Patents Assigned to Tanaka Kikinzoku Kogyo K.K.
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Publication number: 20240083801Abstract: A bushing for producing glass fibers, including: a plurality of nozzles made of platinum or the like to discharge molten glass; and a base plate made of platinum or the like. A coating layer is preferentially formed on an outer circumferential face in a tip part on the side of glass discharge of the nozzle, and a width of the coating layer is 5% or more and 95% or less with respect to the entire length of the nozzle. The base plate includes a non-coating area. Areas of the nozzles and the base plate not provided with the coating layer act as a sacrificial metal for protecting the nozzle tip parts. In consideration of the sacrificial metal, a coverage rate P of the coating layer in the nozzle tip parts calculated e with a prescribed equation is preferably 5% or more and 350% or less.Type: ApplicationFiled: March 10, 2022Publication date: March 14, 2024Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Hideo SEGAWA, Jumpei SUZUKI, Shigekazu ONOZUMI
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Patent number: 11912783Abstract: An object of the present invention is to provide a monoclonal antibody capable of sufficiently inhibiting a non-specific reaction caused by a non-specific factor, a non-specific reaction inhibitor containing the monoclonal antibody, and the like. The present invention relates to a monoclonal antibody against dog IgM produced by a hybridoma with accession No. NITE BP-02556.Type: GrantFiled: February 21, 2019Date of Patent: February 27, 2024Assignee: Tanaka Kikinzoku Kogyo K.K.Inventors: Keita Suzuki, Hisahiko Iwamoto
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Patent number: 11913110Abstract: The present invention relates to a raw material of an organoruthenium compound for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method. This organoruthenium compound is an organoruthenium compound represented by the following Formula 1 and including a trimethylenemethane-based ligand (L1) and three carbonyl ligands coordinated to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand L1 is represented by the following Formula 2: wherein a substituent R of the ligand L1 is hydrogen, or any one of an alkyl group, a cyclic alkyl group, an alkenyl group, an alkynyl group, and an amino group having a predetermined number of carbon atoms.Type: GrantFiled: January 28, 2021Date of Patent: February 27, 2024Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Ryosuke Harada, Tomohiro Tsugawa, Shigeyuki Ootake, Teruhisa Iwai, Seung-Joon Lee
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Publication number: 20240060176Abstract: The present invention is drawn to a raw material for chemical deposition for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, containing an organoruthenium compound represented by the following formula 1, and further containing ?-diketone that is the same as a ligand of the organoruthenium compound. The raw material for chemical deposition of the present invention is inhibited in discoloration/precipitation even when heated at a high temperature, and enables to form a stable ruthenium thin film or ruthenium compound thin film. wherein substituents R1 and R2 are each hydrogen, or a linear or branched alkyl group.Type: ApplicationFiled: February 22, 2022Publication date: February 22, 2024Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Kazuharu SUZUKI, Yuki MORI, Subhabrata DAS, Hirofumi NAKAGAWA, Shunichi NABEYA
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Publication number: 20240014335Abstract: The present invention relates to a photoelectric conversion element material provided with a base material and a light-receiving layer including a semiconductor film formed on the base material. The semiconductor film that forms this light-receiving layer includes Ag2?xBixSx+1 (x is an integer of 0 or 1) and has a crystallite diameter of 10 nm or more and 40 nm or less. The light-receiving layer can be produced by applying an ink containing the semiconductor nanoparticles dispersed in a dispersion medium to a base material and then firing the ink at 200° C. or higher and 350° C. or lower. The photoelectric conversion element material of the present invention has an absorption property with respect to light with wavelengths in the near infrared region and excellent photoresponsivity.Type: ApplicationFiled: December 27, 2021Publication date: January 11, 2024Applicants: TANAKA KIKINZOKU KOGYO K.K., UNIVERSITY INDUSTRY FOUNDATION, YONSEI UNIVERSITYInventors: Hiroki SATO, Yuusuke OHSHIMA, Tatsuya NAKAZAWA, Hyung Jun KIM, Dong Hyun KIM
