Abstract: A method of cleaning a complex powder transfer system including providing a powder transfer system having a washing fluid source, a spray device valve in fluid communication with the washing fluid source, a backflush valve in fluid communication with the washing fluid source, a receiving device having an upper chamber, a lower chamber, and a membrane filter disposed between the upper and lower chambers. The method includes opening the backflush valve to initiate a backflush cycle, running the backflush cycle to wash the upper chamber with a fluid, and closing the backflush valve after the backflush cycle completes. The method includes opening the spray device valve to initiate a spray device cycle, running the spray device cycle to wash the lower chamber with fluid, and closing the spray device valve after the spray device cycle completes. The method includes opening a pressure valve to provide PCA to the receiving container.

Abstract: A method and an apparatus for cleaning a channel, especially a transmission and/or cooling channel, in any type of device, machine, installation, and/or tool, particularly in any type of heat exchanger and/or a molding core, cavity and/or insert is proposed, wherein a channel is cleaned through dynamic, bi-directional pulsation of cleaning medium inside the to-be-cleaned channel, the method being realized by a cleaning apparatus equipped with a diaphragm pump module, plugged either only in the feed side of the transmission line or in the feed side and in the return side, which, after connecting the diaphragm pump module to the external energy source and shutting off the flow control system from the reservoir and the feed pump, allows for putting cleaning medium into a state of two-way dynamic pulsating motion.

Abstract: A method for cleaning a breathing apparatus comprising a respiratory mask, by such precleaning activity as: providing the breathing apparatus in an externally contaminated state, providing a holder for the respiratory mask having at least one curved sealing face and stretching the respiratory mask onto the holder such that a sealing lip of the respiratory mask lies on the curved sealing face and closes off an interior of the respiratory mask, and the holder with the respiratory mask may be introduced into a precleaning chamber, exposing an outer side of the respiratory mask in the precleaning chamber to at least one precleaning fluid. And, after the precleaning, the respiratory mask may be released from the holder, introducing the respiratory mask into a primary cleaning chamber and exposing the respiratory mask, including an inner side of the respiratory mask that faces the interior, to a primary cleaning fluid.

Abstract: The present invention provides cleaning solutions for removing ink, coating, varnish, adhesive, etc. residue from printing equipment. The cleaning solutions of the present invention comprise one or more solvents, preferably selected from acetoacetates, alcohols, glycol ethers, glycol esters, terpenes, and water, and are preferably free of surfactants. The cleaning solutions of the invention have a relative evaporation time (RET) of less than 60 seconds, and a ratio of the RET to the radius of the sphere of solubility of the resin in the ink to be removed of less than 6.

Abstract: A cleaning insert for removable arrangement in a cooking space of a cooking appliance includes a receiving device for receiving a cleaning unit with a cleaning composition in a reversibly fixed manner, and a supporting body connected to the receiving device for positioning the receiving device relative to the cooking space.

Abstract: A method for decommissioning a nuclear facility includes: separating a nuclear reactor pressure vessel from biodegradable concrete; decommissioning a concrete structure; covering the biodegradable concrete; and decommissioning the biodegradable concrete.

Abstract: In some embodiments, a sonic cleaning system includes a tank configured to receive a liquid that enables propagation of sonic waves and a cylindrical insert located within the tank. The cylindrical insert includes a first end having a first opening and a second end opposite the first end. The second end has a second opening. The cylindrical insert is configured to suspend a workpiece between the first opening and the second opening. The sonic cleaning system includes a sonic transducer located within the cylindrical insert.

Abstract: A surface treatment method of a Si element-containing wafer including, during a cleaning process of the wafer, forming a water-repellent protective film on at least the recess portion of the uneven pattern by supplying a vapor of a composition containing a water-repellent protective film-forming component and a solvent in a state that a liquid is retained in at least the recess portion of the uneven pattern, changing the vapor of the composition into a liquid and replacing the liquid retained in the recess portion with the liquid of the composition. The water-repellent protective film-forming component consists of a compound of formula [1], and the solvent contains at least an acyclic carbonate. R1x(CH3)3-xSiN(R2)2??[1] R1 is selected from the group consisting of a H and a C1-C10 hydrocarbon group; x is an integer of 1 to 3; and R2 is each independently a group selected from the group consisting of methyl, ethyl and acetyl.

Abstract: A method of removing polyvinyl alcohol (PVA)-based scaffold from a 3D printed part formed by a 3D printing process that renders a finished product for immediate use. The method principally involves preparing an acidic-aqueous cleansing solution comprising a mixture of carboxylic acid and water; immersing the 3D printed part conventionally bonded with PVA-based scaffold into the acidic-aqueous cleansing solution for a select amount of time to break down and remove the PVA-based scaffold from the 3D printed part; and adding to the acidic-aqueous cleansing solution a select quantity of polymeric carbohydrate to crosslink and bond with the PVA-based scaffold to effect dissolution thereof into the acidic-aqueous cleansing solution.

