Abstract: A solid-state imaging device having a first area and a second area surrounding the first area is provided. The solid-state imaging device includes a substrate having a plurality of photoelectric conversion elements. The solid-state imaging device also includes a color filter layer disposed on the substrate. The color filter layer includes a plurality of color filter segments corresponding to the plurality of photoelectric conversion elements. The solid-state imaging device further includes an optical waveguide layer over the color filter layer. The optical waveguide layer includes a waveguide partition grid, a waveguide material in spaces of the waveguide partition grid, and an anti-reflection film on the waveguide partition grid and the waveguide material. The width of the top of the waveguide partition grid is larger than the width of the bottom of the waveguide partition grid.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a plurality of photoelectric conversion elements. The solid-state image sensor also includes a color filter layer disposed above the photoelectric conversion elements. The color filter layer has a plurality of color filter segments. The solid-state image sensor further includes a partition grid disposed between the color filter segments. Moreover, the solid-state image sensor includes a patterned structure disposed on the color filter layer. The patterned structure has a plurality of patterned segments. The solid-state image sensor also includes a transparent layer disposed on the color filter layer and the partition grid. The transparent layer surrounds the patterned segments. At least one patterned segment is disposed on the partition grid.

Abstract: A solid-state image sensor having a first region and a second region adjacent to the first region along a first direction is provided. The solid-state image sensor includes a first unit pattern disposed in the first region. The solid-state image sensor also includes a second unit pattern disposed in the second region and corresponding to the first unit pattern. The first unit pattern and the second unit pattern each includes normal pixels and an auto-focus pixel array. The normal pixels and the auto-focus pixel array in the first unit pattern form a first arrangement, the normal pixels and the auto-focus pixel array in the second unit pattern form a second arrangement, and the first arrangement and the second arrangement are symmetric with respect to the first axis of symmetry.

Abstract: A biosensor is provided. The biosensor includes a substrate, a plurality of photodiodes, a polarizing element and a plurality of reaction sites. The plurality of photodiodes are embedded in the substrate. The polarizing element is disposed on the substrate. The plurality of reaction sites are disposed on the polarizing element.

Abstract: A coating apparatus includes a process chamber, a rotation device, and a rotation holder. The rotation device is disposed in the process chamber. The rotation holder is connected to the rotation device. The rotation holder includes two extension elements, two retaining elements, and two pins. The two extension elements are disposed around a center axis and separated from each other, wherein each of the two extension elements has a side surface. Each of the two retaining elements has a bottom surface, one of the two retaining elements is connected to one of the side surfaces, and the other of the two retaining elements is connected to the other of the side surfaces. One of the two pins is connected to one of the bottom surfaces, and the other of the two pins is connected to the other of the bottom surfaces.

Abstract: An optical device includes a first conductive layer, a first junction layer, a light absorption layer, a second junction layer, and a second conductive layer. The first junction layer is disposed on the first conductive layer. The light absorption layer is disposed on the first junction layer, wherein the light absorption layer includes a plurality of unit cells, each of the unit cells includes a plurality of pillar structures, and the pillar structures of each of the unit cells are different sizes. The second junction layer is disposed on the light absorption layer. The second conductive layer is disposed on the second junction layer.

Abstract: An image-sensing device includes photoelectric elements for receiving incident light. The photoelectric elements are arranged into unit cells, and each of the unit cells includes a first, a second, a third and a fourth photoelectric element. The first, the second, the third and the fourth photoelectric elements in each of the unit cells are formed of pillar structures, and the first, the second, the third and the fourth photoelectric elements are different sizes. The first photoelectric element captures a first image in a first phase, the second photoelectric element captures a second image in a second phase, the third photoelectric element captures a third image in a third phase, and the fourth photoelectric element captures a fourth image in a fourth phase. The first phase, the second phase, the third phase, and the fourth phase are different.

Abstract: An optical filter and a method for forming the same are provided. The optical filter includes a substrate and a plurality of filter stacks formed on the substrate. Each of the plurality of filter stacks includes a higher-refractive-index layer, a medium-refractive-index layer, and a lower-refractive-index layer. The higher-refractive-index layer has a first refractive index of higher than 3.5. The medium-refractive-index layer is disposed on the higher-refractive-index layer. The medium-refractive-index layer has a second refractive index higher than 2.9 and lower than the first refractive index. The lower-refractive-index layer is disposed on the medium-refractive-index layer. The lower-refractive-index layer has a third refractive index lower than the second refractive index.

Abstract: A semiconductor device is provided. The semiconductor device includes a substrate having a photoelectric conversion element, a first light-shielding layer disposed on the substrate and having a first aperture, a light-transmitting layer disposed on the first light-shielding layer, at least one second light-shielding layer disposed in the light-transmitting layer and having a second aperture, and a light-condensing structure disposed on the light-transmitting layer. The orthogonal projection of the second aperture on the bottom surface of the substrate has a long axis of symmetry and a short axis of symmetry perpendicular to the long axis of symmetry.

Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of first dielectric layers, a plurality of metal layers of Ag or its alloy and a plurality of second dielectric layers are formed over the substrate. The plurality of first dielectric layers and the plurality of metal layers are alternately formed over the substrate. The plurality of second dielectric layers are formed on one side away from the substrate of the plurality of metal layers and located between the plurality of metal layers and the plurality of first dielectric layers. An optical element fabricated by the method is also provided.

Abstract: An optical device is provided. The optical device includes a substrate, a central color filter, a first color filter and a second color filter sequentially disposed on the substrate from the center to the edge of the substrate, and a central hollow member, a first hollow member and a second hollow member respectively disposed on the central color filter, the first color filter and the second color filter. There is no distance between a center of the central color filter and a center of the central hollow member. There is a first distance between a center of the first color filter and a center of the first hollow member. There is a second distance between a center of the second color filter and a center of the second hollow member. The first distance is greater than zero. The second distance is greater than the first distance.

Abstract: In some embodiments, a biosensor is provided. The biosensor includes a sensing element and a cover disposed on the sensing element. The sensing element includes: a first substrate embedded with a photodiode; and a filter layer disposed on the substrate. The cover includes: a second substrate; an upper optical element disposed in the second substrate; and an upper reaction well disposed on the upper optical element.

Abstract: A light filter structure is provided. The light filter structure includes a substrate having a plurality of photoelectric conversion elements. The light filter structure also includes a dielectric-stacking layer disposed on the substrate. The light filter structure further includes a flattening layer disposed on the dielectric-stacking layer. The dielectric-stacking layer has a wedge portion and a flattening portion adjacent to the wedge portion, the wedge portion has a continuously or non-continuously varied thickness, and the flattening portion has a substantially constant thickness.

Abstract: An optical communication device includes a plurality of laser sources, a plurality of first meta-lenses, and an optical fiber. The laser sources transmit a plurality of laser beams in the same direction according to electrical signals. The laser beams have different wavelengths. The first meta-lenses receive the laser beams, and in a first substrate, refract the laser beams to a focal point to generate a mixed laser beam. The optical fiber receives the mixed laser beam for transmission. The focal point is arranged at the input end of the optical fiber.

Abstract: An optical element is provided. The optical element includes a substrate, a plurality of metal grids formed on the substrate, a patterned organic layer formed on the plurality of metal grids, a color filter surrounded by the patterned organic layer, and a light collection layer formed between the color filter and the substrate, and surrounded by the patterned organic layer. The refractive index of the light collection layer is greater than that of the patterned organic layer.

Abstract: An optical device is provided. The optical device includes a plurality of metal grids, a first patterned organic layer, and a second patterned organic layer. The first patterned organic layer includes a first portion having a first thickness, a second portion having a second thickness, a third portion having a third thickness, and a plurality of fourth portions. The first portion, the second portion and the third portion are respectively formed between the metal grids. The fourth portions are formed on the metal grids. The first thickness of the first portion is greater than the second thickness of the second portion. The second thickness of the second portion is greater than the third thickness of the third portion. The second patterned organic layer is formed on the fourth portions of the first patterned organic layer.

Abstract: A sensor device is provided. The sensor device includes at least one sensor unit. The sensor unit includes at least one sensor element, an interlayer, a passivation layer, a micro-lens structure, an opening, and a first reflecting layer. The interlayer is disposed on the sensor element. The passivation layer is disposed on the interlayer. The micro-lens structure is disposed on the passivation layer. The opening is disposed in the micro-lens structure. The first reflecting layer is disposed on the micro-lens structure. In addition, the first reflecting layer extends from the opening to the passivation layer.

Abstract: An optical device is provided. The optical device includes a substrate, a plurality of color filters formed on the substrate, and a plurality of spacers formed between the color filters. Each spacer has a first sidewall and a second sidewall opposite to the first sidewall. There is a first angle between the first sidewall of each spacer and a normal line of the top surface of the substrate. There is a second angle between the second sidewall of each spacer and the normal line of the top surface of the substrate. At least one of the first angle and the second angle is increased gradually towards the edge of the substrate.

Abstract: A method for fabricating an optical element is provided. A substrate is provided. A plurality of metal grids are formed on the substrate. An organic layer is formed on the substrate and the metal grids. The organic layer is etched to form a first patterned organic layer including a plurality of first protrusion portions and a plurality of first trenches surrounded by the first protrusion portions. The first patterned organic layer is etched to form a second patterned organic layer including a plurality of second protrusion portions and a plurality of second trenches surrounded by the second protrusion portions. Each second protrusion portion covers one metal grid. There is a distance between the center axis of one second protrusion portion of the second patterned organic layer and the center axis of one metal grid covered by the one second protrusion portion of the second patterned organic layer.

Abstract: A light filter structure is provided. The light filter structure includes a substrate having a plurality of photoelectric conversion elements. The light filter structure also includes a first metal-stacking layer disposed on the substrate. The light filter structure further includes a graded layer disposed on the first metal-stacking layer. The graded layer has a continuously or non-continuously varied thickness. The light filter structure includes a flatting layer disposed on the graded layer. The light filter structure also includes a second metal-stacking layer disposed on the flatting layer.