Abstract: A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.

Abstract: In a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by a material, which has been isolated from a target connected to the magnetron, and, optionally with the material reacting with a reactive gas present in the vacuum chamber, homogeneity of the coating layer on a substrate is improved by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or by employing two magnetrons having different rotational speeds.

Abstract: In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.

Abstract: In a method for coating substrates with materials to be vaporized in a vacuum coating system, the vaporization material is deposited on the substrate by double vaporization using an intermediate carrier. The intermediate carrier is continuously moved and cylindrical.

Abstract: A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.

Abstract: A drive end block for a rotatable magnetron comprises a housing, which has a vacuum-tight rotary feedthrough extending through a wall of the housing, and a drive apparatus for generating a torque. An output end of the rotary feedthrough lies outside the housing for connection to the rotatable magnetron and a drive end of the rotary feedthrough lies inside the housing for introducing a torque. The drive apparatus is situated outside the housing of the drive end block and is connected using a torque transmission apparatus to the drive end of the rotary feedthrough so that the drive apparatus is electrically insulated from the housing and the rotary feedthrough of the drive end block.

Abstract: A substrate treatment system for treating substrates includes a system chamber, delimited by chamber walls, at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. At least a first group of transportation rollers which are arranged immediately one behind the other, each has its own drive device.

Abstract: A support device for a magnetron arrangement with a rotating target includes a housing with a drive shaft mounted to rotate in the housing. An end of the drive shaft accessible from outside of the housing connects to the rotating target and another end lies within the housing for introduction of a torque. An electric motor with a stator and a rotor is arranged within the housing to generate a torque.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A sealing device for a rotary feedthrough for receiving a rotating machine element whose outer side can be applied to another machine element, includes at least two sealing elements disposed in tandem in the axial direction of the machine element. Inner sides of the sealing elements are configured for forming an active sealing connection with the rotating machine element. At least one of the sealing elements can be pressurized with an additional force acting in the radial direction so that the force of compression acting on the rotating machine element for the at least one of the sealing elements can be adjusted relative to the force of compression acting on the rotating machine element due to at least one other sealing element.

Abstract: A substrate treatment system for treating substrates in a continuous process includes a system chamber delimited by chamber walls, having an entry lock and an exit lock, and also at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. The rotor of the drive device is arranged under the pressure conditions prevailing in the system chamber and the stator of the drive device is arranged outside the pressure conditions prevailing in the system chamber.

Abstract: In a method for producing an organic light emitting illuminant, a base electrode layer is formed over a substrate, an organic light emitting layer is formed over at least one portion of the base electrode layer, and a top electrode layer is formed over at least one portion of the organic light emitting layer, the layers being formed in the shape of strips. The strip-shaped formation of the layers is carried out in a coating process in an in-line vacuum coating system having stationary shadowing masks on the advancing substrate such that at least one area of the base electrode layer remains uncoated once the layers have been formed.

Abstract: A coating device for producing an organic light-emitting illuminant comprising mutually adjacent regions having in each case different emission colors, includes a vacuum chamber, a device for linearly transporting a substrate, and a plurality of coating sources and diaphragms, provides OLED structures which have an improved intensity of the light emission. The thicknesses of the hole transport, emission and electron transport layers in the mutually adjacent regions differ and are in each case set such that an optimum coupling-out for the light color emitted in the corresponding region is achievable.

Abstract: A surface heating device for a substrate treatment device with increased power density and improved homogeneity of heat radiation includes a jacket tube heater with straight tube sections and bent tube sections in which straight tube sections are arranged parallel to each other in a main plane and straight tube sections are connected to each other by bent tube sections, so that at least part of the bent tube sections are aligned sloped relative to the main plane.

Abstract: A sputtering magnetron for coating a substrate includes a target and a magnet system that can be displaced relative to one another. The magnet system forms a magnetic field that penetrates the target, and has a support apparatus, a support plate with magnets arranged thereon, and actuators. The support apparatus is connectable to the support plate by the actuators such that distance between the magnet system and the target can be set, at least in sections. A cooling circuit cools the magnet arrangement and the target by a coolant. A layer measuring device obtains data of layer properties of at least one layer deposited on the substrate. Magnet system controls evaluate the data obtained and generate manipulated variables employed as the input variables of the actuators. A method for dynamically influencing the magnetic field is also provided.

Abstract: A substrate treatment plant includes a process chamber delimited by chamber walls and in the process chamber a substrate conveying unit for the horizontal conveyance of slab-shaped substrates in one conveying plane and in one conveying direction. The substrate conveying unit includes an arrangement of rotatably mounted, cylindrical conveying rollers transversely arranged to the conveying direction, the topmost generatrices of the conveying rollers defining the conveying plane, and at least one substrate treatment unit, which is located above the conveying plane, and at least one gas inlet. In the region of the substrate treatment unit at least one additional heating unit is located below the conveying plane and a condensation unit is located under the substrate conveying unit.

Abstract: A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.

Abstract: A method is provided for depositing a transparent conductive oxide (TCO) layer on a substrate, in which contaminations of the layers of the layer system is reduced through the diffusion of material from the substrate, and whose layer properties in respect to coupling and transmission of light are optimized. For that purpose, a barrier layer, a seed layer and a transparent conductive oxide layer are directly successively deposited on the substrate. Also, a thin-film solar cell is described which comprises such a transparent conductive oxide layer.

Abstract: A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set.

Abstract: A reflection layer system and a method for the production thereof for front-surface mirrors for solar applications are provided.