Abstract: Disclosed are C.sub.6 to C.sub.11 branched chain alkoxy monosubstituted diaryl iodonium salts, such as [4-(2-ethylhexyloxy)phenyl]phenyliodonium hexafluoroantimonate. These diaryl iodonium salts are useful as photoinitiators for epoxy containing compounds, especially epoxysilanes.
Type:
Grant
Filed:
May 29, 1990
Date of Patent:
September 1, 1992
Assignee:
Minnesota Mining and Manufacturing Company
Abstract: In-situ development of an ultraviolet absorber is provided by a compound such as a hydroxy-phenyl-triazole containing a group which protects the absorber during actinically activated polymerization by light at first frequency. After polymerization the protective group is removed by actinic reaction at a second frequency lower than the first frequency. The protective group is formed by replacing the hydrogen of the hydroxyl group with an acyl group containing 1 to 3 carbon atoms or an acryloxy group of the formula: ##STR1## where R.sup.1 is either an alkyl containing 1 to 6 carbon atoms or --CH.dbd.CH.sub.2.
Abstract: Disclosed in the present application is a method of curing a dental impression material by passing actinic light through a tray while the tray is in contact with the impression making composition, a new dental impression composition that is polymerizable by having an initiator activated by actinic light within the visible light range of 360 to 600 nanometers, a new composition of matter that is a compound having at least two terminal acrylate unsaturations and an organosilicone containing backbone and a new method of forming dental prosthetics by directly forming against the soft tissue of the oral cavity and then setting with visible light curing.
Abstract: A dental cement system containing a photocurable ionomer, reactive powder and water undergoes both a conventional setting reaction and a photocuring reaction.The cement system can provide a long working time and can be cured on demand by exposure to an appropriate source of radiant energy. The surface of the cement cured in this manner is then hard enough to allow subsequent clinical procedures to be performed, while the ongoing chemical-cure "setting" reaction hardens the remainder of the cement.
Type:
Grant
Filed:
February 19, 1991
Date of Patent:
July 14, 1992
Assignee:
Minnesota Mining and Manufacturing Company
Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerizable composition. The composition comprises a polymerizable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodized aluminum and the plate is useful in the production of lithographic printing plates.
Type:
Grant
Filed:
October 5, 1989
Date of Patent:
July 14, 1992
Assignee:
Vickers Plc
Inventors:
John R. Wade, Rodney M. Potts, Michael J. Pratt
Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I ##STR1## where R is a certain alkyl radical, an aryl radical or a radical R.sup.1 and R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, a non-ortho OH group, OCH.sub.3, OC.sub.2 H.sub.3, SH, SCH.sub.3, Cl, F, CN, COOH, COO(C.sub.1 -C.sub.3 -alkyl), CF.sub.3, N(CH.sub.3).sub.2, N(C.sub.2 H.sub.5).sub.2, N(CH.sub.3)C.sub.6 H.sub.5, .sup.+ N(CH.sub.3).sub.3 X.sup.- or .sup.+N(CH.sub.3).sub.X X.sup.-, where X.sup.- is an acid anion, and one or more of the radicals R.sup.2 to R.sup.
Type:
Grant
Filed:
December 15, 1989
Date of Patent:
July 7, 1992
Assignee:
BASF Aktiengesellschaft
Inventors:
Gerd Rehmer, Andreas Boettchher, Gerhard Auchter
Abstract: A hot melt adhesive crosslinkable by UV irradiation comprising a hot melt adhesive base, a saturated hydrocarbon oligomer containing at least one acryloyl group in a molecule for affording crosslinkability by UV irradiation, and a photopolymerization initiator, an optical disc comprising a pair of substrate, at least one of which is provided with an information recording layer, adhered to each other by means of a hot melt adhesive crosslinkable by UV irradiation and the process for preparing the same are disclosed. The adhesive of the present invention has a high heat resistance and heat stability, is applicable at a low temperature and at a low viscosity, has high softening point and high viscosity by UV irradiation. The optical disc of the present invention has high productivity, no corrosion and high heat resistance.
