Abstract: A structural member 10 has a base material 100 and a protective film 200 covering the surface S1 of the base material 100. When a section obtained by cutting the base material 100 perpendicularly to the surface S1 thereof is defined as a cross-section, a shape of a line corresponding to the surface S1 of the base material 100 in the cross-section is defined as a surface shape, and Fourier transformation is performed on a function representing the surface shape, and the transformed function is drawn as a graph with wavelength (?m) on a horizontal axis, an average slope of the graph in a range where the wavelength is 30 ?m or less is 0.0050 or less.

Abstract: A structural member 10 includes a base material 100 and a protective film 200 formed by depositing a material while applying an impact force to a surface 110 of the base material 100. Provided that an index indicating a degree of a local denseness of the protective film 200 is defined as a denseness index, the value of the denseness index at a first portion that is a portion of the protective film 200 including an outer surface 210 thereof is 50% or more of the value of the denseness index at a second portion that is a portion of the protective film 200 closer to a base material 100 side thereof than the first portion.

Abstract: An electrostatic chuck includes: a dielectric substrate on which at least one first gas hole is formed; a base plate on which at least one second gas hole is formed; and a joining layer which is provided between the dielectric substrate and the base plate and which is formed of an insulating material. A first opening being an end of the at least one first gas hole is formed on a surface of the dielectric substrate. A second opening being an end of the at least one second gas hole is formed at a position which differs from the at least one first opening on a surface of the base plate. A communication groove is formed on the surface of the base plate.

Abstract: A toilet device includes a toilet unit including a toilet seat, a biological information measuring part configured to measure biological information of a user, a wireless communication part configured to wirelessly communicate with a personal digital assistant of the user, and a controller configured to transmit the biological information to the personal digital assistant of the user; the controller is configured to provide the transmission suspension period between a start of the user using the toilet unit and a transmission of the biological information; and the controller is configured to set the transmission period when transmitting the biological information.

Abstract: A toilet device includes a casing and a deodorizing unit provided inside the casing and configured to deodorize air in a toilet room. The deodorizing unit includes a duct and a fan configured to suction air into the duct. The duct includes a first extending portion extending from the casing, a second extending portion extending from the casing at a position different from a position of the first extending portion, and a connection portion connecting the first extending portion and the second extending portion. The first extending portion, the second extending portion, and the connection portion are integrally formed with the casing.

Abstract: An electrostatic chuck 10 includes a dielectric substrate 100 including a surface 110 as a mounting surface, a heater 140 provided inside the dielectric substrate 100, and an attraction electrode 130 provided inside the dielectric substrate 100 at a position closer to the surface 110 side than the heater 140. Both the heater 140 and the attraction electrode 130 are configured such that a plurality of ceramic particles CP are disposed inside a conductor. The heater 140 is thicker than the attraction electrode 130. In the electrostatic chuck 10, an average particle diameter of the ceramic particles CP disposed inside the heater 140 is 50% or more and 150% or less of an average particle diameter of the ceramic particles CP disposed inside the attraction electrode 130.

Abstract: An electrostatic chuck that can reduce fluctuation in an in-plane temperature distribution of a wafer is provided. An electrostatic chuck 10 includes a dielectric substrate 100 on which a plurality of gas holes 140 are formed, a base plate 200 supporting the dielectric substrate 100, and a joining layer 300 joining the dielectric substrate 100 with the base plate 200. The joining layer 300 includes a first joining layer 310, and a second joining layer 320 surrounding the first joining layer 310 in an annular shape on an outer peripheral side. A thermal conductivity of the second joining layer 320 is higher than a thermal conductivity of the first joining layer 310.

Abstract: An electrostatic chuck includes a dielectric substrate including a first part which includes a surface as a placement surface, and a second part protruding from an outer peripheral end of the first part further toward an outer peripheral side and being thinner than the first part. A base plate joined to the dielectric substrate. A joining layer joins the dielectric substrate with the base plate. The joining layer includes a first joining layer, and a second joining layer surrounding the first joining layer in an annular shape on an outer peripheral side. A thermal conductivity of the second joining layer is higher than a thermal conductivity of the first joining layer. In the electrostatic chuck, an end part on an inner peripheral side of the second joining layer is located at a position not overlapping with the first part in top view.

Abstract: An electrostatic chuck that can reduce a fluctuation in an in-plane temperature distribution of a wafer is provided. An electrostatic chuck 10 includes a dielectric substrate 100 on which a plurality of gas holes 140 are formed, a base plate 200 supporting the dielectric substrate 100, and a joining layer 300 joining the dielectric substrate 100 with the base plate 200. The joining layer 300 includes a first joining layer 310, and a second joining layer 320 surrounding the first joining layer 310 in an annular shape on an outer peripheral side. A thermal conductivity of the second joining layer 320 is higher than a thermal conductivity of the first joining layer 310.

