Patents Assigned to Toho Chemical Industry Co., Ltd.
  • Patent number: 11091400
    Abstract: An admixture for a hydraulic composition includes a polycondensation product P containing a copolymer prepared by polycondensation of a monomer mixture containing compounds A to C of the following Formulae (A) to (C); and a polycarboxylic acid-based polymer Q including a structural unit having an amino and an imino group, and/or a structural unit having an amino, imino, and amido group: (wherein R1 is a hydrogen atom, alkyl, or alkenyl group; A1O is a C2-4 alkylene oxide group; p is a number of 1 to 300; and X is a hydrogen atom, an alkyl, or acyl group; R2 is an alkyl or alkenyl group; A2O is a C2-4 alkylene oxide group; q is a number of 1 to 300; and Y1 is a phosphate ester group; and R3 is a hydrogen atom, carboxy, alkyl, alkenyl, phenyl, naphthyl, or heterocyclic group; and r is a number of 1 to 100).
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: August 17, 2021
    Assignees: SIKA TECHNOLOGY AG, TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kaname Saitoh, Toshihiro Ogawa, Michael Wernher Danzinger, Akira Suga, Taro Tsushima, Seiichi Koshisaka
  • Publication number: 20200055785
    Abstract: An admixture for a hydraulic composition includes a polycondensation product P containing a copolymer prepared by polycondensation of a monomer mixture containing compounds A to C of the following Formulae (A) to (C); and a polycarboxylic acid-based polymer Q including a structural unit having an amino and an imino group, and/or a structural unit having an amino, imino, and amido group: (wherein R1 is a hydrogen atom, alkyl, or alkenyl group; A1O is a C2-4 alkylene oxide group; p is a number of 1 to 300; and X is a hydrogen atom, an alkyl, or acyl group; R2 is an alkyl or alkenyl group; A2O is a C2-4 alkylene oxide group; q is a number of 1 to 300; and Y1 is a phosphate ester group; and R3 is a hydrogen atom, carboxy, alkyl, alkenyl, phenyl, naphthyl, or heterocyclic group; and r is a number of 1 to 100).
    Type: Application
    Filed: February 8, 2018
    Publication date: February 20, 2020
    Applicants: SIKA TECHNOLOGY AG, TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kaname SAITOH, Toshihiro OGAWA, Michael Wernher DANZINGER, Akira SUGA, Taro TSUSHIMA, Seiichi KOSHISAKA
  • Patent number: 10487170
    Abstract: A polycondensation product containing a phenolic copolymer useful for a hydraulic-composition dispersant that has stable dispersability and can obtain a prescribed fluidity, including a copolymer obtained by polycondensing a monomeric mixture including compounds A-D of formulas (A)-(D). A hydraulic-composition dispersant containing the product or copolymer. In the formulas, A1O, A2O, A3O, and A4O represent a C2-4 alkylene oxide group; m, n represent a number from 0 to 300 and m+n?1; p, q represent a number from 1 to 300; X represents a hydrogen atom, alkyl group, or C1-24 acyl group; R0, R1 represent a hydrogen atom, alkyl group or alkenyl group; Y1, Y2 represent a hydrogen atom, phosphoester group, or sulfate ester group; Y3 represents a phosphoester or a sulfate ester group; R2 represents a hydrogen atom, carboxyl group, C1-10 alkyl group, C2-10 alkenyl group, phenyl group, napthyl group, or heterocyclic group; r represents a number from 1-100.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: November 26, 2019
    Assignee: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akira Suga, Katsutoshi Sato, Tomohisa Okada, Taro Tsushima
  • Publication number: 20180223028
    Abstract: A polycondensation product containing a phenolic copolymer useful for a hydraulic-composition dispersant that has stable dispersability and can obtain a prescribed fluidity, including a copolymer obtained by polycondensing a monomeric mixture including compounds A-D of formulas (A)-(D). A hydraulic-composition dispersant containing the product or copolymer. In the formulas, A1O, A2O, A3O, and A4O represent a C2-4 alkylene oxide group; m, n represent a number from 0 to 300 and m+n?1; p, q represent a number from 1 to 300; X represents a hydrogen atom, alkyl group, or C1-24 acyl group; R0, R1 represent a hydrogen atom, alkyl group or alkenyl group; Y1, Y2 represent a hydrogen atom, phosphoester group, or sulfate ester group; Y3 represents a phosphoester or a sulfate ester group; R2 represents a hydrogen atom, carboxyl group, C1-10 alkyl group, C2-10 alkenyl group, phenyl group, napthyl group, or heterocyclic group; r represents a number from 1-100.
