Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided inside the ceramic dielectric substrate and connected to a high frequency power supply. The first electrode layer is provided between the first major surface and the second major surface. The first electrode layer has a first surface and a second surface. A surface roughness of the second surface is larger than a surface roughness of the first surface.

Abstract: A flush toilet according to an embodiment includes a bowl part, a rim part, a water spout port, and a water storage part. The bowl part receives waste. The rim part is formed on a top of the bowl part. The water spout port spouts a washing water from one side of the bowl part in leftward and rightward directions. The water storage part is formed on a bottom of the bowl part. The bowl part includes a guide part that causes the washing water to swirl from the one side to another side that is opposite to the one side and causes the washing water that swirls to the another side to flow into a back side of the water storage part.

Abstract: There is provided a bathtub, including: a bottom surface part; a side surface part surrounding the bottom surface part, extending upward from the bottom surface part, and including a backrest part; a pillow part provided to be movable vertically over a prescribed range along the backrest part; and a water discharger mounted to the pillow part, the water discharger being provided to be movable vertically along the backrest part with the pillow part.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the base plate and the first major surface. The ceramic dielectric substrate includes a first hole part. The first porous part includes a porous section, and a first compact section being more compact than the porous section. As projected on a plane perpendicular to a first direction from the base plate to the ceramic dielectric substrate, the first compact section is configured to overlap the first hole part, and the porous section is configured not to overlap the first hole part.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the third surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the fourth surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: According to one embodiment, a member for a semiconductor manufacturing device includes an alumite base material including a concavity, and a first layer formed on the alumite base material and including an yttrium compound. The first layer includes a first region, and a second region provided in the concavity and located between the first region and the alumite base material. An average particle diameter in the first region is shorter than an average particle diameter in the second region.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate includes first and second major surfaces, and at least one groove. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the groove and the gas feed channel. The ceramic dielectric substrate includes holes communicating with the groove and the gas feed channel and piercing the ceramic dielectric substrate in a first direction from the base plate toward the ceramic dielectric substrate. The first porous part includes at least one porous region including pores, and at least one dense region denser than the porous region. The porous region further includes at least one dense part.

Abstract: A flush toilet according to an embodiment includes a bowl part, a rim part, and a water spout port. The bowl part receives waste. The rim part is formed on a top of the bowl part. The water spout port spouts a washing water along the rim part. A height of a bottom surface wall that forms a passing water channel where the washing water flows along the rim part increases from an end part on a side of the water spout port toward a front end of the bowl part.

Abstract: There are provided a flush water tank apparatus capable of reducing a pressure of flush water in a pressure chamber easily, and a flush toilet apparatus provided with the same. A discharge valve hydraulic drive portion of a flush water tank apparatus includes a cylinder in which supplied the flush water flows, a piston that is slidably disposed in the cylinder, partitions inside of the cylinder into a pressure chamber and a back pressure chamber, and further is moved from a first position to a second position by a pressure of the flush water that has flowed into the pressure chamber, an outflow portion from which the flush water in the cylinder flows out, and a communication mechanism that establishes communication between the pressure chamber and the outflow portion after the clutch mechanism is disengaged.

Abstract: There is provided a flush water tank apparatus capable of returning to a state where next toilet flush operation can be started in a short time while opening a discharge valve using a water supply pressure. A flush water tank apparatus (4) includes a reservoir tank (10), a discharge valve (12), a discharge valve hydraulic drive portion (14) configured to drive the discharge valve using a water supply pressure, and a discharge/vacuum break valve device (30) provided on an upstream side of the discharge valve hydraulic drive portion and configured to supply the water supplied from the upstream side to the discharge valve hydraulic drive portion on a downstream side. The discharge valve hydraulic drive portion includes a cylinder (14a) into which the water from the discharge/vacuum break valve device flows, and a piston (14b) configured to be moved by a pressure of the water flowing into the cylinder to move the discharge valve.

