Patents Assigned to Tanaka Kikinzoku Kogyo K.K.
  • Publication number: 20240083801
    Abstract: A bushing for producing glass fibers, including: a plurality of nozzles made of platinum or the like to discharge molten glass; and a base plate made of platinum or the like. A coating layer is preferentially formed on an outer circumferential face in a tip part on the side of glass discharge of the nozzle, and a width of the coating layer is 5% or more and 95% or less with respect to the entire length of the nozzle. The base plate includes a non-coating area. Areas of the nozzles and the base plate not provided with the coating layer act as a sacrificial metal for protecting the nozzle tip parts. In consideration of the sacrificial metal, a coverage rate P of the coating layer in the nozzle tip parts calculated e with a prescribed equation is preferably 5% or more and 350% or less.
    Type: Application
    Filed: March 10, 2022
    Publication date: March 14, 2024
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Hideo SEGAWA, Jumpei SUZUKI, Shigekazu ONOZUMI
  • Patent number: 11912783
    Abstract: An object of the present invention is to provide a monoclonal antibody capable of sufficiently inhibiting a non-specific reaction caused by a non-specific factor, a non-specific reaction inhibitor containing the monoclonal antibody, and the like. The present invention relates to a monoclonal antibody against dog IgM produced by a hybridoma with accession No. NITE BP-02556.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: February 27, 2024
    Assignee: Tanaka Kikinzoku Kogyo K.K.
    Inventors: Keita Suzuki, Hisahiko Iwamoto
  • Patent number: 11913110
    Abstract: The present invention relates to a raw material of an organoruthenium compound for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method. This organoruthenium compound is an organoruthenium compound represented by the following Formula 1 and including a trimethylenemethane-based ligand (L1) and three carbonyl ligands coordinated to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand L1 is represented by the following Formula 2: wherein a substituent R of the ligand L1 is hydrogen, or any one of an alkyl group, a cyclic alkyl group, an alkenyl group, an alkynyl group, and an amino group having a predetermined number of carbon atoms.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: February 27, 2024
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke Harada, Tomohiro Tsugawa, Shigeyuki Ootake, Teruhisa Iwai, Seung-Joon Lee
  • Publication number: 20240060176
    Abstract: The present invention is drawn to a raw material for chemical deposition for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, containing an organoruthenium compound represented by the following formula 1, and further containing ?-diketone that is the same as a ligand of the organoruthenium compound. The raw material for chemical deposition of the present invention is inhibited in discoloration/precipitation even when heated at a high temperature, and enables to form a stable ruthenium thin film or ruthenium compound thin film. wherein substituents R1 and R2 are each hydrogen, or a linear or branched alkyl group.
    Type: Application
    Filed: February 22, 2022
    Publication date: February 22, 2024
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Kazuharu SUZUKI, Yuki MORI, Subhabrata DAS, Hirofumi NAKAGAWA, Shunichi NABEYA
  • Publication number: 20240014335
    Abstract: The present invention relates to a photoelectric conversion element material provided with a base material and a light-receiving layer including a semiconductor film formed on the base material. The semiconductor film that forms this light-receiving layer includes Ag2?xBixSx+1 (x is an integer of 0 or 1) and has a crystallite diameter of 10 nm or more and 40 nm or less. The light-receiving layer can be produced by applying an ink containing the semiconductor nanoparticles dispersed in a dispersion medium to a base material and then firing the ink at 200° C. or higher and 350° C. or lower. The photoelectric conversion element material of the present invention has an absorption property with respect to light with wavelengths in the near infrared region and excellent photoresponsivity.