Abstract: A structural member having sufficient durability against plasma is provided. The structural member 10 includes a base material 100 and a protective film 200 covering the surface 110 of the base material 100. The protective film 200 includes ytterbium oxide as a main component. In a diffraction pattern provided by analyzing the protective film 200 using X-ray diffraction, when the maximum intensity of the peak attributed to the (401) plane of a monoclinic crystal structure is defined as PM, and the maximum intensity of the peak attributed to the (222) plane of a cubic crystal structure is defined as PC, the structural member 10 satisfies PM/PC >0.38.

Abstract: A structural member having sufficient durability against plasma is provided. The structural member 10 includes a base material 100 and a protective film 200 covering the surface 110 of the base material 100. The protective film 200 includes a crystal including ytterbium oxide as a main component and the crystal has a lattice constant of 10.530×10?10 m or more.

Abstract: A structural member having sufficient durability against plasma is provided. The structural member 10 includes a base material 100 and a protective film 200 covering the surface 110 of the base material 100. The protective film 200 includes ytterbium oxide as a main component and has an indentation hardness of greater than 8.6 GPa.

Abstract: Provided is a flush toilet device in which flushing can be effectively performed with small amount of flush water by accurately setting opening times for individual drain valves. A flush toilet device (1) of the present invention includes a flush toilet main body (2), a flush water tank (4), a first drain valve (10) configured to control flush water from a rim spout port (2d) by opening and closing a first drain port (4b) provided in the flush water tank, a second drain valve (12) configured to control flush water from a jet spout port (2e) by opening and closing a second drain port (4c) provided in the flush water tank, and a hydraulic drive mechanism (16) configured to open the first or second drain valve by using water supply pressure of flush water supplied from a tap water supply line to the flush water tank.

Abstract: A siphon jet-type flush toilet apparatus includes a bowl, a drain trap conduit, a jet water spout port, a pressure pump, a line sensor that detects an object fallen into the bowl, and a control unit that determines whether the object is solid waste or floating waste. The control unit controls the pressure pump such that first jet water ejection is performed through the jet water spout port at a first flow rate for inducing siphonage and such that second jet water ejection is subsequently performed through the jet water spout port at a second flow rate lower than the first flow rate. The control unit controls the pressure pump such that the duration of the first jet water ejection is shorter when the object is determined to be floating waste than when the object is determined to be solid waste.

Abstract: A flush toilet is a siphon jet flush toilet that includes a bowl, a discharge trap conduit that includes an ascending conduit extending upward, a jet spout port configured to spout flush water toward an inlet of the discharge trap conduit, and a jet water conduit configured to guide flush water to the jet spout port, in which in a flow channel cross-section of the ascending conduit of the discharge trap conduit, a narrowed portion that narrows a flow channel in which the flush water flows is provided in an upper-side flow channel located above a center line of the discharge trap conduit in an up-down direction, and a flow channel cross-sectional area of the upper-side flow channel is smaller than a flow channel cross-sectional area of a lower-side flow channel located below the center line.

Abstract: A structural member 10 includes a substrate 100 and a passivation film 200 covering the surface 110 of the substrate 100. The passivation film 200 includes yttria as a main component, and the full width at half maximum of the peak at a wavenumber of approximately 370 cm?1 in the Raman spectrum of the passivation film 200 obtained by Raman spectroscopy is 23 cm?1 or more.

Abstract: A wall-mounted flush toilet includes a toilet main body fixed to a wall; and an illuminating device attached to the toilet main body, the illuminating device being configured to emit light to a floor surface, wherein the toilet main body includes a bowl, a discharge trap having an inlet connected below the bowl to discharge waste in the bowl, a skirt configured to cover sides of each of the bowl and the discharge trap, and a rear wall part formed behind the skirt and fixed to the wall, the toilet main body being disposed above a floor surface, and the illuminating device is provided within an internal space provided behind the lowermost end of the discharge trap and above a lower end of the skirt.

Abstract: A toilet system includes: a toilet seat; a sensor configured to measure a physical quantity which reflects blood flow conditions of a user; a health index calculator configured to calculate a plurality of health indices based on measurement results of the sensor; a health index output part configured to output the plurality of health indices which has been calculated; a timer configured to measure a seating time; and a controller configured to control an output manner of the health index output part based on measurement results of the timer. When the seating time is not shorter than a first required time but shorter than a second required time, the first health index is outputted, but the second health index is stopped to be outputted. When the seating time is not shorter than the second required time, both the first health index and the second health index are outputted.

Abstract: A wall-mounted flush toilet includes a ceramic toilet main body including a bowl configured to receive waste and a discharge trap having an inlet connected to a lower part of the bowl and configured to discharge waste from within the bowl, the ceramic toilet main body further includes a skirt that covers outer shells of the bowl and the discharge trap from sides of the outer shells and a rear end formed rearward of the skirt and configured to be fixed to a wall, and the rear end includes a firing pedestal that functions as a pedestal grounded during a firing process in a ceramic molding process.