Abstract: In the exhaust gas treatment method of the present invention, exhaust gas in an excited state in semiconductor device production equipment is introduced into a plasma treatment unit of a treatment unit under reduced pressure, introduced into a reactor of a reaction removal unit while maintained in an excited state by plasma generated in the plasma treatment unit, and is reacted with a reaction remover composed of particulate calcium oxide filled into the reactor to remove harmful gas components in the exhaust gas. Exhaust gas may also be reacted with the reaction remover after having degraded the harmful gas components by oxidative degradation in the presence of plasma by supplying oxygen to the plasma treatment unit.

Abstract: Disclosed is a heat-transfer-medium heating and cooling apparatus in which a pump which pumps out a heat transfer medium, a heat exchanger which cools the heat transfer medium, a reactor whose temperature is controlled by the heat transfer medium, and a heating unit which heats the heat transfer medium are disposed in a recirculation path. A reserve path which branches upward from a pump-suction-side path extending from the heating unit to the pump and connects to a liquid phase portion of an expansion vessel is provided in the pump-suction-side path.

Abstract: A method for synthesizing carbon nanocoils with high efficiency, by determining the structure of carbon nuclei that have been attached to the ends of carbon nanocoils and thus specifying a true catalyst for synthesizing carbon nanocoils is implemented. The catalyst for synthesizing carbon nanocoils according to the present invention is a carbide catalyst that contains at least elements (a transition metal element, In, C) or (a transition metal element, Sn, C), and in particular, it is preferable for the transition metal element to be Fe, Co or Ni. In addition to this carbide catalyst, a metal catalyst of (Fe, Al, Sn) and (Fe, Cr, Sn) are effective. From among these, catalysts such as Fe3InC0.5, Fe3InC0.5Snw and Fe3SnC are particularly preferable. The wire diameter and the coil diameter can be controlled by using a catalyst where any of these catalysts is carried by a porous carrier.

Abstract: A welding shield gas comprising an inert gas and nitrogen gas, where the concentration of the nitrogen gas is 1 to 95 vol %; or comprising an inert gas and a helium gas, where the concentration of the helium gas is 35 to 95 vol %; or comprising an inert gas, nitrogen gas, and a helium gas, wherein the concentration of the nitrogen gas is not less than 1 vol % and less than 65 vol % and the concentration of the helium gas is 35 to 95 vol %. This shield gas can be used in the non-consumable electrode arc welding of a welded material consisting of stainless steel.

Abstract: The object of the present invention is to achieve a deep weld penetration in a welded portion in metal by setting appropriate conditions for welding without deteriorating the quality of welding. That is, in the present invention, the weld penetration can be made deep by using a shielding gas comprising: 0.2% by volume or more (preferably 0.4% by volume or more) of oxygen gas; and the balance being helium gas, and by further setting the other welding conditions, such that the concentration of oxygen in the welded metal in the range of 70 to 700 ppm, and the scale ratio, i.e. the value D/W, can be made large. According to the present invention, a deeper weld penetration can be achieved without deteriorating the quality of welding by adopting at least one selected from the appropriate conditions of the welding current, the welding speed, and the arc length.

Abstract: A shielding gas for MAG welding wherein a carbon steel solid wire is used for lap fillet welding of a galvanized steel sheet; wherein the shielding gas is a mixed gas composition consisting of 8 to 15% by volume of oxygen, 20 to 30% by volume of carbon dioxide, and residual % by volume of argon.

Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.

Abstract: Antisense oligonucleotide sequences which enable the measurement of the distribution and structure of antisense oligonucleotide drugs in the body, with lapse of time, and a method of detecting these sequences are provided. The antisense chains have a natural or non-natural nucleotide or peptide nucleic acid as a structural unit in which carbon atoms and nitrogen atoms are substituted by 13C and 15N, respectively, and the antisense chains can be detected by nuclear magnetic resonance spectroscopy (NMR) such as 15N—1H or 13C—1H hetero nuclear multiple quantum coherence spectroscopy.

Abstract: A semiconductor manufacturing method whereby reactive gas processing such as selective epitaxial growth can be carried out with high precision by correctly adjusting conditions during processing is performed by a semiconductor manufacturing apparatus which can restrict increases in the moisture content, prevent heavy metal pollution and the like, and investigate the correlation between moisture content in the process chamber and outside regions. The moisture content in a reaction chamber and in a gas discharge system of the reaction chamber are measured when a substrate is provided, and the conditions for reactive gas processing are adjusted based on the moisture content.

