Abstract: A switching circuit can include a logic circuit having a logic circuit input and a logic circuit output and at least three input transistors coupled to provide three separate paths between three input/output (I/O) nodes and the logic circuit input. The switching circuit can further include at least three output transistors coupled to provide three separate paths between the three I/O nodes and the logic circuit output. Methods of fabricating such switch circuits and devices and/or systems including such switching circuits are also disclosed.

Abstract: A junction field effect transistor comprises a semiconductor substrate. A first impurity region of a first conductivity type is formed in the substrate. A second impurity region of the first conductivity type is formed in the substrate and spaced apart from the first impurity region. A channel region of the first conductivity type is formed between the first and second impurity regions. A gate region of a second conductivity type is formed in the substrate between the first and second impurity regions. A gap region is formed in the substrate between the gate region and the first impurity region such that the first impurity region is spaced apart from the gate region.

Abstract: The invention can include at least one storage cell having a store gate structure formed from a semiconductor material doped to a first conductivity type and in contact with a channel region comprising a semiconductor material doped to a second conductivity type. A storage cell can also include at least a first source/drain region and a second source/drain region separated from one another by the channel region. A control gate structure, comprising a semiconductor layer doped to the first conductivity type can be formed over a substrate surface. The control gate structure can be in contact with the channel region. Such a storage cell can be more compact and/or provide longer data retention times than conventional storage cells, such as many conventional dynamic random access memory (DRAM) type cells.

Abstract: A method for modeling a circuit includes receiving a netlist that defines a plurality of connections between a plurality of circuit elements and identifying a subset of the connections. The method also includes routing the identified connections with a first group of wires having a first wire width and routing at least a portion of the remaining connections with a second wire width. The second wire width is smaller than the first wire width. The method further includes replacing the first group of wires with a third group of wires having the second wire width.

Abstract: A level-shifting circuit includes an input node, a first output transistor, a second output transistor, a pull-up transistor, and an output node. The input node receives an input signal. The first output transistor turns on when the input signal is at a first voltage level and couples an output node to a positive supply voltage when turned on. The second output transistor, a bipolar junction transistor (BJT), couples the output node to a negative supply voltage when turned on. The pull-up transistor turns on when the input signal is at a second voltage level and generates a voltage at a base terminal of the second output transistor that turns the second output transistor on. Additionally, the level-shifting circuit generates, at the output node, an output signal with a voltage swing that includes a positive voltage range and a negative voltage range.

Abstract: This invention describes a method of building complementary logic circuits using junction field effect transistors in silicon. This invention is ideally suited for deep submicron dimensions, preferably below 65 nm. The basis of this invention is a complementary Junction Field Effect Transistor which is operated in the enhancement mode. The speed-power performance of the JFETs becomes comparable with the CMOS devices at sub-70 nanometer dimensions. However, the maximum power supply voltage for the JFETs is still limited to below the built-in potential (a diode drop). To satisfy certain applications which require interface to an external circuit driven to higher voltage levels, this invention includes the structures and methods to build CMOS devices on the same substrate as the JFET devices.

Abstract: A JFET integrated onto a substrate having a semiconductor layer at least and having source and drain contacts over an active area and made of first polysilicon (or other conductors such as refractive metal or silicide) and a self-aligned gate contact made of second polysilicon which has been polished back to be flush with a top surface of a dielectric layer covering the tops of the source and drain contacts. The dielectric layer preferably has a nitride cap to act as a polish stop. In some embodiments, nitride covers the entire dielectric layer covering the source and drain contacts as well as the field oxide region defining an active area for said JFET. An embodiment with an epitaxially grown channel region formed on the surface of the substrate is also disclosed.

Abstract: A semiconductor device including a bias voltage generator formed from a junction field effect transistor (JFET). The JFET includes a control gate terminal and a first and a second source/drain terminal. The first and second source/drain terminals can form a first terminal of a p-n junction and the control gate terminal can form a second terminal of the p-n junction. The first terminal of the p-n junction can be provided with a first potential. The second terminal can be left essentially floating to provide a bias voltage. A bias receiving circuit can receive the bias voltage. The bias receiving circuit can be in close proximity on the semiconductor device to the bias voltage generator.