    Type: Application
    Filed: August 4, 2016
    Publication date: August 9, 2018
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akira SUGA, Katsutoshi SATO, Tomohisa OKADA, Taro TSUSHIMA
  • Patent number: 9382155
    Abstract: There is provided a gypsum dispersant and a gypsum additive that improve the fluidity of gypsum slurry even if gypsum raw materials used are different in quality and that do not induce delay of curing of gypsum slurry. A gypsum dispersant, including: (A) a polycarboxylic acid polymer; and (B) a polymer obtained by a reaction of an alkylene diamine and/or a monoamine and an epihalohydrin as essential components.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 5, 2016
    Assignees: Toho Chemical Industry Co., Ltd., Yoshino Gypsum Co., Ltd.
    Inventors: Akira Ikeda, Seiichi Koshisaka, Katsutoshi Sato
  • Patent number: 9062137
    Abstract: There is provided as an antistatic agent that preserves antistatic properties for a long period of time and that does not impair the appearance and transparency of a resin into which the antistatic agent is kneaded, and a resin composition containing the antistatic agent. The antistatic agent including a block copolymer; a thermoplastic resin composition including the antistatic agent; and a film or sheet including the composition.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: June 23, 2015
    Assignee: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventor: Tetsuhiro Utsumi
  • Patent number: 8835585
    Abstract: A cement dispersant that includes a copolymer resulting from a reaction of components (A) to (C), where: (A) is an ester compound obtained by adding 0 to 10 moles of C2-4 alkylene oxide to 1 mole of at least one compound of Formula (1) RO-(AO)n-H (where R is a C1-12 alkyl group, A is a C2-4 alkylene group, and n is an integer of 0 to 7) and subjecting the resulting adduct to a reaction with an ?,?-unsaturated carboxylic acid, in which the compound of Formula (1) contains not more than 5% by mass of the constituent compounds having n of 3 or less relative to the total mass of the compound of Formula (1); (B) is an ?,?-unsaturated carboxylic acid or a salt thereof; and (C) is another copolymerizable monomer, where appropriate, or a salt thereof.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: September 16, 2014
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventors: Akira Ikeda, Akira Suga, Satoshi Kobayashi
  • Patent number: 8742017
    Abstract: There is provided an antistatic agent that preserves its antistatic property for a long period of time and has the appearance and the transparency that are not impaired when kneaded into a resin, and a resin composition containing the antistatic agent. An antistatic agent including a block copolymer which is obtained from a reaction product of a polyolefin (a) having one end being acid-modified and a diol and/or a diamine (b) having a polyoxyalkylene chain, and in which a part or all of acid groups remaining in the reaction product is neutralized with an alkaline substance. A thermoplastic resin composition including the antistatic resin. A film or sheet including the thermoplastic resin composition.