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Patent number: 11864325Abstract: The present invention relates to a method for forming a metal pattern on a pattern formation section set on a base material. In the present invention, a substrate provided with a fluorine-containing resin layer on a surface of the base material including the pattern formation section is used. The present inventive method for forming a metal pattern includes steps of: forming a functional group on the pattern formation section; and applying a metal ink including an amine compound and a fatty acid as protective agents to the base material surface to fix the metal particles on the pattern formation section. In the present invention, a fluorine-containing resin having a surface free energy measured by the Owens-Wendt method of 13 mN/m or more and 20 mN/m or less is applied as the fluorine-containing resin layer. Further, a metal ink including ethyl cellulose as an additive is applied as the metal ink.Type: GrantFiled: June 18, 2020Date of Patent: January 2, 2024Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Kenjiro Koshiji, Yuichi Makita, Noriaki Nakamura, Masato Kasuga, Yuusuke Ohshima, Hiroki Sato, Shigeyuki Ootake, Hitoshi Kubo
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Publication number: 20230407459Abstract: The present invention relates to a platinum-based sputtering target containing platinum or a platinum alloy. The platinum-based sputtering target of the present invention is characterized by a material structure in a thickness-direction cross section thereof. Specifically, when a thickness-direction cross section is equally divided into n sections (n=5 to 20) along a thickness direction, a region including (n?2) sections excluding both end sections is set as a determination region, and when an average grain size in each of the sections is measured in the determination region, as well as an average grain size in the entire determination region is measured, the average grain size in the entire determination region is 150 ?m or less, and a coefficient of variation calculated based on the average grain size in each of the sections of the determination region is 15% or less.Type: ApplicationFiled: November 15, 2021Publication date: December 21, 2023Applicants: TOHOKU UNIVERSITY, TANAKA KIKINZOKU KOGYO K.K.Inventors: Akihito FUJINO, Kunihiro TANAKA, Shuichi KUBOTA, Takao ASADA, Tetsuo ENDOH, Shoji IKEDA
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Publication number: 20230395551Abstract: A bonding structure to be formed in bonding of a Si semiconductor or the like and a substrate, as materials to be bonded, with transient liquid phase diffusion bonding. The bonding structure includes a bonding portion presenting a specific material texture. A metal composition of the bonding portion includes 78.0% by mass or more and 80.0% by mass or less of Ag, 20.0% by mass or more and 22.0% by mass or less of Sn, and an inevitable impurity element. A characteristic material texture configured from an island-like Ag phase including 95% by mass or more of Ag and a Ag3Sn phase including a Ag3Sn intermetallic compound and surrounding the island-like Ag phase is presented in observation of any cross section of the bonding portion.Type: ApplicationFiled: October 25, 2021Publication date: December 7, 2023Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takaomi KISHIMOTO, Junichi TAKEUCHI, Hiraku TORINOUMI
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Publication number: 20230395818Abstract: A catalyst for an oxygen reduction reaction containing catalyst particles having a shell-core structure containing a PtCo alloy or a PtCoMn alloy as a core, and platinum as a shell layer. A specific plane of a face-centered cubic lattice is formed by a plurality of platinum atoms contained in the shell layer, and a lattice constant of the plane of the face-centered cubic lattice on the catalyst particle surface is 3.70 ? or more and 4.05 ? or less (in a PtCo alloy), or 3.870 ? or more and 4.10 ? or less (in a PtCoMn alloy). A catalyst design method includes a step of calculating, with respect to an orientation plane such as the plane formed by platinum atoms of the shell layer, adsorption energies for an oxygen molecule, an OH group and a water molecule by first-principles calculation based on density functional theory.Type: ApplicationFiled: December 13, 2021Publication date: December 7, 2023Applicants: TANAKA KIKINZOKU KOGYO K.K., NATIONAL INSTITUTE OF TECHNOLOGYInventors: Minoru ISHIDA, Koichi MATSUTANI, Hiroshi NAKANISHI, Hideaki KASAI, Bhume CHANTARAMOLEE, Susan Menez ASPERA
