Patents Examined by Bernard Codd
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Patent number: 6225174Abstract: This invention teaches methods and apparatus for forming self-aligned photosensitive material spacers about protruding structures in semiconductor devices. One embodiment of the invention is a method for forming a lightly doped drain (LDD) structure, utilizing disposable photosensitive material spacers. A second embodiment of the invention comprises a method for forming a transistor, having salicided source/drain regions, utilizing photosensitive polyimide spacers for forming the salicided source/drain regions, without disposing of the spacers. A third embodiment of the invention comprises a method for creating an offset from a protruding structure on a semiconductor substrate, using disposable photosensitive material spacers.Type: GrantFiled: June 13, 1996Date of Patent: May 1, 2001Assignee: Micron Technology, Inc.Inventors: Nanseng Jeng, Christophe Pierrat
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Patent number: 6221564Abstract: This invention teaches methods and apparatus for forming self-aligned photosensitive material spacers about protruding structures in semiconductor devices. One embodiment of the invention is a method for forming a lightly doped drain (LDD) structure, utilizing disposable photosensitive material spacers. A second embodiment of the invention comprises a method for forming a transistor, having salicided source/drain regions, utilizing photosensitive polyimide spacers for forming the salicided source/drain regions, without disposing of the spacers. A third embodiment of the invention comprises a method for creating an offset from a protruding structure on a semiconductor substrate, using disposable photosensitive material spacers.Type: GrantFiled: August 13, 1998Date of Patent: April 24, 2001Assignee: Micron Technology, Inc.Inventors: Nanseng Jeng, Christophe Pierrat
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Patent number: 6201179Abstract: An integrated solar power collector system for direct installation on an upholding structure includes a plurality of first array of photovoltaic modules. Each array comprises a substrate, defining a module support area, an anchoring zone, a first interlocking zone and a second interlocking zone on an opposite side of the first substrate from the first interlocking zone. A array also comprises collecting surface with a plurality of photovoltaic modules arranged proximal to each other on the module support area so as to leave a minimal residual space between the modules. The substrates are made of a corrugated material so as to present an increased support for the modules and to provide channels for channels for removing the heat dissipated by the modules. Each array is fixed to an upholding structure along the anchoring zone and the first interlocking zone and is fixed to a neighboring module along the second interlocking zone.Type: GrantFiled: October 2, 1998Date of Patent: March 13, 2001Inventor: Nick Dalacu
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Patent number: 6187448Abstract: An encapsulant material includes a layer of metallocene polyethylene disposed between two layers of an acid copolymer of polyethylene. More specifically, the layer of metallocene polyethylene is disposed adjacent a rear surface of the first layer of the acid copolymer of polyethylene, and a second layer of the acid copolymer of polyethlene is disposed adjacent a rear surface of the layer of metallocene polyethylene. The encapsulant material can be used in solar cell module and laminated glass applications.Type: GrantFiled: March 6, 1998Date of Patent: February 13, 2001Assignee: Evergreen Solar, Inc.Inventors: Jack I. Hanoka, Peter P. Klemchuk
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Patent number: 6146803Abstract: In a liquid toner for use in imaging processes which comprises pigmented polymer particles, at least one charge director and a hydrocarbon liquid toner carrier, the polymer is a blend of at least two distinct polymer components, the blend being characterized in that in a 40% non-volatile mixture with a hydrocarbon liquid toner carrier, it has on a semi-logarithmic viscosity vs. temperature cooling curve, a break-point at a temperature below about 65.degree. C. at a viscosity of between about 3.times.10.sup.5 centipoises and about 5.times.10.sup.6 centipoises. The polymer blend and an electrostatic imaging process (particularly one using an intermediate transfer member) utilizing the above toner are also claimed. Use of such polymer blends enables liquid toner to be applied in such processes at no more than and in some cases less than the customary processing temperatures.Type: GrantFiled: February 28, 1994Date of Patent: November 14, 2000Assignee: Indigo N.V.Inventors: Benzion Landa, Peretz Ben-Avraham, Becky Bossidan
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Patent number: 6136486Abstract: The invention is a self-cross-linked polyvinyl butyral (PVB) binder for organic photoconductors (OPC's) used in electrophotography. The no cross-linked form of the binder is available from Monsanto Co. in the U.S.A. a Butvar.TM., and from Sekisui Chemical Co. in Japan as Slek.TM.. I discovered that the PVB may be self-cross-linked by subjecting it to a thermal cure at between about 150.degree.-300.degree. C. for about 2 hours. I think other ways of cross-linking, for example, e-beam, UV or X-ray radiation, will achieve results similar to those I obtained with heat. No cross-linker, nor cross-linkable copolymer nor catalyst is required to accomplish the cross-linking. After self-cross-linking, the PV has good mechanical durability and good anti-solvent characteristics. In addition, he self-cross-linked PVB's glass transition temperature (T.sub.g) increases from about 65.degree. C. to about 170.degree. C.Type: GrantFiled: October 20, 1994Date of Patent: October 24, 2000Assignee: Hewlett-Packard CompanyInventor: Khe Chanh Nguyen