Abstract: An apparatus (100), including: a base (102) configured to retain a liquid therein; an abrasive mat (200) configured to rest on a bottom of the base and to support a saw blade in a horizontal orientation; and a blade slot (612) configured to hold the saw blade in a vertical orientation.

Abstract: A pool chemical injector includes a chamber to hold a volume of a chemical therein, the chamber having a body with a tapered end; an opening to allow for insertion of the chemical into the chamber; an elongated tube to attach to the tapered end of the body; a valve engaged with the tube and to open and close chemical flow through the elongated tube; and an attachment to secure to an end of the elongated tube through which the chemical flows; the elongated tube and attachment deliver the chemical to a floor of the pool.

Abstract: A method of retrofitting an environmental control system of an aircraft includes inserting the orifice plate through the connector slot and the connector ring slot into the receptacle. The method also includes aligning the covering portion with the connector slot.

Abstract: A method for cleaning a paint spray gun, which comprises a rotating atomization head to apply a coating material while rotating and an outer circumferential tube to cover the exterior of the rotating atomization head, has a cleaning solution application step for applying a cleaning solution to the external face of the outer circumferential tube, and a rotating atomization head rotation step for generating a rotational flow between the rotating atomization head and the outer circumferential tube by rotating the rotating atomization head. The cleaning solution flowing down the external face of the outer circumferential tube applied in the cleaning solution application step penetrates between the rotating atomization head and the outer circumferential tube by way of the rotational flow. Such method uses a small amount of cleaning solution for cleaning external and internal faces of the outer circumferential tube and the external face of a rotating atomization head.

Abstract: Methods of removing amine contaminants from equipment used in the production of polyether polyols. These methods include: (a) contacting the equipment with an aqueous solution of a first acid; (b) discharging the aqueous solution of the first acid from the equipment; (c) contacting the equipment with an aqueous solution of an acidic metal conditioner; (d) discharging the aqueous solution of the acidic metal conditioner from the equipment; (e) contacting the equipment with an aqueous solution of an alkali metal hydroxide; and (f) discharging the aqueous solution of the alkali metal hydroxide from the equipment.

Abstract: The present invention provides a method for cleaning a component for use in an ultra-high vacuum. The method may comprise the steps of placing the component to be cleaned in a vacuum furnace chamber; plasma cleaning the component at a temperature of greater than about 80° C.; and evacuating the chamber to a pressure of less than about 10E-5 mbar. Apparatus for performing such methods and kits comprising said components are also provided.

Abstract: The disclosure relates to a method including capturing and/or obtaining a reservoir information item at a dispensing module for a detergent and/or cleaning agent, with the reservoir information item representative of at least one property of a reservoir for the detergent and/or cleaning agent, an application specification for the detergent and/or cleaning agent contained in the reservoir, and/or a property of the detergent and/or cleaning agent contained in the reservoir, and the reservoir is connected or connectable to the dispensing module. The method further includes determining and/or causing the determination of a dispensing control information item depending at least in part on the reservoir information item, with the dispensing control information item configured to at least partly control the dispensing of the detergent and/or cleaning agent by the dispensing module.

Abstract: The substrate processing method includes a hydrophilization step of hydrophilizing a surface of a substrate, a processing liquid supplying step of supplying a processing liquid to the hydrophilized surface of the substrate, a processing film forming step in which the processing liquid supplied to the surface of the substrate is solidified or cured to form a processing film on the surface of the substrate, and a peeling step in which a peeling liquid is supplied to the surface of the substrate to peel the processing film from the surface of the substrate. The peeling step includes a penetrating hole forming step in which the processing film is partially dissolved in the peeling liquid to form a penetrating hole in the processing film.

Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate. The methods can include a) supplying a sublimating material to a substrate having a pattern disposed on a surface thereof; b) maintaining the sublimating material on the surface for a time sufficient to modify the surface; c) solidifying the sublimating material on the surface; and d) removing by sublimation the sublimating material disposed on the surface.

Abstract: A compressed air introduction part (5) capable of introducing compressed air into an air passage (2a) of a cylinder body (2) is provided. The compressed air introduction part (5) has a compressed air exit port (5a) formed in the shape of a ring that extends circumferentially about a cylinder-center axis (C1) of the cylinder body (2). An annular protuberance surface portion (30) is formed on an inner circumferential surface forming the air passage (2a) on an air blowout port (2c) side of the compressed air exit port (5a), and a protuberance surface (30a) of the annular protuberance surface portion (30) is shaped so as to extend from a peripheral edge portion of the air blowout port (2c) side of the compressed air exit port (5a) along the radial direction of the cylinder body (2) and to then gradually curve and extend toward the air blowout port (2c) side.

Abstract: A method for dry cleaning a susceptor is performed after a substrate is removed from a processing chamber of a substrate processing apparatus. In the method, a cleaning gas for dry cleaning is supplied to a first region including a substrate receiving region in the susceptor. The cleaning gas is regionally supplied to a second region where the cleaning gas is difficult to reach when the cleaning gas is supplied to the first region.