Abstract: The present invention is directed to a plasma treating apparatus, for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated, which includes a hot air heating system for heating the dielectric container by blowing hot air to a central location on the outside surface of the dielectric container.The present invention is further directed to a plasma treating method for generating plasma in a dielectric container and for,treating the surface of a substrate with the plasma generated which includes hot air heating for heating the dielectric container by blowing hot air to the outside surface of the dielectric container to a temperature at which a thin film does not deposit on the inside surface of the dielectric container.

Abstract: An optical fiber is releasably held in coil or skein form by a magnetized in film coating on the fiber. Adjacent convolutions are held together by a magnetic field to prevent unintended unravelling of the coil, but the fiber can be rapidly played out at high speed without rupture and with a constant release tension force. The magnetic field has a radial and axial component relative to the coil cylinder. A magnetizing apparatus is disclosed for magnetizing the film. A sensor feedback loop can dynamically adjust the reel-out drag force to dampen vibration modes during reel out which can cause tangle.

Abstract: A process for preparing a coated substrate in which mist particles are created from a dilute liquid, the mist particles are contacted with a pressurized carrier gas and contacted with radio frequency energy while being heated to form a vapor, and the vapor is then deposited onto a substrate. The coated substrate is then heated to a temperature of 450 to 1,400 degrees centigrade for at least ten minutes.

Abstract: A method for producing a magnetic recording medium having a magnetic layer having a two-layered structure positioned on a substrate, which includes forming the magnetic layer on the substrate by a vacuum deposition process during the travel of the substrate on a cylindrical can, wherein a first evaporation source and a second evaporation source are positioned on the same side of a vertical line passing across a longitudinal axis of the cylindrical can while confronting the cylindrical can, a shield plate having a first opening and a second opening is positioned between the cylindrical can and the first and second evaporation sources, each of vapors evaporated from the first and second evaporation sources passes through the first and second openings, respectively, a distance between the vertical line passing across the longitudinal axis of the cylindrical can and a center of an evaporation part of the first evaporation source is longer than a radius of the cylindrical can, and a distance between the vertical l

Abstract: A ceramic coating bonded to an iron tubular member comprising a bonding layer formed on a surface of the iron tubular member by a reaction of an iron tubular oxide layer of the iron tubular member and a silicate; and an iron oxide diffusion-preventing layer produced from fine metal oxide particles or an organometallic binder by firing on a surface of the bonding layer. The ceramic coating may further comprises an oxidation-preventing layer, a heat-insulating layer, a refractory layer or a thin dense protective layer. It may be produced by coating the surface of the iron tubular member with a silicate binder to form a layer which is then converted to a bonding layer by a heat treatment in a steam atmosphere; coating the surface of the bonding layer with fine metal oxide particles or an organometallic binder to form an iron oxide diffusion-preventing layer; and after curing and drying firing the resulting ceramic coating in an atmosphere having an oxygen partial pressure of 10 mmHg or less.

Abstract: A silicone rubber potting compound contains an alkoxysilane (.gamma.-glycidoxypropyltrimethoxysilane) as an adhesion promoter. Harmful effects caused by the adhesion promoter are alleviated by using as an additive a titanate having the form Ti(OR).sub.4, where R is an isopropyl, butyl, octyl, or acetylacetonate.

Abstract: A process for providing the surface of a film made from a weldable polymer material with projections. The projections are formed by particles which are applied, in particular sprayed, in the molten state onto the film surface. The welding factor is preferably significantly below 1.

Abstract: A method for forming a coating film is here disclosed which comprises the steps of coating a member with a coating material containing a pigment for a thermosetting base coat, overcoating the coated member with a coating material for a thermosetting clear coat in a wet-on-wet coating manner, and then thermosetting the uncured coating films simultaneously;a binder component in the coating material for the base coat comprising50 to 90% by weight of an acrylic copolymer having a hydroxyl value of from 40 to 80 mg KOH/g and an acid value of from 0.5 to 30 mg KOH/g and a glass transition temperature of from -40.degree. to 20.degree. C. which is obtained by copolymerizing 10 to 40% by weight of a hydroxyl group-containing (meth)acrylic ester, 0.2 to 10% by weight of a carboxyl group-containing vinyl monomer, 30 to 89.

Abstract: Ordered polymer fibers, such as aramid or polybenzazole, can be coated with a ceramic coating by physical vapor deposition to yield a coated fiber having improved properties.

Abstract: To achieve a high adhesive strength of a metallization on an enamel, the surface of the enamel is first roughened and simultaneously treated by ultrasound to remove loose particles. Then the layer is conditioned by a wetting agent, activated and the metal layer is deposited chemically. Particularly good results are obtained when the conditioning and activation of the surface are performed at a temperature slightly elevated above room temperature, about 40.degree. C., for about 5 minutes and the roughening is performed chemically by treating with a 2% solution of ammonium hydrogen fluoride.