    Type: Application
    Filed: December 27, 2021
    Publication date: January 11, 2024
    Applicants: TANAKA KIKINZOKU KOGYO K.K., UNIVERSITY INDUSTRY FOUNDATION, YONSEI UNIVERSITY
    Inventors: Hiroki SATO, Yuusuke OHSHIMA, Tatsuya NAKAZAWA, Hyung Jun KIM, Dong Hyun KIM
  • Patent number: 11864325
    Abstract: The present invention relates to a method for forming a metal pattern on a pattern formation section set on a base material. In the present invention, a substrate provided with a fluorine-containing resin layer on a surface of the base material including the pattern formation section is used. The present inventive method for forming a metal pattern includes steps of: forming a functional group on the pattern formation section; and applying a metal ink including an amine compound and a fatty acid as protective agents to the base material surface to fix the metal particles on the pattern formation section. In the present invention, a fluorine-containing resin having a surface free energy measured by the Owens-Wendt method of 13 mN/m or more and 20 mN/m or less is applied as the fluorine-containing resin layer. Further, a metal ink including ethyl cellulose as an additive is applied as the metal ink.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: January 2, 2024
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Kenjiro Koshiji, Yuichi Makita, Noriaki Nakamura, Masato Kasuga, Yuusuke Ohshima, Hiroki Sato, Shigeyuki Ootake, Hitoshi Kubo
  • Publication number: 20230407459
    Abstract: The present invention relates to a platinum-based sputtering target containing platinum or a platinum alloy. The platinum-based sputtering target of the present invention is characterized by a material structure in a thickness-direction cross section thereof. Specifically, when a thickness-direction cross section is equally divided into n sections (n=5 to 20) along a thickness direction, a region including (n?2) sections excluding both end sections is set as a determination region, and when an average grain size in each of the sections is measured in the determination region, as well as an average grain size in the entire determination region is measured, the average grain size in the entire determination region is 150 ?m or less, and a coefficient of variation calculated based on the average grain size in each of the sections of the determination region is 15% or less.
    Type: Application
    Filed: November 15, 2021
    Publication date: December 21, 2023
    Applicants: TOHOKU UNIVERSITY, TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Akihito FUJINO, Kunihiro TANAKA, Shuichi KUBOTA, Takao ASADA, Tetsuo ENDOH, Shoji IKEDA
  • Publication number: 20230395551
    Abstract: A bonding structure to be formed in bonding of a Si semiconductor or the like and a substrate, as materials to be bonded, with transient liquid phase diffusion bonding. The bonding structure includes a bonding portion presenting a specific material texture. A metal composition of the bonding portion includes 78.0% by mass or more and 80.0% by mass or less of Ag, 20.0% by mass or more and 22.0% by mass or less of Sn, and an inevitable impurity element. A characteristic material texture configured from an island-like Ag phase including 95% by mass or more of Ag and a Ag3Sn phase including a Ag3Sn intermetallic compound and surrounding the island-like Ag phase is presented in observation of any cross section of the bonding portion.
    Type: Application
    Filed: October 25, 2021
    Publication date: December 7, 2023
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Takaomi KISHIMOTO, Junichi TAKEUCHI, Hiraku TORINOUMI
  • Publication number: 20230395818
    Abstract: A catalyst for an oxygen reduction reaction containing catalyst particles having a shell-core structure containing a PtCo alloy or a PtCoMn alloy as a core, and platinum as a shell layer. A specific plane of a face-centered cubic lattice is formed by a plurality of platinum atoms contained in the shell layer, and a lattice constant of the plane of the face-centered cubic lattice on the catalyst particle surface is 3.70 ? or more and 4.05 ? or less (in a PtCo alloy), or 3.870 ? or more and 4.10 ? or less (in a PtCoMn alloy). A catalyst design method includes a step of calculating, with respect to an orientation plane such as the plane formed by platinum atoms of the shell layer, adsorption energies for an oxygen molecule, an OH group and a water molecule by first-principles calculation based on density functional theory.
