Abstract: A coherent optical source, having a center frequency in the terahertz band can be generated. Two coherent optical sources of different frequencies can be mixed in a nonlinear crystal to generate an optical source having a third distinct frequency in the terahertz frequency range. The third frequency, an idler frequency, equals the difference between pump and signal wave frequencies incident on the crystal. The pump and signal wave frequencies are selected so that their frequency difference is in the terahertz range and so that the interaction between the pump, signal, and idler wave frequencies is phase matched using a cross-Reststrahlen band dispersion-compensated phasematching technique.

Abstract: A sterilization apparatus wherein one or more electron beam tubes are used to direct electron beams into an ambient gaseous environment to create an electron plasma cloud into which non-sterile target objects may be moved. The electron plasma cloud is formed by interaction of the electron beam with the ambient atmosphere. Helium or other like gaseous may be used to expand the effective volume of the electron plasma cloud. Manipulators are used to move target objects in the electron plasma cloud, exposing non-sterile surfaces to the cloud and then joining the surfaces together where appropriate. The beam tube used to generate the electron beam has a thin low energy absorbing window which allows relatively low energy beams to be used, minimizing damage to materials within the surface of the target objects.

Abstract: A charged beam lithography method simultaneously uses multiple charged beams to irradiate a workpiece. In specific embodiments, collimators are employed to assist in aligning the multiple charged beams by eliminating "noise" from reflections of other beams. Each collimator is positioned to correspond with respective of the charged beams and detectors for detecting reflected particles from the charged beams. The particles are reflected from particular marks used in the alignment process.

Abstract: Water vapor enhanced focused particle beam machining speeds up the removal of polymer-based dielectric materials from areas surrounding metallic interconnects on integrated circuits while at the same time decreasing the rate of removal of aluminum. Selective material removal protects metal interconnects from machining damage and greatly reduces the time that protective material is exposed to the particle beam.

Abstract: There is disclosed a small-sized and inexpensive electron spectroscopic imaging (ESI) system using an .OMEGA.-filter. The amounts of currents supplied to the lenses located before and after the .OMEGA.-filter need not be varied, whether the .OMEGA.-filter is used or not. The .OMEGA.-filter has an entrance window and an exit window. A straight path is formed between these two windows. A coil in an objective lens is located above a specimen. An entrance aperture is positioned close to the back focal plane of the objective lens. The objective lens is so energized that an electron microscope image is focused at the center of the filter on the straight path. The first stage of imaging lens is so energized that an image at the position P is an object plane. This image is magnified and focused onto a fluorescent screen by the following stages of imaging lenses.

Abstract: A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.

Abstract: A charge-exchange device is disclosed which is able to considerably reduce, without the use of foils, radio activation caused by a beam deflection angle and, which also implements a further efficiency and reduction of a laser output. The charge-exchange device is provided with an undulator and an optical resonator. The undulator magnetic field which has been generated by the undulator generates the Lorentz electric field by interaction with the relativistic velocity of H.sup.0 neutral beam being injected. The optical resonator amplifies the photon density of the laser beam and causes it to collide against the injected H.sup.0 neutral beam, thereby resonantly exciting the H.sup.0 beam to the principal quantum number of 4. The H.sup.0 beam which has been resonantly excited or excited by the relativistic Doppler effect in the undulator magnetic field is ionized to H.sup.+ ion by the Lorentz electric field.

Abstract: A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle beam before exposing the charged-particle beam onto an object. The method includes the steps of mounting masks having the same aperture to the at least two exposure columns; scanning, in each of the at least two exposure columns, the charged-particle beam over an area containing a mark on a surface substantially at the same height as the object after passing the charged-particle beam through the same aperture; obtaining, in each of the at least two exposure columns, a signal waveform corresponding to the scan by detecting charged particles scattered by the mark; and comparing the signal waveform between the at least two exposure columns.

Abstract: A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.

Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope.

Abstract: The present invention relates to a means and method for decreasing the energy distribution of ions produced from solid or liquid samples by pulsed desorption method. More particularly, the present invention discloses a method wherein the kinetic energies of ions are related to their locations at a given time after the excitation event which caused their desorption. Based on this relationship between ion position and energy, an accelerating electric field is applied at a predetermined time after the excitation event. The magnitude of the applied electric field and the time of its application are such that the kinetic energy distribution of the ions is substantially reduced or eliminated.

Abstract: An E-beam generator and detector arrangement sends an electron beam through a series of differentially evacuated vacuum chambers of small size to detect faulty circuitry in individual semiconductor devices. The vacuum chambers are open to one end and are sealed by the semiconductor device without contacting the vacuum chambers. A laser generator is operated by a control system with the E-beam generator and detector arrangement to provide a laser beam in a known physical relationship to the electron beam to correct detected faulty circuitry in the semiconductor devices. The E-beam generator and detector arrangement confirms the correction without further handling of the semiconductor device.

Abstract: An ion beam generator includes an ion beam source for generating an ion beam, an acceleration/deceleration column for selectably accelerating or decelerating ions in the ion beam to desired energies, a source filter positioned between the ion beam source and the acceleration/deceleration column for removing first undesired species from the ion beam, and a mass analyzer positioned downstream of the acceleration/deceleration column for removing second undesired species from the ion beam. The ion beam generator supplies an energetic ion beam having a low level of energy and mass contaminants. The ion beam generator may be utilized in an ion implanter.

Abstract: This invention includes an iso-energetic intensity modulating filter and method for therapeutic charged-particle beams, preferably electron beams, in which attenuating members are arranged to completely attenuate portions of the beam while permitting other portions of the beam to pass through the space between attenuating members. The attenuating members block the charged particles without producing any significant bremsstrahlung contamination in the filtered beam. The attenuating members can be arranged in a large number of configurations to obtain the desired modulated beam intensity profile. This invention also includes an improved iso-energetic, intensity-modulated charged-particle beam produced by the filtering device and method of this invention. A charged-particle beam therapeutic device and treatment method which has the iso-energetic intensity modulating filter is also included in this invention.

Abstract: An Electrospray probe which includes a replaceable or disposable micron size diameter Electrospray tip used for low flow rate Electrospray has been developed. The Electrospray probe assembly combines the use of a low pressure gas and electric fields to initiate and sustain the Electrospray process at low liquid flow rates. The operational flow rates of this probe range from below 25 nL/min to over 1 .mu.L/min, with total sample volume loaded ranging from less than 1 .mu.L to over 20 .mu.L. The Electrospray probe assembly includes axial and radial adjustment of the Electrospray tip position relative to the sampling orifice into vacuum and that tip position can be locked in place. The replaceable microtip can be safely removed from the Electrospray (ES) chamber without turning off high voltage within the ES chamber. Telescoping support ways have been included to prevent ES tip damage by guiding the Electrospray probe tip during removal from and insertion into the ES chamber.

Abstract: There is disclosed a scanning probe microscope capable of operating either as a scanning tunneling microscope (STM) or as an atomic force microscope (AFM). The probe microscope uses only one scanner in both modes of operation. When the instrument is operated in the AFM mode, the scanner is mounted to a base stage. The distance between a sample and an AFM tip is controlled. The sample is held to the front end of the scanner. An atomic force exerted between the tip and the sample is measured. When the instrument is operated in the STM mode, a sample stage is mounted to the base stage. The scanner is held opposite to the sample stage. A voltage is applied between the sample held to the sample stage and an STM tip attached to the front end of the scanner. The induced tunneling current between the STM tip and the sample is measured.

Abstract: An apparatus and method to separate and store ions by exploiting mobility characteristics of the ions. A sample is introduced into a trap volume and ionized. The ions are separated according to their mobility characteristics by applying an electric field to the trap volume. The ions thus migrate to equilibrium positions in the trap volume due to a difference in mobilities and to changes in the electric field. The ions may be sequentially scanned from the trap by changing the electric field. The identity of ions within the trap may then be determined.

Abstract: An ultraviolet irradiation device of the optical path division type for treating a workpiece which is often subject to deformations and color changes due to heat, and in which the distribution of radiance is good and the average irradiance on the surface irradiated with light can be increased which can be achieved with light emitted from a rod-shaped lamp and reflected by a trough=shaped cold mirror being incident in cold mirrors which split the optical path. This light is thus divided into two parts and is incident in total reflection mirrors. On the other hand, the direct light emitted by the rod-shaped lamp is incident in second optical path splitting cold mirrors which divides this light and causes it to be incident in the total reflection mirrors. The light reflected by the total reflection mirrors is incident in heat reflection filters, and is transmitted by the heat reflection filters so as to be radiated onto a workpiece.

Abstract: An electron beam exposure system which includes a plurality of electron beam exposure apparatuses and achieves reduction in the memory of an electron beam exposure apparatus by eliminating data transfer/data conversion for each electron beam exposure apparatus. The plurality of electron beam exposure apparatuses of the electron beam exposure system deflect an electron beam on the basis of control data and expose a pattern onto an object to be exposed, and a data control device sends, on the basis of pattern information of a pattern to be exposed which is sent out from one of the electron beam exposure apparatuses, control data corresponding to the pattern to be exposed to the electron beam exposure apparatus which has sent the pattern information. Also disclosed is a method of manufacturing devices, which utilizes a plurality of electron beam exposure apparatuses.

Abstract: .[.The invention teaches the uses of a plurality of electric fields and of orthogonal spray configurations of vaporized analyte which combine so as to operate to enhance the efficiency of analyte detection and mass analysis with a mass spectrometer by reducing vapor in the vacuum system and concomitant noise. Several embodiments of the invention are described for purposes of illustration..]. .Iadd.The invention relates to a method and apparatus for improving signal relative to noise without loss of ion collection efficiency in electrospray mass spectrometry, including liquid chromatography/mass spectrometry..Iaddend.