Abstract: A surface treatment agent including a compound represented by the following general formula (P-1) and an acid. In the formula, R1 represents a linear or branched alkyl group having 8 or more carbon atoms, a linear or branched fluorinated alkyl group having 8 or more carbon atoms, or an aromatic hydrocarbon group; R2 and R3 each independently represents a hydrogen atom, a linear or branched alkyl group having 8 or more carbon atoms, a linear or branched fluorinated alkyl group having 8 or more carbon atoms, or an aromatic hydrocarbon group R1—P(?O)(OR2)(OR3)??(P-1).

Abstract: In an aspect, the present invention provides a structure, a structure-manufacturing method, a cell-sorting method, or the like. In an aspect, a structure (1) of the present invention is a structure including a first substrate (10) and a second substrate (20) disposed to face one side of the first substrate (10), in which the first substrate (10) has a plurality of depressions (11) which are open to the other side of the first substrate and each of which has a size that enables each of the depressions to capture one unit of a cell, at least some of the depressions (11) have communication holes (12) which communicate with one side and the other side of the first substrate and each of which has a size that enables secretions secreted from the cell to move through the communication holes, the second substrate (20) can include accumulation portions (13) in which the secretions moving through the communication holes (12) are accumulated, and the accumulation portions (13) can correspond to the depressions (11).

Abstract: A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.

Abstract: Provided are a porous film having excellent surface smoothness and a method for producing the same. The surface roughness of a porous film of polyvinylidene fluoride, polyethersulfone, polyimide and/or polyamide-imide is Ra 30,000 ? or less. The opening diameter of the porous film is preferably from 100 nm to 5000 nm. The method for producing a porous film preferably includes a step for kneading a varnish containing fine particles and at least one resin selected from the group consisting of polyvinylidene fluoride, polyether sulfone, polyamic acid, polyimide, polyamide-imide precursor, and polyamide-imide. The varnish preferably has a viscosity at 25° C. of 0.1-3 Pa·s, a solids fraction concentration of 10-50 mass %, and a fine particle average particle size of 10-5000 nm.

Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cp is a group represented by general formula (Cp-1) shown below).

Abstract: A deep ultraviolet LED with a design wavelength ?, including a reflecting electrode layer (Au), a metal layer (Ni), a p-GaN contact layer, a p-block layer made of a p-AlGaN layer, an i-guide layer made of an AlN layer, a multi-quantum well layer, an n-AlGaN contact layer, a u-AlGaN layer, an AlN template, and a sapphire substrate that are arranged in this order from a side opposite to the sapphire substrate, in which the thickness of the p-block layer is 52 to 56 nm, a two-dimensional reflecting photonic crystal periodic structure having a plurality of voids is provided in a region from the interface between the metal layer and the p-GaN contact layer to a position not beyond the interface between the p-GaN contact layer and the p-block layer in the thickness direction of the p-GaN contact layer, the distance from an end face of each of the voids in the direction of the sapphire substrate to the interface between the multi-quantum well layer and the i-guide layer satisfies ?/2n1Deff (where ? is the design wav

Abstract: A silicon etching solution including a component which is a quaternary ammonium hydroxide represented by Formula (A-1), and a component which is a nonionic surfactant, in which an HLB value of the quaternary ammonium hydroxide is in a range of 12 to 15; in Formula (A-1), R1 to R4 each independently represent a monovalent hydrocarbon group, and the total number of carbon atoms contained in R1 to R4 is 10 or greater.

Abstract: A resist composition including a compound represented by formula (b1) in which Rb1 represents an aryl group which may have a substituent; Rb2 and Rb3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rb1 and the aryl group or the alkyl group represented by Rb2 or Rb3 has a substituent containing a halogen atom, and at least one of the aryl group represented by Rb1 and the aryl group or the alkyl group represented by Rb2 or Rb3 has a substituent containing a sulfonyl group; and X? represents a counteranion.

Abstract: The purpose of the present invention is to provide: a surface treatment liquid that is capable of favorably hydrophilizing or hydrophobing surfaces of an object to be treated without having to include a film forming resin; and a surface treatment method using the surface treatment liquid. The present invention provides a surface treatment liquid which comprises (A) a resin and (C) a solvent, wherein as (A) the resin, a resin is used which has a weight average molecular weight of 100000 or more and contains a functional group I which comprises one group or more selected from the group consisting of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II which is a hydrophilic group or a hydrophobic group other than the functional group I.

Abstract: A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rd0 represents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Wax0 represents an (nax0+1)-valent aromatic hydrocarbon group which may have a substituent.

Abstract: A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an ?-position of Ya0.

Abstract: To provide a curable composition which can easily form an optical film with good fluorescence efficiency and includes quantum dots (B), a film made of a cured product of the curable composition, an optical film for a light-emitting display element made of the film, a light-emitting display element panel including the optical film, and a light-emitting display equipped with the light-emitting display element panel. A film is formed by curing a curable composition which includes an epoxy compound (A) having two or more epoxy groups and including a cyclic structure other than an oxirane ring, quantum dots (B), and an acid generator (C).

Abstract: A curable composition which is capable of forming a cured product having satisfactory heat resistance and adhesion to a base material, and has satisfactory curability, a cured film obtained from a cured product of the curable composition, a display panel or an OLED light provided with the cured film, and a method for producing a cured product using the curable composition. The composition includes a curable compound and a cationic polymerization initiator, and contains a cationic polymerizable compound having, as the main skeleton, a fused ring in which three or more rings including an aromatic ring are fused, and a salt including a gallium-containing anion as the cationic polymerization initiator.

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).

Abstract: A resin composition resulting in a cured article which is excellent in balance among mechanical strength, surface smoothness, and light transmittance, a method for producing a cured article, a cured article, and a flexible substrate or flexible display including the cured article. The resin composition includes a polyamic acid having a structural unit represented by the following formula (1), a cellulose compound having a weight average molecular weight of 60,000 or less, and an organic solvent. In the formula (1), A is a tetravalent organic group and B is a divalent organic group.

Abstract: In a method of manufacturing an integrated circuit device, a photoresist layer is formed by coating a photoresist composition on a substrate having a main surface and an edge portion surrounding the main surface. A portion of the photoresist layer is removed from the edge portion of the substrate. After the portion of the photoresist layer is removed, the substrate is processed using a main treatment composition including an organic solvent, acid, and water.

Abstract: A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure.

Abstract: A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.

Abstract: A method of producing a cell culture chip, in which a first adhesive is film-formed on a first substrate having transparency such that a first adhesive layer and a recessed portion on which one or more cell culture flow paths are formed face each other, and a second adhesive is film-formed on the first substrate such that a second adhesive layer and a flat portion around the recessed portion face each other, thereby obtaining a cell culture flow path substrate, the first adhesive containing a polyester-based resin having a glass transition temperature of 5° C. or higher, and the second adhesive containing a polyester-based resin having a glass transition temperature of lower than 5° C.

Abstract: [Problems] To easily and efficiently manufacture a catalyst layer having high catalytic activity and to easily manufacture a fuel cell having high power generation efficiency. [Solution] An apparatus for forming a catalyst layer 3 for a fuel cell on an electrolyte film (application object) 2, the apparatus including: a holding portion 6 that holds a sheet-shaped electrolyte film 2, an application portion 7 that applies a catalyst ink 5 for forming the catalyst layer 3 on at least one side of the electrolyte film 2 held by the holding portion 6, a chamber portion 8 that is capable of forming a space 55 including the holding portion 6, and a suction portion 9 that depressurizes the inside of the space 55 formed by the chamber portion 8 so as to dry the catalyst ink 5.