    Type: Application
    Filed: December 13, 2021
    Publication date: December 7, 2023
    Applicants: TANAKA KIKINZOKU KOGYO K.K., NATIONAL INSTITUTE OF TECHNOLOGY
    Inventors: Minoru ISHIDA, Koichi MATSUTANI, Hiroshi NAKANISHI, Hideaki KASAI, Bhume CHANTARAMOLEE, Susan Menez ASPERA
  • Patent number: 11817299
    Abstract: A gold sputtering target is made of gold and inevitable impurities, and has a surface to be sputtered. In the gold sputtering target, an average value of Vickers hardness is 40 or more and 60 or less, and an average crystal grain size is 15 ?m or more and 200 ?m or less. A {110} plane of gold is preferentially oriented at the surface to be sputtered.
    Type: Grant
    Filed: December 23, 2022
    Date of Patent: November 14, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Tetsuya Kato, Yohei Mizuno, Chiharu Ishikura
  • Patent number: 11814424
    Abstract: An object of the present invention is to provide a means for rapidly diagnosing infection with VZV. The present invention relates to an antibody against VZVgE or an antibody fragment thereof, and an immunological measurement method and an immunological measurement device using the antibody or the antibody fragment thereof, etc.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: November 14, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Hisahiko Iwamoto, Keita Suzuki, Tetsuo Tomiyama
  • Patent number: 11807925
    Abstract: A probe pin material including a Ag—Pd—Cu-based alloy essentially including Ag, Pd and Cu, B as a first additive element, and at least any element of Zn, Bi and Sn, as a second additive element. A concentration of the first additive element is 0.1 mass % or more and 1.5 mass % or less, and a concentration of the second additive element is 0.1 mass % or more and 1.0 mass % or less. A Ag concentration, a Pd concentration and a Cu concentration in the Ag—Pd—Cu-based alloy are required as follows: a Ag concentration (SAg), a Pd concentration (SPd) and a Cu concentration (SCu) converted as given that a Ag—Pd—Cu ternary alloy is formed from only such three elements all fall within a predetermined range in a Ag—Pd—Cu ternary system phase diagram. The probe pin material is excellent in resistance value and hardness/wear resistance, and also is enhanced in bending resistance.
    Type: Grant
    Filed: November 7, 2022
    Date of Patent: November 7, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Takeshi Fuse, Kunihiro Shima, Takeyuki Sagae, Shinji Kouno
  • Patent number: 11810700
    Abstract: A CoPt-oxide-based in-plane magnetized film having a magnetic coercive force of 2.00 kOe or more and remanent magnetization per unit area Mrt of 2.00 memu/cm2 or more. The in-plane magnetized film for use as a hard bias layer of a magnetoresistive element contains metal Co, metal Pt, and an oxide. The in-plane magnetized film contains the metal Co in an amount of 55 at % or more and less than 95 at % and the metal Pt in an amount of more than 5 at % and 45 at % or less relative to a total of metal components of the in-plane magnetized film, and contains the oxide in an amount of 10 vol % or more and 42 vol % or less relative to a whole amount of the in-plane magnetized film. The in-plane magnetized film has a thickness of 20 nm or more and 80 nm or less.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: November 7, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Kim Kong Tham, Ryousuke Kushibiki, Masahiro Aono, Yasunobu Watanabe
  • Patent number: 11808670
    Abstract: The invention relates to an immunochromatographic device which contains a nitrous acid compound and an organic acid or an organic acid derivative and which is for detecting a detection target in an analyte wherein a sample droplet-receiving member, a labeling substance-holding member, a chromatography medium member and an absorption member are arranged in a manner that a sample develops in this order and wherein a part containing the nitrous acid compound and a part containing the organic acid or the like are at upstream positions from the labeling substance-containing part, and the part containing the nitrous acid compound and the part containing the organic acid or the like are not substantially in contact with each other in the thickness direction.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: November 7, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Keita Suzuki, Yuya Kato, Hisahiko Iwamoto
  • Publication number: 20230348511
    Abstract: The present invention relates to an organoruthenium compound raw material for a chemical deposition method. An organoruthenium compound is represented by the following Formula 1 in which a trimethylenemethane-based ligand (L1), and two carbonyl ligands and a ligand X coordinate to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand (L1) is represented by the following Formula 2. Besides, the ligand X is any one of an isocyanide ligand, a pyridine ligand, an amine ligand, an imidazole ligand, a pyridazine ligand, a pyrimidine ligand, and a pyrazine ligand. wherein a substituent R of the ligand L1 is hydrogen, or any one of an alkyl group, a cyclic alkyl group, an alkenyl group, an alkynyl group, and an amino group having a predetermined number of carbon atoms.