Abstract: A method of forming a high flux of activated species, such as ions, of an energy transferring gas by employing a substantial pressure differential between a first conduit in which the energy transferring gas is introduced into a vacuumized enclosure and the background pressure which exits in said enclosure. In one embodiment, the flow rate of the energy transferring gas flowing through said first conduit, when taken in conjunction with said pressure differential, causes the high flux to activated species of the energy transferring gas to collide with a precursor deposition/etchant gas, remotely introduced into the enclosure through a second conduit, for forming deposition/etchant species therefrom. In an alternate embodiment, the pressure differential causes those activated species, themselves, to be either deposited upon or etched away from the surface of a remotely positioned substrate.

Abstract: According to the present invention, there is provided an improved process for the formation of a deposited film by way of a microwave plasma CVD method, the improvement comprising monitoring an effective power of a microwave to be introduced into a reaction chamber, leading to a control means an output signal indicative of the effective power corresponding a plasma intensity, and automatically controlling the matching between the reaction chamber and the microwave to be introduced into the reaction chamber according to an output signal from the control means. According to the above process, even after a long discharge time has elapsed, the plasma intensity in the reaction chamber may be maintained constant, and the effective power of the microwave to be introduced into the reaction chamber may be therefore maintained constant.

Abstract: A method of forming a high flux of activated species, such as ions, of an energy transferring gas by employing a substantial pressure differential between a first conduit in which the energy transferring gas is introduced into a vacuumized enclosure and the background pressure which exits in said enclosure. In one embodiment, the flow rate of the energy transferring gas flowing through said first conduit, when taken in conjunction with said pressure differential, causes the high flux of activated species of the energy transferring gas to collide with a precursor deposition/etchant gas, remotely introduced into the enclosure through a second conduit, for forming deposition/etchant species therefrom. In an alternate embodiment, the pressure differential causes those activated species, themselves, to be either deposited upon or etched away from the surface of a remotely positioned substrate.

Abstract: Disclosed is a method of manufacturing a magnetic recording medium which comprises the steps of: forming a non-magnetic layer on a substrate by using a non-magnetic material which is magnetizable by heat to a predetermined temperature, and then locally heating the non-magnetic layer to magnetize the heated part to thereby form a magnetic layer thereat.

Abstract: An improved process for preparing a semiconductor layer by means of high frequency glow discharge generated between a ground electrode and a RF electrode, the improvement which comprises controlling a DC potential difference between the electrodes at a voltage of not more than 10 V. According to the process, the semiconductor layer formed on the RF electrode side is satisfactory in electrical and electronical properties, and can be practically used.

Abstract: A process for the formation of a compact vertical contact having reduced lateral space requirements yet compatible with highly planarized semiconductor manufacturing processes. The contact is made from a foundation region having a top surface to an overlying layer separated from the foundation region by a dielectric. The overlying layer can be contacted on its edge rather than on its top surface in order to reduce the lateral expanse of the contact.

Abstract: An apparatus for generating a plasma in the lumen of a small diameter tube includes a housing having a diaphragm which separates the housing into a first chamber equipped with a gas inbleed assembly and a second chamber connected to a vacuum source. Parallel plate electrodes in the first chamber are encased in a dielectric which prevents substantially all plasma discharge external of a plasma zone between the electrodes. A conduit maintains gas flow between the chambers. A bore through the dielectric includes the plasma zone and receives the tube to be plasma treated.A method for treating the luminal wall of a plastic tube includes positioning a tube in the plasma zone, evacuating the chambers, bleeding a gas into the chambers, and delivering radiofrequency power to the electrodes. A long tube may be drawn through the plasma zone, or the dielectric and electrodes may be moved past the tube.

Abstract: A method of forming at low temperatures silicon- and nitrogen-containing ceramic or ceramic-like coatings for the protection of electronic devices. The coatings are produced by the ceramification at temperatures of, or below, 400 degrees Centigrade of preceramic silicon nitrogen-containing polymer coatings deposited from a solvent solution. The coatings are useful for planarizing the surfaces of electronic devices and for passivation.

Abstract: A method and apparatus for vacuum coating of materials having a three-dimensional surface structure is disclosed that provides cooling, to prevent heat destruction of those materials during vacuum coating. The web is moved back and forth across the coating area, between rolls. A cooling film is rolled onto each roll with the web. As the web is unrolled, the film is unrolled and recooled before being rolled up again with the web.

Abstract: A method and apparatus is described for combined deposition of thin films of materials from an ion beam source and a molecular beam source in a single reactor.