Patents Assigned to ULVAC, Inc.
  • Patent number: 12217969
    Abstract: A silicon dry etching method of the invention, includes: preparing a silicon substrate; forming a mask pattern having an opening on the silicon substrate; forming a deposition layer on the silicon substrate in accordance with the mask pattern while introducing a first gas; carrying out a dry etching process with respect to the silicon substrate in accordance with the mask pattern while introducing a second gas, and thereby forming a recess pattern on a surface of the silicon substrate; and carrying out an ashing process with respect to the silicon substrate while introducing a third gas.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: February 4, 2025
    Assignee: ULVAC, Inc
    Inventors: Kenta Doi, Toshiyuki Sakuishi, Toshiyuki Nakamura, Yasuhiro Morikawa
  • Patent number: 12205795
    Abstract: A plasma processing device includes an inductively coupled plasma antenna including an input end and an output end, a series circuit including an additional inductor and a variable capacitor connected in series, and a controller that varies a capacitance of the variable capacitor. The input terminal is connected via an antenna matching device to an antenna power supply. The output terminal is connected to the additional inductor. The additional inductor is connected via the variable capacitor to ground.
    Type: Grant
    Filed: May 31, 2022
    Date of Patent: January 21, 2025
    Assignee: ULVAC, INC.
    Inventors: Taichi Suzuki, Yasuhiro Morikawa, Kenta Doi, Toshiyuki Nakamura
  • Patent number: 12169886
    Abstract: A display device of the present invention includes a display controller executing display control processing of controlling an operation of a predetermined display destination to cause the display destination to display a plurality of N-dimensional graphs. The plurality of N-dimensional graphs include a first graph and a second graph. When a predetermined condition related to acquisition of fixed value change information including auxiliary explanatory variable information designating one or more of auxiliary explanatory variables as objects to be changed in value, and information indicating current variable values is satisfied, the display control processing includes processing of updating the first graph and the second graph to be displayed on the display destination to a changed graph due to changing of values of the auxiliary explanatory variables indicated by the auxiliary explanatory variable information to the current variable values indicated by the fixed value change information.
    Type: Grant
    Filed: February 17, 2023
    Date of Patent: December 17, 2024
    Assignee: ULVAC, Inc.
    Inventors: Hironori Chatani, Yuta Hayashi, Toshiya Soyama, Daisuke Kawakubo
  • Publication number: 20240355626
    Abstract: The present invention relates to a low-resistance material film formation method for forming a film on a semiconductor substrate by using physical vapor deposition (PVD), comprising the steps of: a) forming a barrier layer on a SiO2 wafer by using low-temperature magnetron sputtering at a pressure of 1-40 Pa; b) modifying, after formation of the barrier layer, the surface of the barrier layer by applying RF bias in an Ar gas atmosphere without applying DC power; and c) layering a low-resistance material on the barrier layer by using magnetron sputtering, wherein the low-resistance material is at least one selected from the group consisting of tungsten (W), ruthenium (Ru), molybdenum (Mo), cobalt (Co) and rhodium (Rh).
    Type: Application
    Filed: June 8, 2022
    Publication date: October 24, 2024
    Applicant: ULVAC, INC.
    Inventors: Chang Min SHIM, Do Hyun OH, Hang KANG, Byeong Hwa JEONG, Takahiro NAKAYAMA, Tomohiro SAITOU
  • Patent number: 12112929
    Abstract: A cathode unit for a magnetron sputtering apparatus includes a backing plate joined to an upper side opposed to a sputtering surface of a target set in a posture facing an inside of a vacuum chamber and a magnet unit disposed above the backing plate at an interval, a refrigerant passage through which a refrigerant can flow being formed in the backing plate, in which a surface pressure applying unit is provided, the surface pressure applying unit applying, toward an upper outer surface of the backing plate from above the backing plate, a surface pressure equivalent to pressure applied to an upper inner surface of the backing plate when the refrigerant is circulated.
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: October 8, 2024
    Assignee: ULVAC, INC.
    Inventors: Koji Suzuki, Hideto Nagashima, Katsuya Hara, Hideki Mataga
  • Patent number: 12092398
    Abstract: A freeze-drying apparatus includes a freeze-drying chamber in which an object to be dried using water as a solvent is disposed, a collection chamber provided with a cold trap which connects with the freeze-drying chamber to condense and collect water vapor generated from the object to be dried, measuring devices which measure a state quantity of at least one of the object to be dried, an inside of the freeze-drying chamber, and an inside of the collection chamber, and a determining unit which determines a water vapor mass flow rate based on the state quantity measured by each measuring device, in which the determining unit has measurement models performed to observe the water vapor mass flow rate, and while each measuring device measures the state quantity, a set based on which the water vapor mass flow rate is determined with superiority at the time of the determination is selected.
    Type: Grant
    Filed: July 12, 2021
    Date of Patent: September 17, 2024
    Assignee: ULVAC, INC.
    Inventors: Tomomitsu Ozeki, Tsuyoshi Yoshimoto, Yoichi Ohinata
  • Publication number: 20240301545
    Abstract: A vacuum evaporation method includes a vaporization step in which use is made of an evaporation boat including: a boat main body having a containing part of an evaporation material as an evaporation source; and electrode mounting plate parts respectively extending outward at both ends of the boat main body. A wire-shaped evaporation material is fed from above a bottom plate of the boat main body defining the containing part of the evaporation material, in a manner to come into contact with the bottom plate. Electric current is applied across both the electrode mounting plate parts in order to heat the boat main body, thereby evaporating the evaporation material inside the containing part. The vacuum evaporation method further includes a displacement step of continuously or intermittently displacing, while the wire-shaped evaporation material is being fed, a front end part of the wire-shaped evaporation material relative to the boat main body.
    Type: Application
    Filed: February 1, 2024
    Publication date: September 12, 2024
    Applicant: ULVAC, INC.
    Inventors: Takahito Kimoto, Masashi Yasuda, Toshiharu Kurauchi, Shunsuke Sasaki, Yuusuke Ujihara
  • Publication number: 20240304453
    Abstract: The present disclosure provides an etching method that includes a resist pattern-forming step of forming a resist layer on a target object, the resist layer being formed of a resin, the resist layer having a resist pattern; an etching step of etching the target object via the resist layer having the resist pattern; and a resist protective film-forming step of forming a resist protective film on the resist layer. The etching step is repetitively carried out multiple times. A processing gas, used in the resist protective film-forming step, includes a gas capable of forming SixOy?z; wherein a is any one of F, Cl, H, and CkHl; and each of x, y, z, k, is a selected non-zero value. After the etching steps are repetitively carried out multiple times, the resist protective film-forming step is performed.
    Type: Application
    Filed: May 15, 2024
    Publication date: September 12, 2024
    Applicant: ULVAC, INC.
    Inventors: TAICHI SUZUKI, Yasuhiro MORIKAWA, Kenta DOI, Toshiyuki NAKAMURA
  • Publication number: 20240279791
    Abstract: An evaporation source for use in a vacuum evaporation apparatus is provided with: an evaporation boat inclusive of a boat main body with a containing part for an evaporation material, and electrode mounting plate parts respectively extending outward from both ends of the boat main body; and material feeding means for feeding a wire-shaped evaporation material into the containing part from an upper side thereof. By charging electric current across both electrode mounting plate parts, the boat main body is heated to evaporate the evaporation material inside the containing part. A supporting means is disposed in contact, from underneath, with such a bottom plate part of the boat main body as defines the containing part. The supporting means has supporting plates disposed in a state in which upper ends of the supporting plates are in contact, from underneath, with the bottom plate part of the boat main body.
    Type: Application
    Filed: December 12, 2023
    Publication date: August 22, 2024
    Applicant: ULVAC, INC.
    Inventors: Takahito Kimoto, Masashi Yasuda, Toshiharu Kurauchi, Shunsuke Sasaki
  • Publication number: 20240279790
    Abstract: Provided is an evaporation source for use in a vacuum evaporation apparatus, the evaporation source restricting a local overheating and planning prolonged lifetime. The evaporation source includes: a boat main body having a containing part for the evaporation material; rising plate parts each rising upward from both ends as seen in one direction of the boat main body; and electrode mounting plate parts each extending outward from the respective upper ends of the rising plate parts. The boat main body is heated by applying electric power across both the electrode mounting plate parts, thereby causing the evaporation material inside the containing part to be evaporated. At this time, the rising plate parts are provided with dividing passages for the applied electric current.
