Patents Examined by Andrew Smyth
  • Patent number: 11167053
    Abstract: A system and method for an antivirus and radiation detection system configured to protect a wearer is provided. The system includes a personal protective equipment for preventing respiratory infection that includes a body configured to cover a nose and mouth of the user the body including at least one filter element disposed in the body that allows air to pass through the filter element from a first side of the body to a second side of the body; the filter element having a filter media; an ultraviolet light element disposed in the filter element that provides ultraviolet light into the filter media; and a pulsing laser element disposed in the filter element.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: November 9, 2021
    Inventor: Mark Laty
  • Patent number: 11164717
    Abstract: An object of the invention is to provide a technique of capturing images at higher speed and higher magnification when acquiring continuous tilted images with an electron microscope. The electron microscope of the invention includes a first spherical receiver fixed to a column of the electron microscope and configured to slide with a spherical fulcrum provided at a tip end of a sample holder; a spherical surface part provided on the column; and a second spherical receiver provided outside the column. The spherical surface part and the second spherical receiver slide on a contact part between the spherical surface part and the second spherical receiver, and a track of the slide is along a spherical surface centered on a central axis of the first spherical receiver, so that a view shift and a focus shift from an observation position of a sample can be reduced.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: November 2, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hideki Kikuchi, Tadao Furutsu, Kouichirou Saitou, Hidekazu Suzuki, Ryoji Namekawa
  • Patent number: 11160890
    Abstract: An automatic disinfection workstation system utilizes a disinfecting workstation-light to disinfect surfaces within the workstation and may also include an airflow disinfecting system that utilizes an airflow disinfecting light to disinfect an airflow through the workstation. The workstation may have three walls forming the workstation enclosure and the disinfecting workstation-light may be configured proximal to the top of the walls and emit ultraviolet light to deactivate or kill germs or viruses within the line of sight of the light. The disinfecting workstation-light is actuated over the workstation to produce light with various lines of sight to more effectively disinfect the workstation. In addition, a light-angle actuator may rotate the light to further increase the various lines-of-sight. This combination of traversing the light at various angles may further enhance the effectiveness of disinfecting the workstation.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: November 2, 2021
    Inventor: Frank Lytle
  • Patent number: 11160896
    Abstract: Provided are a light blocking apparatus and an air purifier including the light blocking apparatus. The light blocking apparatus includes a housing, a light blocking member and a through hole. The through hole is located in the housing. A spacing or a gap is provided between the light blocking member and the housing. Projection of the light blocking member in spaced relationship from the housing covers the through hole.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: November 2, 2021
    Inventor: Ruidian Yang
  • Patent number: 11158495
    Abstract: A multi-reflecting time-of-flight mass spectrometer (MR-TOF MS) includes an ion source, an orthogonal accelerator, and an ion mirror assembly. The ion source is capable of generating a beam of ions, and is arranged to accelerate the ions in a first direction along a first axis. The orthogonal accelerator is arranged to accelerate the ions in a second direction along a second axis. The second direction is orthogonal to the first direction. The ion mirror assembly includes a plurality of gridless planar mirrors and a plurality of electrodes. The plurality of electrodes are arranged to provide time-focusing of ions along a third axis substantially independent of ion energy and ion position.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: October 26, 2021
    Assignee: LECO Corporation
    Inventors: Viatcheslav Artaev, Anatoly N. Verenchikov
  • Patent number: 11154634
    Abstract: An ultraviolet-C light fixture is provided, the ultraviolet-C light fixture comprising at least one ultraviolet-C light bulb to sterilize an air flow, an ultraviolet-C radiation field created by the at least one ultraviolet-C light bulb to sterilize the air flow, a top end cap, a base and a plurality of louvers, the plurality of louvers positioned proximate one another, the top end cap and the base to create a gap, the gap sized to allow ultraviolet radiation to pass outside the ultraviolet light fixture to create a sterilization field outside the ultraviolet light fixture to eradicate bacterial, viral or pathogen particles from the air flow surrounding the fixture and the gap sized to allow passage of the air flow containing a cloud of infectious bacterial, viral or pathogen particles to pass through a sterilization chamber within the ultraviolet light fixture to eradicate bacterial, viral or pathogen particles from the air flow.
