Patents Assigned to Technological Systems Limited
  • Patent number: 6187685
    Abstract: There is disclosed a method and apparatus for etching a substrate. The method comprises the steps of etching a substrate or alternately etching and depositing a passivation layer. A bias frequency, which may be pulsed, may be applied to the substrate and may be at or below the ion plasma frequency.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: February 13, 2001
    Assignee: Surface Technology Systems Limited
    Inventors: Janet Hopkins, Ian Ronald Johnston, Jyoti Kiron Bhardwaj, Huma Ashraf, Alan Michael Hynes, Leslie Michael Lea
  • Patent number: 6051503
    Abstract: This invention relates to methods for treatment of semiconductor substrates and in particular a method of etching a trench in a semiconductor substrate in a reactor chamber using alternatively reactive ion etching and depositing a passivation layer by chemical vapour deposition, wherein one or more of the following parameters: gas flow rates, chamber pressure, plasma power, substrate bias, etch rate, deposition rate, cycle time and etching/deposition ratio vary with time.
    Type: Grant
    Filed: August 1, 1997
    Date of Patent: April 18, 2000
    Assignee: Surface Technology Systems Limited
    Inventors: Jyoti Kiron Bhardwaj, Huma Ashraf, Babak Khamsehpour, Janet Hopkins, Alan Michael Hynes, Martin Edward Ryan, David Mark Haynes
  • Patent number: 5530324
    Abstract: The invention relates to a resonance reducing arrangement for a device displaceable between two positions.In one described embodiment the device (14) is displaced against the resilience of a spring (11) by causing an electrical device (15) to accelerate the device (14) towards its second position, terminating the force accelerating the device (14) to allow the device to continue to displace towards the second position and then reactivating the electrical device (15) to cause the electrical device (15) to expand to that position at which it holds the device (14) in its second position.
    Type: Grant
    Filed: May 27, 1994
    Date of Patent: June 25, 1996
    Assignee: Technology Systems Limited
    Inventors: Edwin D. Gaskell, William H. Stevens
  • Patent number: 5330301
    Abstract: A processing apparatus 10 has chambers 11 and 12 and a loading mechanism 13 for transferring workpieces into and out of the chambers. The workpieces are carried on a pallet 16 which is slotted so that, when it is inserted into the chambers 11 or 12 the slots are aligned with lines A-H on lifting pins. This arrangement enables the mechanism 13 to withdraw the pallet, whilst the pins 22 are in their erect position.
    Type: Grant
    Filed: September 2, 1992
    Date of Patent: July 19, 1994
    Assignee: Surface Technology Systems Limited
    Inventor: Carl D. Brancher