Abstract: To provide a liquid crystal compound having a large negative value of dielectric anisotropy (??). A compound is represented by formula (1): wherein, in formula (1), R1 and R2 are hydrogen, halogen or alkyl having 1 to 10 carbons, and in the alkyl, at least one of —CH2— may be replaced by —O—, at least one of —(CH2)2— may be replaced by —CH?CH—, and at least one of hydrogen may be replaced by halogen; ring A1 and ring A2 are 1,4-cyclohexylene or 1,4-phenylene; Z1 is a single bond, —(CH2)2—, —CH2O—, —OCH2—, —CF2O—, —OCF2—, —COO—, or —OCO—; Y is halogen, —CF3, —CF2H or —CH2F; and m, n and p are 0, 1 or 2, and a sum (m+n) of m and n is 0, 1 or 2.

Abstract: A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

Abstract: The present invention relates to liquid crystal media and to high-frequency components comprising same, especially microwave components for high-frequency devices, such as devices for shifting the phase of microwaves, in particular for microwave phased-array antennas.

Abstract: A liquid crystal composition satisfies at least one of characteristics such as a high maximum temperature of a nematic phase, a low minimum temperature of a nematic phase, a small viscosity, a large optical anisotropy, a large positive dielectric anisotropy, a large specific resistance, a large elastic constant, a high stability to ultraviolet light and heat, or is suitably balanced between at least two of the characteristics. An AM device has a short response time, a large voltage holding ratio, a large contrast ratio, a long service life and so forth. The liquid crystal composition includes a specific two-ring compound having a high maximum temperature and a large elastic constant as a first component, a specific compound having a large dielectric anisotropy as a second component, and has a nematic phase. The liquid crystal display device contains this composition.

Abstract: A liquid crystal compound containing cyclobutyl and a linking group difluoromethyleneoxy, and a preparation method and use thereof are disclosed. The compound is as shown in Formula I. The liquid crystal compound containing cyclobutyl as a terminal group and difluoromethyleneoxy (—CF2O—) as a linking group in the molecular structure of Formula I according to the present invention, has not only a high dielectric anisotropy, but also importantly an extremely fast response speed and a high clearing point, which are of great significance for the formulation of a liquid crystal mixture.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.

Abstract: A resist composition used in a method of forming a resist pattern including applying a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component to a substrate to form a resist film; subjecting the resist film to exposure; baking after subjecting the resist film to exposure, wherein at an exposed portion of the resist film, the base generated from the photo-base generator component upon exposure and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of acid provided to the resist film in advance; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern.

Abstract: An organic light emitting diode (OLED) device includes a first electrode; a second electrode facing the first electrode; an emitting material layer disposed between the first and second electrodes and a horizontally oriented liquid crystal type emitting material.

Abstract: The present application relates to an optical device. The optical device according to one embodiment may be a light-dividing device, for example, a device that can divide incident light into at least two kinds of light having different polarization states. For example, the optical device can be used to realize a stereoscopic image.

Abstract: An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below.

Abstract: A liquid-crystal medium which comprises a component A which consists of one or more compounds of the formula IA, in which the parameters have the respective meanings given in the claims or in the text, and to the corresponding, novel mesogenic compounds and to the preparation thereof. The use of these liquid-crystal media, in particular in components for high-frequency technology, and to components of this type which contain the media according to the invention, and to the production and use of these components. The components are suitable, in particular, for phase shifters in the microwave and millimeter wave region, for microwave and millimeter wave array antennae and very particularly for so-called tuneable “reflectarrays”.

Abstract: Polymerizable compounds, to processes and intermediates for the preparation thereof, and to the use thereof for optical, electro-optical and electronic purposes, in particular in liquid-crystal (LC) media and LC displays, especially in LC displays of the PS (“polymer sustained”) or PSA (“polymer sustained alignment”) type.

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.

Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.

Abstract: A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

Abstract: The present invention relates to the use of LC (liquid-crystal) compounds and LC media comprising them in LC displays of the PS (polymer stabilized) or PSA (polymer sustained alignment) type.

Abstract: A resist composition comprising a salt of a mono- to tetrafunctional carboxylic acid with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium, indium, tin, antimony, cesium, zirconium, and hafnium, and a solvent is improved in film uniformity when coated, and exhibits a high resolution, high sensitivity, and minimal LER when processed by the EB or EUV lithography.

Abstract: A radiation-sensitive composition includes a polymer composition and a radiation-sensitive acid generator. The polymer composition includes a first polymer and a second polymer. The first polymer includes a repeating unit shown by a following formula (1). The second polymer includes a repeating unit shown by a following formula (2) and does not include a repeating unit shown by the formula (1).

Abstract: Topcoat layer compositions suitable for use in forming a topcoat layer over a layer of photoresist include: a matrix polymer which is aqueous alkali soluble; a first additive of mer which is aqueous alkali soluble and comprises polymerized units of a monomer of the following general formula (I): wherein: R1 is hydrogen or a C1 to C6 alkyl or fluoroalkyl group; R2 is a C3 to C8 branched alkylene group; and R3 is a C1 to C4 fluoroalkyl group; and wherein the first additive polymer is present in the composition in an amount less than the matrix polymer, and the first additive polymer has a lower surface energy than a surface energy of the matrix polymer; wherein a layer of the topcoat composition in a dried state has a water receding contact angle of from 75 to 85°. The compositions find particular applicability to immersion lithography processing.