Abstract: In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.

Abstract: The invention is directed to an arrangement for generating a pulsed laser beam with high average output, in particular for generating a hot plasma which emits extreme ultraviolet (EUV) radiation. It is the object of the invention to find a novel possibility for generating a laser beam with a high repetition rate and average output which allows the repetition frequency and, therefore, the output of the laser system to be increased by connecting together a plurality of individual lasers having limited repetition rate without degradation of the beam quality on the target compared to that of an individual laser.

Abstract: The invention is directed to a method and an arrangement for plasma-based generation of soft x-radiation, particularly for the generation of extreme ultraviolet (EUV) radiation. The object of the invention, to find a novel possibility for providing a target for a plasma-based radiation source which permits a reduction in the heating and erosion of the nozzle and therefore permits an improved temperature control at the injection device, is met according to the invention in that a closure device is arranged between the target nozzle and the interaction region which interrupts an opening for temporarily passing the target flow by mechanically moving elements, wherein at least a portion of the target flow that is provided in a reproducible manner is separated in order to interact with the energy beam only during those time intervals in which an optical transmission from the interaction region to the target nozzle is prevented by the closure device.

Abstract: A short-wavelength radiation is generated which is stable over time from a plasma generated by energy input into a target jet, in which intensity variations due to altered coupling of excitation radiation into the target jet are minimized. Measuring devices are provided for successive detection over time of deviations of at least one of the directions of the target jet or the energy beam from an intersection point of the two directions that is provided as an interaction point. The measuring devices have output signals which are suitable as regulating variables for the orientation of the directions on the interaction point, and actuating elements are provided for adjusting and tracking at least one of the directions of either the target jet or the energy beam depending on the output signal of the measuring devices in the manner of a control loop.

Abstract: The invention is directed to an arrangement for debris reduction in a radiation source based on a plasma, particularly for generating bundled radiation in the extreme ultraviolet (EUV) spectral region. The object of the invention, to find a novel possibility for beam shaping and debris reduction in a radiation source based on a plasma which substantially increases the life of collector optics without having to tolerate a substantial reduction in transparency or a sudden destruction of the protective mechanism, is met according to the invention in that exchangeable additional optics are arranged in the radiation path between a conventional debris filter and the collector optics, wherein a distance-increasing intermediate imaging of the source location relative to the collector optics is provided by the additional optics for further debris reduction.

Abstract: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation.

Abstract: The invention is directed to an arrangement for the optical detection of a moving target flow for pulsed energy beam pumped radiation generation based on a plasma. It is the object of the invention to find a novel possibility for detection of a moving target flow for energy beam pumped radiation generation based on a plasma which allows reliable orientation of the excitation beam on the target without the detector being subjected to influence and damage due to radiation emitted by the plasma. According to the invention, this object is met in that a target generator provides a target flow with relatively constant target states in an interaction point, a sensor unit is directed to a detection point which lies close to the interaction point in the direction of the path.

Abstract: The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.

Abstract: The arrangement for generating EUV radiation based on electrically triggered gas discharges with high repetition rates and high average outputs.

Abstract: The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve.

Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.

Abstract: The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, wherein the radiation source has a plasma column emitting extreme ultraviolet radiation. The arrangement includes an energy monitoring unit, and a detection beam path. The detection beam path is separate from the illumination beam path and is arranged with the energy monitoring unit for detecting pulse energy, so that the illumination beam path is not impaired by the energy measurement. The detection beam path is matched to the illumination beam path with respect to bundle extension and optical losses.

Abstract: The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources.

Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation, particularly for photolithography exposure processes. The object of the invention is to find a novel possibility for realizing radiation sources for generating extreme ultraviolet (EUV) radiation which permits a uniform basic construction for ensuring beam characteristics that are reproducible over the long term and in which the source is conceived so as to be flexible with respect to specific applications.

Abstract: The invention is directed to a method for energy regulation of pulsed-operation gas discharge-coupled radiation sources, particularly of excimer lasers, F2 lasers and EUV radiation sources. The object of the invention is to find a novel possibility for energy regulation of pulsed-operation gas discharge-coupled radiation sources which permits a control of the charging voltage while taking into account the aging of gas discharge components (particularly of the work gas) without recalibration of the system.

Abstract: The invention is directed to a detector arrangement for energy measurement of pulsed x-ray radiation, particularly for monitoring the energy emitted by pulsed EUV radiation sources.

Abstract: A method is disclosed for stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation, particularly of an EUV source based on a gas discharge. The object of the disclosed invention is to find a novel possibility for stabilizing the radiation output of a gas discharge-coupled radiation source in pulsed operation which allows the pulse energy to be regulated on the basis of pulse energy fluctuations of the radiation emission detected through measurements without requiring regular calibration measurements of the E(U) curve in the stationary operating regime with continuous pulse sequences.

Abstract: The invention is directed to a method for generating extreme ultraviolet (EUV) radiation based on a radiation-emitting plasma, particularly for generating EUV radiation with a wavelength around 13 nm. The object of the invention, to find a novel possibility for generating extreme ultraviolet radiation based on a radiation-emitting plasma in which the emission output of the EUV source is increased to the wavelength range above the L-absorption edge of silicon without substantially increasing the technical and monetary expenditure for plasma generation, is met in a method for generating extreme ultraviolet radiation through emission of broadband radiation from a plasma under vacuum conditions in that the plasma is generated using at least one element from V to VII in the p-block of the fifth period of the periodic table of elements. Iodine, tellurium, antimony or materials containing these elements or chemical compounds formed with these elements are preferably used.

Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge.

Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation, particularly for photolithography exposure processes. The object of the invention is to find a novel possibility for realizing radiation sources for generating extreme ultraviolet (EUV) radiation which permits a uniform basic construction for ensuring beam characteristics that are reproducible over the long term and in which the source is conceived so as to be flexible with respect to specific applications.