Abstract: A transparent polyurethane layer which is resistant to fogging. The layer contains monomers and/or oligomers of acrylic acid or of salts of said acid grafted radiochemically to the surface of said layer. The layer is used as a coating layer for laminated glazings.
Abstract: What is provided herein are radiation curable compositions containing(a) multifunctional vinyl ether monomers having the formula:X--R.sub.1 --Y.sub.1 --R.sub.2 --Y.sub.2).sub.n CH.dbd.CH.sub.2 ].sub.mwhereX is a 5-8 membered ring, saturated or unsaturated;R.sub.1 is a direct bond or C.sub.1 -C.sub.10 straight or branched chain alkylene;Y.sub.1 and Y.sub.2 are independently oxygen or sulfur;R.sub.2 is C.sub.2 -C.sub.10 straight or branched chain alkylene;n is 0-10; andm is 3-5;(b) a cationic initiator, and, optionally,(c) a polymerizable vinyl ether, epoxide, or acrylate oligomer.
Type:
Grant
Filed:
November 3, 1989
Date of Patent:
April 21, 1992
Assignee:
ISP Investments Inc.
Inventors:
Kou-Chang Liu, Fulvio J. Vara, James A. Dougherty
Abstract: A cured composition possessing excellent cohesive strength at high temperatures along with excellent adhesion, shear strength and solvent resistance is prepared by the high energy ionizing radiation initiated curing of a polymer composition comprising an alkenyl arene/conjugated diene block copolymer and a oligomer such that the unsaturation index of the composition is minimized. The radiation initiated curing of the adhesive composition is accomplished without requiring the aid of a coupling agent to promote crosslinking of the block copolymer during exposure to the radiation.
Abstract: Photocurable compositions with, as photoinitiator, sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R.sub.1 is a divalent organic bridge; each R.sub.2 and R.sub.3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R.sub.2 and R.sub.3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
Type:
Grant
Filed:
July 10, 1991
Date of Patent:
April 7, 1992
Assignee:
IBM
Inventors:
Raymond W. Angelo, Jeffrey D. Gelorme, Joseph P. Kuczynski, William H. Lawrence, Socrates P. Pappas, Logan L. Simpson
Abstract: A circuit board with insulated wire thereon is encapsulated with a photocurable adhesive composition comprising a phenoxy resin; a reaction product of an unsaturated carboxylic acid and epoxidized non-linear novolak; reaction product of an unsaturated carboxylic acid and a tetrabrominated diglycidyl ether of a phenol; monohydroxy dipentaerythritol acrylate and/or pentaerythritol tetraacrylate; polyethylenically unsaturated compound; and photoinitiator, and optionally, hexamethylol melamine-formaldehyde; and/or a thixotropic agent.
Type:
Grant
Filed:
May 24, 1991
Date of Patent:
March 24, 1992
Assignee:
IBM Corporation
Inventors:
Jeffrey D. Gelorme, Eugene R. Skarvinko
Abstract: Radiation-curable catalysts are obtainable by reactingA) 1 equivalent of a dihydric to hexahydric oxyalkylated C.sub.2 -C.sub.10 -alcohol withB) from 0.05 to 1 equivalent of a dibasic to tetrabasic C.sub.3 -C.sub.36 -carboxylic acid or its anhydride andC) from 0.1 to 1.5 equivalents of acrylic acid and/or methacrylic acidand reacting the excess carboxyl groups with an equivalent amount of epoxide compound, and are used in radiation-curable coating materials.
Type:
Grant
Filed:
April 3, 1990
Date of Patent:
March 17, 1992
Assignee:
BASF Aktiengesellschaft
Inventors:
Erich Beck, Wolfram Weiss, Horst Schmidt
Abstract: Compounds of the formula I ##STR1## in which n is 1-30 and X, Y, R, Ar.sup.1 and Ar.sup.2 are as defined in claim 1 can be prepared by reaction of a benzil dialkyl ketal with a diol. Depending on the molar ratio of the two reaction components, products having a different polycondensation degree n are obtained. the compounds can be used as photoinitiators.
