Abstract: The present subject matter relates to systems and methods for sealing one or more MEMS devices within an encapsulated cavity. A first material layer can be positioned on a substrate, the first material layer comprising a first cavity and a second cavity that each have one or more openings out of the first material layer. At least the first cavity can be exposed to a first atmosphere and sealed while it is exposed to the first atmosphere while not sealing the second cavity. The second cavity can then be exposed to a second atmosphere that is different than the first atmosphere, and the second cavity can be sealed while it is exposed to the second atmosphere.

Abstract: Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity. The method for forming the cavity further includes forming at least one first vent hole of a first dimension which is sized to avoid or minimize material deposition on a beam structure during sealing processes. The method for forming the cavity further includes forming at least one second vent hole of a second dimension, larger than the first dimension.

Abstract: Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity. The method for forming the cavity further includes forming at least one first vent hole of a first dimension which is sized to avoid or minimize material deposition on a beam structure during sealing processes. The method for forming the cavity further includes forming at least one second vent hole of a second dimension, larger than the first dimension.

Abstract: Systems and methods for calibrating antenna tuner device parameters can involve measuring a first signal level of an antenna tuner device, adjusting a tuning setting of the antenna tuner device, measuring one or more adjusted signal levels of the antenna tuner device, determining a level change between the first signal level and the one or more adjusted signal levels, comparing the level change to a predefined reference level change, and adjusting a device setting of the antenna tuner device to compensate for a difference between the level change and the predefined reference level change.

Abstract: Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity. The method for forming the cavity further includes forming at least one first vent hole of a first dimension which is sized to avoid or minimize material deposition on a beam structure during sealing processes. The method for forming the cavity further includes forming at least one second vent hole of a second dimension, larger than the first dimension.

Abstract: The present subject matter relates to systems and methods for sealing one or more MEMS devices within an encapsulated cavity. A first material layer can be positioned on a substrate, the first material layer comprising a first cavity and a second cavity that each have one or more openings out of the first material layer. At least the first cavity can be exposed to a first atmosphere and sealed while it is exposed to the first atmosphere while not sealing the second cavity. The second cavity can then be exposed to a second atmosphere that is different than the first atmosphere, and the second cavity can be sealed while it is exposed to the second atmosphere.

Abstract: Methods and devices for fabricating tri-layer beams are provided. In particular, disclosed are methods and structures that can be used for fabricating multilayer structures through the deposition and patterning of at least an insulation layer, a first metal layer, a beam oxide layer, a second metal layer, and an insulation balance layer.

Abstract: Tunable notch filters and control loop systems and methods can include a tunable notch filter providing a stop band, a sensing circuit in communication with the tunable notch filter and adapted to determine a phase change between a reference signal and a signal reflected from the tunable notch filter, and a control loop in communication with the tunable notch filter and the sensing circuit, the control loop being operable to adjust the tunable notch filter to modify the phase change.

Abstract: Cantilever beam electrostatic actuators are disclosed. A cantilever beam electrostatic actuator in accordance with the present invention comprises an actuator beam having a first width at a support anchor point and a second width at a distal end of the actuator, wherein the first width is narrower than the second width. Another actuator in accordance with the present invention comprises an actuator region, having a first width, a beam, having a second width, coupled between an edge of the actuator region and a pivot point, the beam being approximately centered on the actuator region, wherein the second width is narrower than the first width, and at least one auxiliary actuator flap, coupled to the actuator region, the at least one auxiliary actuator flap coupled to the actuator region along the edge of the actuator region, the at least one auxiliary actuator flap being farther away from a centerline of the actuator than the beam.