    Type: Application
    Filed: December 12, 2023
    Publication date: August 22, 2024
    Applicant: ULVAC, INC.
    Inventors: Takahito Kimoto, Masashi Yasuda, Toshiharu Kurauchi, Shunsuke Sasaki
  • Publication number: 20240263876
    Abstract: A freeze-drying apparatus includes a freeze-drying chamber in which an object to be dried using water as a solvent is disposed, a collection chamber provided with a cold trap which connects with the freeze-drying chamber to condense and collect water vapor generated from the object to be dried, measuring devices which measure a state quantity of at least one of the object to be dried, an inside of the freeze-drying chamber, and an inside of the collection chamber, and a determining unit which determines a water vapor mass flow rate based on the state quantity measured by each measuring device, in which the determining unit has measurement models performed to observe the water vapor mass flow rate, and while each measuring device measures the state quantity, a set based on which the water vapor mass flow rate is determined with superiority at the time of the determination is selected.
    Type: Application
    Filed: July 12, 2021
    Publication date: August 8, 2024
    Applicant: ULVAC, INC.
    Inventors: Tomomitsu Ozeki, Tsuyoshi Yoshimoto, Yoichi Ohinata
  • Patent number: 12040153
    Abstract: An ion gun of the invention includes: an anode; a magnetic pole that has an inner surface facing the anode, a slit provided at a position corresponding to the anode, and an inner inclined surface that extends from an end of the inner surface to the slit and that forms a part of the slit; and a cover that covers at least the inner surface and the inner inclined surface, is formed of an electroconductive and non-magnetic material, and is detachable from the magnetic pole.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: July 16, 2024
    Assignee: ULVAC, INC.
    Inventor: Takumi Yuze
  • Patent number: 12020942
    Abstract: An etching method of the invention includes: a resist pattern-forming step of forming a resist layer on a target object, the resist layer being formed of a resin, the resist layer having a resist pattern; an etching step of etching the target object via the resist layer having the resist pattern; and a resist protective film-forming step of forming a resist protective film on the resist layer. The etching step is repetitively carried out multiple times. After the etching steps are repetitively carried out multiple times, the resist protective film-forming step is carried out.
    Type: Grant
    Filed: April 25, 2022
    Date of Patent: June 25, 2024
    Assignee: ULVAC, INC.
    Inventors: Taichi Suzuki, Yasuhiro Morikawa, Kenta Doi, Toshiyuki Nakamura
  • Publication number: 20240202998
    Abstract: A display device of the present invention includes a display controller executing display control processing of controlling an operation of a predetermined display destination to cause the display destination to display a plurality of N-dimensional graphs. The plurality of N-dimensional graphs include a first graph and a second graph. When a predetermined condition related to acquisition of fixed value change information including auxiliary explanatory variable information designating one or more of auxiliary explanatory variables as objects to be changed in value, and information indicating current variable values is satisfied, the display control processing includes processing of updating the first graph and the second graph to be displayed on the display destination to a changed graph due to changing of values of the auxiliary explanatory variables indicated by the auxiliary explanatory variable information to the current variable values indicated by the fixed value change information.
    Type: Application
    Filed: February 17, 2023
    Publication date: June 20, 2024
    Applicant: ULVAC, Inc.
    Inventors: Hironori CHATANI, Yuta HAYASHI, Toshiya SOYAMA, Daisuke KAWAKUBO
  • Patent number: 12012650
    Abstract: [Object] To provide a sputtering target for producing an oxide semiconductor thin film having high properties, which serves as a substitute for IGZO, and a method of producing the same. [Solving Means] In order to achieve the above-mentioned object, a sputtering target according to an embodiment of the present invention includes: an oxide sintered body including indium, tin, and germanium, in which an atom ratio of germanium with respect to a total of indium, tin, and germanium is 0.07 or more and 0.40 or less, and an atom ratio of tin with respect to the total of indium, tin, and germanium is 0.04 or more and 0.60 or less. As a result, it is possible to achieve transistor characteristics of having mobility of 10 cm2/Vs or more.