    Type: Grant
    Filed: January 7, 2011
    Date of Patent: June 3, 2014
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventor: Tetsuhiro Utsumi
  • Patent number: 8536280
    Abstract: [PROBLEM] To provide a novel star polymer useful as resist materials with high sensitivity and high resolution, and a novel coupling agent for anionic polymerization for synthesizing the polymer. [MEANS FOR SOLVING THE PROBLEM] A star polymer comprising: a core part derived from a coupling agent for anionic polymerization composed of an acid-degradable compound having an organic group derived from a halide; and an arm part that is attached to the core part and composed of an acid-degradable polymer chain obtained by anionic polymerization; and the coupling agent for anionic polymerization.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: September 17, 2013
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventor: Katsuhiko Yano
  • Patent number: 8487068
    Abstract: The present invention provides a method for producing a polybenzoxazole precursor having reduced contents of residual aprotic polar solvent and residual halogen without discharging a large amount of waste water during purification. The present invention specifically relates to a method for producing a polybenzoxazole precursor, which comprises synthesizing a polybenzoxazole precursor in an aprotic polar solvent, adding and mixing water and a water-insoluble solvent with the resulting polybenzoxazole precursor solution to still stand the solution, and then separating a water layer from the solution to reduce a content of impurities remaining in the polybenzoxazole precursor.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: July 16, 2013
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventor: Naoya Kutsuzawa
  • Publication number: 20130123434
    Abstract: There is provided as an antistatic agent that preserves antistatic properties for a long period of time and that does not impair the appearance and transparency of a resin into which the antistatic agent is kneaded, and a resin composition containing the antistatic agent. A block copolymer obtained from a reactant between (a) an acid-modified polyolefin and (b) an alkylene oxide adduct of amide alcohol of General Formula (1), part or all of residual acid groups in the reactant being neutralized by an alkaline substance: R1—CONH—R2—O-(A1O)n-H (1) (where R1 is a C1-21 linear or branched alkyl group or alkenyl group; R2 is a C1-4 linear or branched alkylene group; A1 is a C2-4 alkylene group; and n is an integer of 1 to 100); an antistatic agent including the block copolymer; a thermoplastic resin composition including the antistatic agent; and a film or sheet including the composition.
    Type: Application
    Filed: July 26, 2011
    Publication date: May 16, 2013
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventor: Tetsuhiro Utsumi
  • Publication number: 20130059985
    Abstract: The present invention provides a method for producing a polybenzoxazole precursor having reduced contents of residual aprotic polar solvent and residual halogen without discharging a large amount of waste water during purification. The present invention specifically relates to a method for producing a polybenzoxazole precursor, which comprises synthesizing a polybenzoxazole precursor in an aprotic polar solvent, adding and mixing water and a water-insoluble solvent with the resulting polybenzoxazole precursor solution to still stand the solution, and then separating a water layer from the solution to reduce a content of impurities remaining in the polybenzoxazole precursor.
    Type: Application
    Filed: August 30, 2012
    Publication date: March 7, 2013
    Applicant: Toho Chemical Industry Co., Ltd.
    Inventor: Naoya Kutsuzawa
  • Publication number: 20130018162
    Abstract: A cement dispersant that includes a copolymer resulting from a reaction of components (A) to (C), where: (A) is an ester compound obtained by adding 0 to 10 moles of C2-4 alkylene oxide to 1 mole of at least one compound of Formula (1) RO-(AO)n-H (where R is a C1-12 alkyl group, A is a C2-4 alkylene group, and n is an integer of 0 to 7) and subjecting the resulting adduct to a reaction with an ?,?-unsaturated carboxylic acid, in which the compound of Formula (1) contains not more than 5% by mass of the constituent compounds having n of 3 or less relative to the total mass of the compound of Formula (1); (B) is an ?,?-unsaturated carboxylic acid or a salt thereof; and (C) is another copolymerizable monomer, where appropriate, or a salt thereof.
    Type: Application
    Filed: March 31, 2011
    Publication date: January 17, 2013
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akira Ikeda, Akira Suga, Satoshi Kobayashi
  • Publication number: 20120283386
    Abstract: There is provided an antistatic agent that preserves its antistatic property for a long period of time and has the appearance and the transparency that are not impaired when kneaded into a resin, and a resin composition containing the antistatic agent. An antistatic agent including a block copolymer which is obtained from a reaction product of a polyolefin (a) having one end being acid-modified and a diol and/or a diamine (b) having a polyoxyalkylene chain, and in which a part or all of acid groups remaining in the reaction product is neutralized with an alkaline substance. A thermoplastic resin composition including the antistatic resin. A film or sheet including the thermoplastic resin composition.
