Abstract: A retaining wall block having a rear flange and a mold box and method of making the block. The mold box is configured with a mold cavity that includes a vertical flange forming cavity extending from the top of the mold box to the bottom of the mold box.
Abstract: A barrier assembly includes a barrier having a chamber adapted to hold a ballast, an inlet being formed on the barrier in communication with the chamber. A flag assembly includes a post having a first end and an opposing second end with a flag disposed on the first end. A retainer is disposed on the post and includes a catch radially outwardly projecting from the post, the catch being movable between an outwardly extended position and an inwardly retracted position, the catch resiliently urging toward the extended position when in the retracted position, the first end of the post being received within the inlet on the barrier so that the catch is disposed within the chamber in the extended position, the catch being configured so that the first end of the post cannot be pulled out through the inlet without moving the catch to the retracted position.
Abstract: A retaining wall having a plurality of courses of retaining wall blocks including a first upper course and a second lower course. Each retaining wall block has opposed front and rear faces, opposed first and second side surfaces, and opposed and substantially parallel upper and lower surfaces, and at least one weight bearing pad extends from one of the upper and lower surfaces. The at least one weight bearing pad extends substantially from the rear face to the front face of the block. The weight bearing pads are the only areas of contact between the blocks in the first upper course and the blocks in the second lower course.
Abstract: A semiconductor device has a buried oxide layer formed over a substrate. An active silicon layer is formed over the buried oxide layer. A drain region is formed in the active silicon layer. An LDD drift region is formed in the active silicon layer adjacent to the drain region. The drift region has a graded doping distribution. A co-implant region is formed in the active silicon. A source region is formed in the co-implant region. A shallow trench insulator is formed along a top surface of the LDD drift region. The shallow trench isolator has a length less than the LDD drift region. The shallow trench insulator terminates under the polysilicon gate and within the LDD drift region. A polysilicon gate is formed above the active silicon layer between the source region and LDD drift region and at least partially overlapping the shallow trench insulator.
Type:
Grant
Filed:
May 15, 2009
Date of Patent:
December 30, 2014
Assignee:
Great Wall Semiconductor Corporation
Inventors:
Patrick M. Shea, Samuel J. Anderson, David N. Okada
Abstract: A decorative circuit breaker panel cover can decorate and/or add functionality to a circuit breaker panel cover. In some embodiments, the decorative cover may be, for example, a decorative tin having an inlaid design. In other embodiments, the decorative cover may include a shelving system that fits over the circuit breaker panel.
Abstract: A semiconductor device has a semiconductor wafer with a plurality of semiconductor die including a plurality of contact pads. An insulating layer is formed over the semiconductor wafer and contact pads. An under bump metallization (UBM) is formed over and electrically connected to the plurality of contact pads. A mask is disposed over the semiconductor wafer with a plurality of openings aligned over the plurality of contact pads. A conductive bump material is deposited within the plurality of openings in the mask and onto the UBM. The mask is removed. The conductive bump material is reflowed to form a plurality of bumps with a height less than a width. The plurality of semiconductor die is singulated. A singulated semiconductor die is mounted to a substrate with bumps oriented toward the substrate. Encapsulant is deposited over the substrate and around the singulated semiconductor die.
Type:
Grant
Filed:
March 29, 2012
Date of Patent:
November 25, 2014
Assignee:
Great Wall Semiconductor Corporation
Inventors:
Samuel J. Anderson, Gary Dashney, David N. Okada
Abstract: A wall block comprises an upper surface and an opposed lower surface. A front face and an opposed back face, and a first side face and an opposed second side face, are disposed between the upper surface and the lower surface. The first side face and the second side face generally extend from the front face to the back face. The block includes one or more features that define a horizontal alignment direction. The front face extends from the first side face to the second side face generally along a direction that is slanted with respect to the horizontal alignment direction.