    Type: Grant
    Filed: January 2, 2021
    Date of Patent: October 26, 2021
    Assignee: McKinley Sims Holdings LLC
    Inventors: Dewey McKinley Sims, Jr., Dewey McKinley Sims, III
  • Patent number: 11127558
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: September 21, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Patent number: 11120981
    Abstract: A laser desorption/ionization method includes: a first process of preparing a sample support body that includes a substrate in which a plurality of through-holes are formed and a conductive layer that is provided on the first surface of the substrate; a second process of mounting a frozen sample on a mounting surface of a mount under a sub-freezing atmosphere, and fixing the sample support body to the mount in a state in which the second surface is in contact with the frozen sample; a third process of thawing the sample, and moving components of the thawed sample toward the first surface via the plurality of through-holes due to a capillary phenomenon; and a fourth process of irradiating the first surface with a laser beam while applying a voltage to the conductive layer, and ionizing the components that have moved toward the first surface.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: September 14, 2021
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11114291
    Abstract: A method of filtering ions (16) is disclosed comprising: providing an ion filter (6) having an ion entrance, an ion exit and a plurality of electrodes (18); applying an AC and/or RF voltage to at least a first electrode so as to generate a pseudo-potential barrier; and urging ions towards the pseudo-potential barrier as they travel from the entrance to the exit whilst maintaining the ion filter (6) at a pressure such that first ions are repelled by the pseudo-potential barrier and so are transmitted through the filter to said exit, whereas second ions having substantially the same mass to charge ratio as the first ions but a lower mass are not capable of being repelled by the pseudo-potential barrier and reaching said exit.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: September 7, 2021
    Inventors: Boris Kozlov, David J. Langridge
  • Patent number: 11107659
    Abstract: There is provided an ion generator including a vapor generating chamber for generating a vapor by heating a raw material in which a first solid material which is a single substance of an impurity element and a second solid material which is a compound containing the impurity element are mixed with each other, and a plasma generating chamber for generating a plasma containing ions of the impurity element by using the vapor.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: August 31, 2021
    Inventor: Hiroki Murooka
  • Patent number: 11092591
    Abstract: Provided are methods of determining prior radiation dose exposure levels for subjects, and kits therefor. Also provided are methods of treatment.
    Type: Grant
    Filed: November 13, 2015
    Date of Patent: August 17, 2021
    Assignee: Albert Einstein College of Medicine
    Inventors: Aaron Alain-Jon Golden, Pilib Ó Broin, Chandan Guha, Irwin Kurland
  • Patent number: 11094502
    Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: August 17, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul Smakman, Tamara Druzhinina, Coen Adrianus Verschuren
  • Patent number: 11087949
    Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.
    Type: Grant
    Filed: August 20, 2020
    Date of Patent: August 10, 2021
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Dirk Preikszas, Bernd Hafner
  • Patent number: 11083810
    Abstract: A control panel having a variety of potential applications that utilize ultraviolet-C (UV-C) light as a means of disinfection. In one embodiment, a human/machine interface (HMI) panel, such as a touchscreen or keypad uses a dynamically moveable multi-reflector assembly using UV-C light to disinfect its touch surfaces. The goal of integrating UV-C disinfection with an HMI works to provide a safe and effective dose of UV-C light to the panel's surface for the purpose of reducing the number of active pathogens.
    Type: Grant
    Filed: January 7, 2020
    Date of Patent: August 10, 2021
    Assignee: GHSP, Inc.
