Patents Assigned to Tokyo Ohka Kogyo Co., Ltd.
  • Patent number: 10437147
    Abstract: A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an ?-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: October 8, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Yuta Iwasawa
  • Patent number: 10429740
    Abstract: A method of recovering a defect portion of a resist pattern formed on a substrate including applying a shrinking agent composition so as to cover the resist pattern having the defect portion; forming a developing solution-insoluble region on the surface of the resist pattern; and developing the covered resist pattern, the shrinking agent composition including a polymeric compound (X) which is a homopolymer or a random copolymer.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: October 1, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Junichi Tsuchiya, Rikita Tsunoda, Daichi Takaki, Miki Shinomiya, Masafumi Fujisaki
  • Patent number: 10429738
    Abstract: A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.
    Type: Grant
    Filed: September 27, 2016
    Date of Patent: October 1, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Akihiko Nakata, Akihito Morioka, Tsukasa Sugawara
  • Patent number: 10429735
    Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: October 1, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Ryoji Watanabe
  • Patent number: 10416560
    Abstract: A coloring agent dispersion which contains a satisfactorily dispersed pigment, and results in a photosensitive resin composition capable of forming a cured film when mixed in the photosensitive resin composition; a photosensitive resin composition containing the coloring agent dispersion; a cured product of the composition; an organic EL element provided with the cured product; a method for forming a pattern using the composition; and a method for producing a photosensitive resin composition using the dispersion. In a coloring agent dispersion including a coloring agent which contains a pigment and a dispersant, a dispersant containing a silsesquioxane compound of a specific structure is used.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO, LTD.
    Inventors: Naozumi Matsumoto, Yasuhide Ohuchi, Tatsuro Ishikawa, Mayumi Kuroko, Dai Shiota
  • Patent number: 10414918
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
  • Patent number: 10401727
    Abstract: A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which R101 represents a hydrocarbon group having at least 1 hydroxy group as a substituent; Y101 represents a single bond or a divalent linking group containing an oxygen atom; V101 represents a single bond, an alkylene group or a fluorinated alkylene group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M?m+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: September 3, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Tsuyoshi Nakamura
  • Patent number: 10400078
    Abstract: A surface treatment liquid capable of making a surface of a treatment target hydrophilic or hydrophobic without including a resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. The surface treatment liquid includes a resin, a solvent and a strong acid having a pKa of 1 or less. The resin includes a functional group I that is at least one of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II that is a hydrophilic group or a hydrophobic group other than the functional group I.
    Type: Grant
    Filed: September 21, 2016
    Date of Patent: September 3, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Takahiro Senzaki
  • Patent number: 10363585
    Abstract: A cleaning liquid which includes 3-alkoxy-3-methyl-1-butanol represented by the following general formula (1); at least one of diethylene glycol monomethyl ether and triethylene glycol monomethyl ether; and quaternary ammonium hydroxide: in which R1 represents an alkyl group having 1 to 5 carbon atoms.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: July 30, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yuriko Shirai, Ryusuke Uchida
  • Patent number: 10366888
    Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: July 30, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Yoshitaka Komuro, Takehiro Seshimo, Katsumi Ohmori
  • Patent number: 10364372
    Abstract: A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B).
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: July 30, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Kunihiro Noda, Hiroki Chisaka, Kazuya Someya, Koichi Misumi, Dai Shiota
  • Patent number: 10353291
    Abstract: A method of forming a photosensitive resin layer including laminating a photosensitive resin layer including a chemically amplified positive-type photosensitive resin composition which includes an acid generator which generates an acid upon light exposure and generates an acid by heating on a metal surface having catalytic activity, a resin whose solubility in alkali increases under the action of an acid, and an organic solvent, on an catalytic activity-containing metal surface of a substrate; and heating the photosensitive resin layer, so that the solubility in alkali of the photosensitive resin layer increases as the layer becomes closer to an interface with the substrate.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: July 16, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Eiichi Shimura, Shinji Kumada, Aya Momozawa
  • Patent number: 10336708
    Abstract: A novel imidazole compound that yields a surface treatment liquid that is very effective at suppressing migration and oxidation of a wiring surface; a metal surface treatment liquid that contains the imidazole compound; a metal surface treatment method that uses the metal surface treatment liquid; and a laminate production method that uses the surface treatment liquid. A metal is surface-treated using the surface treatment liquid which includes a saturated fatty acid or a saturated fatty acid ester of a specific structure, in which a prescribed position is substituted by an aromatic group of a prescribed structure and an imidazolyl group that may have a substituent group.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: July 2, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tatsuro Ishikawa, Kunihiro Noda, Yasuhide Ohuchi, Hiroki Chisaka, Dai Shiota, Yukitsugu Maeda, Takafumi Imoto, Kouhei Fujita, Yasuyuki Akai
  • Patent number: 10336976
    Abstract: A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: July 2, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Takahiro Senzaki
  • Patent number: 10324377
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 18, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Taku Hirayama, Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Tatsuya Fujii
  • Patent number: 10322989
    Abstract: A transparent body production method that includes subjecting the compound represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W1 and W2 is the group represented by formula (2) in which the ring Z is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or an alkylene group having 1-4 carbon atoms, R2 is a specific substituent, and m is an integer of 0 or higher, the group represented by formula (4) is —OH— or a (meth)acryloyloxy group, each of the rings Y1 and Y2 is an aromatic hydrocarbon ring, R is a single bond or a specific divalent group, each of R3a and R3b is —CN, a halogen group, or a monovalent hydrocarbon group, and each of n1 and n2 is an integer of 0-4.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: June 18, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Kunihiro Noda, Hiroki Chisaka, Mayumi Kuroko
  • Patent number: 10317797
    Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: June 11, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hidetami Yaegashi, Kenichi Oyama, Katsumi Ohmori, Yoshitaka Komuro, Takehiro Seshimo
  • Patent number: 10301438
    Abstract: A dispersion liquid including a fiber material which is capable of forming a porous film having high porosity; a porous film formed using the dispersion liquid; a power storage element including the porous film; and a method for producing a porous film using the dispersion liquid. In the dispersion liquid including the fiber material and an organic solvent, which is used for forming a porous film by applying and drying, the fiber material contains a predetermined amount of a modified cellulose fiber including a carboxy group or a metal salt thereof, and the amount of water in the dispersion liquid is 5% by mass or less.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: May 28, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Teruhiro Uematsu, Takeshi Hikima
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Publication number: 20190127541
    Abstract: To provide a surface treatment liquid capable of making a base material including polyorganosiloxane on at least a part of a surface thereof hydrophilic stably over a long period of time, and provide a surface treatment method using the surface treatment liquid. In a surface treatment liquid including (A) resin and a (B) solvent, as the (A) resin, resin having a functional group I that is a hydroxyl group and/or a cyano group is used, and a functional group II that is a hydrophilic group other than the functional group I, and a ratio of a structural unit having an anionic group to total structural units of the (A) resin is 5 mol % or less, or resin including a cationic group including an anion moiety and a cation moiety that can be bonded to the (A) resin is used.
    Type: Application
    Filed: October 29, 2018
    Publication date: May 2, 2019
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takashi KAMIZONO, Takahiro SENZAKI, Takuya NOGUCHI