Type:
Grant
Filed:
September 19, 2012
Date of Patent:
November 18, 2014
Assignee:
Keystone Retaining Wall Systems LLC
Inventors:
Robert A. MacDonald, Thomas S. Riccobene
Abstract: A surface covering unit includes at least one face comprised of at least one primary rotational tessellation element. The rotational tessellation element includes at least two pairs of sides, and the sides in each pair of sides have the same length and are images of one another. The sides of a first pair of sides extend from a first vertex and are rotationally spaced from each other, and the sides of a second pair of sides extend from a second vertex and are rotationally spaced from each other. The sides of the first and second pairs of sides have two or more straight line segments or complex curves, and are not a single straight line or a single curve. One pair of sides has a length different from the other pair of sides. The surface covering has a natural appearance such that a repeating pattern is not readily apparent.
Abstract: Certain embodiments provide systems and methods for providing a window wall with flush slab edge covers. A window wall system can include a sill receptor configured to fixably attach to a top surface of a slab. The window wall system may include a head receptor configured to fixably attach to an underside surface of the slab. The window wall system can include a window wall panel including panel infill and a panel sill configured to detachably couple to the sill receptor. The window wall system may include a slab edge cover including cover infill. The slab edge cover can be configured to detachably couple to the window wall panel and the head receptor. In various embodiments, an exterior surface of the panel infill and an exterior surface of the cover infill are configured to flushly align when the slab edge cover is detachably coupled to the window wall panel.
Type:
Application
Filed:
May 7, 2013
Publication date:
November 13, 2014
Applicant:
Elston Window & Wall, LLC
Inventors:
Kenneth R. Evensen, James Jonathan White
Abstract: A landscaping edger includes a top face, bottom face, front face, rear face, and first and second end faces. The first and second end faces are angled inwardly toward each other from the front face to the rear face. The top face has a three dimensional topographical definition with a plurality of projections and a plurality of reliefs recessed from the projections. The entire top face is sloped so that gravity will drain water off the top face.
Type:
Grant
Filed:
February 7, 2013
Date of Patent:
October 28, 2014
Assignee:
Anchor Wall Systems, Inc.
Inventors:
Jay J. Johnson, Robert Brian Burnquist, Steven Paul Bennett
Abstract: In an embodiment, a water management barrier may include a hollow body at least partially defined by a front wall, a back wall, a top portion, a bottom portion, a first end, and a second end. The front wall may include a plurality of raised portions spaced from each other and extending substantially between the top portion and the bottom portion. The raised portions may at least partially define a plurality of channels extending substantially between said top portion and said bottom portion. The raised portions and/or the channels may be configured to help the front wall resist deformation due to one or more forces being exerted on the front wall. The barrier may also include an elongated connection member connection to the first end and a connection recess formed in the second end. The barrier may also include an elongated foot member attached to the bottom portion.
Abstract: Molds and processes that permit high-speed, mass production of retaining wall blocks having patterned or other processed front faces, as well as retaining wall blocks formed by such processes. The invention permits the front face of the block to be impressed with a pattern or otherwise directly processed, to allow the formation of pre-determined block front faces, while at the same time facilitating high-speed, high-volume production of blocks. A mirror image of the desired pattern can be created on a stripper shoe by selecting a desired three-dimensional surface from a naturally occurring or man made object and digitally scanning the selected three-dimensional pattern to create scanned data. The scanned data can then be used to machine a face of the stripper shoe that is the mirror image of the selected pattern.
Abstract: A fenestration assembly is described. The fenestration assembly includes: (1) a layer of film; (2) a frame having a first surface and a second surface, which is opposite to the first surface, the first surface substantially surrounding and having secured thereon the film and the frame having a thickness such that when the second side is fitted onto a window or a window frame, the thickness of the frame defines a space between the film and the window; and (3) wherein said film is a low-emittance film having an emissivity equal to or less than 0.35.
Abstract: A method for dampening acoustical vibration within a room including providing a grid formed of a plurality of cells defined by panels made from a flexible or deformable material which do not intersect one another such that the grid can be collapsed and expanded in a parallelogram motion. The grid can be positioned above floor level to attenuate acoustical sound within the room.