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Patent number: 11817299Abstract: A gold sputtering target is made of gold and inevitable impurities, and has a surface to be sputtered. In the gold sputtering target, an average value of Vickers hardness is 40 or more and 60 or less, and an average crystal grain size is 15 ?m or more and 200 ?m or less. A {110} plane of gold is preferentially oriented at the surface to be sputtered.Type: GrantFiled: December 23, 2022Date of Patent: November 14, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Tetsuya Kato, Yohei Mizuno, Chiharu Ishikura
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Patent number: 11814424Abstract: An object of the present invention is to provide a means for rapidly diagnosing infection with VZV. The present invention relates to an antibody against VZVgE or an antibody fragment thereof, and an immunological measurement method and an immunological measurement device using the antibody or the antibody fragment thereof, etc.Type: GrantFiled: April 26, 2021Date of Patent: November 14, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Hisahiko Iwamoto, Keita Suzuki, Tetsuo Tomiyama
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Patent number: 11807925Abstract: A probe pin material including a Ag—Pd—Cu-based alloy essentially including Ag, Pd and Cu, B as a first additive element, and at least any element of Zn, Bi and Sn, as a second additive element. A concentration of the first additive element is 0.1 mass % or more and 1.5 mass % or less, and a concentration of the second additive element is 0.1 mass % or more and 1.0 mass % or less. A Ag concentration, a Pd concentration and a Cu concentration in the Ag—Pd—Cu-based alloy are required as follows: a Ag concentration (SAg), a Pd concentration (SPd) and a Cu concentration (SCu) converted as given that a Ag—Pd—Cu ternary alloy is formed from only such three elements all fall within a predetermined range in a Ag—Pd—Cu ternary system phase diagram. The probe pin material is excellent in resistance value and hardness/wear resistance, and also is enhanced in bending resistance.Type: GrantFiled: November 7, 2022Date of Patent: November 7, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takeshi Fuse, Kunihiro Shima, Takeyuki Sagae, Shinji Kouno
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Patent number: 11810700Abstract: A CoPt-oxide-based in-plane magnetized film having a magnetic coercive force of 2.00 kOe or more and remanent magnetization per unit area Mrt of 2.00 memu/cm2 or more. The in-plane magnetized film for use as a hard bias layer of a magnetoresistive element contains metal Co, metal Pt, and an oxide. The in-plane magnetized film contains the metal Co in an amount of 55 at % or more and less than 95 at % and the metal Pt in an amount of more than 5 at % and 45 at % or less relative to a total of metal components of the in-plane magnetized film, and contains the oxide in an amount of 10 vol % or more and 42 vol % or less relative to a whole amount of the in-plane magnetized film. The in-plane magnetized film has a thickness of 20 nm or more and 80 nm or less.Type: GrantFiled: October 30, 2019Date of Patent: November 7, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Kim Kong Tham, Ryousuke Kushibiki, Masahiro Aono, Yasunobu Watanabe
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Patent number: 11808670Abstract: The invention relates to an immunochromatographic device which contains a nitrous acid compound and an organic acid or an organic acid derivative and which is for detecting a detection target in an analyte wherein a sample droplet-receiving member, a labeling substance-holding member, a chromatography medium member and an absorption member are arranged in a manner that a sample develops in this order and wherein a part containing the nitrous acid compound and a part containing the organic acid or the like are at upstream positions from the labeling substance-containing part, and the part containing the nitrous acid compound and the part containing the organic acid or the like are not substantially in contact with each other in the thickness direction.Type: GrantFiled: March 3, 2017Date of Patent: November 7, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Keita Suzuki, Yuya Kato, Hisahiko Iwamoto
