Patents Assigned to Universiteit van Amsterdam
  • Patent number: 11771028
    Abstract: The present invention relates to a liquid composition comprising living green microalgae for improving plant growth. The liquid composition is prepared by growing green microalgae at a pH of 10-12 in the presence of hydrogen carbonate as the inorganic carbon source. The liquid composition may be stored at 4 to 25 degrees C. until use. The liquid composition may be used to improve fertilizers.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: October 3, 2023
    Assignees: ALGAE INNOVATIONS NETHERLANDS B.V., UNIVERSITEIT VAN AMSTERDAM
    Inventors: Robert Baard, Wishwas Abhyankar, Stanley Brul
  • Patent number: 11518088
    Abstract: The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location. This provides a fast 3D printing assembly allowing high resolution details.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: December 6, 2022
    Assignee: UNIVERSITEIT VAN AMSTERDAM
    Inventor: Suhas Nawada
  • Publication number: 20220088853
    Abstract: The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location. This provides a fast 3D printing assembly allowing high resolution details.
    Type: Application
    Filed: April 20, 2020
    Publication date: March 24, 2022
    Applicant: UNIVERSITEIT VAN AMSTERDAM
    Inventor: Suhas NAWADA
  • Patent number: 11192918
    Abstract: The invention relates to methods for preparing a compound comprising a peptide attached to a molecular scaffold whereby multiple peptide loops are formed, to compounds that can be obtained with such methods and uses thereof.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: December 7, 2021
    Assignees: Stichting voor de Technische Wetenschappen, Universiteit van Amsterdam
    Inventors: Gaston Julia Johannes Richelle, Dieuwertje Emma Streefkerk, Jan Herman van Maarseveen, Peter Timmerman
  • Publication number: 20210330736
    Abstract: In embodiments the invention relates to means and methods for the treatment of Parkinson's disease. In some embodiments the means and methods involve a PDE2 inhibitor, a PDE11 inhibitor or a combination thereof, optionally together with a GUCY2C agonist.
    Type: Application
    Filed: September 5, 2019
    Publication date: October 28, 2021
    Applicant: UNIVERSITEIT VAN AMSTERDAM
    Inventors: Marten Piet SMIDT, Lars Philip VAN DER HEIDE
  • Publication number: 20210115330
    Abstract: Method for manufacturing fluoro(hydro)carbon-substituted silicon or germanium quantum dots which comprises the steps of:—reacting a Zintl salt or intermetallic compound of post-transition metals or metalloids of silicon or germanium with a halogen-containing oxidizing agent to form halide-terminated silicon or germanium quantum dots,—reacting the halide-terminated silicon or germanium quantum dots with a fluoro(hydro)carbon agent selected from the group of metal-fluoro (hydro)carbon compounds of the formula MRq, wherein M is a metal selected from Group 1, 2, 4, 11, 12, 13, or 14 of the periodic table of elements, q is an integer which corresponds to the valence of the metal, and R is CFnHm-fluoro/hydro-carbon, wherein n is 1 or 2, m is 0 or 1, and the total of n and m is 2, wherein each R may be the same or different, metal-fluoro (hydro)carbon halide compounds of the formula NQaRp wherein N is a metal selected from Group 1, 2, 4, 11, 12, 13, or 14 of the periodic table of elements, Q is a halogen selected fr
    Type: Application
    Filed: May 1, 2019
    Publication date: April 22, 2021
    Applicants: UNIVERSITEIT TWENTE, UNIVERSITEIT VAN AMSTERDAM
    Inventors: Hui NIE, Katerina NEWELL, Jos Marie Johannes PAULUSSE
  • Patent number: 10774308
    Abstract: The invention provides a method for influencing the stability of an antibody producing cell, comprising directly or indirectly influencing the amount of BCL6 and/or Blimp 1 expression product within said antibody producing cell. Stable antibody producing cells and cell lines are also provided, as well as methods for producing antibodies using such cells and/or cell lines.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: September 15, 2020
    Assignees: ACADEMISCH MEDISCH CENTRUM BIJ DE UNIVERSITEIT VAN AMSTERDAM, AIMM THERAPEUTICS B.V.
    Inventor: Hergen Spits
  • Publication number: 20200232931
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 23, 2020
    Applicants: ASML Netherlands B.V., Stiching Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van Amsterdam
    Inventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs JANSEN, Lars Christian FREISEM, Kjeld Sijbrand Eduard EIKEMA, Simon Gijsbert Josephus MATHIJSSEN
  • Publication number: 20200009213
    Abstract: In embodiments the invention relates to means and methods for the treatment of Parkinson's disease. In some embodiments the means and methods involve a GUCY2C agonist. The invention also relates to test systems and cells that are suited to identify new candidate compounds for the treatment of Parkinson's disease.
    Type: Application
    Filed: March 2, 2018
    Publication date: January 9, 2020
    Applicant: Universiteit van Amsterdam
    Inventor: Lars Philip van der Heide
  • Publication number: 20200000356
    Abstract: The invention provides an assembly comprising: a recording assembly for recording a time-based brain-related signal; a stimulus generator for providing a stimulus, and a computer assembly, functionally coupled to said recording assembly and to said stimulus generator, said computer assembly comprising: a memory for storing at least a data segment of said time-based brain-related signal during recording of said time-based brain-related signal, and a computer program which, when running on said computer assembly, functionally real-time performs: retrieving a most-recent data segment of said stored data segment of said time-based brain-related signal; fitting at least one curve to said retrieved most-recent data segment; predicting a future continuation of said most-recent data segment using said at least one curve fitted to said most-recent data segment; detecting a predefined pattern in said predicted future continuation for predicting occurrence of said predefined pattern, and defining a predicted event time
    Type: Application
    Filed: February 22, 2018
    Publication date: January 2, 2020
    Applicants: Universiteit van Amsterdam, Okazolab Ltd
    Inventors: Lucia Maddalena TALAMINI, Ilia Korjoukov
  • Publication number: 20190310559
    Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.