Type:
Grant
Filed:
April 27, 1990
Date of Patent:
March 10, 1992
Assignee:
Ciba-Geigy Corporation
Inventors:
Rinaldo Husler, Rudolf Kirchmayr, Werner Rutsch, Manfred Rembold
Abstract: Compounds of the formula ##STR1## in which a is 1, 2, or 3, R.sup.1 is an uncharged, carbocyclic or heterocyclic aromatic ring, unsubstituted or substituted, R.sup.2 is an unsubstituted or substituted cyclopentadienyl or indenyl anion, and .vertline.X.vertline..sup.a- is an a-valent anion, are suitable for use as latent curing catalysts for two-component polyurethane coatings which are activated by irradiation with actinic light or by heating.
Type:
Grant
Filed:
November 18, 1988
Date of Patent:
February 25, 1992
Assignee:
Ciba-Geigy Corporation
Inventors:
Godwin Berner, Manfred Rembold, Franciszek Sitek, Werner Rutsch
Abstract: An energy polymerizable composition and process therefore, comprising a cationically polymerizable material and a catalytically effective amount of an ionic salt of an organometallic complex cation as polymerization initiator, said ionic salt of an organometallic complex cation being capable of adding an intermediate strength nucleophile or upon photolysis capable of liberating at least one coordination site, said metal in said organometallic complex cation being selected from elements of Periodic Groups IVB, VB, VIB, VIIB, and VIIIB are disclosed. Certain of the organometallic metallic polymerization initiators are novel cationic salts.
Type:
Grant
Filed:
November 22, 1982
Date of Patent:
February 18, 1992
Assignee:
Minnesota Mining and Manufacturing Company
Abstract: Disclosed are siloxanyl-substituted diaromatic iodonium salts such as 4-[3-1,1,3,3,5,5,5-heptamethyl siloxanyl propoxy]phenyl-phenyliodonium hexafluoroantimonate. These diaryl iodonium salts are useful as photoinitiators for epoxy containing compounds, especially epoxypolysiloxanes. Also disclosed is a process for the preparation of a siloxanyl-substituted diaromatic iodonium salt.
Type:
Grant
Filed:
December 14, 1990
Date of Patent:
February 4, 1992
Assignee:
Minnesota Mining and Manufacturing Company
Abstract: A thermosetting resin composition of highly satisfactory storage stability comprises 100 parts by weight of a thermosetting resin composition, 0.0001 to 2.0 parts by weight of a thiuram compound possessing at least one atomic group represented by the following formula: ##STR1## wherein p stands for an integer in the range of 1 to 8, and 0.00001 to 0.1 part by weight (as copper metal) of a copper-containing compound.
Abstract: The current invention provides a photopolymerized pressure-sensitive adhesive which adheres well to all common surfaces and has an outstanding ability to bond to plasticized vinyl substrates and to remain firmly bonded thereto even after the in contact therewith for extended periods of time comprising the photopolymerization reaction product of a mixture containing about: 60-95 parts of alkyl acrylate; 5-40 parts monoethylenically unsaturated polar copolymerizable monomer; 10-30 parts ethylene vinylacetate copolymer containing about 40% to 70% vinylacetate; and 0.1-1 part photoinitiator.
Type:
Grant
Filed:
May 12, 1989
Date of Patent:
January 7, 1992
Assignee:
Minnesota Mining and Manufacturing Company
Inventors:
Yvan A. Bogaert, Martine H. A. Deketele
Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
Type:
Grant
Filed:
March 28, 1990
Date of Patent:
December 31, 1991
Assignee:
Ciba-Geigy Corporation
Inventors:
Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek