Abstract: A method of manufacturing a semiconductor device includes: preparing a stepped structure being arranged on a substrate, the stepped structure including a first region and a second region, a height of the stepped structure of the second region being lower than a height of the stepped structure of the first region; and etching the first region and the second region of the stepped structure by irradiating the first region and the second region with an ion beam, an irradiation amount of the ion beam irradiating the first region is larger than an irradiation amount of the ion beam irradiating the second region.

Abstract: Metallic substrate treatment methods and articles comprising a phosphonate functionalized layer are provided. The method comprises contacting a metallic substrate comprising at least one of aluminum and an aluminum alloy with a fluid to form a phosphonate functionalized layer on at least a region of the metallic substrate. The fluid comprises at least one of a phosphonate containing acid and a derivative thereof. At least one of the phosphonate containing acid and the derivative thereof comprises a pKa of a first acidic proton. The fluid comprises a pH at least 0.5 pH value greater than the pKa of the first acidic proton. The article comprises a metallic substrate comprising aluminum or an aluminum alloy and a phosphonate functionalized layer on at least a region of the metallic substrate.

Abstract: A method for producing an Al—Cr—O-based coating on a workpiece surface, including: a) placing a workpiece in an interior of a vacuum chamber, and b) depositing a film comprising aluminum and chromium on the workpiece surface to be coated, wherein a ratio of aluminum to chromium in the film in atomic percentage has a first value corresponding to Al/Cr?2.3, and c) forming volatile compounds of Cr—O, thereby causing at least part of the chromium contained in the film to leave the film in a form of Cr—O volatile compounds, and d) executing step c) during a period of time, within which the chromium content in the film is reduced until attaining a second value of the ratio of aluminum to chromium in the film in atomic percentage corresponding to Al/Cr?3.5, thereby the film is transformed into a film containing a reduced content of chromium.

Abstract: A metalizing bath for an electroless plating system includes a metal ion source, a reducing agent, insoluble particulate matter, and stabilizing components, wherein the stabilizing components comprise at least one anionic surfactant and at least one cationic surfactant.

Abstract: Multi-layer coatings comprising polymerization reaction products of 1,1-di-activated vinyl compounds are described. Also provided are processes for coating substrates with curable compositions comprising 1,1-di-activated vinyl compounds. Also provided are articles coated with this composition.

Abstract: The present invention relates to a method for the protection of a hafnium-free, nickel-based monocrystalline superalloy part against corrosion and oxidation. The method comprises at least the following steps of: manufacturing a hafnium-free, nickel-based monocrystalline superalloy part (1), depositing on the part a first hafnium-free sublayer (2), depositing, on the first sublayer (2), a second hafnium-doped sublayer (3), depositing, on the second sublayer (3), a third hafnium-free sublayer (4), sandblasting the third sublayer (4) to at least partially separate the third sublayer (4) and increase the surface roughness of an upper sub-layer formed by the second sublayer (3) and at least partially by the third sublayer (4), performing oxidation treatment so as to obtain at the surface a layer of hafnium-doped oxidised material (5), depositing a thermal barrier layer (6) on the layer of oxidised material (5).

Abstract: A coated tool in a non-limiting embodiment of the present disclosure includes a base and a coating film located on the base. The coated tool includes a first surface, a second surface adjacent to the first surface, and a cutting edge located on at least a part of a ridge part of the first surface and the second surface. The coating film includes an AlTiN film. The coating film has a first compressive stress ?11 in a first direction which is parallel to a surface of the base and intersects with the cutting edge at an angle of 90°, and a second compressive stress ?22 in a second direction which intersects with the first direction at an angle of 90°. The first compressive stress ?11 is different from the second compressive stress ?22.

Abstract: The current disclosure relates to a vapor deposition assembly for depositing silicon nitride on a substrate by a plasma-enhanced cyclic deposition process. The disclosure also relates to a method for depositing silicon nitride on a substrate by a plasma-enhanced cyclic deposition process. The method comprises providing a substrate in a reaction chamber, providing a vapor-phase silicon precursor according to the formula SiH3X, wherein X is iodine or bromine, into the reaction chamber, removing excess silicon precursor and possible reaction byproducts from the reaction chamber and providing a reactive species generated from a nitrogen-containing plasma into the reaction chamber to form silicon nitride on the substrate. The disclosure further relates to structure and devices formed by the method.

