Abstract: A flush toilet includes: a toilet main unit having a bowl portion, and a water conduit formed in the toilet main unit and configured to supply flush water into the bowl portion. The water conduit has: a first water-guiding portion extending from a water supply portion to a first spout port located on one of right and left sides of the bowl portion; and a second water-guiding portion extending from the water supply portion to a second spout port located on the other of the right and left sides of the bowl portion. The water supply portion is located at a right-sided or left-sided position in a right and left direction. The flush water is supplied to the water supply portion in a direction inclined with respect to a front and back direction and intersected with an inside surface of the water supply portion, as seen in plan view.

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing an object to be processed and a second major surface on an opposite side of the first major surface, and a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate. The base plate includes a first communicating passage passing a medium which adjusts a temperature of the object to be processed. The first communicating passage has an upper surface, a side surface, and a lower surface. A ratio of variation of a maximum height Sz in the upper surface to a height of the first communicating passage is not more than 1%.

Abstract: According to one embodiment, a sanitary washing apparatus includes a private part washing nozzle configured to wash a human body private part, a tube configured to supply water to the private part washing nozzle, an incoming water connection part connected to an upstream side of the tube and configured to supply water to the tube, a casing storing the private part washing nozzle, the tube, and the incoming water connection part, and a nozzle wash part configured to wash the private part washing nozzle. The private part washing nozzle is curved upward to be convex, and has a first region positioned frontward of the nozzle wash part in an advanced state in which the private part washing nozzle advances from the casing. The incoming water connection part is provided under the private part washing nozzle, and is rotatable.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has first and second major surfaces. The first electrode layer is provided inside the ceramic dielectric substrate. The first electrode layer is connected to a high frequency power supply. The first electrode layer has a first surface at the first major surface side and a second surface at a side opposite to the first surface. The first electrode layer includes a first portion including the first surface. The first electrode layer includes a ceramic component and a metal component. A concentration of the metal component in the first portion is higher than an average concentration of the metal component in the first electrode layer.

Abstract: The hydraulic generator includes a first structure; a second structure, such that a water passageway from the inflow port to the outflow port is formed by the first structure and the second structure in a state that the second structure is attached to the first structure; a water turbine; and an electrical generator. The second structure is removable from the first structure, and includes a fixing portion fixing the fixed shaft.

Abstract: According to the embodiment, a sanitary washing device is provided on a toilet including a bowl. The sanitary washing device includes a casing, a nozzle, a shielding plate, and a controller. The nozzle washes a human body private part. The nozzle is advanceable and retractable between a storage position and an advanced position. The shielding plate is provided rotatably with respect to the casing and positioned frontward of the nozzle when the nozzle is at the storage position. The controller controls an operation of the nozzle. The nozzle has a first spout hole squirting water. The shielding plate is at a first position when the nozzle is at the advanced position. The controller performs a frontward washing operation of squirting water before using the sanitary washing device. A part of the shielding plate is positioned frontward of a front end part of the nozzle in the frontward washing operation.

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface of the ceramic dielectric substrate and being opposite to the gas introduction path. The first porous part includes a first region positioned on the ceramic dielectric substrate side. The ceramic dielectric substrate includes a first substrate region positioned on the first region side. The first region and the first substrate region are provided in contact with each other, and an average particle diameter in the first region is different from an average particle diameter in the first substrate region.

Abstract: According to one embodiment, a sanitary washing apparatus includes a private part washing nozzle configured to wash a human body private part, a tube configured to supply water to the private part washing nozzle, an incoming water connection part connected to an upstream side of the tube and configured to supply water to the tube, a casing storing the private part washing nozzle, the tube, and the incoming water connection part, and a nozzle wash part configured to wash the private part washing nozzle. The private part washing nozzle is curved upward to be convex, and has a first region positioned frontward of the nozzle wash part in an advanced state in which the private part washing nozzle advances from the casing. The incoming water connection part is provided under the private part washing nozzle, and is rotatable.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.

Abstract: A flush water tank apparatus supplying flush water to a flush toilet by using electrical power generated in the flush water tank apparatus, and a flush toilet apparatus including the flush water tank apparatus are provided. The flush water tank apparatus includes a discharge valve hydraulic drive portion, a discharge control device, an electromagnetic valve, a branching portion causing supplied tap water to flow into the discharge control device and into the water supply valve respectively, and a generator generating electrical power to operate the electromagnetic valve. The generator is provided on a water conduit in a downstream side of the branching portion, and on the water conduit in an upstream side of the water supply valve or in a downstream side of the water supply valve.

Abstract: A flush water tank apparatus capable of opening and closing a discharge valve without the use of an external power source. A flush water tank apparatus includes a reservoir tank having a discharge opening; a discharge valve which opens and closes to supply and shut off the supply of flush water to the flush toilet; a discharge valve hydraulic drive portion, which uses the supply pressure of supplied municipal water to drive the discharge valve; an electric generator for generating electrical power using the flow of supplied municipal water; an electromagnetic valve operated by electrical power generated by the generator; and a water supply control device for controlling the supply of water to the discharge valve hydraulic drive portion based on the operation of the electromagnetic valve, and for controlling the supply of water to the reservoir tank.

Abstract: A sanitary washing device includes a nozzle, a drive device, a casing, a nozzle lid, and an illuminator. The casing includes a nozzle container. The nozzle lid is provided to be openable and closable with respect to an opening provided at a front end of the nozzle container. The nozzle lid is in a closed state in which the opening is closed when the entirety of the nozzle is stored in the nozzle container. The illuminator irradiates sterilizing light into an interior of the nozzle container. The sterilizing light has a sterilizing effect. At least one of the nozzle lid or a vicinity of the nozzle lid is luminous in a state of being visible to the user when the nozzle lid is in the closed state and the sterilizing light from the illuminator is irradiated into the interior of the nozzle container.

Abstract: According to one embodiment, a sanitary washing device for washing human private parts includes a nozzle configured to jet water toward the human private parts, and a protective electronic circuit configured to prohibit operation of at least part of the sanitary washing device when a component of the sanitary washing device fails. The protective electronic circuit includes a failure diagnosis part configured to diagnose a failure of a component of the protective electronic circuit. At least part of the operation related to the jetting in the sanitary washing device is prohibited when a failure of the component of the sanitary washing device is sensed by diagnosis using the failure diagnosis part.

Abstract: A toilet seat includes a bottom plate including a first main part including a first opening, a pair of first hinge parts provided on both side ends of a first back end portion of the first main part, a top plate provided on the bottom plate, the top plate including a second main part including a second opening opposing the first opening and a pair of second hinge parts provided on both side ends of a second back end portion of the second main part, a first bonding member bonding an outer perimeter side of the bottom plate and the top plate, and a second bonding member bonding an inner perimeter side of the bottom plate and the top plate.

Abstract: According to one embodiment, a toilet lid device includes a casing, a toilet seat and a toilet lid rotatably supported with respect to the casing, and a first support portion and a second support portion rotatably supporting the toilet lid with respect to the casing. The casing is provided between left and right side surfaces of the casing. The casing includes first and second grooves. The first and second grooves are not exposed on the left and right side surfaces. The toilet lid includes first and second hinge portions. The first hinge portion is connected to the first support portion in the first groove, and the second hinge portion is connected to the second support portion in the second groove. Each of the left and right side surfaces of the casing does not include a step backward a rear end of the toilet seat.