    Inventors: Aghuinhue Umenei, Robert W. Rossien, Eric Bryant
  • Patent number: 11087956
    Abstract: A semiconductor metrology tool for analyzing a sample is disclosed. The semiconductor metrology tool includes a particle generation system, a local electrode, a particle capture device, a position detector, and a processor. The particle generation system is configured to remove a particle from a sample. The local electrode is configured to produce an attractive electric field and to direct the removed particle towards an aperture of the local electrode. The particle capture device is configured to produce a repulsive electric field around a region between the sample and the local electrode and to repel the removed particle towards the aperture. The position detector is configured to determine two-dimensional position coordinates of the removed particle and a flight time of the removed particle. The processor is configured to identify the removed particle based on the flight time.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: August 10, 2021
    Inventors: Shih-Wei Hung, Jang Jung Lee
  • Patent number: 11071803
    Abstract: An ultraviolet sterilization line lamp is disclosed. The ultraviolet sterilization line lamp includes a lamp body, the lamp body being elongated, two sides of the lamp body being provided with two accommodating grooves; two grilles connected to the lamp body and respectively located in the two accommodating grooves, inner wall surfaces of each of the grilles and each of the accommodating grooves forming a sterilization cavity, each of the grilles including light exit grooves communicating with the sterilization cavity, each of the light exit grooves extending from one end of a corresponding grille close to the lamp body to another end of the corresponding grille away from the lamp body, an inner wall surface of each of the light exit grooves being provided with a light-absorbing layer; and two ultraviolet sterilization modules connected to the lamp body or the grille, and respectively located in two sterilization cavities.
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: July 27, 2021
    Inventors: Qing Lan, Tianlong Dai, Shoubao Chen, Ligen Liu
  • Patent number: 11069505
    Abstract: In order to provide an aberration corrector with a wide aberration correction range, easy control, highly accurate aberration correction, and a low cost, an aberration corrector, passing an electron beam through a central axis 201, includes a first current line group (101 to 112) which is arranged parallel to an optical axis at a position separated by R1 from the central axis, and excites a first multipole field, and a second current line group (21 to 32) which is arranged parallel to the optical axis at a position separated by R2 from the central axis, and independently excites a second multipole field having an order and intensity different from those of the first multipole field.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: July 20, 2021
    Inventor: Tomonori Nakano
  • Patent number: 11067538
    Abstract: An apparatus includes a first electrode and a second electrode. The second electrode is placed in parallel with the first electrode to provide constant gap distance. The gap between the first electrode and the second electrode is at atmospheric pressure. Ions are introduced into the center of the gap and travel through the apparatus in a direction parallel to the first electrode and the second electrode. The apparatus is configured as a high-field symmetric-waveform apparatus for filtering high mobility ions or for fragmenting ions. The apparatus is also configured for three modes of operation: as a conventional DMS; as a filter high mobility ions; and as fragmentation device. A symmetric electric field is produced in the gap with a maximum density normalized field strength greater than 10 Td to filter high mobility ions and with a maximum density normalized field strength greater than 100 Td to fragment ions.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: July 20, 2021
    Assignee: DH Technologies Development Pte. Ltd.
    Inventors: Bradley B. Schneider, Erkinjon Nazarov, Thomas R. Covey
  • Patent number: 11062875
    Abstract: A control unit for controlling a deflector in an imaging apparatus. The imaging apparatus includes an electron gun arranged to provide electron beam to scan a specimen, and the deflector. The deflector is arranged to move the electron beam in a first scanning direction and a second scanning direction that are in the same plane for scanning the specimen. The control unit is configured to determine the first scanning direction and the second scanning direction, and process the determined first scanning direction and the determined second scanning direction based on predetermined equations. The control unit is further configured to provide, based on the processing, a control signal to the deflector to adjust one or both of the first scanning direction and the second scanning direction such that they become substantially orthogonal.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: July 13, 2021
    Assignee: City University of Hong Kong
    Inventors: Fu-Rong Chen, Pei-En Li, Ying-Shuo Tseng
  • Patent number: 11062876
    Abstract: An evaluation method for an electronic device provided with an insulating film between a pair of electrode layers includes preparing a sample that has a tunnel barrier insulating film as the insulating film; irradiating the sample with electron beams from a plurality of angles to acquire a plurality of images; and performing image processing using the plurality of images to reconstruct a stereoscopic image and generate a cross-sectional image of the sample from the stereoscopic image.
    Type: Grant
    Filed: March 21, 2019
    Date of Patent: July 13, 2021
    Inventors: Masaaki Niwa, Tetsuo Endoh, Shoji Ikeda, Kosuke Kimura