    Type: Application
    Filed: January 7, 2011
    Publication date: November 8, 2012
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventor: Tetsuhiro Utsumi
  • Patent number: 8163683
    Abstract: There is provided a pour point depressant for lubricants that has an effect of lowering pour points of both solvent refined base oils and high viscosity index base oils. A pour point depressant for lubricants comprising: a mixture of an alkyl (meth)acrylate polymer (A) that is composed of an alkyl(meth)acrylate containing alkyl groups having an average carbon number (CA) of 12.5 to 13.8, and an alkyl(meth)acrylate polymer (B) that is composed of an alkyl(meth)acrylate containing alkyl groups having an average carbon number (CB) of 13.9 to 15.5.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: April 24, 2012
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventors: Naoki Haga, Akiyuki Hiraide
  • Publication number: 20120029128
    Abstract: There is provided a practically useful aqueous resin composition which enables to obtain a coating film that is satisfactory not only in corrosion resistance but also in coating adhesion when applied over a metal surface, specifically an aqueous resin composition which enables, in a form of a thin film having a thickness of about 0.1-5 ?m, to exhibit various properties practically required for surface treating agents for chromium-free surface-treated steel plates, namely excellent corrosion resistance, adhesion to steel plates, durability against alkaline degreasing agents or solvents which are used for removing a press oil used during press molding, adhesion to an overcoating material which is used for aesthetic purposes, mechanical stability and the like. The aqueous resin composition comprises 100 parts by mass of a copolymer of an ?,?-ethylenically unsaturated carboxylic acid and an olefin; and 0.
    Type: Application
    Filed: October 4, 2011
    Publication date: February 2, 2012
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Noriyuki Kikuchi, Yasunori Terunuma, Takashi Muramatsu, Mikio Akimoto, Kazuo Nobuchika, Tadashige Nakamoto
  • Publication number: 20100120641
    Abstract: There is provided a pour point depressant for lubricants that has an effect of lowering pour points of both solvent refined base oils and high viscosity index base oils. A pour point depressant for lubricants comprising: a mixture of an alkyl(meth)acrylate polymer (A) that is composed of an alkyl(meth)acrylate containing alkyl groups having an average carbon number (CA) of 12.5 to 13.8, and an alkyl(meth)acrylate polymer (B) that is composed of an alkyl(meth)acrylate containing alkyl groups having an average carbon number (CB) of 13.9 to 15.5.
    Type: Application
    Filed: June 6, 2008
    Publication date: May 13, 2010
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Naoki Haga, Akiyuki Hiraide
  • Patent number: 7714048
    Abstract: A biodegradable resin composition that exhibits excellent antistatic properties and antifogging properties while maintaining its molecular weight to such a degree as to provide practically satisfactory strength of a molded article molded even according to a kneading process.
    Type: Grant
    Filed: April 25, 2005
    Date of Patent: May 11, 2010
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventors: Masaya Goino, Yasuhiro Kakida, Shoji Obuchi
  • Publication number: 20100111885
    Abstract: The invention provides a hair shape-controlling composition which has excellent applicability to hair, which causes less damage to permanent-waved hair or straightened hair, which can provide treated hair with an excellent texture as expected, and which does not impede a glossy appearance of treated hair. The hair shape-controlling composition including a first component containing a reducing agent and an alkaline agent, and a second component containing an oxidizing agent is provided by containing a specific hydroxy-ether-amine compound or a specific quaternary ammonium salt.
    Type: Application
    Filed: February 20, 2008
    Publication date: May 6, 2010
    Applicants: SHISEIDO COMPANY, LTD., TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kazuya Shibata, Emiko Kawata, Takahiro Yamashita, Masaaki Uemura, Tanemasa Nagano, Kouichi Kinoshita
  • Publication number: 20100056748
    Abstract: [PROBLEM] To provide a novel star polymer useful as resist materials with high sensitivity and high resolution, and a novel coupling agent for anionic polymerization for synthesizing the polymer. [MEANS FOR SOLVING THE PROBLEM] A star polymer comprising: a core part derived from a coupling agent for anionic polymerization composed of an acid-degradable compound having an organic group derived from a halide; and an arm part that is attached to the core part and composed of an acid-degradable polymer chain obtained by anionic polymerization; and the coupling agent for anionic polymerization.
    Type: Application
    Filed: August 26, 2009
    Publication date: March 4, 2010
    Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.
    Inventor: Katsuhiko Yano