    Type: Grant
    Filed: April 27, 2020
    Date of Patent: June 18, 2024
    Assignee: ULVAC, INC.
    Inventors: Kentarou Takesue, Masaru Wada, Kouichi Matsumoto, Yuu Kawagoe, Motohide Nishimura
  • Patent number: 12014946
    Abstract: [Object] To provide an electrostatic chuck that stably supports a substrate while suppressing a rapid increase in the volume of a gas, a vacuum processing apparatus, and a substrate processing method. [Solving Means] An electrostatic chuck according to an embodiment of the present invention includes: a chuck plate that has a first surface supporting a substrate and a second surface opposite to the first surface. The chuck plate includes an exhaust passage that exhausts a gas from between the substrate and the first surface, the gas being emitted from the substrate between the substrate and the first surface when the substrate is supported by the first surface.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 18, 2024
    Assignee: ULVAC, INC.
    Inventors: Genji Sakata, Hidekazu Yokoo
  • Patent number: 11972932
    Abstract: [Object] To improve step coverage of a coating film [Solving Means] A deposition apparatus that includes a first electrode, a second electrode, a first power supply source, a second power supply source, and a phase adjuster is used. The first power supply source includes a first high-frequency power source and a first matching circuit, the first high-frequency power source outputting first high-frequency power, the first matching circuit being connected between the first high-frequency power source and the first electrode. The second power supply source includes a second matching circuit that outputs second high-frequency power, the second high-frequency power having the same period as the first high-frequency power and being lower than the first high-frequency power.
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: April 30, 2024
    Assignee: Ulvac, Inc.
    Inventors: Toshihiko Nakahata, Kazuyoshi Hashimoto, Harumasa Yamaguchi
  • Publication number: 20240120233
    Abstract: A vacuum processing apparatus of this invention having a stage on which is disposed the to-be-processed substrate further has a lifting/rotation mechanism capable of lifting the to-be-processed substrate lying on the stage off from an upper surface of the stage to a predetermined height position so that, at this lifted position, the to-be-processed substrate is capable of rotation about a substrate center by a predetermined rotational angle. The lifting/rotation mechanism has: a driving rod built into the stage so as to be moveable up and down and also be rotatable; and a substrate supporting body having a base end plate part capable of contacting a central region, including the substrate center, of the to-be-processed substrate. The substrate supporting body further has at least two arm plate parts elongated from the base end plate part outward thereof.
    Type: Application
    Filed: September 26, 2022
    Publication date: April 11, 2024
    Applicant: ULVAC, INC.
    Inventors: Tetsushi Fujinaga, Yukinobu Numata, Yasuo Ookubo, Daiki Shimada
  • Patent number: 11935936
    Abstract: [Object] It is an object of the present invention to provide an aluminum alloy film having excellent bending resistance and heat resistance, and a thin film transistor including the aluminum alloy film. [Solving Means] In order to achieve the above-mentioned object, an aluminum alloy film according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. Such an aluminum alloy film has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: March 19, 2024
    Assignee: ULVAC, INC.
    Inventors: Yuusuke Ujihara, Motoshi Kobayashi, Yasuhiko Akamatsu, Tomohiro Nagata, Ryouta Nakamura, Junichi Nitta, Yasuo Nakadai
  • Patent number: 11923178
    Abstract: A vacuum processing apparatus SM of this invention has: a vacuum chamber which performs a predetermined processing on a to-be-processed substrate that is set in position in the vacuum chamber. Inside the vacuum chamber there is disposed a deposition preventive plate) which is made up of a fixed deposition preventive plate and a moveable deposition preventive plate which is moveable in one direction. Further provided are: a metal block body disposed in a vertical posture on an inner wall surface of the vacuum chamber; and a cooling means for cooling the block body. In a processing position in which a predetermined vacuum processing is performed on the to-be-processed substrate, a top surface of the block body is arranged to be in proximity to or in contact with the moveable deposition preventive plate.
    Type: Grant
    Filed: September 12, 2019
    Date of Patent: March 5, 2024
    Assignee: ULVAC, INC.
    Inventors: Koji Suzuki, Hideto Nagashima, Yoshinori Fujii