Abstract: Problem: To provide a spout apparatus in which sagging of the mesh structure portion in the flow-conditioning member due to water pressure can be suppressed even if the flow-conditioning member is formed by a fine diameter mesh structure, and the flow-conditioning member can be compactly constituted and flow velocity distribution made uniform. Solution Means: The embodiment of the invention is a spout apparatus 2, including a spout apparatus main unit 6, a flow-conditioning member 12, and a spray member 16; wherein the flow-conditioning member 12 is formed by a mesh structure in which numerous fine holes are formed, and the mesh structure is layered and formed three dimensionally, such that the mesh structure portion of at least a portion of the mesh structure extends in a direction parallel to the direction of water flowing into the flow-conditioning member.

Abstract: A flush toilet according to an embodiment includes a bowl part, a rim part, and a water spout port. The bowl part receives waste. The rim part is formed on a top of the bowl part. The water spout port spouts a washing water along the rim part. A height of a bottom surface wall that forms a passing water channel where the washing water flows along the rim part increases from an end part on a side of the water spout port toward a front end of the bowl part.

Abstract: A water area apparatus according to one aspect of embodiments includes: a first device; a second device whose power consumption is smaller than that of the first device; a Power Factor Correction (PFC) circuit that is connected to an Alternating-Current power supply, reduces harmonic current, and steps up a voltage to output the stepped-up voltage; and a regulator that is connected to the PFC circuit and steps down a voltage to obtain a constant voltage, wherein the voltage stepped up by the PFC circuit is applied to the first device, and the voltage stepped down by the regulator is applied to the second device.

Abstract: A sanitary washing device according to an embodiment comprises a heating part, a nozzle configured to jet water heated by the heating part toward human private parts; a controlling part configured to control at least one of the heating part and the nozzle, and a monitoring part. The monitoring part is configured to diagnose a failure of the controlling part and to prohibit at least one of heating in the heating part and jetting from the nozzle when the controlling part fails. The controlling part is configured to diagnose a failure of the monitoring part and to prohibit at least one of heating in the heating part and jetting from the nozzle when the monitoring part fails.

Abstract: A sanitary washing device includes a nozzle, a valve unit, a casing, and a toilet seat. The nozzle is configured to discharge water toward an ano-genital region of a human body. The valve unit is provided on a pipe line between a water supply source and the nozzle, and includes an electromagnetic valve. The casing stores the nozzle and the valve unit. The casing includes a low portion positioned below the toilet, and a high portion positioned backward of the low portion. A length in a vertical direction of the high portion is greater than a length in the vertical direction of the low portion. The valve unit is disposed in the low portion. A length in the vertical direction of the valve unit is less than a length in a longitudinal direction, and less than a length in a lateral direction.

Abstract: A sanitary washing device includes a nozzle, a valve unit, a casing, a water supply hose, and a water supply connection part. The nozzle is configured to discharge water toward an ano-genital region. The valve unit is provided on a pipe line between a water supply source and the nozzle. The casing stores the nozzle and the valve unit. The water supply hose is flexible and configured to supply water from the water supply source into the casing. The water supply connection part connects the water supply hose and the valve unit. The water supply connection part is open in a horizontal direction. The water supply hose is directly connected to the water supply connection part in a horizontal direction. The casing includes a hose container in which a portion of the water supply hose can be stored by bending.

Abstract: A sanitary washing device includes a nozzle, a valve unit, a casing, and a toilet seat. The nozzle is configured to discharge water toward an ano-genital region of a human body. The valve unit is provided on a pipe line between a water supply source and the nozzle. The valve unit includes an electromagnetic valve. The casing stores the nozzle and the valve unit. The toilet seat is pivotally supported to be rotatable with respect to the casing. A heater is provided inside the toilet seat. At least a portion of the valve unit is disposed below the toilet seat.

Abstract: The flush toilet of the present invention includes a bowl which receives waste; and a discharge trap conduit which is connected to a lower portion of the bowl and extends to a discharge opening connected to an inlet of an external discharge pipe and a part of which stores sealing water. The discharge trap conduit includes: an ascending conduit which ascends rearward from the lower portion of the bowl; and a descending conduit that descends from a downstream end of the ascending conduit to the discharge opening. The descending conduit includes a bottom surface on the rear side of the discharge opening and a guiding portion formed on the bottom surface which guides the wastewater flowing horizontally from the bottom surface toward the discharge opening to be directed to either a left or right side of the center of the discharge opening.