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Patent number: 6133520Abstract: A thermophotovoltaic cell and diode photodetector having improved open circuit voltage and high internal efficiency includes a semiconductor body having regions of n-type conductivity and p-type conductivity adjacent each other to form a p-n junction therebetween. The p-type region is of a material having a band gap which will absorb black-body radiation and the n-type region is of a material having a wider band gap than that of the p-type region. This forms a heterojunction between the two regions. The region of n-type region has a doping level which is an order of magnitude less than the doping level in the p-type region. This structure forms a cell having a space charge region in the n-type region.Type: GrantFiled: November 12, 1998Date of Patent: October 17, 2000Assignee: Sarnoff CorporationInventors: Dmitri Zalmanovich Garbuzov, Victor Borisovich Khalfin, Ramon Ubaldo Martinelli, Hao Lee, Nancy Ann Morris, John Charles Connolly
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Patent number: 6130380Abstract: In a solar cell, a crystal defect layer by ion implantation or an amorphous layer by ion implantation is formed between p type diffusion layers provided in an island-like manner at a side opposite to a light receiving surface of a low concentration p type semiconductor single crystalline substrate. The element of the ion implantation may be at least one selected from the group consisting of hydrogen, silicon, germanium, fluorine, oxygen and carbon. The constituent substance of the semiconductor substrate, such as Si is preferably used for the ion implantation. In such a solar cell structure having the crystal defect or amorphous layer, relatively long wavelength light that could not effectively be utilized in the prior art solar cell may be utilized so that the photoelectric conversion efficiency may be improved.Type: GrantFiled: April 28, 1998Date of Patent: October 10, 2000Assignee: Sharp Kabushiki KaishaInventor: Kazuyo Nakamura
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Patent number: 6127082Abstract: An apparatus and method are described for supplying material to a substrate (109). The apparatus includes a member (3) having a surface with a plurality of features (8) which locate, in use, menisci of a liquid (1) supplied to the member. An actuator (4) induces mechanical vibrations within the liquid located by the features to cause liquid droplets (7) to be sprayed. Liquid (1) is supplied to the member and electrical charge is supplied to the member and electrical charge is supplied to the liquid by, for example, an electrode (14). Electrical charge or potential is also supplied to the substrate (109) so that the droplets are directed towards the substrate to deposit material thereon.Type: GrantFiled: January 12, 1998Date of Patent: October 3, 2000Assignee: TCC Group PLCInventors: Victor Carey Humberstone, Andrew Jonathan Sant, David Mark Blakey, Peter John Taylor, Richard Wilhelm Janse Van Rensburg
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Patent number: 6120977Abstract: An exposure technique which accomplishes high transparency and the prevention of influence of reflected light in the ultraviolet region of KrF excimer laser light, the technique being capable of decreasing reflected light by employing a base polymer having high transparency in the ultraviolet region and by employing a bleaching agent in combination with a photo acid generator, the bleaching agent being capable of preventing the formation of eaves in an upper portion of a resist pattern.Type: GrantFiled: April 3, 1996Date of Patent: September 19, 2000Assignee: Fujitsu LimitedInventors: Yuko Kaimoto, Satoshi Takechi, Akira Oikawa
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Patent number: 6114046Abstract: An encapsulant material includes a layer of metallocene polyethylene disposed between two layers of ionomer. More specifically, the layer of metallocene polyethylene is disposed adjacent a rear surface of the first ionomer layer, and a second layer of ionomer is disposed adjacent a rear surface of the layer of metallocene polyethylene. The encapsulant material can be used in solar cell module and laminated glass applications.Type: GrantFiled: July 24, 1997Date of Patent: September 5, 2000Assignee: Evergreen Solar, Inc.Inventor: Jack I. Hanoka
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Patent number: 6110637Abstract: A photoresist suitable for the production of structures in the submicron range contains the following components:a polymer component with carboxylic acid anhydride functions and carboxylic acid tert. butyl ester groupsa photoinitiator which releases an acid when exposed anda suitable solvent.Type: GrantFiled: February 9, 1995Date of Patent: August 29, 2000Assignee: Siemens AktinegesellschaftInventors: Recai Sezi, Rainer Leuschner, Horst Borndoerfer, Michael Sebald, Siegfried Birkle, Hellmut Ahne
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Patent number: 6107116Abstract: A photovoltaic element is formed by providing a substrate under vacuum; introducing a sputter gas and applying RF power to generate a plasma and provide a photovoltaic element having a substrate, a zinc oxide layer containing fluorine on the substrate, wherein a fluorine-containing zinc oxide layer is employed as a target.Type: GrantFiled: August 17, 1998Date of Patent: August 22, 2000Assignee: Canon Kabushiki KaishaInventors: Toshimitsu Kariya, Keishi Saito