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Publication number: 20230348511Abstract: The present invention relates to an organoruthenium compound raw material for a chemical deposition method. An organoruthenium compound is represented by the following Formula 1 in which a trimethylenemethane-based ligand (L1), and two carbonyl ligands and a ligand X coordinate to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand (L1) is represented by the following Formula 2. Besides, the ligand X is any one of an isocyanide ligand, a pyridine ligand, an amine ligand, an imidazole ligand, a pyridazine ligand, a pyrimidine ligand, and a pyrazine ligand. wherein a substituent R of the ligand L1 is hydrogen, or any one of an alkyl group, a cyclic alkyl group, an alkenyl group, an alkynyl group, and an amino group having a predetermined number of carbon atoms.Type: ApplicationFiled: January 28, 2021Publication date: November 2, 2023Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Ryosuke HARADA, Tomohiro TSUGAWA, Shigeyuki OOTAKE, Seung-Joon LEE, Yohei KOTSUGI
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Patent number: 11795540Abstract: A gold sputtering target has a gold purity of 99.999% or more. In such a gold sputtering target, an average value of Vickers hardness is 20 or more and less than 40, an average crystal grain size is 15 ?m or more and 200 ?m or less, and a {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.Type: GrantFiled: December 19, 2022Date of Patent: October 24, 2023Assignee: TANAKA KIKINZOKU KOGYO K. K.Inventors: Tetsuya Kato, Takashi Terui, Masahiro Takahashi
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Patent number: 11795524Abstract: The present invention relates to a medical Pt—W alloy, containing 10 mass % or more and 15 mass % or less of W, with the balance being Pt and inevitable impurities, in which a Zr content is 1000 ppm or less. Limiting the Zr content can improve workability, particularly workability at the stage of hot working. Regarding impurity control, further limiting a Ca content to 250 ppm or less can provide more suitable workability. The present invention is good in workability in processing into a wire included in an embolic coil, a guide wire or the like.Type: GrantFiled: September 8, 2022Date of Patent: October 24, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Yuki Horinouchi, Michimasa Okubo, Mizuki Nihei, Akira Inoue, Takeyuki Sagae
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Patent number: 11795527Abstract: The present invention relates to an alloy for medical use, including Pt, Co, Cr, Ni, and Mo. The alloy includes 10 atom % or more and 30 atom % or less of Pt, 20 atom % or more and 31 atom % or less of Cr, 5 atom % or more and 24 atom % or less of Ni, 4 atom % or more and 8 atom % or less of Mo, the balance Co, and unavoidable impurities, and a ratio of the Ni content (CNi) to the Pt content (CPt), CNi/CPt is 1.5 or less. The present invention can be applied to various kinds of devices for medical use, such as catheter, embolic coils, and guide wires, in addition to stents such as flow-diverter stents.Type: GrantFiled: November 18, 2019Date of Patent: October 24, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Shubham Yadav, Yuya Kato, Kenji Goto, Kunihiro Shima
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Patent number: 11754555Abstract: According to a pad which is used for an immunochromatographic device for extracting a substance to be detected contained in a detection target in an analyte with nitrous acid and which contains an acid anhydride having vapor pressure at 25° C. of 5×10?2 Pa or less and solubility in water at 25° C. of 0.1 mg/L or more, the storage stability is improved; a substance to be detected contained in an analyte is detected with high sensitivity; and the complexity of production is reduced.Type: GrantFiled: June 13, 2019Date of Patent: September 12, 2023Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventor: Hiroshi Kishi
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Patent number: 11753708Abstract: A high strength/highly conductive copper alloy plate material of the present invention contains silver in a range of 4% by mass or more and 13% by mass or less, and balancing copper and unavoidable impurities. In the high strength/highly conductive copper alloy plate material, a minimum value of a tensile strength (UTS) is 600 MPa or more and 1250 MPa or less, and a conductivity (% IACS) is 60% or more and 90% or less.Type: GrantFiled: October 18, 2022Date of Patent: September 12, 2023Assignee: Tanaka Kikinzoku Kogyo K.K.Inventors: Yusuke Saito, Takaomi Kishimoto, Sigeyuki Nakano