    Type: Application
    Filed: January 28, 2021
    Publication date: November 2, 2023
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke HARADA, Tomohiro TSUGAWA, Shigeyuki OOTAKE, Seung-Joon LEE, Yohei KOTSUGI
  • Patent number: 11795540
    Abstract: A gold sputtering target has a gold purity of 99.999% or more. In such a gold sputtering target, an average value of Vickers hardness is 20 or more and less than 40, an average crystal grain size is 15 ?m or more and 200 ?m or less, and a {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.
    Type: Grant
    Filed: December 19, 2022
    Date of Patent: October 24, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K. K.
    Inventors: Tetsuya Kato, Takashi Terui, Masahiro Takahashi
  • Patent number: 11795524
    Abstract: The present invention relates to a medical Pt—W alloy, containing 10 mass % or more and 15 mass % or less of W, with the balance being Pt and inevitable impurities, in which a Zr content is 1000 ppm or less. Limiting the Zr content can improve workability, particularly workability at the stage of hot working. Regarding impurity control, further limiting a Ca content to 250 ppm or less can provide more suitable workability. The present invention is good in workability in processing into a wire included in an embolic coil, a guide wire or the like.
    Type: Grant
    Filed: September 8, 2022
    Date of Patent: October 24, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Yuki Horinouchi, Michimasa Okubo, Mizuki Nihei, Akira Inoue, Takeyuki Sagae
  • Patent number: 11795527
    Abstract: The present invention relates to an alloy for medical use, including Pt, Co, Cr, Ni, and Mo. The alloy includes 10 atom % or more and 30 atom % or less of Pt, 20 atom % or more and 31 atom % or less of Cr, 5 atom % or more and 24 atom % or less of Ni, 4 atom % or more and 8 atom % or less of Mo, the balance Co, and unavoidable impurities, and a ratio of the Ni content (CNi) to the Pt content (CPt), CNi/CPt is 1.5 or less. The present invention can be applied to various kinds of devices for medical use, such as catheter, embolic coils, and guide wires, in addition to stents such as flow-diverter stents.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: October 24, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Shubham Yadav, Yuya Kato, Kenji Goto, Kunihiro Shima
  • Patent number: 11754555
    Abstract: According to a pad which is used for an immunochromatographic device for extracting a substance to be detected contained in a detection target in an analyte with nitrous acid and which contains an acid anhydride having vapor pressure at 25° C. of 5×10?2 Pa or less and solubility in water at 25° C. of 0.1 mg/L or more, the storage stability is improved; a substance to be detected contained in an analyte is detected with high sensitivity; and the complexity of production is reduced.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: September 12, 2023
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventor: Hiroshi Kishi
  • Patent number: 11753708
    Abstract: A high strength/highly conductive copper alloy plate material of the present invention contains silver in a range of 4% by mass or more and 13% by mass or less, and balancing copper and unavoidable impurities. In the high strength/highly conductive copper alloy plate material, a minimum value of a tensile strength (UTS) is 600 MPa or more and 1250 MPa or less, and a conductivity (% IACS) is 60% or more and 90% or less.
    Type: Grant
    Filed: October 18, 2022
    Date of Patent: September 12, 2023
    Assignee: Tanaka Kikinzoku Kogyo K.K.
    Inventors: Yusuke Saito, Takaomi Kishimoto, Sigeyuki Nakano