Abstract: A process comprises the steps of recovering exhaust gas containing krypton or xenon which are used as an atmospheric gas for semiconductor product preparation apparatuses; introducing the exhaust gas to separating and purifying equipment and thereby separating and purifying krypton or xenon from the exhaust gas, wherein the former step of recovering a rare gas-containing exhaust gas discharged from an equipment using a rare gas comprises removing one or more interfering gases which lower(s) the adsorption ability of activated carbon capable of adsorbing rare gases; and thereafter pressure filling the rare gas-containing exhaust gas obtained after said one or more interfering gases removal treatment into a gas-recovering container, which comprises a air-tight container having a joint section capable of connecting a gas duct through an on-off valve and containing therein the activated carbon capable of adsorbing rare gases; and thereby recovering the rare gas containing exhaust gas; and the latter step of intro

Abstract: Component contained in a gas mixture can be separated based on a PSA method and recovered with high purities at the same time, the system is simple, the system cost is low, and the operation is easy and may be used for separating oxygen and nitrogen from air or for separating noble gases and nitrogen from a gas mixture containing noble gases and nitrogen, and obtaining each gas as a product.

Abstract: A gas separation method and apparatus that recovers efficiently principal gas components from a feed gas that includes a plurality of components, and enables supplying the product gases continuously at a stable flow rate and component concentration. A first separation step using a first adsorption column and a second separation step using a second adsorption column are provided, a circulating feed gas, consisting of the recovered exhaust gases discharged in each of the steps and the feed gas, is used as a gas to be separated. The outflow rate and component concentration of a second gas product are maintained constant by controlling the outflow rate of the first gas product.

Abstract: A welding device and a welding method for butt welding two pipes to be welded are provided. The welding device comprises a welding device body, having an electrode unit with a welding electrode and a fixing clamp for holding the pipes to be welded; and electrode position indicating means for indicating a position of the welding electrode with respect to the pipes to be welded. The electrode position indicating means is capable of irradiating an indicating light to the pipes to be welded at the position corresponding to the welding electrode. Therefore, the positions of the butt edge surfaces of the pipes and the welding electrode can be easily and correctly consistent so as to perform a good welding.

Abstract: An adsorbent for separating nitrogen from a mixed gas of oxygen and nitrogen is MSC wherein an oxygen and nitrogen separation ratio ? and a ratio (t95/t50) of a time t50 required for adsorbing 50% of the oxygen equilibrium adsorption amount and a time t95 required for adsorbing 95% of the oxygen equilibrium adsorption amount satisfy the inequality (t95/t50)<0.4×(??24)??35. The amount of adsorbent used with respect to a predetermined amount of nitrogen generated can be reduced since a method is carried out which uses this adsorbent to produce nitrogen by separating nitrogen from the mixed gas of oxygen and nitrogen by means of a PSA method. By this method, it is possible to reduce the cost of the apparatus and reduce and miniaturize the scale of the apparatus, and the power consumption amount can be reduced.

Abstract: A container valve, attached to a gas container, wherein the container valve has a pressure reducing function, and is inside a valve block in the gas container. In the valve block, the container valve comprises a gas filling passage in which a filling valve is installed, a gas lead-out passage in which a lead-out valve is installed, and a pressure regulator arranged at an upstream side of the lead-out valve in the gas lead-out passage. The container valve can safely supply gas under a reduced pressure for use by opening the container valve of a container whose pressure is high and gas can be filled easily into the container. The container valve can be miniaturized and the purging operation for supplying high purity gas can be performed.

Abstract: A fuel filling device is provided with a fuel supply adjusting section which adjusts the amount of fuel supplied, a fuel feed line which feeds fuel from a fuel supply adjusting section to a vehicle W, a nozzle removably coupled to vehicle W that supplies fuel from fuel feed line to vehicle W, and a discharge device that discharges fuel present within fuel feed line to the outside to prevent deterioration of packings used in the device in the case of filling a fuel at high pressure, while also facilitate the operation of a filling nozzle.

Abstract: A method for purifying carbon monoxide, which can efficiently remove metal carbonyl in carbon monoxide while suppressing the production of carbon dioxide, is provided by selecting a metal oxide having proper oxidizability as a reactant with metal carbonyl. Carbon monoxide containing metal carbonyls as trace impurities is contacted with a remover containing manganese sesquioxide as a main component, thereby reacting metal carbonyl in carbon monoxide with said manganese sesquioxide to remove said metal carbonyl from said carbon monoxide.

Abstract: A cleaning gas improves the etching reaction rate of cleaning gas including a fluorocarbon gas, and increases the cleaning effect. And the cleaning method uses the cleaning gas. A mixed gas of a fluorocarbon gas represented by the general formula of CvHxFyOz, wherein v is an integer from 1 to 5, x is selected from 0 and an integer from 1 to 3, y is an integer from 1 to 12, and z is selected from 0 and 1 and oxygen gas, to which is added at least one selected from the group of nitrogen trifluoride, fluorine, nitrous oxide, nitrogen, and rare gases up to 10% by volume based on the total gas volume.

Abstract: The present invention discloses a CVD apparatus which, together with being able to efficiently perform purging treatment after maintenance, uses for the purge gas a mixed gas of a gas having high thermal conductivity and an inert gas during heated flow purging treatment after maintenance to perform startup of the CVD apparatus while reducing the amount of time required for purging treatment. Purging treatment before semiconductor film formation is performed by repeating the pumping of a vacuum and the introduction of inert gas a plurality of times.