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Patent number: 6103435Abstract: An electrophotographic photoconductor includes an electroconductive support and a photoconductive layer formed thereon which contains a compound having a charge generating moiety and a charge transporting moiety in the molecule thereof. As such a compound for use in the electrophotographic photoconductor, various compounds having a charge generating moiety derived from an azo compound and a charge transporting moiety derived from a triarylamine compound are proposed. Bisazo and trisazo compounds serving as such compounds are also proposed, together with intermediates for producing the bisazo and trisazo compounds.Type: GrantFiled: May 17, 1999Date of Patent: August 15, 2000Assignee: Ricoh Company, Ltd.Inventors: Tomoyuki Shimada, Masaomi Sasaki, Chiaki Tanaka
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Patent number: 6096460Abstract: Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1.2 to 2.0, preferably in the range from 1.26 to 1.8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0.04 to 0.8, preferably in the range from 0.06 to 0.59 at the selected lithographic wavelength below 400 nm.Type: GrantFiled: April 20, 1999Date of Patent: August 1, 2000Assignee: E. I. du Pont de Nemours and CompanyInventors: Roger Harquail French, Kenneth George Sharp
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Patent number: 6096483Abstract: The present invention provides a curable composition which comprises (A) a base-generating substance which generates a base when exposed to the action of ultraviolet light, (B) a siloxane polymer which has silicon-hydrogen bonds (Si--H) capable of reacting with hydroxy groups under the effect of the base to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2), and (C) an acid substance. This composition is cured by irradiation with ultraviolet light. During this ultraviolet irradiation, a mask is placed between a coating film of the composition and the radiation source, and the uncured portions of the composition are dissolved and removed so that a pattern is formed. The residual portions are then heated to produce a pattern-cured product.Type: GrantFiled: March 31, 1997Date of Patent: August 1, 2000Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 6093509Abstract: A lithographic printing plate, in which (1) the non-image area of a hydrophilic swellable layer is 1 to 50 g/m.sup.2 in water absorbability, and the water absorbability of the image area is less than that of the non-image area, (2) the non-image area of a hydrophilic swellable layer is 0.01 to 10 kg/mm.sup.2 in initial modulus, and the initial modulus of the image area is larger than that of the non-image area, (3) the non-image area of a hydrophilic swellable layer is 10 to 2000% in water swelling ratio, and the water swelling ratio of the image area is less than that of the non-image area, or (4) the hydrophilic swelling layer has a phase separated structure consisting of at least two phases; a phase mainly composed of a hydrophilic polymer and a phase mainly composed of a hydrophobic polymer, can be produced from a new photosensitive lithographic original plate simple in development treatment, highly repellent against ink even without being etched, and allowing the use of pure water as dampening water.Type: GrantFiled: December 10, 1996Date of Patent: July 25, 2000Assignee: Toray Industries, Inc.Inventors: Masanao Isono, Yuzuru Baba, Norikazu Tabata, Norimasa Ikeda
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Patent number: 6091020Abstract: A concentrating coverglass allows efficient power generation for providing higher specific powers by space power arrays with weight penalties being countered by combining the functions of a solar concentrator and protective coverglass into a single element. A preferred frustoconical lens achieves a concentration ratio of about 4.5 at a thickness of about 1.0 mm. Efficient space power arrays with relatively wide tracking angle tolerance of up to about .+-.5.degree. using these coverglasses permit heavier payloads in the satellite's operating systems over traditional satellite designs.Type: GrantFiled: October 16, 1997Date of Patent: July 18, 2000Assignee: The Boeing CompanyInventors: Eugene S. Fairbanks, John William Yerkes
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Patent number: 6087073Abstract: There is described a method of preparing a water-less lithographic plate by coating a positive working photosensitive composition onto an oleophilic base imagewise exposing the plate and developing it to remove the areas of the photosensitive composition which have been light exposed, coating overall the surface of the plate with a layer of a composition which is ink-releasing or when cured becomes ink releasing, then either as a separate step or as a combined step curing the ink-releasing composition or drying the ink-releasing composition and light exposing overall the plate, then redeveloping the plate to remove the photosensitive composition remaining after the first development and any ink-releasing composition overlying the photosensitive composition.Type: GrantFiled: September 18, 1997Date of Patent: July 11, 2000Assignee: Kodak Polychrome Graphics L.L.C.Inventors: Peter Andrew Reath Bennett, Carole-Anne Smith
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Patent number: RE36935Abstract: A method of reproducing multiplex images wherein an electrostatic image is formed on an image retainer by using a common electrostatic image forming device, the electrostatic image formed on the image retainer is developed, the steps of the above are repeated to superpose a plurality of toner images on the image retainer, and the toner images is transferred on a recording paper by one step. The developings other than the first time developing are carried out in such a manner that the surface of a developer layer on a developer feeding carrier does not contact with the surface of the toner image on the image retainer.Type: GrantFiled: September 5, 1995Date of Patent: October 31, 2000Assignee: Konica CorporationInventors: Satoshi Haneda, Hisashi Shoji, Seiichiro Hiratsuka