Abstract: A dishwasher appliance is provided. The dishwasher appliance includes a first spray assembly and a second spray assembly. A pressure actuated valve is coupled to a supply conduit. The pressure actuated valve selectively permits wash fluid from the supply conduit to flow to the second spray assembly. A related method for operating a dishwasher appliance is also provided.

Abstract: A cartridge for a water-conducting domestic appliance, in particular a domestic dishwasher, which has a detergent dosing system having at least one detergent dispenser for receiving at least one cartridge, wherein the cartridge has separate chambers for storing at least two detergents, the cartridge including a cartridge housing having at least two chambers formed therein, wherein each chamber has a storage capacity for storing detergent which is greater than the quantities required for one washing cycle.

Abstract: A dishwasher with a tub at least partially defining a treating chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a filter disposed in the recirculation flow path to filter the liquid.

Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.

Abstract: A water-bearing domestic appliance and method of operating a water-bearing domestic appliance, wherein the domestic appliance includes a water feed system that is controlled by a control device and that supplies a measured volume of water to the domestic appliance. The domestic appliance further includes a total water volume detection device to detect a total volume of water that is supplied via the water feed system to the domestic appliance during its service life.

Abstract: A robot vacuum cleaner includes a housing and a brush roller disposed at a bottom of the housing. The brush roller is configured to be rotatable about a horizontal axle. A blade is disposed above the brush roller in stationary relation with respect to the housing. The horizontal axle is adjustable in height relative to the housing. The brush roller is spaced away from the blade in a lower position and is in engagement with the blade in an upper position.

Abstract: A system and method for washing a gas turbine engine. The method for washing the gas turbine engine includes coupling a pressurized air supply assembly to an air supply and to a secondary air system, cranking a compressor rotor assembly of the gas turbine engine, supplying pressurized offline buffer air from the air supply to the pressurized air supply assembly, and spraying a cleaner into the compressor.

Abstract: A washing machine includes a cabinet, a washing tub disposed in the cabinet, a detergent supply device to supply detergent to the washing tub, a valve housing, having valve devices to control water supply, connected to the detergent supply device, a coupling pipe coupled to a water supply hose outside the cabinet to guide water into the cabinet, and a connection pipe to connect the valve housing to the coupling pipe, wherein the valve housing is directly coupled to the detergent supply device, and the connection pipe is fixed to the valve housing and the coupling pipe.

Abstract: This invention relates in part to a method for cleaning an ion source component of an ion implanter used in semiconductor and microelectronic manufacturing. The ion source component includes an ionization chamber and one or more components contained within the ionization chamber. The interior of the ionization chamber and/or the one or more components contained within the ionization chamber have at least some deposits thereon of elements contained within a dopant gas, e.g., carborane (C2B10H12). The method involves introducing a cleaning gas into the ionization chamber, and reacting the cleaning gas with the deposits under conditions sufficient to remove at least a portion of the deposits from the interior of the ionization chamber and/or from the one or more components contained within the ionization chamber.

Abstract: A water-conducting domestic appliance, in particular a domestic dishwasher, the water-conducting domestic appliance including a washing compartment for receiving items therein that are to be subjected to a washing cycle by the water-conducting domestic appliance; a detergent dosing system, the detergent dosing system having a detergent dispenser with a receiving compartment, the receiving area for receiving at least one cartridge that is configured to hold at least one detergent; and a cartridge having separate chambers for storing at least two detergents, each chamber having a storage capacity for storing detergent that is greater than a quantity of detergent required for one washing cycle.

Abstract: A cartridge for a water-conducting domestic appliance, in particular a domestic dishwasher, which has a detergent dosing system having at least one detergent dispenser for receiving at least one cartridge, wherein the cartridge has separate chambers for storing at least two detergents, the cartridge including a cartridge housing having at least two chambers formed therein, wherein each chamber has a storage capacity for storing detergent which is greater than the quantities required for one washing cycle.

Abstract: A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus.

Abstract: A method for reducing contaminants in a semiconductor device is provided. The method includes cleaning the semiconductor substrate. The cleaning includes rotating the semiconductor substrate and dispersing an aerosol at a predetermined temperature to a surface of the semiconductor substrate or a layer formed on the substrate to be cleaned. The aerosol includes a chemical having a predetermined pressure and a gas having a predetermined flow rate.

Abstract: A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.

Abstract: A cooker including a first coating layer that is a general ceramic enamel layer and a second coating layer that includes phosphorus oxide-based components are coated on a surface of a cavity corresponding to the inner surface of the cooking chamber. Therefore, the inside of the cooking chamber can be more easily cleaned.

Abstract: A dishwasher with a tub at least partially defining a treating chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a filter disposed in the recirculation flow path to filter the liquid.

Abstract: A process and also to a system for cleaning and maintaining a medical hand-held instrument, in particular a dental hand-held instrument, with an elongate grip sleeve in which elements are arranged which pertain to a drive arrangement and which are, in particular, rotatably supported, for example a shaft. For the purpose of cleaning and maintaining the hand-held instrument different media are conducted through it. In this connection a first medium, for example oil, is conducted merely through a power-transmission region surrounding the elements of the drive arrangement, whereas, on the other hand, a second medium, for example a cleaning agent, is conducted additionally also through at least one further cavity within the hand-held instrument.

Abstract: The present disclosure provides a method for cleaning a respirator using a cleaning device of the type having a fluid device and a pressure application device. The method comprises applying a cleaning fluid to the respirator with the fluid device; connecting a gas carrying element of the respirator to a pressure connection of the pressure application device; and applying pressurized gas to the gas carrying element during the application of the cleaning fluid.

Abstract: A water-conducting domestic appliance, in particular a domestic dishwasher, the water-conducting domestic appliance including a washing compartment for receiving items therein that are to be subjected to a washing cycle by the water-conducting domestic appliance; and a detergent dosing system, the detergent dosing system having a detergent dispenser with a receiving compartment, the receiving area for receiving at least one cartridge that is configured to hold at least one detergent, the detergent dosing system having the capability to store a quantity of detergent greater than a quantity needed for a single washing cycle and the detergent dosing system having an apparatus for detecting a fill level in at least one of the detergent dispenser and the at least one cartridge.

Abstract: A method of process chemical temperature control for resist stripping of a substrate in a resist stripping system includes selecting at least two temperature control objectives and selecting at least two temperature control operating variables for optimization to achieve the at least two temperature control objectives. The method further includes injecting and mixing a first process chemical and a second process chemical into a treatment liquid delivery system of the resist stripping system, which forms a treatment liquid including an active species. The method further includes injecting vapor into the treatment liquid delivery system. The vapor is injected into the treatment liquid or the treatment liquid is injected into the vapor. Treatment liquid is dispensed from the dispensing device onto the substrate. At least two of the temperature control operating variables are adjusted in response to at least two metrology data values.