Abstract: A polycarbonate dimethacrylate which is the condensation product of 2 parts of hydroxyalkylmethacrylate of the formula ##STR1## in which A is C.sub.1 -C.sub.6 alkylene, and 1 part of a bis(chloroformate) of the formula ##STR2## in which R is C.sub.2 -C.sub.5 alkylene having at least two carbon atoms in its principal chain and n is an integer from 1 to 4, is usable, admixed with a secondary monomer suitable for dental applications, such as BIS-GMA; PUDMA or the like, as an adhesive system for dental restorative materials. Particularly useful is the novel condensation product of 2-hydroxyethylmethacrylate and triethylene glycol bis(chloroformate).

Abstract: Polymer compositions having a first and second portion selected from polypropylenes, polyethylenes, propylene-ethylene copolymers and mixtures thereof having enhanced crystallization properties and a method for producing the same are disclosed. Antioxidant is mixed with the first portion, 0.01 to 1.25 wt %, of the composition which is then irradiated to a dosage of 5-30 Mrads of ionizing radiation in air to induce cross linking. The irradiated first portion is then blended with the non-irradiated second portion. The cross-linked polymer is believed to provide nucleation sites for the initiation of crystallization, thereby enhancing crystallization of the polymer as evidenced by elevated DSC freeze points. Crystallization of the polyolefin is enhanced without any detrimental effects on hexane or xylene extractability of the polymer and without degrading the composition to any appreciable extent.

Abstract: A light-sensitive composition which comprises at least one compound represented by the following general formula (I) as light-free radical generator:S-L-A (I)in formula (I), S represents a light absorbing moiety which absorbs light having a wave length of not less than 300 nm with an absorptivity coefficient of not less than 1000, A represents an active moiety which interacts with the light absorbing moiety S in an excited state to generate free radicals and L represents a group for coupling the moieties S and A; and a photopolymerizable composition which comprises at least one radical polymerizable compound having ethylenically unsaturated group, at least one compound represented by the foregoing general formula (I) as a light-free radical generator and optionally at least one linear organic high molecular weight polymer.

Abstract: A photocurable compound prepared as a starting material by incorporation therein of a composition comprising a fluorescein compound photoreducing dye, tribenzylamine, and at least one specific peroxide permits production of a shaped article which, on exposure to visible light, exhibits high curability and acquires hardness virtually indiscriminately on the obverse and reverse sides of the article. A mixture comprising both or either of an unsaturated polyester resin and an epoxy acrylate resin which are photocurable compounds, glass fibers, and a specific peroxide, is convenient for the production of specific cured shaped articles particularly by the filament winding technique or the drawing technique.

Abstract: Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds are of the general formula ##STR1## where R is alkyl, aryl or a radical R.sup.1 andR.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, OH, OAlkyl, SH, SAlkyl, halogen, N (Alkyl).sub.2 or N (Alkyl) (Aryl) and at least one but not more than three of the radicals R.sup.2 to R.sup.6 is or are a radical ##STR3## where X is alkylene, cycloalkylene, oxaalkylene or arylene, Y is H or CH.sub.3 -- and Z is O or NY.The novel radiation-sensitive ethylenically unsaturated compounds are suitable for the preparation of polymeric radiation-sensitive compounds.

Abstract: A process of producing a water absorptive resin, wherein a water absorptive polymer which comprises cross-linked poly(metal salt of acrylic acid) as a major component is impregnated with water, and the water-impregnated water absorptive polymer is exposed to one of a high-temperature highly-humid atmosphere or a ultraviolet radiation, to thereby partially release the cross-linkage of the cross-linked poly(metal salt of acrylic acid).

Abstract: Xanthate, dithiocarbamate and dithiophosphate salts of transition metals, together with a coinitiator selected from organic halogen and tertiary amine compounds provide light activated initiator systems for radically polymerizable ethylenically unsaturated compounds such as (meth)acrylate esters.

Abstract: A process for producing a rubber product by vulcanizing a molded article composed of a rubber composition containing a peroxide as a crosslinking agent in the presence of oxygen, wherein said molded article is irradiated with electron beams, is disclosed. The rubber article produced by the invention is not sticky on the surface and exhibits excellent tensile properties.

Abstract: Resin compositions comprising 20 to 50% by weight, based on total composition weight, of a first resin which comprises an acrylate-epoxy oligomer having a molecular weight of from 2000 to 5000; from 2 to 10% of a second resin which comprises an acrylate-urethane oligomer; up to 50% of a third resin which comprises a second acrylate-epoxy oligomer, where from 1 to 5% of the epoxy is an epoxy novolac; from 10 to 40% of a liquid acrylate; from 2 to 20% of a liquid diacrylate having an ether linkage; from 5 to 25% of a liquid alkylene diacrylate; and from 1 to 5% of a UV photoinitiator. The compositions also preferably includes from 0.05 to 1% of a flow control agent. The compositions are applied to substrates such as printed wiring boards and cured with ultraviolet light to form a conformal coating on the substrate.

