Abstract: A flush toilet of the present invention includes: a bowl including a waste receiving surface, a rim and a shelf surface formed between the waste receiving surface and the rim, the shelf surface of the bowl including linear portions provided on a right side and a left side, a front arc portion connected to front ends of the linear portions, and a rear arc portion connected to rear ends of the linear portions; a rim spout portion spouting flush water from a rim spout port to the shelf surface to form a circulating flow; and the like. Flush water is spouted backward from the rim spout port along the linear portions of the shelf surface; and the shelf surface located on an upstream side of the rim spout port has a sloped surface ascending toward the rim spout port.

Abstract: Provided are a flush water tank apparatus capable of restraining instability of an operation of a piston and restraining fluctuations in a water pressure of flush water discharged from a first discharge part provided separately from an inlet, and a flush toilet apparatus including the flush water tank apparatus. A discharge valve hydraulic drive portion of a flush water tank apparatus of the present invention includes a cylinder, a piston, and a rod extending from the piston through a through-hole portion formed in the cylinder, the cylinder including an inlet into which flush water flows, a first discharge part that is provided separately from the inlet to drain the flush water, and a second discharge part that is provided separately from the first discharge part and is formed between the rod and the through-hole portion and between the piston and the through-hole portion.

Abstract: There are provided a flush water tank apparatus capable of reducing a pressure of flush water in a pressure chamber easily, and a flush toilet apparatus provided with the same. A discharge valve hydraulic drive portion of a flush water tank apparatus includes a cylinder in which supplied the flush water flows, a piston that is slidably disposed in the cylinder, partitions inside of the cylinder into a pressure chamber and a back pressure chamber, and further is moved from a first position to a second position by a pressure of the flush water that has flowed into the pressure chamber, an outflow portion from which the flush water in the cylinder flows out, and a communication mechanism that establishes communication between the pressure chamber and the outflow portion after the clutch mechanism is disengaged.

Abstract: A flush toilet includes a toilet main body and a tank device that supplies flush water to the toilet main body, where the tank device includes a storage tank provided behind the toilet main body and above a floor surface, and a water supply device that supplies the flush water to the storage tank, a capacity of an upper part located at a position higher than a middle height position that equally divides the storage tank into two in an up-down direction is greater than a capacity of a lower part located at a position lower than the middle height position, and the storage tank includes a plurality of upper surfaces with height differences, and a water passage port is provided in a manner penetrating a highest surface among the upper surfaces to allow the flush water supplied from the water supply device to flow into the storage tank.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second porous parts. The ceramic dielectric substrate includes first and second major surfaces. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided in the ceramic dielectric substrate and is opposite to the gas feed channel. The second porous part is provided in the base plate and is opposite to the gas feed channel. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. The first porous part includes a first porous region including pores and a first dense region. The second porous part includes a second porous region including pores and a second dense region.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric, a base plate, a first electrode layer, and a second electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided between the first major surface and the second major surface. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer has a first surface and a second surface. A distance between the first surface and the first major surface is constant. A distance between the second surface and the first surface at an end portion of the first electrode layer is shorter than a distance between the second surface and the first surface at a central portion of the first electrode layer.

Abstract: An electrostatic chuck includes: an electrically-conductive base plate including a first part, a second part at an outer circumference of the first part, and a gas inlet path for introducing a cooling gas; a first electrostatic chuck part configured to clamp a wafer on the first part, including a ceramic dielectric substrate that includes an embedded first clamping electrode and at least one through-hole communicating with the gas inlet path; and a second electrostatic chuck part configured to clamp a focus ring on the second part, including a ceramic layer that includes at least one through-hole for introducing a cooling gas and that includes at least a first layer contacting the focus ring when the second electrostatic chuck part clamps the focus ring, in which the first layer is less dense than the ceramic dielectric substrate. Thereby, the electrostatic chuck can increase the device yield.

Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole connected to at least one of multiple first grooves. The first grooves include a first boundary groove, and at least one first in-region groove. Multiple second grooves and at least one second gas introduction hole are provided in the second region. The second grooves are include a second boundary groove extending along the first boundary and are provided to be most proximal to the first boundary. A groove end portion-end portion distance between the first boundary groove and the second boundary groove is smaller than a groove end portion-end portion distance between the first boundary groove and the first in-region groove.

Abstract: A flush toilet according to an embodiment includes a bowl part, a rim part, a water spout port, and a water storage part. The bowl part receives waste. The rim part is formed on a top of the bowl part. The water spout port spouts a washing water. The water storage part is formed on a bottom of the bowl part. A first region that is connected to a discharge channel and a second region that is located on a front side of the first region are formed in the water storage part. A main stream of the washing water that is spouted from the water spout port along the rim part swirls on the bowl part and flows into the first region.

