Abstract: A method is disclosed for stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation, particularly of an EUV source based on a gas discharge. The object of the disclosed invention is to find a novel possibility for stabilizing the radiation output of a gas discharge-coupled radiation source in pulsed operation which allows the pulse energy to be regulated on the basis of pulse energy fluctuations of the radiation emission detected through measurements without requiring regular calibration measurements of the E(U) curve in the stationary operating regime with continuous pulse sequences.

Abstract: The invention is directed to a method for energy regulation of pulsed-operation gas discharge-coupled radiation sources, particularly of excimer lasers, F2 lasers and EUV radiation sources. The object of the invention is to find a novel possibility for energy regulation of pulsed-operation gas discharge-coupled radiation sources which permits a control of the charging voltage while taking into account the aging of gas discharge components (particularly of the work gas) without recalibration of the system.

Abstract: The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources.

Abstract: The invention is directed to a detector arrangement for energy measurement of pulsed x-ray radiation, particularly for monitoring the energy emitted by pulsed EUV radiation sources.

Abstract: The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve.

Abstract: The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, particularly for controlling the dose stability in EUV lithography for chip fabrication in semiconductor technology.

Abstract: The invention is directed to a method for generating extreme ultraviolet (EUV) radiation based on a radiation-emitting plasma, particularly for generating EUV radiation with a wavelength around 13 nm. The object of the invention, to find a novel possibility for generating extreme ultraviolet radiation based on a radiation-emitting plasma in which the emission output of the EUV source is increased to the wavelength range above the L-absorption edge of silicon without substantially increasing the technical and monetary expenditure for plasma generation, is met in a method for generating extreme ultraviolet radiation through emission of broadband radiation from a plasma under vacuum conditions in that the plasma is generated using at least one element from V to VII in the p-block of the fifth period of the periodic table of elements. Iodine, tellurium, antimony or materials containing these elements or chemical compounds formed with these elements are preferably used.

Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.