Abstract: A process for texturing a coating via exposing a photocurable composition comprising a multifunctional urea compound, an ethylenically unsaturated compound, and an aromatic ketone photosensitizer that functions through a hydrogen abstraction mechanism when exposed to ultraviolet light.

Abstract: A photocurable resin composition for glass lamination, consisting essentially of a radical polymerizable monomer having at least one repeating units of ethylene oxide in its molecule and terminated with allyl, acrylate or methacrylate groups, and a photopolymerization initiator, a cured product of which has a volume resistivity of less than 5.times.10.sup.9 .OMEGA..multidot.cm. Addition of a polythiol provides an ene/thiol cure.

Abstract: A pressure sensitive adhesive is prepared by the polymerization of an appropriate acrylic ester formulation of the type that includes an ethylenically unsaturated monomer having a polar group, and at least part of such polymerization is accomplished by photopolymerization using a source of ultraviolet radiation that provides a substantial portion of its ultraviolet radiation in the wavelength band of from about 280 to about 350 nm and a light intensity at the surface of the formulation being polymerized of no more than about 4.0 milliwatts/cm.sup.2.

Abstract: Tris(norbornenyl) isocyanurate compounds of the formula: ##STR1## wherein R.sup.1 is either H or methyl group, are prepared from the base-catalyzed trimerization of norbornenyl isocyanate. Tris(norbornenyl) isocyanurate is suitable for use as a crosslinker in thiol-ene formulations containing a difunctional thiol oligomer or in systems containing norbornene-difunctional oligomers and polyfunctional thiols, producing improved high temperature properties for the cured compositions.

Abstract: Agents which are curable by ultraviolet radiation are based on a binder formulation of (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of polyolefinically unsaturated compounds. The agents contain copolymers (1) which are obtainable by subjecting a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated photoinitiator and (C) from 0 to 10% by weight of a polymerization-regulating photoinitiator to free radical polymerization, the sum of (B) and (C) being not less than 0.1% by weight and the stated percentages by weight being based on the sum of the weights of (A)+(B)+(C).

Abstract: A process for the preparation of an oriented homo- or co-polyalkene material of improved strain rate sensitivity, which process comprises subjecting the oriented homo- or co-polyalkene material having a weight average molecular weight (M.sub.w).ltoreq.350,000, a number average molecular weight (M.sub.n).gtoreq.5,000, and a 2% secant modulus of at least 10 GPa at a strain rate of 2.times.10.sup.-5 sec.sup.-1 to a high energy irradiation of a dosage of at least 1 Mrad and not more than 60 Mrads at an elevated temperature in vacuo or in an inert or sensitizing atmosphere.

Abstract: A photocurable composition based on a cycloaliphatic polyepoxide, a poly(tetramethylene oxide)polyol and photoinitiator; and a printed circuit board having as a conformal coating thereon, the cured product of the photocurable composition.

Abstract: A method of profile lapping adhesion which comprises:coating on a film or sheet, or a substrate, or both of these an adhesive composition which comprises:(a) an epoxy resin or an isocyanate compound,(b) a curing agent for the epoxy resin or the isocyanate compound, and(c) a photopolymerizable vinyl compound:irradiating the adhesvie compoisiton;laminating the sheet or film to the substrate while the sheet or film is wrapped around the substrate; andcuring the adhesive composition.An adhesive composition especially suitable for use in the profile lapping adhesion is provided, which comprises:(a) a photopolymerizable compound which has a number average molecular weight of not less than about 3000 and at least one photopolymerizable double linkage in the molecule;(b) a photopolymerizable monomer which has a molecular weight of about 200-800; and(c) an isocyanate compound.

Abstract: Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylmethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.

Abstract: Pressure-sensitive acrylate-based adhesive copolymers comprising polymerized acrylate units and polymerized fluorochemical surfactant units and a process for preparing same. Also prepolymeric compositions comprising the monomeric components of an acrylate-based pressure-sensitive adhesive and a polymerizable fluorochemical surfactant. The prepolymeric compositions generally have surface energy lower than that of the monomeric components of the acrylate-based pressure sensitive adhesive alone. Also, the adhesive compositions better maintain adhesive properties when aged when compared to corresponding adhesive compositions involving non-polymerizable fluorochemical surfactants.

Abstract: The photopolymerizable composition described containsA) at least one ethylenically unsaturated photopolymerizable compound,B) a photoinitiator of the formula I ##STR1## and C) a photosensitizer from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxanthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitizers C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.