Abstract: An electrostatic chuck includes: an electrically-conductive base plate including a first part, a second part at an outer circumference of the first part, and a gas inlet path for introducing a cooling gas; a first electrostatic chuck part configured to clamp a wafer on the first part, including a ceramic dielectric substrate that includes an embedded first clamping electrode and at least one through-hole communicating with the gas inlet path; and a second electrostatic chuck part configured to clamp a focus ring on the second part, including a ceramic layer that includes at least one through-hole for introducing a cooling gas and that includes at least a first layer contacting the focus ring when the second electrostatic chuck part clamps the focus ring, in which the first layer is less dense than the ceramic dielectric substrate. Thereby, the electrostatic chuck can increase the device yield.

Abstract: There are provided a flush water tank apparatus capable of accurately setting the amount of flush water to be discharged while opening a discharge valve by a discharge valve hydraulic drive unit. A flush water tank apparatus includes a valve controller, where, in a case where a first amount of flush water is selected, the valve controller causes the timing control mechanism to be engaged with the discharge valve and causes the timing control mechanism to operate such that engagement is released after a lapse of a first period of time, and in a case where a second amount of flush water is selected, the valve controller causes the timing control mechanism to be engaged with the discharge valve and causes the timing control mechanism to operate such that engagement is released after lapse of a second period of time shorter than the first period of time.

Abstract: The present invention is a flush water tank apparatus (4) and includes: a storage tank (10) on which a drain port (10a) is formed, a discharge valve (12) opening/closing the drain port; a discharge valve hydraulic drive unit (14) driving the discharge valve using water supply pressure; a clutch mechanism (30) coupling the discharge valve and the discharge valve hydraulic drive unit to pull up the discharge valve; flush water amount selection device capable of selecting between a first and a second amount of flush water; a timing control mechanism controlling a timing of the drain port being blocked; and a control jet unit (20) jetting, when the second amount is selected, flush water to a water receiving surface provided on the timing control mechanism so that a timing of the drain port being blocked is earlier than a case of the first amount of flush water.

Abstract: A flush water tank apparatus enabling accurately setting an amount of flush water to be discharged while opening a discharge valve via a discharge valve hydraulic drive unit and a flush toilet apparatus including the flush water tank are provided. A flush water tank apparatus includes a first float device; a second float device that prevents from descent of the discharge valve according to the water level so as to discharge a second amount of flush water; and an adjustment mechanism configured so that when the second amount of flush water is selected by the flush water amount selection portion the clutch mechanism is disconnected at a pull-up height of the discharge valve such that the discharge valve descended by the disconnection of the clutch mechanism is held by the second float device in a holding state.

Abstract: A flush toilet according to the embodiment includes a main water guide channel, a downstream-side water guide channel, and a convex part. Through the main water guide channel, flush water supplied from a water supply source flows. The downstream-side water guide channel on a downstream side of the main water guide channel spouts the flush water from a water spout port of the downstream-side water guide channel. The convex part is formed in the downstream-side water guide channel. The convex part includes a first guide part that guides upward the flush water flowing through the downstream-side water guide channel, and a second guide part on a downstream side of the first guide part which guides downward the flush water.

Abstract: A flush toilet includes a toilet main body and a tank device, and the tank device includes a storage tank and a tank mounting member to which the storage tank is detachably attached. At a time of attachment of the storage tank to the tank mounting member, an attaching portion of the storage tank is engaged with an attachment-receiving portion of the tank mounting member by the storage tank being lowered onto a base of the tank mounting member from above. Then, when the storage tank is moved in a horizontal direction relative to the tank mounting member, the attaching portion of the storage tank is configured to be fixed to the attachment-receiving portion of the tank mounting member.

Abstract: A flush toilet includes a bowl part and a water storage part. The bowl part receives waste. The water storage part is formed on a bottom of the bowl part and stores a stored water. The water storage part includes a front surface part, a back surface part that is formed on a back side of the front surface part, and a pair of side surface parts that are formed between the front surface part and the back surface part. On at least one side surface part in the pair of side surface parts, a convex surface that protrudes toward another side surface part is formed.

Abstract: The flush water tank apparatus of the present invention includes: a clutch mechanism 30 coupling the discharge valve 12 and the discharge valve hydraulic drive unit 14 to pull up the discharge valve, and being disconnected at a predetermined timing to cause the discharge valve to descend; flush water amount selection device capable of selecting from a first and a second amounts of flush water; a float device 26 including a float and a holding mechanism switchable between a holding and a non-holding states in conjunction with movement of the float; and a timing control mechanism controlling a timing of a drain port 10a being blocked; and, when the second amount is selected, causes the second amount of flush water to be discharged by switching the holding mechanism to the non-holding state before a water level in a storage tank drops to a predetermined water level.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided inside the ceramic dielectric substrate and connected to a high frequency power supply. The first electrode layer is provided between the first major surface and the second major surface. The first electrode layer has a first surface and a second surface. The first electrode layer includes a first region including the first surface, a second region including the second surface, and a third region positioned between the first region and the second region. A porosity of the first region is lower than a porosity of the third region.