device base through the adhesive layer, wherein in the dehydration step, a temperature of a roll surface of th
    Type: Application
    Filed: December 6, 2018
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masaya SHIMOGAWARA, Shinichi MORISHIMA, Hiroyoshi KUROKI, Eishi FUJIMOTO, Yuta NAKASHIZU
  • Publication number: 20200386702
    Abstract: A gas sensor includes first and second electrodes (107, 109) and a first semiconductor layer (113) comprising a semiconducting transition halide or pseudohalide, for example copper thiocyanate, in electrical contact with the first and second electrodes. The semiconducting transition metal halide or pseudohalide provide that a semiconductor based gas sensor is sensitive to alkenes and can detect low concentrations of alkenes. Furthermore, the gas sensor may comprise a second semiconductor layer (111), different from the first semiconductor layer. The second semiconductor layer is preferably an organic semiconductor. The gas sensor may be a top-gate or bottom-gate thin film transistor (103: gate electrode; 105: gate dielectric) or a horizontal or vertical chemiresistor. The gas sensor may be used for detection of alkenes, for example ethylene or 1-MCP.
    Type: Application
    Filed: November 27, 2018
    Publication date: December 10, 2020
    Applicant: Sumitomo Chemical Company Limited
    Inventors: Simon Godddard, Nir Yaacobi-Gross
  • Patent number: 10861684
    Abstract: A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: December 8, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki Kuroda, Mikio Takigawa
  • Patent number: 10858461
    Abstract: A thermoplastic elastomer composition contains components (A) to (D), wherein the content of the component (A), (B), (C) and (D) is, respectively, 26% by weight or more and 59% by weight or less, 2% by weight or more and 9% by weight or less, 16% by weight or more and 61% by weight or less and 11% by weight or more and 56% by weight or less, when the total amount of the components (A) to (D) is 100% by weight, and the ratio of the content of the component (C) to the content of the component (D) is over 1 and 5 or less.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: December 8, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Katsuya Kida
  • Patent number: 10858590
    Abstract: A compound capable of suppressing the occurrence of alignment defects and lowering the phase transition temperature of a liquid crystal composition without impairing optical characteristics is provided. In particular, a compound represented by formula (A) is provided in which the variable groups are as defined in the specification.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: December 8, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Shinnosuke Yoshioka, Noriyuki Hida, Katsuaki Miyazaki, Daichi Fujimoto
  • Publication number: 20200375183
    Abstract: An object of the present invention is to provide an aqueous suspension concentrate comprising mefentrifluconazole, which is excellent in pourability from a container, hardly precipitates during storage, and is inhibited from being separated. An aqueous suspension comprising mefentrifluconazole, a surfactant, and water and having a loss tangent tan ? of 0.5 to 0.7.
    Type: Application
    Filed: July 10, 2020
    Publication date: December 3, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hiroto TADA