    Type: Application
    Filed: April 5, 2019
    Publication date: October 10, 2019
    Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.
    Inventors: Johannes Fitzgerald DE BOER, Vasco Tomas TENNER, Arie Jeffrey DEN BOEF, Christos MESSINIS
  • Patent number: 10421066
    Abstract: The invention describes a novel catalytic composition comprising at least one nickel precursor A with at least one diphosphinamine ligand B1 of formula (R1)(R?1)P—N(R3)—P(R2)(R?2) or an iminobisphosphine ligand B2 of formula (R3)N?P(R1)(R?1)—P(R2)(R?2) or an iminobisphosphine ligand B?2 of formula (R3)N?P(R2)(R?2)—P(R1)(R?1). The invention also describes the use of said catalytic composition in a method for the oligomerisation of olefins.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: September 24, 2019
    Assignees: IFP Energies Nouvelles, Universiteit Van Amsterdam
    Inventors: Pierre-Alain Breuil, Pierre Boulens, Joost Reek, Helene Olivier-Bourbigou
  • Publication number: 20190265028
    Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.
    Type: Application
    Filed: February 15, 2019
    Publication date: August 29, 2019
    Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
  • Publication number: 20190249079
    Abstract: Multi-chromatic photoluminescent, oxide-capped semiconductor nanocrystals and methods for forming such semiconductor nanocrystals. The method includes exposing one or more oxide-capped semiconductors, preferably type IV semiconductor nanocrystals, to electron beam radiation, wherein the radiation has an energy between 1 and 30 keV, the radiation introducing color centers in the oxide that exhibit photoluminescence in at least the green band of the visible spectrum.
    Type: Application
    Filed: September 8, 2017
    Publication date: August 15, 2019
    Applicant: UNIVERSITEIT VAN AMSTERDAM
    Inventors: Katerina Dohnalova, Benjamin Bruhn, Benjamin Brenny
  • Patent number: 10273454
    Abstract: The invention provides a method for influencing the stability of an antibody producing cell, comprising directly or indirectly influencing the amount of BCL6 and/or Blimp 1 expression product within said antibody producing cell. Stable antibody producing cells and cell lines are also provided, as well as methods for producing antibodies using such cells and/or cell lines.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: April 30, 2019
    Assignee: ACADEMISCH MEDISCH CENTRUM BIJ DE UNIVERSITEIT VAN AMSTERDAM
    Inventors: Hergen Spits, Ferenc A. Scheeren, Tim Beaumont, Sean A. Diehl
  • Publication number: 20190107781
    Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
    Type: Application
    Filed: October 3, 2018
    Publication date: April 11, 2019
    Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
  • Publication number: 20180374700
    Abstract: A method for assembling semiconductor nanocrystals including: providing a binary system including semiconductor nanocrystals with an effective particle diameter of at most 20 nm, a first and a second solvent, the system having: a Ta, which is the temperature at which aggregation starts, a Ts, which is the solvent separation temperature of the system, an aggregation temperature range between Ta and Ts with Ta being included and Ts not, a homogeneous temperature range which is below Ta when Ta is lower than Ts and which is above Ta when Ta is higher than Ts, a heterogeneous temperature range which is above Ts when Ta is lower than Ts and below Ts when Ta is higher than Ts, and, bringing the temperature of the binary system from a value in the homogeneous temperature range to a value in the aggregation temperature range, thereby causing formation of an aggregate of the nanocrystals.
    Type: Application
    Filed: December 22, 2016
    Publication date: December 27, 2018
    Applicant: UNIVERSITEIT VAN AMSTERDAM
    Inventors: Emanuele MARINO, Thomas Edward KODGER, Peter SCHALL
  • Publication number: 20180348145
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Application
    Filed: May 15, 2018
    Publication date: December 6, 2018
    Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van Amsterdam
    Inventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
  • Patent number: 10077427
    Abstract: The invention provides a method for influencing the stability of an antibody producing cell, comprising directly or indirectly influencing the amount of BCL6 and/or Blimp 1 expression product within said antibody producing cell. Stable antibody producing cells and cell lines are also provided, as well as methods for producing antibodies using such cells and/or cell lines.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: September 18, 2018
    Assignees: ACADEMISCH MEDISCH CENTRUM BIJ DE UNIVERSITEIT VAN AMSTERDAM, AIMM THERAPEUTICS B.V.
    Inventor: Hergen Spits
  • Publication number: 20180225550
    Abstract: The invention provides a method for recognition of information in digital image data, said method comprising a learning phase on a data set of example digital images having known information, and characteristics of categories are computed automatically from each example digital image and compared to its known category, said method comprises training a convolutional neural network comprising network parameters using said data set, in which via deep learning each layer of said convolutional neural network is represented by a linear decomposition of all filters as learned in each layer into basis functions.
    Type: Application
    Filed: June 3, 2016
    Publication date: August 9, 2018
    Applicant: UNIVERSITEIT VAN AMSTERDAM
    Inventors: Jorn-Henrik JACOBSEN, Johannes Christianus VAN GEMERT, Reinier VAN DEN BOOMGAARD, Zhongyu LOU, Arnoldus Wilhelmus Maria SMEULDERS