Abstract: A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.

Abstract: Embodiments of the present disclosure generally relate to semiconductor processing, and specifically to methods and apparatus for surface modification of substrates. In an embodiment, a substrate modification method is provided. The method includes positioning a substrate within a processing chamber; and depositing a material on a portion of the substrate by a deposition process, wherein the deposition process comprises: thermally heating the substrate to a temperature of less than about 500° C.; delivering a first electromagnetic energy from an electromagnetic energy source to the substrate to modify a first region of the substrate, the first region of the substrate being at or near an upper surface of the substrate; and depositing a first material on the first region while delivering the first electromagnetic energy.

Abstract: The present inventive concept relates to a method for removing impurities in thin film and a substrate processing apparatus. The method for removing impurities in a thin film includes the steps of: providing a substrate having a thin film formed thereon in a process chamber; supplying a first gas reacting and coupling with impurities contained in the thin film, into the process chamber; exhausting a coupled product of the impurities and the first gas by depressurizing an interior of the process chamber after stopping the supply of the first gas; curing the thin film by supplying a second gas being different from the first gas into the process chamber; and stopping the supply of the second gas and exhausting the remaining second gas from the interior of the process chamber.

Abstract: A method for producing an abrasion-resistant coating on the inner wall of an aluminum alloy workpiece is provide. The steps include mixing a graphene powder and Al powder to obtain a mixed powder; combining and heating the mixed power with a polyvinyl alcohol (PVA) liquid, and performing spray granulation to obtain a low-temperature self-propagating composite; stirring a slurry comprising the low-temperature self-propagating composite and sodium silicate; injecting the slurry into a cylindrical inner cavity of an aluminum alloy workpiece mounted on a horizontal rotary table for rotation, the aluminum alloy workpiece is heated with the rotation at a second temperature of 80-100° C. so that the slurry is uniformly solidified on the cylindrical inner surface of the cylindrical inner cavity; and burning the slurry, after the slurry is uniformly solidified and while the rotation is maintained, with an oxyacetylene flame to form the wear-resistant coating.

Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.

Abstract: Disclosed is a method for treating wood veneer, including the steps of providing at least one sheet of wood veneer; coating at least one side of the sheet of wood veneer with an aqueous coating composition including nanocellulose to obtain a coated sheet of wood veneer; and drying the coated sheet using compression pressure and heat. Also disclosed is a coated wood veneer including a sheet of wood veneer and a coating including nanocellulose arranged on at least one surface of the sheet.

Abstract: A manufacturing method is provided during which a preform component for a turbine engine is provided. The preform component includes a substrate and a locating feature at an exterior surface of the substrate. An outer coating is applied over the substrate. The outer coating covers the locating feature. At least a portion of the preform component and the outer coating are scanned with an imaging system to provide scan data indicative of a location of the locating feature. A cooling aperture is formed in the substrate and the outer coating based on the scan data.

Abstract: A porous thin film includes a framework that includes a plurality of pores. The pores extend from an opening located at an upper surface of the framework to a bottom surface contained in the framework. A pore-coating film is formed on sidewalls and the bottom surface of the pores.

Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.

Abstract: In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.

Abstract: Methods and systems for depositing vanadium nitride layers onto a surface of the substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a vanadium nitride layer onto a surface of the substrate. The cyclical deposition process can include providing a vanadium halide precursor to the reaction chamber and separately providing a nitrogen reactant to the reaction chamber. The cyclical deposition process may desirably be a thermal cyclical deposition process.

Abstract: A method comprising providing a carbonaceous material, the substrate having a first thermal conductivity. The method further comprises depositing a first masking layer having a second thermal conductivity on at least a portion of the substrate, a ratio of the second thermal conductivity to the first thermal conductivity being less than or equal to 1:30. The method further comprises depositing a second masking layer on the first masking layer to form an etch mask, and etching an exposed portion of the substrate.